JPS62109222A - 磁気記録媒体 - Google Patents
磁気記録媒体Info
- Publication number
- JPS62109222A JPS62109222A JP61219912A JP21991286A JPS62109222A JP S62109222 A JPS62109222 A JP S62109222A JP 61219912 A JP61219912 A JP 61219912A JP 21991286 A JP21991286 A JP 21991286A JP S62109222 A JPS62109222 A JP S62109222A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- silicon
- magnetic recording
- substrate
- hard carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 title claims description 91
- 239000010410 layer Substances 0.000 claims description 167
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 63
- 229910052710 silicon Inorganic materials 0.000 claims description 62
- 239000010703 silicon Substances 0.000 claims description 62
- 239000000758 substrate Substances 0.000 claims description 44
- 229910021385 hard carbon Inorganic materials 0.000 claims description 42
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 11
- 239000011253 protective coating Substances 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 229910003481 amorphous carbon Inorganic materials 0.000 claims description 2
- 239000010408 film Substances 0.000 description 36
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 30
- 229910052799 carbon Inorganic materials 0.000 description 30
- 239000011241 protective layer Substances 0.000 description 26
- 238000000151 deposition Methods 0.000 description 21
- 230000008021 deposition Effects 0.000 description 20
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 10
- 239000001257 hydrogen Substances 0.000 description 10
- 229910052739 hydrogen Inorganic materials 0.000 description 10
- 239000000853 adhesive Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 8
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 6
- 229910021332 silicide Inorganic materials 0.000 description 6
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- 239000006249 magnetic particle Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 229910000077 silane Inorganic materials 0.000 description 5
- 238000005299 abrasion Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000013081 microcrystal Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 238000004627 transmission electron microscopy Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910001004 magnetic alloy Inorganic materials 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- VLJQDHDVZJXNQL-UHFFFAOYSA-N 4-methyl-n-(oxomethylidene)benzenesulfonamide Chemical compound CC1=CC=C(S(=O)(=O)N=C=O)C=C1 VLJQDHDVZJXNQL-UHFFFAOYSA-N 0.000 description 1
- 229910019974 CrSi Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910019026 PtCr Inorganic materials 0.000 description 1
- -1 PtSi or CrSi Chemical compound 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 238000004838 photoelectron emission spectroscopy Methods 0.000 description 1
- 229910021340 platinum monosilicide Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
- G11B5/726—Two or more protective coatings
- G11B5/7262—Inorganic protective coating
- G11B5/7264—Inorganic carbon protective coating, e.g. graphite, diamond like carbon or doped carbon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/90—Magnetic feature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/793,517 US4647494A (en) | 1985-10-31 | 1985-10-31 | Silicon/carbon protection of metallic magnetic structures |
| US793517 | 1985-10-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62109222A true JPS62109222A (ja) | 1987-05-20 |
