JPS54158445A - Sintering of photosensitive resin - Google Patents
Sintering of photosensitive resinInfo
- Publication number
- JPS54158445A JPS54158445A JP6801478A JP6801478A JPS54158445A JP S54158445 A JPS54158445 A JP S54158445A JP 6801478 A JP6801478 A JP 6801478A JP 6801478 A JP6801478 A JP 6801478A JP S54158445 A JPS54158445 A JP S54158445A
- Authority
- JP
- Japan
- Prior art keywords
- sintering
- heated
- wafer
- hot plate
- inert gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6801478A JPS54158445A (en) | 1978-06-05 | 1978-06-05 | Sintering of photosensitive resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6801478A JPS54158445A (en) | 1978-06-05 | 1978-06-05 | Sintering of photosensitive resin |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54158445A true JPS54158445A (en) | 1979-12-14 |
Family
ID=13361546
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6801478A Pending JPS54158445A (en) | 1978-06-05 | 1978-06-05 | Sintering of photosensitive resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54158445A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5735319A (en) * | 1980-08-13 | 1982-02-25 | Hitachi Ltd | Heat treatment device |
JPS57166339U (ja) * | 1981-04-13 | 1982-10-20 | ||
JPS5821332A (ja) * | 1981-05-15 | 1983-02-08 | ジ−・シ−・エ−・コ−ポレ−シヨン | 半導体ウエハにレジストをベ−キングする装置 |
JPS5881934U (ja) * | 1981-11-30 | 1983-06-03 | 株式会社日立製作所 | 自動連続式ベ−ク炉 |
JPS64738A (en) * | 1988-05-20 | 1989-01-05 | Hitachi Ltd | Heat treatment of semiconductor wafer |
US6559071B2 (en) * | 1998-08-31 | 2003-05-06 | Alliedsignal Inc. | Process for producing dielectric thin films |
-
1978
- 1978-06-05 JP JP6801478A patent/JPS54158445A/ja active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5735319A (en) * | 1980-08-13 | 1982-02-25 | Hitachi Ltd | Heat treatment device |
JPH0313735B2 (ja) * | 1980-08-13 | 1991-02-25 | Hitachi Ltd | |
JPS57166339U (ja) * | 1981-04-13 | 1982-10-20 | ||
JPS6214684Y2 (ja) * | 1981-04-13 | 1987-04-15 | ||
JPS5821332A (ja) * | 1981-05-15 | 1983-02-08 | ジ−・シ−・エ−・コ−ポレ−シヨン | 半導体ウエハにレジストをベ−キングする装置 |
JPS5881934U (ja) * | 1981-11-30 | 1983-06-03 | 株式会社日立製作所 | 自動連続式ベ−ク炉 |
JPS64738A (en) * | 1988-05-20 | 1989-01-05 | Hitachi Ltd | Heat treatment of semiconductor wafer |
JPH0424855B2 (ja) * | 1988-05-20 | 1992-04-28 | Hitachi Ltd | |
US6559071B2 (en) * | 1998-08-31 | 2003-05-06 | Alliedsignal Inc. | Process for producing dielectric thin films |
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