JPS5857756A - 非晶質太陽電池 - Google Patents

非晶質太陽電池

Info

Publication number
JPS5857756A
JPS5857756A JP56154749A JP15474981A JPS5857756A JP S5857756 A JPS5857756 A JP S5857756A JP 56154749 A JP56154749 A JP 56154749A JP 15474981 A JP15474981 A JP 15474981A JP S5857756 A JPS5857756 A JP S5857756A
Authority
JP
Japan
Prior art keywords
transparent electrode
amorphous silicon
solar cell
average particle
efficiency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56154749A
Other languages
English (en)
Japanese (ja)
Other versions
JPS627716B2 (enrdf_load_stackoverflow
Inventor
Yutaka Hayashi
豊 林
Mitsuyuki Yamanaka
光之 山中
Hideyo Iida
英世 飯田
Nobuyasu Shiba
柴　信康
Hideyuki Karasawa
唐沢　秀幸
Hideyuki Mishiyuku
俊雄 三宿
Atsuo Ito
厚雄 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Taiyo Yuden Co Ltd
Original Assignee
Agency of Industrial Science and Technology
Taiyo Yuden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Taiyo Yuden Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP56154749A priority Critical patent/JPS5857756A/ja
Priority to AU88507/82A priority patent/AU534002B2/en
Priority to FR8216039A priority patent/FR2514201A1/fr
Priority to GB08228022A priority patent/GB2113002B/en
Priority to US06/428,712 priority patent/US4500743A/en
Publication of JPS5857756A publication Critical patent/JPS5857756A/ja
Publication of JPS627716B2 publication Critical patent/JPS627716B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/206—Electrodes for devices having potential barriers
    • H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
    • H10F77/247—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers comprising indium tin oxide [ITO]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Photovoltaic Devices (AREA)
JP56154749A 1981-10-01 1981-10-01 非晶質太陽電池 Granted JPS5857756A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP56154749A JPS5857756A (ja) 1981-10-01 1981-10-01 非晶質太陽電池
AU88507/82A AU534002B2 (en) 1981-10-01 1982-09-17 Amorphous semiconductor solar cell
FR8216039A FR2514201A1 (fr) 1981-10-01 1982-09-23 Pile solaire a semi-conducteur amorphe
GB08228022A GB2113002B (en) 1981-10-01 1982-09-30 Amorphous semiconductor solar battery electrode
US06/428,712 US4500743A (en) 1981-10-01 1982-09-30 Amorphous semiconductor solar cell having a grained transparent electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56154749A JPS5857756A (ja) 1981-10-01 1981-10-01 非晶質太陽電池

Publications (2)

Publication Number Publication Date
JPS5857756A true JPS5857756A (ja) 1983-04-06
JPS627716B2 JPS627716B2 (enrdf_load_stackoverflow) 1987-02-18

Family

ID=15591066

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56154749A Granted JPS5857756A (ja) 1981-10-01 1981-10-01 非晶質太陽電池

Country Status (5)

Country Link
US (1) US4500743A (enrdf_load_stackoverflow)
JP (1) JPS5857756A (enrdf_load_stackoverflow)
AU (1) AU534002B2 (enrdf_load_stackoverflow)
FR (1) FR2514201A1 (enrdf_load_stackoverflow)
GB (1) GB2113002B (enrdf_load_stackoverflow)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5961973A (ja) * 1982-09-27 1984-04-09 ア−ルシ−エ−　コ−ポレ−ション 光検知器
JPS59159574A (ja) * 1983-03-02 1984-09-10 Komatsu Denshi Kinzoku Kk アモルフアス太陽電池
JPS59161881A (ja) * 1983-03-07 1984-09-12 Semiconductor Energy Lab Co Ltd 光電変換装置作製方法
JPS59201471A (ja) * 1983-04-29 1984-11-15 Semiconductor Energy Lab Co Ltd 光電変換半導体装置
JPS59201470A (ja) * 1983-04-08 1984-11-15 Taiyo Yuden Co Ltd 非晶質シリコン太陽電池
JPS59224183A (ja) * 1983-06-03 1984-12-17 Semiconductor Energy Lab Co Ltd 半導体装置
JPS6010788A (ja) * 1983-06-30 1985-01-19 Kanegafuchi Chem Ind Co Ltd 太陽電池用基板
JPS6034076A (ja) * 1983-08-05 1985-02-21 Taiyo Yuden Co Ltd 非晶質シリコン太陽電池
JPS6068663A (ja) * 1983-09-26 1985-04-19 Komatsu Denshi Kinzoku Kk アモルフアスシリコン太陽電池
JPS6085575A (ja) * 1983-10-18 1985-05-15 Semiconductor Energy Lab Co Ltd 半導体装置作製方法
JPS60170269A (ja) * 1984-02-14 1985-09-03 Fuji Electric Corp Res & Dev Ltd 薄膜太陽電池の製造方法
JPS60178498A (ja) * 1984-02-25 1985-09-12 カシオ計算機株式会社 楽音波形発生装置
JPS60240166A (ja) * 1984-05-14 1985-11-29 Taiyo Yuden Co Ltd 非晶質シリコン太陽電池及びその製造方法
JPS6193672A (ja) * 1984-10-12 1986-05-12 Sanyo Electric Co Ltd 光起電力装置
JPS61116534A (ja) * 1984-10-19 1986-06-04 工業技術院長 光低反射透明導電膜及びその製造方法
JPS61222282A (ja) * 1985-03-28 1986-10-02 Nippon Sheet Glass Co Ltd アモルフアスシリコン太陽電池
JPS6268253U (enrdf_load_stackoverflow) * 1985-10-19 1987-04-28
JPS63456A (ja) * 1986-06-20 1988-01-05 Tdk Corp 太陽電池用透明導岩膜の製造方法
JPH01225373A (ja) * 1988-03-04 1989-09-08 Nippon Sheet Glass Co Ltd 太陽電池用基板
JPH03227576A (ja) * 1990-02-01 1991-10-08 Canon Inc 薄膜太陽電池作製方法
US5964962A (en) * 1995-11-13 1999-10-12 Sharp Kabushiki Kaisha Substrate for solar cell and method for producing the same; substrate treatment apparatus; and thin film solar cell and method for producing the same
DE112010000803T5 (de) 2009-01-23 2012-07-19 Ulvac, Inc. Verfahren zum Herstellen einer Solarzelle sowie Solarzelle