| JPH0416853B2 JPH0416853B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-03-25 |
Family
ID=25160095
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61219912A Granted JPS62109222A (ja) | 1985-10-31 | 1986-09-19 | 磁気記録媒体 |
Country Status (4)
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6476423A (en) * | 1987-09-17 | 1989-03-22 | Nec Corp | Magnetic disk |
| JPH01125720A (ja) * | 1987-11-10 | 1989-05-18 | Nec Corp | 磁気記憶体及びその製造方法 |
| JP2013501219A (ja) * | 2009-07-29 | 2013-01-10 | ウオーターズ・テクノロジーズ・コーポレイシヨン | 被覆されたステータ表面を有する回転シアーインジェクタ弁 |
Families Citing this family (100)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3546325C2 (de) * | 1985-01-17 | 1994-06-01 | Hitachi Metals Ltd | Magnetisches Aufzeichnungsmedium |
| US4877677A (en) * | 1985-02-19 | 1989-10-31 | Matsushita Electric Industrial Co., Ltd. | Wear-protected device |
| JPS61242323A (ja) * | 1985-04-19 | 1986-10-28 | Fuji Electric Co Ltd | 磁気記録媒体 |
| US5300951A (en) * | 1985-11-28 | 1994-04-05 | Kabushiki Kaisha Toshiba | Member coated with ceramic material and method of manufacturing the same |
| US4755426A (en) * | 1986-01-18 | 1988-07-05 | Hitachi Maxell, Ltd. | Magnetic recording medium and production of the same |
| US4994321A (en) * | 1986-01-24 | 1991-02-19 | Fuji Photo Film Co., Ltd. | Perpendicular magnetic recording medium and the method for preparing the same |
| US4804590A (en) * | 1986-02-06 | 1989-02-14 | Nihon Shinku Gijutsu Kabushiki Kaisha | Abrasion resistant magnetic recording member |
| US4833031A (en) * | 1986-03-20 | 1989-05-23 | Matsushita Electric Industrial Co., Ltd. | Magnetic recording medium |
| JP2532209B2 (ja) * | 1986-04-04 | 1996-09-11 | ティーディーケイ株式会社 | 磁気記録媒体 |
| US4840844A (en) * | 1986-06-02 | 1989-06-20 | Hitachi, Ltd. | Magnetic recording medium |
| JPH07114016B2 (ja) * | 1986-06-12 | 1995-12-06 | 株式会社東芝 | 磁気記録媒体及びその製造方法 |
| DE3630419A1 (de) * | 1986-09-06 | 1988-03-10 | Kernforschungsanlage Juelich | Verfahren zur beschichtung von hoher waermebelastung ausgesetzten bauelementen mit einer amorphen wasserstoffhaltigen kohlenstoffschicht |
| JP2791015B2 (ja) * | 1986-12-24 | 1998-08-27 | 株式会社日立製作所 | 磁気記録媒体 |
| DE3644823A1 (de) * | 1986-12-31 | 1988-07-14 | Basf Ag | Magnetische aufzeichnungstraeger |
| US4861662A (en) * | 1987-02-03 | 1989-08-29 | Akashic Memories Corporation | Protective layer for magnetic disk |
| WO1988006334A1 (en) * | 1987-02-13 | 1988-08-25 | Akashic Memories Corporation | Surface coating for magnetic head |
| JPH0827940B2 (ja) * | 1987-04-24 | 1996-03-21 | 日本電気株式会社 | 磁気記憶体およびその製造方法 |
| JP2610469B2 (ja) * | 1988-02-26 | 1997-05-14 | 株式会社 半導体エネルギー研究所 | 炭素または炭素を主成分とする被膜を形成する方法 |
| US6224952B1 (en) * | 1988-03-07 | 2001-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Electrostatic-erasing abrasion-proof coating and method for forming the same |
| US5190824A (en) * | 1988-03-07 | 1993-03-02 | Semiconductor Energy Laboratory Co., Ltd. | Electrostatic-erasing abrasion-proof coating |
| US5275850A (en) * | 1988-04-20 | 1994-01-04 | Hitachi, Ltd. | Process for producing a magnetic disk having a metal containing hard carbon coating by plasma chemical vapor deposition under a negative self bias |
| US5030494A (en) * | 1989-01-26 | 1991-07-09 | International Business Machines Corporation | Carbon overcoat for a thin film magnetic recording disk containing discrete clusters of tungsten (W) or tungsten carbide (WC) which project from the surface of the overcoat |
