JPS5817112A - ポジ型ノボラツクホトレジスト組成物及びその調製物 - Google Patents

ポジ型ノボラツクホトレジスト組成物及びその調製物

Info

Publication number
JPS5817112A
JPS5817112A JP10910282A JP10910282A JPS5817112A JP S5817112 A JPS5817112 A JP S5817112A JP 10910282 A JP10910282 A JP 10910282A JP 10910282 A JP10910282 A JP 10910282A JP S5817112 A JPS5817112 A JP S5817112A
Authority
JP
Japan
Prior art keywords
cresol
mixture
resin
resist
sensitizer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10910282A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0454221B2 (OSRAM
Inventor
メドハト・エイ・トウキ−
レオ・クラワンスキイ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philip A Hunt Chemical Corp
Original Assignee
Philip A Hunt Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philip A Hunt Chemical Corp filed Critical Philip A Hunt Chemical Corp
Publication of JPS5817112A publication Critical patent/JPS5817112A/ja
Publication of JPH0454221B2 publication Critical patent/JPH0454221B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Phenolic Resins Or Amino Resins (AREA)
JP10910282A 1981-06-22 1982-06-22 ポジ型ノボラツクホトレジスト組成物及びその調製物 Granted JPS5817112A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US27570781A 1981-06-22 1981-06-22
US275883 1981-06-22
US275707 1999-03-25

Publications (2)

Publication Number Publication Date
JPS5817112A true JPS5817112A (ja) 1983-02-01
JPH0454221B2 JPH0454221B2 (OSRAM) 1992-08-28

Family

ID=23053465

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10910282A Granted JPS5817112A (ja) 1981-06-22 1982-06-22 ポジ型ノボラツクホトレジスト組成物及びその調製物

Country Status (1)

Country Link
JP (1) JPS5817112A (OSRAM)

Cited By (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59162542A (ja) * 1983-03-04 1984-09-13 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
JPS59163260A (ja) * 1983-03-02 1984-09-14 Ishikawajima Harima Heavy Ind Co Ltd 線条体の巻取装置
JPS59165053A (ja) * 1983-03-11 1984-09-18 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS6042753A (ja) * 1983-08-17 1985-03-07 Mitsubishi Chem Ind Ltd ポジ型クレゾ−ルノボラツクフオトレジスト組成物
JPS60125841A (ja) * 1983-12-12 1985-07-05 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPS60133446A (ja) * 1983-12-22 1985-07-16 Fuji Photo Film Co Ltd 感光性組成物
JPS60158440A (ja) * 1984-01-26 1985-08-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPS60159846A (ja) * 1984-01-31 1985-08-21 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
JPS60189739A (ja) * 1984-03-09 1985-09-27 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS61118744A (ja) * 1984-11-15 1986-06-06 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS61141441A (ja) * 1984-12-14 1986-06-28 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS61144644A (ja) * 1984-12-19 1986-07-02 Japan Synthetic Rubber Co Ltd ポジ型感放射線樹脂組成物
JPS6235348A (ja) * 1985-08-09 1987-02-16 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト用組成物
JPS6235349A (ja) * 1985-08-09 1987-02-16 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS6235347A (ja) * 1985-08-09 1987-02-16 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS62136637A (ja) * 1985-12-10 1987-06-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPS62150245A (ja) * 1985-12-24 1987-07-04 Japan Synthetic Rubber Co Ltd 集積回路作製用ポジ型レジスト
JPS62161146A (ja) * 1986-01-10 1987-07-17 Mitsubishi Petrochem Co Ltd ホトレジスト組成物
JPS62172341A (ja) * 1986-01-24 1987-07-29 Sumitomo Chem Co Ltd ポジ型フオトレジスト用ノボラツク樹脂の製造法
JPS62227144A (ja) * 1986-03-28 1987-10-06 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPS62280843A (ja) * 1986-05-30 1987-12-05 Nec Corp 感光剤
JPS632044A (ja) * 1986-06-23 1988-01-07 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPS63113451A (ja) * 1986-10-30 1988-05-18 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPS63223637A (ja) * 1987-03-12 1988-09-19 Mitsubishi Kasei Corp 感光性平版印刷版
JPS6435558A (en) * 1987-07-31 1989-02-06 Mitsubishi Chem Ind Photosensitive planographic printing plate
JPH0210348A (ja) * 1988-03-31 1990-01-16 Morton Thiokol Inc ポジ型感光性組成物及びレジストパターンの形成方法
JPH0219846A (ja) * 1988-07-07 1990-01-23 Sumitomo Chem Co Ltd 集積回路製作用ポジ型レジスト組成物の製造方法
JPH0242443A (ja) * 1988-04-22 1990-02-13 Tokyo Ohka Kogyo Co Ltd ポジ型感光性組成物
JPH02139559A (ja) * 1989-04-21 1990-05-29 Tokyo Ohka Kogyo Co Ltd 半導体デバイス用レジストパターンの製造方法
JPH02306245A (ja) * 1990-05-01 1990-12-19 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPH06148879A (ja) * 1993-04-30 1994-05-27 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH06214384A (ja) * 1993-04-30 1994-08-05 Japan Synthetic Rubber Co Ltd １，２−キノンジアジドスルホン酸エステルの製造方法
WO1996020430A1 (en) * 1994-12-28 1996-07-04 Nippon Zeon Co., Ltd. Positive resist composition
JPH09114094A (ja) * 1996-10-18 1997-05-02 Sumitomo Chem Co Ltd 集積回路製作用ポジ型レジストパターンの形成方法
EP0786699A1 (en) 1996-01-22 1997-07-30 Fuji Photo Film Co., Ltd. Positive photoresist composition
US20140007490A1 (en) * 2012-07-04 2014-01-09 Gleb Vladimirovitch LOKSHIN Insecticidal cartridge

