JPS61118744A - ポジ型ホトレジスト組成物 - Google Patents

ポジ型ホトレジスト組成物

Info

Publication number
JPS61118744A
JPS61118744A JP59239330A JP23933084A JPS61118744A JP S61118744 A JPS61118744 A JP S61118744A JP 59239330 A JP59239330 A JP 59239330A JP 23933084 A JP23933084 A JP 23933084A JP S61118744 A JPS61118744 A JP S61118744A
Authority
JP
Japan
Prior art keywords
naphthoquinone
composition
obtd
resist
diazide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59239330A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6228457B2 (enrdf_load_stackoverflow
Inventor
Susumu Ichikawa
市川　進
Masanori Miyabe
宮部　将典
Yoshiaki Arai
荒井　喜晶
Shingo Asaumi
浅海　慎五
Akira Yokota
晃 横田
Hisashi Nakane
中根　久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP59239330A priority Critical patent/JPS61118744A/ja
Publication of JPS61118744A publication Critical patent/JPS61118744A/ja
Publication of JPS6228457B2 publication Critical patent/JPS6228457B2/ja
Priority to DE19873727848 priority patent/DE3727848A1/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
JP59239330A 1984-11-15 1984-11-15 ポジ型ホトレジスト組成物 Granted JPS61118744A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59239330A JPS61118744A (ja) 1984-11-15 1984-11-15 ポジ型ホトレジスト組成物
DE19873727848 DE3727848A1 (de) 1984-11-15 1987-08-20 Positiv-arbeitende photoresistzusammensetzung, verfahren zu ihrer herstellung und ihre verwendung

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59239330A JPS61118744A (ja) 1984-11-15 1984-11-15 ポジ型ホトレジスト組成物
DE19873727848 DE3727848A1 (de) 1984-11-15 1987-08-20 Positiv-arbeitende photoresistzusammensetzung, verfahren zu ihrer herstellung und ihre verwendung

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP1103208A Division JPH0743534B2 (ja) 1989-04-21 1989-04-21 半導体デバイス用レジストパターンの製造方法

Publications (2)

Publication Number Publication Date
JPS61118744A true JPS61118744A (ja) 1986-06-06
JPS6228457B2 JPS6228457B2 (enrdf_load_stackoverflow) 1987-06-20

Family

ID=39361313

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59239330A Granted JPS61118744A (ja) 1984-11-15 1984-11-15 ポジ型ホトレジスト組成物

Country Status (2)

Country Link
JP (1) JPS61118744A (enrdf_load_stackoverflow)
DE (1) DE3727848A1 (enrdf_load_stackoverflow)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6343134A (ja) * 1986-08-11 1988-02-24 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPS6449038A (en) * 1987-08-19 1989-02-23 Mitsubishi Chem Ind Positive type photoresist composition
JPH0193735A (ja) * 1987-10-05 1989-04-12 Mitsubishi Kasei Corp キノンジアジド系感光性化合物の製造方法
JPH01144463A (ja) * 1987-11-30 1989-06-06 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JPH03242650A (ja) * 1990-02-20 1991-10-29 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
US5087548A (en) * 1985-12-27 1992-02-11 Japan Synthetic Rubber Co., Inc. Positive type radiation-sensitive resin composition
WO1992012205A1 (en) * 1991-01-11 1992-07-23 Sumitomo Chemical Company, Limited Positive resist composition
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
JPH06148879A (ja) * 1993-04-30 1994-05-27 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH06214384A (ja) * 1993-04-30 1994-08-05 Japan Synthetic Rubber Co Ltd １，２−キノンジアジドスルホン酸エステルの製造方法
US6383708B1 (en) 1991-04-26 2002-05-07 Sumitomo Chemical Company, Limited Positive resist composition
WO2002037185A1 (fr) * 2000-10-31 2002-05-10 Clariant International Ltd. Composition de resine photosensible
KR20110041434A (ko) 2008-07-29 2011-04-21 도아고세이가부시키가이샤 도전성 고분자의 패턴 형성 방법
US8895227B2 (en) 2010-01-25 2014-11-25 Toagosei Co., Ltd. Developing solution for photoresist on substrate including conductive polymer, and method for forming pattern