| US5104694A (en) * | 1989-04-21 | 1992-04-14 | Nippon Telephone & Telegraph Corporation | Selective chemical vapor deposition of a metallic film on the silicon surface |
| US5266409A (en) * | 1989-04-28 | 1993-11-30 | Digital Equipment Corporation | Hydrogenated carbon compositions |
| US5031029A (en) * | 1990-04-04 | 1991-07-09 | International Business Machines Corporation | Copper device and use thereof with semiconductor devices |
| US5316844A (en) * | 1990-04-16 | 1994-05-31 | Hoya Electronics Corporation | Magnetic recording medium comprising an aluminum alloy substrate, now magnetic underlayers, magnetic layer, protective layer, particulate containing protective layer and lubricant layer |
| JP2910149B2 (ja) * | 1990-04-26 | 1999-06-23 | 松下電器産業株式会社 | 磁気記録媒体 |
| US5135808A (en) * | 1990-09-27 | 1992-08-04 | Diamonex, Incorporated | Abrasion wear resistant coated substrate product |
| US5637353A (en) * | 1990-09-27 | 1997-06-10 | Monsanto Company | Abrasion wear resistant coated substrate product |
| US5527596A (en) * | 1990-09-27 | 1996-06-18 | Diamonex, Incorporated | Abrasion wear resistant coated substrate product |
| US5164220A (en) * | 1990-10-29 | 1992-11-17 | Diamond Technologies Company | Method for treating diamonds to produce bondable diamonds for depositing same on a substrate |
| US5271802A (en) * | 1990-12-27 | 1993-12-21 | International Business Machines Corporation | Method for making a thin film magnetic head having a protective coating |
| JPH06101462B2 (ja) * | 1991-04-30 | 1994-12-12 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 過フッ化炭化水素ポリマ膜を基板に接着する方法および 基板 |
| JPH05135344A (ja) * | 1991-05-17 | 1993-06-01 | Tdk Corp | 磁気記録媒体 |
| US5707717A (en) * | 1991-10-29 | 1998-01-13 | Tdk Corporation | Articles having diamond-like protective film |
| US5541003A (en) * | 1991-10-31 | 1996-07-30 | Tdk Corporation | Articles having diamond-like protective thin film |
| US5294518A (en) * | 1992-05-01 | 1994-03-15 | International Business Machines Corporation | Amorphous write-read optical storage memory |
| JP3099928B2 (ja) * | 1992-07-07 | 2000-10-16 | ティーディーケイ株式会社 | 磁気ディスク装置 |
| US5374412A (en) * | 1992-07-31 | 1994-12-20 | Cvd, Inc. | Highly polishable, highly thermally conductive silicon carbide |
| US5470447A (en) * | 1992-08-19 | 1995-11-28 | Stormedia, Inc. | Method for applying a protective coating on a magnetic recording head |
| US5609948A (en) * | 1992-08-21 | 1997-03-11 | Minnesota Mining And Manufacturing Company | Laminate containing diamond-like carbon and thin-film magnetic head assembly formed thereon |
| US5827613A (en) * | 1992-09-04 | 1998-10-27 | Tdk Corporation | Articles having diamond-like protective film and method of manufacturing the same |
| US5281851A (en) * | 1992-10-02 | 1994-01-25 | Hewlett-Packard Company | Integrated circuit packaging with reinforced leads |
| US6805941B1 (en) | 1992-11-19 | 2004-10-19 | Semiconductor Energy Laboratory Co., Ltd. | Magnetic recording medium |
| US5637373A (en) * | 1992-11-19 | 1997-06-10 | Semiconductor Energy Laboratory Co., Ltd. | Magnetic recording medium |
| BE1006711A3 (nl) * | 1992-12-02 | 1994-11-22 | Vito | Werkwijze voor het aanbrengen van een diamantachtige koolstoflaag op staal, ijzer of legeringen daarvan. |
| US5344793A (en) * | 1993-03-05 | 1994-09-06 | Siemens Aktiengesellschaft | Formation of silicided junctions in deep sub-micron MOSFETs by defect enhanced CoSi2 formation |
