JPS59109900A - アルミナ膜の加工方法 - Google Patents
アルミナ膜の加工方法Info
- Publication number
- JPS59109900A JPS59109900A JP57219880A JP21988082A JPS59109900A JP S59109900 A JPS59109900 A JP S59109900A JP 57219880 A JP57219880 A JP 57219880A JP 21988082 A JP21988082 A JP 21988082A JP S59109900 A JPS59109900 A JP S59109900A
- Authority
- JP
- Japan
- Prior art keywords
- titanium
- alumina film
- film
- alumina
- processing method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 title claims description 37
- 238000000034 method Methods 0.000 title claims description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 33
- 239000010936 titanium Substances 0.000 claims description 33
- 229910052719 titanium Inorganic materials 0.000 claims description 33
- 229910045601 alloy Inorganic materials 0.000 claims description 16
- 239000000956 alloy Substances 0.000 claims description 16
- 238000005530 etching Methods 0.000 claims description 8
- 238000003672 processing method Methods 0.000 claims description 7
- 239000012528 membrane Substances 0.000 claims description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Weting (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57219880A JPS59109900A (ja) | 1982-12-15 | 1982-12-15 | アルミナ膜の加工方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57219880A JPS59109900A (ja) | 1982-12-15 | 1982-12-15 | アルミナ膜の加工方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29358389A Division JPH02177346A (ja) | 1989-11-10 | 1989-11-10 | アルミナ絶縁膜 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59109900A true JPS59109900A (ja) | 1984-06-25 |
| JPH0310226B2 JPH0310226B2 (enrdf_load_stackoverflow) | 1991-02-13 |
Family
ID=16742498
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57219880A Granted JPS59109900A (ja) | 1982-12-15 | 1982-12-15 | アルミナ膜の加工方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59109900A (enrdf_load_stackoverflow) |
-
1982
- 1982-12-15 JP JP57219880A patent/JPS59109900A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0310226B2 (enrdf_load_stackoverflow) | 1991-02-13 |
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