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2697039B2 (ja) * 1988-12-06 1998-01-14 住友化学工業株式会社 ポジ型レジスト組成物の製造方法
DE4401940A1 (de) * 1994-01-24 1995-07-27 Hoechst Ag Positiv arbeitendes Aufzeichnungsmaterial mit verbesserter Entwickelbarkeit

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3106465A (en) * 1953-03-11 1963-10-08 Azoplate Corp Naphthoquinone diazide lithographic material and process of making printing plates therewith
US3146983A (en) * 1961-11-08 1964-09-01 Chicago Bridge & Iron Co Mounting for invertible vessel
US3148983A (en) * 1959-08-29 1964-09-15 Azoplate Corp Light sensitive omicron-quinone diazides and the photomechanical preparation of printing plates therewith
JPS5817112A (ja) * 1981-06-22 1983-02-01 フイリツプ・エイ・ハント・ケミカル・コ−ポレイシヨン ポジ型ノボラツクホトレジスト組成物及びその調製物
US4409314A (en) * 1980-10-24 1983-10-11 Hoechst Aktiengesellschaft Light-sensitive compounds, light-sensitive mixture, and light-sensitive copying material prepared therefrom
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
JPS6228457A (ja) * 1985-07-24 1987-02-06 廣津　俊昭 タフテイング方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3106465A (en) * 1953-03-11 1963-10-08 Azoplate Corp Naphthoquinone diazide lithographic material and process of making printing plates therewith
US3148983A (en) * 1959-08-29 1964-09-15 Azoplate Corp Light sensitive omicron-quinone diazides and the photomechanical preparation of printing plates therewith
US3146983A (en) * 1961-11-08 1964-09-01 Chicago Bridge & Iron Co Mounting for invertible vessel
US4409314A (en) * 1980-10-24 1983-10-11 Hoechst Aktiengesellschaft Light-sensitive compounds, light-sensitive mixture, and light-sensitive copying material prepared therefrom
JPS5817112A (ja) * 1981-06-22 1983-02-01 フイリツプ・エイ・ハント・ケミカル・コ−ポレイシヨン ポジ型ノボラツクホトレジスト組成物及びその調製物
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
JPS6228457A (ja) * 1985-07-24 1987-02-06 廣津　俊昭 タフテイング方法

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5087548A (en) * 1985-12-27 1992-02-11 Japan Synthetic Rubber Co., Inc. Positive type radiation-sensitive resin composition
JPS6343134A (ja) * 1986-08-11 1988-02-24 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPS6449038A (en) * 1987-08-19 1989-02-23 Mitsubishi Chem Ind Positive type photoresist composition
JPH0193735A (ja) * 1987-10-05 1989-04-12 Mitsubishi Kasei Corp キノンジアジド系感光性化合物の製造方法
JPH01144463A (ja) * 1987-11-30 1989-06-06 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JPH03242650A (ja) * 1990-02-20 1991-10-29 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
US5283155A (en) * 1991-01-11 1994-02-01 Sumitomo Chemical Company, Limited Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative
WO1992012205A1 (en) * 1991-01-11 1992-07-23 Sumitomo Chemical Company, Limited Positive resist composition
US6383708B1 (en) 1991-04-26 2002-05-07 Sumitomo Chemical Company, Limited Positive resist composition
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
JPH06148879A (ja) * 1993-04-30 1994-05-27 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH06214384A (ja) * 1993-04-30 1994-08-05 Japan Synthetic Rubber Co Ltd １，２−キノンジアジドスルホン酸エステルの製造方法
WO2002037185A1 (fr) * 2000-10-31 2002-05-10 Clariant International Ltd. Composition de resine photosensible
KR100859274B1 (ko) 2000-10-31 2008-09-19 에이제토 엘렉토로닉 마티리알즈 가부시키가이샤 감광성 수지 조성물
KR20110041434A (ko) 2008-07-29 2011-04-21 도아고세이가부시키가이샤 도전성 고분자의 패턴 형성 방법
US8895227B2 (en) 2010-01-25 2014-11-25 Toagosei Co., Ltd. Developing solution for photoresist on substrate including conductive polymer, and method for forming pattern

Also Published As

Publication number Publication date
DE3727848A1 (de) 1989-03-02
JPS6228457B2 (enrdf_load_stackoverflow) 1987-06-20

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Legal Events

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