JPS6435558A - Photosensitive planographic printing plate - Google Patents
Photosensitive planographic printing plateInfo
- Publication number
- JPS6435558A JPS6435558A JP19187887A JP19187887A JPS6435558A JP S6435558 A JPS6435558 A JP S6435558A JP 19187887 A JP19187887 A JP 19187887A JP 19187887 A JP19187887 A JP 19187887A JP S6435558 A JPS6435558 A JP S6435558A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- printing plate
- planographic printing
- superior
- photosensitive planographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To obtain a photosensitive planographic printing plate having superior resistance to processing chemicals, superior suitability to safelight and wide development latitude by forming a photosensitive layer of a specified photosensitive compsn. on a support based on an electrolytically etched and anodically oxidized Al material. CONSTITUTION:A photosensitive layer of a photosensitive compsn. contg. o- naphthoquinonediazidosulfonic ester of polyhydroxybenzophenone, <=50wt.% novolak resin and >=50wt.% vinyl-based polymer having phenolic hydroxyl groups is formed on a support based on an electrolytically etched and anodically oxidized Al material. The etching is carried out in an electrolytic soln. contg. principally hydrochloric acid or nitric acid. A photosensitive planographic printing plate having superior resistance to processing chemicals, wide development latitude and superior suitability to safelight is obtd.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62191878A JP2625743B2 (en) | 1987-07-31 | 1987-07-31 | Photosensitive lithographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62191878A JP2625743B2 (en) | 1987-07-31 | 1987-07-31 | Photosensitive lithographic printing plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6435558A true JPS6435558A (en) | 1989-02-06 |
JP2625743B2 JP2625743B2 (en) | 1997-07-02 |
Family
ID=16281973
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62191878A Expired - Fee Related JP2625743B2 (en) | 1987-07-31 | 1987-07-31 | Photosensitive lithographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2625743B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0345952A (en) * | 1989-07-13 | 1991-02-27 | Konica Corp | Photosensitive planographic printing plate |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5055406A (en) * | 1973-09-21 | 1975-05-15 | ||
JPS5133620A (en) * | 1974-09-17 | 1976-03-22 | Konishiroku Photo Ind | KANKOSEISOSEIBUTSU |
JPS5134711A (en) * | 1974-09-18 | 1976-03-24 | Konishiroku Photo Ind | KANKOSEISOSEIBUTSU |
JPS5817112A (en) * | 1981-06-22 | 1983-02-01 | フイリツプ・エイ・ハント・ケミカル・コ−ポレイシヨン | Positive novolak photoresist composition and blend |
JPS58203438A (en) * | 1982-05-24 | 1983-11-26 | Hitachi Ltd | Formation of fine pattern |
JPS6068997A (en) * | 1983-09-27 | 1985-04-19 | Fuji Photo Film Co Ltd | Manufacture of aluminum base for planographic printing plate |
JPS61141441A (en) * | 1984-12-14 | 1986-06-28 | Tokyo Ohka Kogyo Co Ltd | Positive photoresist composition |
JPS6239603A (en) * | 1985-08-13 | 1987-02-20 | ヘキスト・アクチエンゲゼルシヤフト | Novel polymer, radiation sensitive mixture containing the same and production of relief image |
JPS62102243A (en) * | 1985-10-25 | 1987-05-12 | ヘキスト・セラニ−ズ・コ−ポレイシヨン | Making of photoresist |
JPS62105145A (en) * | 1985-10-28 | 1987-05-15 | ヘキスト・セラニ−ズ・コ−ポレイシヨン | Proper mixture for processing photoresist composition and processing of photoresist composition and method of peeling photoresist from base body |
-
1987
- 1987-07-31 JP JP62191878A patent/JP2625743B2/en not_active Expired - Fee Related
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5055406A (en) * | 1973-09-21 | 1975-05-15 | ||
JPS5133620A (en) * | 1974-09-17 | 1976-03-22 | Konishiroku Photo Ind | KANKOSEISOSEIBUTSU |
JPS5134711A (en) * | 1974-09-18 | 1976-03-24 | Konishiroku Photo Ind | KANKOSEISOSEIBUTSU |
JPS5817112A (en) * | 1981-06-22 | 1983-02-01 | フイリツプ・エイ・ハント・ケミカル・コ−ポレイシヨン | Positive novolak photoresist composition and blend |
JPS58203438A (en) * | 1982-05-24 | 1983-11-26 | Hitachi Ltd | Formation of fine pattern |
JPS6068997A (en) * | 1983-09-27 | 1985-04-19 | Fuji Photo Film Co Ltd | Manufacture of aluminum base for planographic printing plate |
JPS61141441A (en) * | 1984-12-14 | 1986-06-28 | Tokyo Ohka Kogyo Co Ltd | Positive photoresist composition |
JPS6239603A (en) * | 1985-08-13 | 1987-02-20 | ヘキスト・アクチエンゲゼルシヤフト | Novel polymer, radiation sensitive mixture containing the same and production of relief image |
JPS62102243A (en) * | 1985-10-25 | 1987-05-12 | ヘキスト・セラニ−ズ・コ−ポレイシヨン | Making of photoresist |
JPS62105145A (en) * | 1985-10-28 | 1987-05-15 | ヘキスト・セラニ−ズ・コ−ポレイシヨン | Proper mixture for processing photoresist composition and processing of photoresist composition and method of peeling photoresist from base body |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0345952A (en) * | 1989-07-13 | 1991-02-27 | Konica Corp | Photosensitive planographic printing plate |
Also Published As
Publication number | Publication date |
---|---|
JP2625743B2 (en) | 1997-07-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |