JPS61127861A - スパツタリング用金タ−ゲツト - Google Patents

スパツタリング用金タ−ゲツト

Info

Publication number
JPS61127861A
JPS61127861A JP24922984A JP24922984A JPS61127861A JP S61127861 A JPS61127861 A JP S61127861A JP 24922984 A JP24922984 A JP 24922984A JP 24922984 A JP24922984 A JP 24922984A JP S61127861 A JPS61127861 A JP S61127861A
Authority
JP
Japan
Prior art keywords
coating layer
gold
target
gold target
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24922984A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0355548B2 (enExample
Inventor
Masatoshi Fukushima
正俊 福島
Kosaburo Suehiro
末廣　幸三郎
Soichi Fukui
福井　総一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP24922984A priority Critical patent/JPS61127861A/ja
Publication of JPS61127861A publication Critical patent/JPS61127861A/ja
Publication of JPH0355548B2 publication Critical patent/JPH0355548B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/028—Including graded layers in composition or in physical properties, e.g. density, porosity, grain size

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP24922984A 1984-11-26 1984-11-26 スパツタリング用金タ−ゲツト Granted JPS61127861A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24922984A JPS61127861A (ja) 1984-11-26 1984-11-26 スパツタリング用金タ−ゲツト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24922984A JPS61127861A (ja) 1984-11-26 1984-11-26 スパツタリング用金タ−ゲツト

Publications (2)

Publication Number Publication Date
JPS61127861A true JPS61127861A (ja) 1986-06-16
JPH0355548B2 JPH0355548B2 (enExample) 1991-08-23

Family

ID=17189838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24922984A Granted JPS61127861A (ja) 1984-11-26 1984-11-26 スパツタリング用金タ−ゲツト

Country Status (1)

Country Link
JP (1) JPS61127861A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63270460A (ja) * 1987-04-27 1988-11-08 Tanaka Kikinzoku Kogyo Kk スパツタリング・タ−ゲツト
WO2017209281A1 (ja) * 2016-06-02 2017-12-07 田中貴金属工業株式会社 金スパッタリングターゲット

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5956971A (ja) * 1982-09-27 1984-04-02 Tanaka Kikinzoku Kogyo Kk スパツタリング用タ−ゲツトの製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5956971A (ja) * 1982-09-27 1984-04-02 Tanaka Kikinzoku Kogyo Kk スパツタリング用タ−ゲツトの製造方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63270460A (ja) * 1987-04-27 1988-11-08 Tanaka Kikinzoku Kogyo Kk スパツタリング・タ−ゲツト
WO2017209281A1 (ja) * 2016-06-02 2017-12-07 田中貴金属工業株式会社 金スパッタリングターゲット
CN109196137A (zh) * 2016-06-02 2019-01-11 田中贵金属工业株式会社 金溅射靶
JPWO2017209281A1 (ja) * 2016-06-02 2019-04-18 田中貴金属工業株式会社 金スパッタリングターゲット
JP2022048244A (ja) * 2016-06-02 2022-03-25 田中貴金属工業株式会社 Ａｕ膜の形成方法
US11569074B2 (en) 2016-06-02 2023-01-31 Tanaka Kikinzoku Kogyo K.K. Gold sputtering target
EP3467141B1 (en) 2016-06-02 2023-10-11 Tanaka Kikinzoku Kogyo K.K. Gold sputtering target
US11817299B2 (en) 2016-06-02 2023-11-14 Tanaka Kikinzoku Kogyo K.K. Gold sputtering target

Also Published As

Publication number Publication date
JPH0355548B2 (enExample) 1991-08-23

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term