JPS5258373A - Inspection for defects of pattern forming film - Google Patents

Inspection for defects of pattern forming film

Info

Publication number
JPS5258373A
JPS5258373A JP13384575A JP13384575A JPS5258373A JP S5258373 A JPS5258373 A JP S5258373A JP 13384575 A JP13384575 A JP 13384575A JP 13384575 A JP13384575 A JP 13384575A JP S5258373 A JPS5258373 A JP S5258373A
Authority
JP
Japan
Prior art keywords
defects
inspection
pattern forming
forming film
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13384575A
Other languages
Japanese (ja)
Inventor
Yoshiaki Goto
Yasuo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13384575A priority Critical patent/JPS5258373A/en
Publication of JPS5258373A publication Critical patent/JPS5258373A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3005—Observing the objects or the point of impact on the object

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Chemical Treatment Of Metals (AREA)
  • ing And Chemical Polishing (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)

Abstract

PURPOSE:To detect the defects of a pattern film by scanning the film with electron beams and detecting the secondary electrons emitted from the film.
JP13384575A 1975-11-07 1975-11-07 Inspection for defects of pattern forming film Pending JPS5258373A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13384575A JPS5258373A (en) 1975-11-07 1975-11-07 Inspection for defects of pattern forming film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13384575A JPS5258373A (en) 1975-11-07 1975-11-07 Inspection for defects of pattern forming film

Publications (1)

Publication Number Publication Date
JPS5258373A true JPS5258373A (en) 1977-05-13

Family

ID=15114369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13384575A Pending JPS5258373A (en) 1975-11-07 1975-11-07 Inspection for defects of pattern forming film

Country Status (1)

Country Link
JP (1) JPS5258373A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55140230A (en) * 1979-04-20 1980-11-01 Hitachi Ltd Pattern-correcting device
JPS5637626A (en) * 1979-09-05 1981-04-11 Chiyou Lsi Gijutsu Kenkyu Kumiai Inspection device for pattern
JPS56100416A (en) * 1980-01-16 1981-08-12 Fujitsu Ltd Method and device for correcting mask
JPS5961136A (en) * 1982-09-30 1984-04-07 Toshiba Corp Mask defect inspecting device
JPS59155941A (en) * 1983-02-25 1984-09-05 Hitachi Ltd Electron-beam inspection device
JPS62158450U (en) * 1986-03-31 1987-10-08
JPH09213255A (en) * 1997-01-20 1997-08-15 Hitachi Ltd Defect inspection device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55140230A (en) * 1979-04-20 1980-11-01 Hitachi Ltd Pattern-correcting device
JPS5637626A (en) * 1979-09-05 1981-04-11 Chiyou Lsi Gijutsu Kenkyu Kumiai Inspection device for pattern
JPS56100416A (en) * 1980-01-16 1981-08-12 Fujitsu Ltd Method and device for correcting mask
JPS6217745B2 (en) * 1980-01-16 1987-04-20 Fujitsu Ltd
JPS5961136A (en) * 1982-09-30 1984-04-07 Toshiba Corp Mask defect inspecting device
JPS59155941A (en) * 1983-02-25 1984-09-05 Hitachi Ltd Electron-beam inspection device
JPH0563939B2 (en) * 1983-02-25 1993-09-13 Hitachi Ltd
JPS62158450U (en) * 1986-03-31 1987-10-08
JPH09213255A (en) * 1997-01-20 1997-08-15 Hitachi Ltd Defect inspection device

Similar Documents

Publication Publication Date Title
JPS5328375A (en) Inspecting method
JPS51115765A (en) Electron tube cathode apparatus
JPS5258373A (en) Inspection for defects of pattern forming film
JPS5225575A (en) Inspection method of the state of object
JPS51130222A (en) A process for producing an electron beam resist image
JPS5212564A (en) Cathode ray tube
JPS5379594A (en) Surface inspecting apparatus of objects
AT331371B (en) GAS DISCHARGE ELECTRON BEAM GENERATING SYSTEM FOR GENERATING AN ELECTRON BEAM WITH THE HELP OF A GLIME DISCHARGE
JPS5260686A (en) X-ray photoelectronic analysis
JPS53122369A (en) Automatic alignment unit for wafer
JPS51116671A (en) Scanning type electron microscope
JPS5242789A (en) Method of inspecting pinholes of insulating film
JPS5421277A (en) Inspection method for pattern
JPS5249880A (en) Defect inspecting apparatus
AT335579B (en) GAS DISCHARGE ELECTRON BEAM GENERATING SYSTEM FOR GENERATING AN ELECTRON BEAM WITH THE HELP OF A GLIME DISCHARGE
JPS53129587A (en) Electron beam exposure unit
JPS52117578A (en) Electron beam exposing method
JPS5326193A (en) Observing method of ion beam radiati on point positions
JPS53113480A (en) Reflecting electron beam detector
JPS5226287A (en) Sample analyzing apparatus by detection of secondary electrons
JPS5666037A (en) X-ray mask
JPS5322368A (en) Pattern inspection method
JPS5234780A (en) Ultrasonic beam scaning apparatus
JPS53127267A (en) Inspection method for pattern
JPS528885A (en) Light fixed type crackdetector signal decision circuit