JPS5679431A - Manufacture of semiconductor integrated circuit device - Google Patents

Manufacture of semiconductor integrated circuit device

Info

Publication number
JPS5679431A
JPS5679431A JP15662079A JP15662079A JPS5679431A JP S5679431 A JPS5679431 A JP S5679431A JP 15662079 A JP15662079 A JP 15662079A JP 15662079 A JP15662079 A JP 15662079A JP S5679431 A JPS5679431 A JP S5679431A
Authority
JP
Japan
Prior art keywords
tips
tip
blank area
wafer
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15662079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63943B2 (enrdf_load_stackoverflow
Inventor
Yoji Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP15662079A priority Critical patent/JPS5679431A/ja
Publication of JPS5679431A publication Critical patent/JPS5679431A/ja
Publication of JPS63943B2 publication Critical patent/JPS63943B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP15662079A 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device Granted JPS5679431A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15662079A JPS5679431A (en) 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15662079A JPS5679431A (en) 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device

Publications (2)

Publication Number Publication Date
JPS5679431A true JPS5679431A (en) 1981-06-30
JPS63943B2 JPS63943B2 (enrdf_load_stackoverflow) 1988-01-09

Family

ID=15631688

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15662079A Granted JPS5679431A (en) 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JPS5679431A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5814137A (ja) * 1981-07-16 1983-01-26 Fujitsu Ltd 縮小投影露光方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5420317A (en) * 1977-07-15 1979-02-15 Taiyo Electric Mfg Exciter for brushless ac generator
JPS5662323A (en) * 1979-10-26 1981-05-28 Fujitsu Ltd Reticle examination method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5420317A (en) * 1977-07-15 1979-02-15 Taiyo Electric Mfg Exciter for brushless ac generator
JPS5662323A (en) * 1979-10-26 1981-05-28 Fujitsu Ltd Reticle examination method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5814137A (ja) * 1981-07-16 1983-01-26 Fujitsu Ltd 縮小投影露光方法

Also Published As

Publication number Publication date
JPS63943B2 (enrdf_load_stackoverflow) 1988-01-09

Similar Documents

Publication Publication Date Title
JPS57183031A (en) Method for wafer exposure and device thereof
JPS5679431A (en) Manufacture of semiconductor integrated circuit device
JPH0620903A (ja) 半導体装置の製造方法
CN113611620A (zh) 半导体晶片的检测方法
JPS57183030A (en) Manufacture of semiconductor device
JPS5568632A (en) Manufacture of photomask
JP2586144B2 (ja) 半導体装置の製造方法
EP0237406A3 (en) Electron beam testing of semiconductor wafers
JPH11297608A (ja) 露光方法及び露光装置
JPS6131610B2 (enrdf_load_stackoverflow)
JPS5446466A (en) Manufacture of semiconductor device
CN120010188A (zh) Wee曝光性能的在线监控方法
JPS5339060A (en) Lot number marking method to wafers
JPS5279678A (en) Repairing method for semiconductor memory elements
JPS641928B2 (enrdf_load_stackoverflow)
JP2001144012A (ja) 半導体装置の製造方法
KR950025941A (ko) 반도체소자의 리소그래피 공정마진 검사방법
JPS51122379A (en) Treatment for defect of photo-mask
JPS5513941A (en) Semiconductor wafer with traget for prove
JPS61154035A (ja) 半導体集積回路装置の製造方法
JPS5617348A (en) Exposing method
KR960018767A (ko) 반도체 웨이퍼 노광 방법
JPS57176723A (en) Selectively forming method for pattern
KR950004486A (ko) 웨이퍼의 필드 영역 분할 방법
JPH0697066A (ja) 半導体装置製造用フォトマスク