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2616992A1 (de) * 1976-04-17 1977-11-03 Agfa Gevaert Ag Lichtempfindliches material zur herstellung von druckformen und aetzresistagen

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2616992A1 (de) * 1976-04-17 1977-11-03 Agfa Gevaert Ag Lichtempfindliches material zur herstellung von druckformen und aetzresistagen

Cited By (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59163260A (ja) * 1983-03-02 1984-09-14 Ishikawajima Harima Heavy Ind Co Ltd 線条体の巻取装置
JPS59162542A (ja) * 1983-03-04 1984-09-13 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
JPS59165053A (ja) * 1983-03-11 1984-09-18 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS6042753A (ja) * 1983-08-17 1985-03-07 Mitsubishi Chem Ind Ltd ポジ型クレゾ−ルノボラツクフオトレジスト組成物
JPS60125841A (ja) * 1983-12-12 1985-07-05 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPS60133446A (ja) * 1983-12-22 1985-07-16 Fuji Photo Film Co Ltd 感光性組成物
JPS60158440A (ja) * 1984-01-26 1985-08-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPS60159846A (ja) * 1984-01-31 1985-08-21 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
JPS60189739A (ja) * 1984-03-09 1985-09-27 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS61118744A (ja) * 1984-11-15 1986-06-06 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS61141441A (ja) * 1984-12-14 1986-06-28 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS61144644A (ja) * 1984-12-19 1986-07-02 Japan Synthetic Rubber Co Ltd ポジ型感放射線樹脂組成物
JPS6235348A (ja) * 1985-08-09 1987-02-16 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト用組成物
JPS6235349A (ja) * 1985-08-09 1987-02-16 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS6235347A (ja) * 1985-08-09 1987-02-16 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS62136637A (ja) * 1985-12-10 1987-06-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPS62150245A (ja) * 1985-12-24 1987-07-04 Japan Synthetic Rubber Co Ltd 集積回路作製用ポジ型レジスト
JPS62161146A (ja) * 1986-01-10 1987-07-17 Mitsubishi Petrochem Co Ltd ホトレジスト組成物
JPS62172341A (ja) * 1986-01-24 1987-07-29 Sumitomo Chem Co Ltd ポジ型フオトレジスト用ノボラツク樹脂の製造法
JPS62227144A (ja) * 1986-03-28 1987-10-06 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPS62280843A (ja) * 1986-05-30 1987-12-05 Nec Corp 感光剤
JPS632044A (ja) * 1986-06-23 1988-01-07 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPS63113451A (ja) * 1986-10-30 1988-05-18 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPS63223637A (ja) * 1987-03-12 1988-09-19 Mitsubishi Kasei Corp 感光性平版印刷版
JPS6435558A (en) * 1987-07-31 1989-02-06 Mitsubishi Chem Ind Photosensitive planographic printing plate
