JPS59152396A - メタロセン，その製造方法およびメタロセンを含む光重合性組成物 - Google Patents

メタロセン，その製造方法およびメタロセンを含む光重合性組成物

Info

Publication number
JPS59152396A
JPS59152396A JP59022069A JP2206984A JPS59152396A JP S59152396 A JPS59152396 A JP S59152396A JP 59022069 A JP59022069 A JP 59022069A JP 2206984 A JP2206984 A JP 2206984A JP S59152396 A JPS59152396 A JP S59152396A
Authority
JP
Japan
Prior art keywords
group
formula
substituted
carbon atoms
titanocene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59022069A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0447680B2 (enExample
Inventor
マーテイン　リーデイカ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS59152396A publication Critical patent/JPS59152396A/ja
Publication of JPH0447680B2 publication Critical patent/JPH0447680B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F17/00—Metallocenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
JP59022069A 1983-02-11 1984-02-10 メタロセン，その製造方法およびメタロセンを含む光重合性組成物 Granted JPS59152396A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH78483 1983-02-11
CH784/83-9 1983-02-11

Publications (2)

Publication Number Publication Date
JPS59152396A true JPS59152396A (ja) 1984-08-31
JPH0447680B2 JPH0447680B2 (enExample) 1992-08-04

Family

ID=4195105

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59022069A Granted JPS59152396A (ja) 1983-02-11 1984-02-10 メタロセン，その製造方法およびメタロセンを含む光重合性組成物

Country Status (13)

Country Link
US (3) US4590287A (enExample)
EP (1) EP0122223B1 (enExample)
JP (1) JPS59152396A (enExample)
KR (1) KR910005751B1 (enExample)
AR (1) AR244709A1 (enExample)
AT (1) ATE38232T1 (enExample)
AU (1) AU563212B2 (enExample)
BR (1) BR8400594A (enExample)
CA (1) CA1332611C (enExample)
DE (1) DE3474828D1 (enExample)
ES (2) ES8602824A1 (enExample)
HK (1) HK24791A (enExample)
ZA (1) ZA84995B (enExample)

Cited By (175)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS622253A (ja) * 1985-06-19 1987-01-08 チバ−ガイギ−　アクチエンゲゼルシヤフト 画像形成方法
JPS6341483A (ja) * 1986-08-01 1988-02-22 チバ−ガイギ−　ア−ゲ− チタノセン類、その製造方法、および組成物
EP0704764A1 (en) 1994-09-05 1996-04-03 Mitsubishi Chemical Corporation Photopolymerizable composition and photosensitive lithographic printing plate
EP0726498A1 (en) 1995-02-10 1996-08-14 Fuji Photo Film Co., Ltd. Photopolymerizable composition
EP0780731A2 (en) 1995-12-22 1997-06-25 Mitsubishi Chemical Corporation Photopolymerizable composition for a color filter, color filter and liquid crystal display device
EP1615073A1 (en) 2004-07-06 2006-01-11 Fuji Photo Film Co., Ltd. Photosensitive composition and image recording method using the same
EP1614537A1 (en) 2004-07-07 2006-01-11 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method
EP1619023A2 (en) 2004-07-20 2006-01-25 Fuji Photo Film Co., Ltd. Image forming material
EP1621341A2 (en) 2004-07-30 2006-02-01 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method
EP1621338A1 (en) 2004-07-27 2006-02-01 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method
EP1627736A1 (en) 2004-08-18 2006-02-22 Konica Minolta Medical & Graphic, Inc. Method of manufacturing light sensitive planographic printing plates and method of using the same
EP1630602A2 (en) 2004-08-31 2006-03-01 Fuji Photo Film Co., Ltd. Polymerizable composition, hydrophilic film formed by curing said composition and planographic printing plate precursor
EP1630618A2 (en) 2004-08-24 2006-03-01 Fuji Photo Film Co., Ltd. Production method of lithographic printing plate, lithographic printing plate precursor and lithographic printing method
EP1635219A1 (en) 2004-08-27 2006-03-15 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
EP1637324A2 (en) 2004-08-26 2006-03-22 Fuji Photo Film Co., Ltd. Color image-forming material and lithographic printing plate precursor
EP1662318A1 (en) 1999-03-09 2006-05-31 Fuji Photo Film Co., Ltd. 1,3-dihydro-1-oxo-2H-indene derivative
EP1669195A1 (en) 2004-12-13 2006-06-14 Fuji Photo Film Co., Ltd. Lithographic printing method
EP1685957A2 (en) 2005-01-26 2006-08-02 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor, lithographic printing method and packaged body of lithographic printing plate precursors
EP1703324A1 (en) 2005-03-18 2006-09-20 Fuji Photo Film Co., Ltd. Photosensitive composition and lithographic printing plate precursor
EP1707352A1 (en) 2005-03-31 2006-10-04 Fuji Photo Film Co., Ltd. Method of producing a planographic printing plate
EP1708025A1 (en) 2005-03-25 2006-10-04 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
EP1710627A1 (en) 2005-03-28 2006-10-11 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
EP1728838A1 (en) 2005-05-31 2006-12-06 Fuji Photo Film Co., Ltd. Ink composition for ink jet-recording and method for preparing lithographic printing plate using the same
EP1755002A2 (en) 2005-08-18 2007-02-21 Fuji Photo Film Co., Ltd. Manufacturing method of lithographic printing plate and manufacturing apparatus of lithographic printing plate
EP1754597A2 (en) 2005-08-19 2007-02-21 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing process
EP1757984A1 (en) 2005-08-22 2007-02-28 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
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WO2007052470A1 (ja) 2005-11-01 2007-05-10 Konica Minolta Medical & Graphic, Inc. 平版印刷版材料、平版印刷版、平版印刷版の作製方法及び平版印刷版の印刷方法
JP2007230970A (ja) * 2006-03-03 2007-09-13 Fujifilm Corp チタノセン系化合物、感光性組成物、及び感光性転写シート
WO2007105404A1 (ja) 2006-03-10 2007-09-20 Fujifilm Corporation 感光性組成物、並びに光記録媒体及びその製造方法、光記録方法、光記録装置
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HK24791A (en) 1991-04-12
EP0122223B1 (de) 1988-10-26
US4590287A (en) 1986-05-20
US4910121A (en) 1990-03-20
BR8400594A (pt) 1984-09-18
AU563212B2 (en) 1987-07-02
ES8705474A1 (es) 1987-05-01
ES529623A0 (es) 1985-12-01
KR910005751B1 (ko) 1991-08-02
ES544252A0 (es) 1987-05-01
AU2445484A (en) 1984-08-16
ES8602824A1 (es) 1985-12-01
AR244709A1 (es) 1993-11-30
DE3474828D1 (en) 1988-12-01
ATE38232T1 (de) 1988-11-15
US4962012A (en) 1990-10-09
EP0122223A2 (de) 1984-10-17
KR840007765A (ko) 1984-12-10
ZA84995B (en) 1984-10-31
JPH0447680B2 (enExample) 1992-08-04
EP0122223A3 (en) 1985-09-11
CA1332611C (en) 1994-10-18

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