JPS645691B2 - - Google Patents

Info

Publication number
JPS645691B2
JPS645691B2 JP9925481A JP9925481A JPS645691B2 JP S645691 B2 JPS645691 B2 JP S645691B2 JP 9925481 A JP9925481 A JP 9925481A JP 9925481 A JP9925481 A JP 9925481A JP S645691 B2 JPS645691 B2 JP S645691B2
Authority
JP
Japan
Prior art keywords
weight
resin composition
photosensitive resin
parts
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9925481A
Other languages
English (en)
Japanese (ja)
Other versions
JPS581142A (ja
Inventor
Hajime Kakumaru
Nobuyuki Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP9925481A priority Critical patent/JPS581142A/ja
Publication of JPS581142A publication Critical patent/JPS581142A/ja
Publication of JPS645691B2 publication Critical patent/JPS645691B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP9925481A 1981-06-25 1981-06-25 感光性樹脂組成物及び感光性樹脂組成物積層体 Granted JPS581142A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9925481A JPS581142A (ja) 1981-06-25 1981-06-25 感光性樹脂組成物及び感光性樹脂組成物積層体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9925481A JPS581142A (ja) 1981-06-25 1981-06-25 感光性樹脂組成物及び感光性樹脂組成物積層体

Publications (2)

Publication Number Publication Date
JPS581142A JPS581142A (ja) 1983-01-06
JPS645691B2 true JPS645691B2 (nl) 1989-01-31

Family

ID=14242571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9925481A Granted JPS581142A (ja) 1981-06-25 1981-06-25 感光性樹脂組成物及び感光性樹脂組成物積層体

Country Status (1)

Country Link
JP (1) JPS581142A (nl)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5888741A (ja) * 1981-11-20 1983-05-26 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性樹脂組成物積層体
JPS604291A (ja) * 1983-06-22 1985-01-10 日立化成工業株式会社 印刷配線板の製造法
JPS60140236A (ja) * 1983-12-27 1985-07-25 Toppan Printing Co Ltd 画像形成材料
JPH0614185B2 (ja) * 1984-04-02 1994-02-23 日立化成工業株式会社 感光性樹脂組成物及びこれを用いた積層体
JPH0617433B2 (ja) * 1984-05-14 1994-03-09 日立化成工業株式会社 感光性樹脂組成物
JPS61186952A (ja) * 1985-02-15 1986-08-20 Mitsubishi Rayon Co Ltd 光重合性樹脂組成物
JPS62290705A (ja) * 1986-06-10 1987-12-17 Mitsubishi Chem Ind Ltd 光重合性組成物
JPS638735A (ja) * 1986-06-30 1988-01-14 Tokyo Ohka Kogyo Co Ltd パタ−ン形成用感光性樹脂板
JPS63147159A (ja) * 1986-12-11 1988-06-20 Fuji Photo Film Co Ltd 光重合性組成物
JP2536540B2 (ja) * 1987-08-26 1996-09-18 日立化成工業株式会社 感光性樹脂組成物
AU634214B2 (en) * 1989-03-14 1993-02-18 Robert Koch Procaine double salt complexes
EP0831372A1 (de) * 1996-09-23 1998-03-25 Siemens Aktiengesellschaft Photopolymere
MY120763A (en) 1997-09-19 2005-11-30 Hitachi Chemical Co Ltd Photosensitive film, process for laminating photosensitive resin layer, photosensitive resin layer-laminated substrate and process for curing photosensitive resin layer

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5139260A (ja) * 1974-09-24 1976-04-01 Kubota Ltd Idodatsukokuki
JPS5143374A (en) * 1974-10-11 1976-04-14 Showa Oil Kihatsuseino tankasuisoo fukumu gasuno jokahoho
JPS5425957A (en) * 1977-07-29 1979-02-27 Nippon Zeon Co Ltd Curable rubber composition having excellent resistance to rancid gasoline
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate

Also Published As

Publication number Publication date
JPS581142A (ja) 1983-01-06

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