JPS6228457B2 - - Google Patents

Info

Publication number
JPS6228457B2
JPS6228457B2 JP59239330A JP23933084A JPS6228457B2 JP S6228457 B2 JPS6228457 B2 JP S6228457B2 JP 59239330 A JP59239330 A JP 59239330A JP 23933084 A JP23933084 A JP 23933084A JP S6228457 B2 JPS6228457 B2 JP S6228457B2
Authority
JP
Japan
Prior art keywords
naphthoquinone
diazide
composition
photosensitive component
sensitivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59239330A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61118744A (ja
Inventor
Susumu Ichikawa
Masanori Myabe
Yoshiaki Arai
Shingo Asaumi
Akira Yokota
Hisashi Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP59239330A priority Critical patent/JPS61118744A/ja
Publication of JPS61118744A publication Critical patent/JPS61118744A/ja
Publication of JPS6228457B2 publication Critical patent/JPS6228457B2/ja
Priority to DE19873727848 priority patent/DE3727848A1/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
JP59239330A 1984-11-15 1984-11-15 ポジ型ホトレジスト組成物 Granted JPS61118744A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59239330A JPS61118744A (ja) 1984-11-15 1984-11-15 ポジ型ホトレジスト組成物
DE19873727848 DE3727848A1 (de) 1984-11-15 1987-08-20 Positiv-arbeitende photoresistzusammensetzung, verfahren zu ihrer herstellung und ihre verwendung

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59239330A JPS61118744A (ja) 1984-11-15 1984-11-15 ポジ型ホトレジスト組成物
DE19873727848 DE3727848A1 (de) 1984-11-15 1987-08-20 Positiv-arbeitende photoresistzusammensetzung, verfahren zu ihrer herstellung und ihre verwendung

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP1103208A Division JPH0743534B2 (ja) 1989-04-21 1989-04-21 半導体デバイス用レジストパターンの製造方法

Publications (2)

Publication Number Publication Date
JPS61118744A JPS61118744A (ja) 1986-06-06
JPS6228457B2 true JPS6228457B2 (enrdf_load_stackoverflow) 1987-06-20

Family

ID=39361313

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59239330A Granted JPS61118744A (ja) 1984-11-15 1984-11-15 ポジ型ホトレジスト組成物

Country Status (2)

Country Link
JP (1) JPS61118744A (enrdf_load_stackoverflow)
DE (1) DE3727848A1 (enrdf_load_stackoverflow)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
JPS6343134A (ja) * 1986-08-11 1988-02-24 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPS6449038A (en) * 1987-08-19 1989-02-23 Mitsubishi Chem Ind Positive type photoresist composition
JP2816677B2 (ja) * 1987-10-05 1998-10-27 三菱化学株式会社 キノンジアジド系感光性化合物の製造方法
JPH0781030B2 (ja) * 1987-11-30 1995-08-30 日本合成ゴム株式会社 感放射線性樹脂組成物
JP2697039B2 (ja) * 1988-12-06 1998-01-14 住友化学工業株式会社 ポジ型レジスト組成物の製造方法
JPH03242650A (ja) * 1990-02-20 1991-10-29 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
EP0525185B1 (en) * 1991-01-11 1997-07-16 Sumitomo Chemical Company Limited Positive resist composition
JP3064595B2 (ja) 1991-04-26 2000-07-12 住友化学工業株式会社 ポジ型レジスト組成物
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP2626467B2 (ja) * 1993-04-30 1997-07-02 日本合成ゴム株式会社 １，２−キノンジアジドスルホン酸エステルの製造方法
JP2626468B2 (ja) * 1993-04-30 1997-07-02 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
DE4401940A1 (de) * 1994-01-24 1995-07-27 Hoechst Ag Positiv arbeitendes Aufzeichnungsmaterial mit verbesserter Entwickelbarkeit
JP4312946B2 (ja) 2000-10-31 2009-08-12 Ａｚエレクトロニックマテリアルズ株式会社 感光性樹脂組成物
CN101999097A (zh) 2008-07-29 2011-03-30 东亚合成株式会社 导电性高分子的图案形成方法
CN102770812B (zh) 2010-01-25 2015-07-01 东亚合成株式会社 含导电性高分子的基材上的光致抗蚀剂用显影液、以及图形形成方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE938233C (de) * 1953-03-11 1956-01-26 Kalle & Co Ag Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
NL255348A (enrdf_load_stackoverflow) * 1959-08-29
US3146983A (en) * 1961-11-08 1964-09-01 Chicago Bridge & Iron Co Mounting for invertible vessel
DE3040157A1 (de) * 1980-10-24 1982-06-03 Hoechst Ag, 6000 Frankfurt Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial
JPS5817112A (ja) * 1981-06-22 1983-02-01 フイリツプ・エイ・ハント・ケミカル・コ−ポレイシヨン ポジ型ノボラツクホトレジスト組成物及びその調製物
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
JPH0635703B2 (ja) * 1985-07-24 1994-05-11 俊昭 廣津 タフテイング方法

Also Published As

Publication number Publication date
DE3727848A1 (de) 1989-03-02
JPS61118744A (ja) 1986-06-06

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term