JPS5815249A - コンタクトホ−ル形成法 - Google Patents

コンタクトホ−ル形成法

Info

Publication number
JPS5815249A
JPS5815249A JP56112302A JP11230281A JPS5815249A JP S5815249 A JPS5815249 A JP S5815249A JP 56112302 A JP56112302 A JP 56112302A JP 11230281 A JP11230281 A JP 11230281A JP S5815249 A JPS5815249 A JP S5815249A
Authority
JP
Japan
Prior art keywords
film
etching
contact hole
insulating film
vapor phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56112302A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6358373B2 (enExample
Inventor
Jun Kanamori
金森 順
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP56112302A priority Critical patent/JPS5815249A/ja
Publication of JPS5815249A publication Critical patent/JPS5815249A/ja
Publication of JPS6358373B2 publication Critical patent/JPS6358373B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W20/069

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP56112302A 1981-07-20 1981-07-20 コンタクトホ−ル形成法 Granted JPS5815249A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56112302A JPS5815249A (ja) 1981-07-20 1981-07-20 コンタクトホ−ル形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56112302A JPS5815249A (ja) 1981-07-20 1981-07-20 コンタクトホ−ル形成法

Publications (2)

Publication Number Publication Date
JPS5815249A true JPS5815249A (ja) 1983-01-28
JPS6358373B2 JPS6358373B2 (enExample) 1988-11-15

Family

ID=14583275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56112302A Granted JPS5815249A (ja) 1981-07-20 1981-07-20 コンタクトホ−ル形成法

Country Status (1)

Country Link
JP (1) JPS5815249A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01119042A (ja) * 1987-10-31 1989-05-11 Nec Corp 半導体装置の製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0340665U (enExample) * 1989-08-30 1991-04-18

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01119042A (ja) * 1987-10-31 1989-05-11 Nec Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6358373B2 (enExample) 1988-11-15

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