| US5645900A (en) * | 1993-04-22 | 1997-07-08 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Diamond composite films for protective coatings on metals and method of formation |
| US5626963A (en) * | 1993-07-07 | 1997-05-06 | Sanyo Electric Co., Ltd. | Hard-carbon-film-coated substrate and apparatus for forming the same |
| US5567512A (en) * | 1993-10-08 | 1996-10-22 | Hmt Technology Corporation | Thin carbon overcoat and method of its making |
| US5691010A (en) * | 1993-10-19 | 1997-11-25 | Sanyo Electric Co., Ltd. | Arc discharge plasma CVD method for forming diamond-like carbon films |
| US5482602A (en) * | 1993-11-04 | 1996-01-09 | United Technologies Corporation | Broad-beam ion deposition coating methods for depositing diamond-like-carbon coatings on dynamic surfaces |
| US5541566A (en) * | 1994-02-28 | 1996-07-30 | Olin Corporation | Diamond-like carbon coating for magnetic cores |
| US5846649A (en) * | 1994-03-03 | 1998-12-08 | Monsanto Company | Highly durable and abrasion-resistant dielectric coatings for lenses |
| US5508368A (en) * | 1994-03-03 | 1996-04-16 | Diamonex, Incorporated | Ion beam process for deposition of highly abrasion-resistant coatings |
| US5888593A (en) * | 1994-03-03 | 1999-03-30 | Monsanto Company | Ion beam process for deposition of highly wear-resistant optical coatings |
| US6087025A (en) * | 1994-03-29 | 2000-07-11 | Southwest Research Institute | Application of diamond-like carbon coatings to cutting surfaces of metal cutting tools |
| US5731045A (en) * | 1996-01-26 | 1998-03-24 | Southwest Research Institute | Application of diamond-like carbon coatings to cobalt-cemented tungsten carbide components |
| US5725573A (en) * | 1994-03-29 | 1998-03-10 | Southwest Research Institute | Medical implants made of metal alloys bearing cohesive diamond like carbon coatings |
| US5593719A (en) * | 1994-03-29 | 1997-01-14 | Southwest Research Institute | Treatments to reduce frictional wear between components made of ultra-high molecular weight polyethylene and metal alloys |
| US5605714A (en) * | 1994-03-29 | 1997-02-25 | Southwest Research Institute | Treatments to reduce thrombogeneticity in heart valves made from titanium and its alloys |
| US5984905A (en) * | 1994-07-11 | 1999-11-16 | Southwest Research Institute | Non-irritating antimicrobial coating for medical implants and a process for preparing same |
| US5462784A (en) * | 1994-11-02 | 1995-10-31 | International Business Machines Corporation | Fluorinated diamond-like carbon protective coating for magnetic recording media devices |
| US5650237A (en) * | 1994-11-21 | 1997-07-22 | Kao Corporation | Magnetic recording medium having a metallic magnetic layer and an aluminum alloy underlayer |
| DE69510526T2 (de) * | 1994-12-23 | 1999-12-30 | Maruwa Ceramic Co., Ltd. | Gleitbauteil und Verfahren zu seiner Herstellung |
| EP0723944A1 (en) * | 1995-01-26 | 1996-07-31 | Optical Coating Laboratory, Inc. | Wear resistant windows |
| JPH09134515A (ja) * | 1995-09-05 | 1997-05-20 | Kao Corp | 磁気記録媒体 |
| KR0152251B1 (ko) * | 1995-11-02 | 1998-10-15 | 장진 | 층 .층 .층 제작 방법에 의한 유사다이아몬드 박막 제조 방법 |
| US5968679A (en) * | 1995-11-28 | 1999-10-19 | Hoya Corporation | Magnetic recording medium and method of manufacturing the same |