JPH0210348A (ja) * 1988-03-31 1990-01-16 Morton Thiokol Inc ポジ型感光性組成物及びレジストパターンの形成方法
JPH0242443A (ja) * 1988-04-22 1990-02-13 Tokyo Ohka Kogyo Co Ltd ポジ型感光性組成物
JPH0219846A (ja) * 1988-07-07 1990-01-23 Sumitomo Chem Co Ltd 集積回路製作用ポジ型レジスト組成物の製造方法
JPH02139559A (ja) * 1989-04-21 1990-05-29 Tokyo Ohka Kogyo Co Ltd 半導体デバイス用レジストパターンの製造方法
JPH02306245A (ja) * 1990-05-01 1990-12-19 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPH06148879A (ja) * 1993-04-30 1994-05-27 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH06214384A (ja) * 1993-04-30 1994-08-05 Japan Synthetic Rubber Co Ltd １，２−キノンジアジドスルホン酸エステルの製造方法
WO1996020430A1 (en) * 1994-12-28 1996-07-04 Nippon Zeon Co., Ltd. Positive resist composition
US5912102A (en) * 1994-12-28 1999-06-15 Nippon Zeon Co., Ltd. Positive resist composition
EP0786699A1 (en) 1996-01-22 1997-07-30 Fuji Photo Film Co., Ltd. Positive photoresist composition
JPH09114094A (ja) * 1996-10-18 1997-05-02 Sumitomo Chem Co Ltd 集積回路製作用ポジ型レジストパターンの形成方法
US20140007490A1 (en) * 2012-07-04 2014-01-09 Gleb Vladimirovitch LOKSHIN Insecticidal cartridge

Also Published As

Publication number Publication date
JPH0454221B2 (OSRAM) 1992-08-28

Similar Documents

Publication Publication Date Title
JPS5817112A (ja) ポジ型ノボラツクホトレジスト組成物及びその調製物
US4377631A (en) Positive novolak photoresist compositions
US4529682A (en) Positive photoresist composition with cresol-formaldehyde novolak resins
US4587196A (en) Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
EP0718693B1 (en) Photoresist compositions and components
US4863827A (en) Postive working multi-level photoresist
JP4065746B2 (ja) ノボラック樹脂中の金属イオンの低減
JP2693472B2 (ja) レジスト
JPS617837A (ja) ポジ型の感放射被覆液
JPH025060A (ja) レジストパターンを得る方法
JPS60159847A (ja) ポジテイブ写真食刻レジスト組成
US6852465B2 (en) Photoresist composition for imaging thick films
US4885232A (en) High temperature post exposure baking treatment for positive photoresist compositions
JPS62262043A (ja) ポジ型感光性樹脂組成物
JPS62105137A (ja) 放射感光性ポジティブ型フォトレジスト組成物及びその製法
US6043002A (en) Metal ion reduction in novolak resin solution using an anion exchange resin
EP0070624B1 (en) Novolak resin and a positive photoresist composition containing the same
US5069996A (en) Process for developing selected positive photoresists
TWI271420B (en) Novolak resin mixtures and photosensitive compositions comprising the same
JPH02217855A (ja) ネガ型電子線レジスト組成物
JPS63161449A (ja) 高コントラストなフオトレジスト組成物
JP3787323B2 (ja) ポジ型ホトレジスト塗布液及びそれを用いた表示素子用基材
EP1877865B1 (en) Nanocomposite photoresist composition for imaging thick films
JPH01104037A (ja) 感光性１，２‐ナフトキノン‐２‐ジアジド‐４‐スルホン酸モノエステル
JPH09146273A (ja) 感光性樹脂組成物の硬化方法