JPS6148422A - 高純度シリカ及びその製法 - Google Patents

高純度シリカ及びその製法

Info

Publication number
JPS6148422A
JPS6148422A JP17036984A JP17036984A JPS6148422A JP S6148422 A JPS6148422 A JP S6148422A JP 17036984 A JP17036984 A JP 17036984A JP 17036984 A JP17036984 A JP 17036984A JP S6148422 A JPS6148422 A JP S6148422A
Authority
JP
Japan
Prior art keywords
silica
less
purity
particle size
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17036984A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0121092B2 (enrdf_load_stackoverflow
Inventor
Hiroyuki Kashiwase
弘之 柏瀬
Genichi Sato
源一 佐藤
Yutaka Konose
豊 木ノ瀬
Shozo Takatsu
高津　章造
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP17036984A priority Critical patent/JPS6148422A/ja
Publication of JPS6148422A publication Critical patent/JPS6148422A/ja
Publication of JPH0121092B2 publication Critical patent/JPH0121092B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified

Landscapes

  • Silicon Compounds (AREA)
JP17036984A 1984-08-17 1984-08-17 高純度シリカ及びその製法 Granted JPS6148422A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17036984A JPS6148422A (ja) 1984-08-17 1984-08-17 高純度シリカ及びその製法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17036984A JPS6148422A (ja) 1984-08-17 1984-08-17 高純度シリカ及びその製法

Publications (2)

Publication Number Publication Date
JPS6148422A true JPS6148422A (ja) 1986-03-10
JPH0121092B2 JPH0121092B2 (enrdf_load_stackoverflow) 1989-04-19

Family

ID=15903655

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17036984A Granted JPS6148422A (ja) 1984-08-17 1984-08-17 高純度シリカ及びその製法

Country Status (1)

Country Link
JP (1) JPS6148422A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0725640A (ja) * 1993-07-09 1995-01-27 Asahi Glass Co Ltd カバーガラス
WO2003002473A1 (fr) * 2001-06-27 2003-01-09 M. Watanabe & Co., Ltd. Particules de silice vitreuse synthetique de grande purete

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54141569A (en) * 1978-04-26 1979-11-02 Toshiba Corp Semiconductor device
JPS554952A (en) * 1978-06-28 1980-01-14 Toshiba Corp Semiconductor device
JPS5610947A (en) * 1979-07-10 1981-02-03 Toshiba Corp Semiconductor sealing resin composition
JPS5659837A (en) * 1979-09-28 1981-05-23 Hitachi Chem Co Ltd Epoxy resin composition
JPS5693749A (en) * 1979-12-27 1981-07-29 Hitachi Chem Co Ltd Epoxy resin composition
JPS56116647A (en) * 1980-02-20 1981-09-12 Hitachi Ltd Manufacturing of silica-alumina type filler for semiconductor memory element covering resin
JPS57195151A (en) * 1981-05-27 1982-11-30 Denki Kagaku Kogyo Kk Low-radioactive resin composition
JPS57212224A (en) * 1981-06-24 1982-12-27 Nitto Electric Ind Co Ltd Epoxy resin composition for encapsulation of semiconductor
JPS5947744A (ja) * 1982-09-10 1984-03-17 Toshiba Ceramics Co Ltd Ｉｃパツケ−ジ用フイラ−材
JPS5954632A (ja) * 1982-09-21 1984-03-29 Mitsubishi Metal Corp 石英ガラス粉末の製造法
JPS60204612A (ja) * 1984-03-29 1985-10-16 Nippon Sheet Glass Co Ltd 高純度二酸化珪素の製造方法

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54141569A (en) * 1978-04-26 1979-11-02 Toshiba Corp Semiconductor device
JPS554952A (en) * 1978-06-28 1980-01-14 Toshiba Corp Semiconductor device
JPS5610947A (en) * 1979-07-10 1981-02-03 Toshiba Corp Semiconductor sealing resin composition
JPS5659837A (en) * 1979-09-28 1981-05-23 Hitachi Chem Co Ltd Epoxy resin composition
JPS5693749A (en) * 1979-12-27 1981-07-29 Hitachi Chem Co Ltd Epoxy resin composition
JPS56116647A (en) * 1980-02-20 1981-09-12 Hitachi Ltd Manufacturing of silica-alumina type filler for semiconductor memory element covering resin
JPS57195151A (en) * 1981-05-27 1982-11-30 Denki Kagaku Kogyo Kk Low-radioactive resin composition
JPS57212224A (en) * 1981-06-24 1982-12-27 Nitto Electric Ind Co Ltd Epoxy resin composition for encapsulation of semiconductor
JPS5947744A (ja) * 1982-09-10 1984-03-17 Toshiba Ceramics Co Ltd Ｉｃパツケ−ジ用フイラ−材
JPS5954632A (ja) * 1982-09-21 1984-03-29 Mitsubishi Metal Corp 石英ガラス粉末の製造法
JPS60204612A (ja) * 1984-03-29 1985-10-16 Nippon Sheet Glass Co Ltd 高純度二酸化珪素の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0725640A (ja) * 1993-07-09 1995-01-27 Asahi Glass Co Ltd カバーガラス
WO2003002473A1 (fr) * 2001-06-27 2003-01-09 M. Watanabe & Co., Ltd. Particules de silice vitreuse synthetique de grande purete

Also Published As

Publication number Publication date
JPH0121092B2 (enrdf_load_stackoverflow) 1989-04-19

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