| US5731070A (en) * | 1995-12-20 | 1998-03-24 | Showa Denko Kabushiki Kaisha | Magnetic recording medium comprising a substrate, magnetic layer, and under layers including a silicon layer and a layer diffused with silicon |
| US5780119A (en) * | 1996-03-20 | 1998-07-14 | Southwest Research Institute | Treatments to reduce friction and wear on metal alloy components |
| US5858477A (en) * | 1996-12-10 | 1999-01-12 | Akashic Memories Corporation | Method for producing recording media having protective overcoats of highly tetrahedral amorphous carbon |
| US5922415A (en) * | 1996-06-20 | 1999-07-13 | Southwest Research Institute | Lubrication of magnetic disk storage media |
| US5948532A (en) * | 1996-12-10 | 1999-09-07 | International Business Machines Corporation | Cermet adhesion layer with carbonaceous wear layer for head/disk interfaces |
| US6066399A (en) | 1997-03-19 | 2000-05-23 | Sanyo Electric Co., Ltd. | Hard carbon thin film and method of forming the same |
| US6030904A (en) * | 1997-08-21 | 2000-02-29 | International Business Machines Corporation | Stabilization of low-k carbon-based dielectrics |
| US6040225A (en) * | 1997-08-29 | 2000-03-21 | The Whitaker Corporation | Method of fabricating polysilicon based resistors in Si-Ge heterojunction devices |
| US6130471A (en) * | 1997-08-29 | 2000-10-10 | The Whitaker Corporation | Ballasting of high power silicon-germanium heterojunction biploar transistors |
| US6726993B2 (en) * | 1997-12-02 | 2004-04-27 | Teer Coatings Limited | Carbon coatings, method and apparatus for applying them, and articles bearing such coatings |
| US6322880B1 (en) * | 1998-09-28 | 2001-11-27 | Seagate Technology Llc | Magneto-resistance recording media comprising a foundation layer and a C-overcoat |
| US6358636B1 (en) | 1998-11-05 | 2002-03-19 | Hmt Technology Corporation | Thin overlayer for magnetic recording disk |
| US6572958B1 (en) * | 1999-07-22 | 2003-06-03 | Seagate Technology Llc | Magnetic recording media comprising a silicon carbide corrosion barrier layer and a c-overcoat |
| WO2004008450A1 (en) * | 2002-06-05 | 2004-01-22 | Seagate Technology Llc | Protective overcoatings |
| US6764774B2 (en) | 2002-06-19 | 2004-07-20 | International Business Machines Corporation | Structures with improved adhesion to Si and C containing dielectrics and method for preparing the same |
| US7097745B2 (en) * | 2003-06-27 | 2006-08-29 | Seagate Technology, Llc | Method of forming a tunneling magnetoresistive head |
| US7067437B2 (en) * | 2003-09-12 | 2006-06-27 | International Business Machines Corporation | Structures with improved interfacial strength of SiCOH dielectrics and method for preparing the same |
| JP4427392B2 (ja) * | 2004-06-22 | 2010-03-03 | 株式会社東芝 | 磁気記録媒体、その製造方法及び磁気記録再生装置 |
| US8815060B2 (en) * | 2004-08-30 | 2014-08-26 | HGST Netherlands B.V. | Method for minimizing magnetically dead interfacial layer during COC process |
| JP3965404B2 (ja) * | 2004-10-18 | 2007-08-29 | ヒタチグローバルストレージテクノロジーズネザーランドビーブイ | 磁気記録媒体及びその製造方法 |
| US7329101B2 (en) * | 2004-12-29 | 2008-02-12 | General Electric Company | Ceramic composite with integrated compliance/wear layer |
| JP4649262B2 (ja) * | 2005-04-19 | 2011-03-09 | 株式会社東芝 | 磁気記録媒体の製造方法 |
| JP2007026506A (ja) * | 2005-07-14 | 2007-02-01 | Hitachi Global Storage Technologies Netherlands Bv | 磁気ヘッドスライダの製造方法及び磁気ヘッドスライダ |
| JP4585476B2 (ja) * | 2006-03-16 | 2010-11-24 | 株式会社東芝 | パターンド媒体および磁気記録装置 |
| JP4675812B2 (ja) * | 2006-03-30 | 2011-04-27 | 株式会社東芝 | 磁気記録媒体、磁気記録装置および磁気記録媒体の製造方法 |