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4663188A (en) * 1982-09-27 1987-05-05 Rca Corporation Method for making a photodetector with enhanced light absorption
JPS59103384A (ja) * 1982-12-04 1984-06-14 Hoya Corp 太陽電池用透明導電膜
US4599482A (en) * 1983-03-07 1986-07-08 Semiconductor Energy Lab. Co., Ltd. Semiconductor photoelectric conversion device and method of making the same
US4728581A (en) * 1986-10-14 1988-03-01 Rca Corporation Electroluminescent device and a method of making same
US4808462A (en) * 1987-05-22 1989-02-28 Glasstech Solar, Inc. Solar cell substrate
US5102721A (en) * 1987-08-31 1992-04-07 Solarex Corporation Textured tin oxide
FR2631330A1 (fr) * 1988-05-10 1989-11-17 Saint Gobain Vitrage Verre a couche conductrice transparente pour photopile en couche mince et son procede d'obtention
EP0364780B1 (en) * 1988-09-30 1997-03-12 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Solar cell with a transparent electrode
US5078803A (en) * 1989-09-22 1992-01-07 Siemens Solar Industries L.P. Solar cells incorporating transparent electrodes comprising hazy zinc oxide
JPH06140650A (ja) * 1992-09-14 1994-05-20 Sanyo Electric Co Ltd 透光性導電酸化膜の改質方法とこれを用いた光起電力装置の製造方法
JPH10117006A (ja) * 1996-08-23 1998-05-06 Kanegafuchi Chem Ind Co Ltd 薄膜光電変換装置
KR100446591B1 (ko) * 1997-02-17 2005-05-16 삼성전자주식회사 태양전지용실리콘박막및그제조방법
JP2001060702A (ja) * 1999-06-18 2001-03-06 Nippon Sheet Glass Co Ltd 光電変換装置用基板およびこれを用いた光電変換装置
JP2002260448A (ja) * 2000-11-21 2002-09-13 Nippon Sheet Glass Co Ltd 導電膜、その製造方法、それを備えた基板および光電変換装置
JP4229606B2 (ja) * 2000-11-21 2009-02-25 日本板硝子株式会社 光電変換装置用基体およびそれを備えた光電変換装置
JP2003347572A (ja) * 2002-01-28 2003-12-05 Kanegafuchi Chem Ind Co Ltd タンデム型薄膜光電変換装置とその製造方法
DE10326957B4 (de) * 2003-06-11 2006-08-10 Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. Dotierte Halbleiteroxidfeinstpulver und Verfahren zu ihrer Herstellung
US20110126890A1 (en) * 2009-11-30 2011-06-02 Nicholas Francis Borrelli Textured superstrates for photovoltaics
US8663732B2 (en) * 2010-02-26 2014-03-04 Corsam Technologies Llc Light scattering inorganic substrates using monolayers
US20110209752A1 (en) * 2010-02-26 2011-09-01 Glenn Eric Kohnke Microstructured glass substrates
JP5541980B2 (ja) * 2010-06-24 2014-07-09 株式会社カネカ 結晶シリコン系太陽電池およびその製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4832946A (enrdf_load_stackoverflow) * 1971-08-31 1973-05-04
JPS5323287A (en) * 1976-08-16 1978-03-03 Hiroyuki Sakaki Photoelectric converting element
JPS5473587A (en) * 1977-11-24 1979-06-12 Sharp Corp Thin film solar battery device
JPS57107080A (en) * 1980-12-25 1982-07-03 Sumitomo Electric Ind Ltd Amorphous thin film solar cell
JPS57166083A (en) * 1981-04-07 1982-10-13 Ricoh Co Ltd Thin film type photoelectric conversion element

