JPS5637626A - Inspection device for pattern - Google Patents

Inspection device for pattern

Info

Publication number
JPS5637626A
JPS5637626A JP11286679A JP11286679A JPS5637626A JP S5637626 A JPS5637626 A JP S5637626A JP 11286679 A JP11286679 A JP 11286679A JP 11286679 A JP11286679 A JP 11286679A JP S5637626 A JPS5637626 A JP S5637626A
Authority
JP
Japan
Prior art keywords
composition
pattern
defective part
inspected
defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11286679A
Other languages
Japanese (ja)
Other versions
JPS6410932B2 (en
Inventor
Fumio Mizuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP11286679A priority Critical patent/JPS5637626A/en
Publication of JPS5637626A publication Critical patent/JPS5637626A/en
Publication of JPS6410932B2 publication Critical patent/JPS6410932B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Abstract

PURPOSE:To detect the composition of a defective part and to classify the possibility of repair by utilizing the fact that pattern forming substance, a substrate, dust and dirt or the like are different from each other in composition. CONSTITUTION:With a defective part 4 which differs from a normal pattern detected when a pattern is inspected by scanning by an electron beam 3, characteristic X-rays 5 emitted from the defective part 4 are incidented on a detector 6 to inspect composition and the result of judgment is indicated 7. Judgements are made as follows: 1. When the composition is same as a pattern forming substance 1. -Correction is possible. 2. When the composition is same as a substrate 1. -Correction is impossible. 3. When the above 1 and 2 are not applied. -No defect. The defect will be corrected by a laser 8 or the like. In this composition, the pattern will effectively be inspected.
JP11286679A 1979-09-05 1979-09-05 Inspection device for pattern Granted JPS5637626A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11286679A JPS5637626A (en) 1979-09-05 1979-09-05 Inspection device for pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11286679A JPS5637626A (en) 1979-09-05 1979-09-05 Inspection device for pattern

Publications (2)

Publication Number Publication Date
JPS5637626A true JPS5637626A (en) 1981-04-11
JPS6410932B2 JPS6410932B2 (en) 1989-02-22

Family

ID=14597482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11286679A Granted JPS5637626A (en) 1979-09-05 1979-09-05 Inspection device for pattern

Country Status (1)

Country Link
JP (1) JPS5637626A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009503495A (en) * 2005-07-30 2009-01-29 シーイービーティー・カンパニー・リミティッド Micro pattern and shape inspection equipment using micro column

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5192182A (en) * 1975-02-10 1976-08-12
JPS5258373A (en) * 1975-11-07 1977-05-13 Fujitsu Ltd Inspection for defects of pattern forming film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5192182A (en) * 1975-02-10 1976-08-12
JPS5258373A (en) * 1975-11-07 1977-05-13 Fujitsu Ltd Inspection for defects of pattern forming film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009503495A (en) * 2005-07-30 2009-01-29 シーイービーティー・カンパニー・リミティッド Micro pattern and shape inspection equipment using micro column

Also Published As

Publication number Publication date
JPS6410932B2 (en) 1989-02-22

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