| US7495865B2 (en) * | 2006-04-10 | 2009-02-24 | Seagate Technology Llc | Adhesion layer for protective overcoat |
| JP2008282512A (ja) * | 2007-05-14 | 2008-11-20 | Toshiba Corp | 磁気記録媒体及び磁気記録再生装置 |
| JP4382843B2 (ja) | 2007-09-26 | 2009-12-16 | 株式会社東芝 | 磁気記録媒体およびその製造方法 |
| US8687323B2 (en) | 2011-10-12 | 2014-04-01 | HGST Netherlands B.V. | Magnetic media disk anticorrosion overcoat with titanium and silicon based layers |
| JP5392375B2 (ja) * | 2012-05-07 | 2014-01-22 | 富士電機株式会社 | 記録媒体 |
| US9045348B2 (en) | 2012-08-29 | 2015-06-02 | HGST Netherlands B.V. | Titanium-silicon protective film composition and apparatus |
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| JPS61242323A (ja) * | 1985-04-19 | 1986-10-28 | Fuji Electric Co Ltd | 磁気記録媒体 |
| JPS61267929A (ja) * | 1985-01-17 | 1986-11-27 | Hitachi Metals Ltd | 磁気記録媒体 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US4411963A (en) * | 1976-10-29 | 1983-10-25 | Aine Harry E | Thin film recording and method of making |
| DE3027162A1 (de) * | 1979-07-23 | 1981-02-19 | Datapoint Corp | Speicherplatte mit einer duennen magnetischen legierungsschicht und verfahren zu ihrer herstellung |
| JPS5634143A (en) * | 1979-08-25 | 1981-04-06 | Hitachi Maxell Ltd | Magnetic recording medium |
| US4503125A (en) * | 1979-10-01 | 1985-03-05 | Xebec, Inc. | Protective overcoating for magnetic recording discs and method for forming the same |
| EP0026496B1 (en) * | 1979-10-01 | 1984-08-15 | Xebec | Magnetic recording disc and method for forming a protective overcoating thereon |
| US4376963A (en) * | 1980-12-19 | 1983-03-15 | International Business Machines Corporation | Composite magnetic recording disk |
| DE3210866C2 (de) * | 1981-03-24 | 1985-01-17 | Nippon Electric Co., Ltd., Tokio/Tokyo | Magnetischer Aufzeichnungsträger und Verfahren zu seiner Herstellung |
| US4542071A (en) * | 1983-07-14 | 1985-09-17 | International Business Machines Corporation | Lubricated magnetic recording disk |
| US4554217A (en) * | 1984-09-20 | 1985-11-19 | Verbatim Corporation | Process for creating wear and corrosion resistant film for magnetic recording media |
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1985
- 1985-10-31 US US06/793,517 patent/US4647494A/en not_active Expired - Lifetime
-
1986
- 1986-09-19 DE DE8686112933T patent/DE3668391D1/de not_active Expired - Lifetime
- 1986-09-19 EP EP86112933A patent/EP0221309B1/en not_active Expired - Lifetime
- 1986-09-19 JP JP61219912A patent/JPS62109222A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61267929A (ja) * | 1985-01-17 | 1986-11-27 | Hitachi Metals Ltd | 磁気記録媒体 |
| JPS61242323A (ja) * | 1985-04-19 | 1986-10-28 | Fuji Electric Co Ltd | 磁気記録媒体 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6476423A (en) * | 1987-09-17 | 1989-03-22 | Nec Corp | Magnetic disk |
| JPH01125720A (ja) * | 1987-11-10 | 1989-05-18 | Nec Corp | 磁気記憶体及びその製造方法 |
| JP2013501219A (ja) * | 2009-07-29 | 2013-01-10 | ウオーターズ・テクノロジーズ・コーポレイシヨン | 被覆されたステータ表面を有する回転シアーインジェクタ弁 |
| US8919371B2 (en) | 2009-07-29 | 2014-12-30 | Waters Technologies Corporation | Rotary shear injector valve with coated stator surface |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0221309A1 (en) | 1987-05-13 |
| US4647494A (en) | 1987-03-03 |
| DE3668391D1 (de) | 1990-02-22 |
| JPH0416853B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-03-25 |
| EP0221309B1 (en) | 1990-01-17 |
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