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4217148A (en) * 1979-06-18 1980-08-12 Rca Corporation Compensated amorphous silicon solar cell

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4832946A (enrdf_load_stackoverflow) * 1971-08-31 1973-05-04
JPS5323287A (en) * 1976-08-16 1978-03-03 Hiroyuki Sakaki Photoelectric converting element
JPS5473587A (en) * 1977-11-24 1979-06-12 Sharp Corp Thin film solar battery device
JPS57107080A (en) * 1980-12-25 1982-07-03 Sumitomo Electric Ind Ltd Amorphous thin film solar cell
JPS57166083A (en) * 1981-04-07 1982-10-13 Ricoh Co Ltd Thin film type photoelectric conversion element

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07283432A (ja) * 1982-09-27 1995-10-27 Rca Corp 光検知器の製造法
JPS5961973A (ja) * 1982-09-27 1984-04-09 ア−ルシ−エ−　コ−ポレ−ション 光検知器
JPS59159574A (ja) * 1983-03-02 1984-09-10 Komatsu Denshi Kinzoku Kk アモルフアス太陽電池
JPS59161881A (ja) * 1983-03-07 1984-09-12 Semiconductor Energy Lab Co Ltd 光電変換装置作製方法
JPS59201470A (ja) * 1983-04-08 1984-11-15 Taiyo Yuden Co Ltd 非晶質シリコン太陽電池
JPS59201471A (ja) * 1983-04-29 1984-11-15 Semiconductor Energy Lab Co Ltd 光電変換半導体装置
JPS59224183A (ja) * 1983-06-03 1984-12-17 Semiconductor Energy Lab Co Ltd 半導体装置
JPS6010788A (ja) * 1983-06-30 1985-01-19 Kanegafuchi Chem Ind Co Ltd 太陽電池用基板
JPS6034076A (ja) * 1983-08-05 1985-02-21 Taiyo Yuden Co Ltd 非晶質シリコン太陽電池
JPS6068663A (ja) * 1983-09-26 1985-04-19 Komatsu Denshi Kinzoku Kk アモルフアスシリコン太陽電池
JPS6085575A (ja) * 1983-10-18 1985-05-15 Semiconductor Energy Lab Co Ltd 半導体装置作製方法
JPS60170269A (ja) * 1984-02-14 1985-09-03 Fuji Electric Corp Res & Dev Ltd 薄膜太陽電池の製造方法
JPS60178498A (ja) * 1984-02-25 1985-09-12 カシオ計算機株式会社 楽音波形発生装置
JPS60240166A (ja) * 1984-05-14 1985-11-29 Taiyo Yuden Co Ltd 非晶質シリコン太陽電池及びその製造方法
JPS6193672A (ja) * 1984-10-12 1986-05-12 Sanyo Electric Co Ltd 光起電力装置
JPS61116534A (ja) * 1984-10-19 1986-06-04 工業技術院長 光低反射透明導電膜及びその製造方法
JPS61222282A (ja) * 1985-03-28 1986-10-02 Nippon Sheet Glass Co Ltd アモルフアスシリコン太陽電池
JPS6268253U (enrdf_load_stackoverflow) * 1985-10-19 1987-04-28
JPS63456A (ja) * 1986-06-20 1988-01-05 Tdk Corp 太陽電池用透明導岩膜の製造方法
JPH01225373A (ja) * 1988-03-04 1989-09-08 Nippon Sheet Glass Co Ltd 太陽電池用基板
JPH03227576A (ja) * 1990-02-01 1991-10-08 Canon Inc 薄膜太陽電池作製方法
US5964962A (en) * 1995-11-13 1999-10-12 Sharp Kabushiki Kaisha Substrate for solar cell and method for producing the same; substrate treatment apparatus; and thin film solar cell and method for producing the same
DE112010000803T5 (de) 2009-01-23 2012-07-19 Ulvac, Inc. Verfahren zum Herstellen einer Solarzelle sowie Solarzelle

Also Published As

Publication number Publication date
AU8850782A (en) 1983-05-05
JPS627716B2 (enrdf_load_stackoverflow) 1987-02-18
FR2514201B1 (enrdf_load_stackoverflow) 1984-03-30
FR2514201A1 (fr) 1983-04-08
AU534002B2 (en) 1983-12-22
GB2113002A (en) 1983-07-27
US4500743A (en) 1985-02-19
GB2113002B (en) 1985-03-13

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