JPS5568632A - Manufacture of photomask - Google Patents
Manufacture of photomaskInfo
- Publication number
- JPS5568632A JPS5568632A JP14238378A JP14238378A JPS5568632A JP S5568632 A JPS5568632 A JP S5568632A JP 14238378 A JP14238378 A JP 14238378A JP 14238378 A JP14238378 A JP 14238378A JP S5568632 A JPS5568632 A JP S5568632A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- memory
- mask
- controller
- correcting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To reduce the number of processes or steps and labor, by making, inspecting and correcting a pattern in one process by a single unit for manufacturing a photomask.
CONSTITUTION: Electronic lenses 6W8 are driven by a lens power supply unit 9, which is controlled by a scanning controller 10. A prescribed pattern is made on a mask 15 in accordance with information supplied from a pattern memory 13 through a central controller 12. The mask 15 provided with the pattern is scanned by an electron beam of energy smaller than that for making the pattern so that a secondary electron image of the pattern is obtained by a detector 11. A pattern signal from the detector 11 is compared with that from the memory 13 by the controller 12. A detective pattern portion, which does not coincide with the pattern stored in the memory 13, is stored into a defect storage region 20 of the memory. After inspection, a defective part due to the shortage of electron irradiation is patterned again in the same way as the initial patterning, thereby correcting the mask pattern.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14238378A JPS5568632A (en) | 1978-11-20 | 1978-11-20 | Manufacture of photomask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14238378A JPS5568632A (en) | 1978-11-20 | 1978-11-20 | Manufacture of photomask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5568632A true JPS5568632A (en) | 1980-05-23 |
Family
ID=15314079
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14238378A Pending JPS5568632A (en) | 1978-11-20 | 1978-11-20 | Manufacture of photomask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5568632A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58178520A (en) * | 1982-04-13 | 1983-10-19 | Toshiba Corp | Inspecting and correcting device of photomask |
| JPS58196020A (en) * | 1982-05-12 | 1983-11-15 | Hitachi Ltd | Inspection of mask for defect, correcting method and its apparatus |
| JPS6132426A (en) * | 1984-07-16 | 1986-02-15 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Method of reversing transparent mask |
| EP0334680A2 (en) * | 1988-03-25 | 1989-09-27 | Canon Kabushiki Kaisha | Mask repair system |
| JPH0260A (en) * | 1989-05-12 | 1990-01-05 | Hitachi Ltd | Method and device for ion beam processing |
| JP2008016607A (en) * | 2006-07-05 | 2008-01-24 | Nuflare Technology Inc | Drawing device and error detection method in the same |
-
1978
- 1978-11-20 JP JP14238378A patent/JPS5568632A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58178520A (en) * | 1982-04-13 | 1983-10-19 | Toshiba Corp | Inspecting and correcting device of photomask |
| JPS58196020A (en) * | 1982-05-12 | 1983-11-15 | Hitachi Ltd | Inspection of mask for defect, correcting method and its apparatus |
| JPH0428097B2 (en) * | 1982-05-12 | 1992-05-13 | Hitachi Ltd | |
| JPS6132426A (en) * | 1984-07-16 | 1986-02-15 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Method of reversing transparent mask |
| EP0334680A2 (en) * | 1988-03-25 | 1989-09-27 | Canon Kabushiki Kaisha | Mask repair system |
| JPH0260A (en) * | 1989-05-12 | 1990-01-05 | Hitachi Ltd | Method and device for ion beam processing |
| JPH0429052B2 (en) * | 1989-05-12 | 1992-05-15 | Hitachi Ltd | |
| JP2008016607A (en) * | 2006-07-05 | 2008-01-24 | Nuflare Technology Inc | Drawing device and error detection method in the same |
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