JPS5735319A - Heat treatment device - Google Patents

Heat treatment device

Info

Publication number
JPS5735319A
JPS5735319A JP11019880A JP11019880A JPS5735319A JP S5735319 A JPS5735319 A JP S5735319A JP 11019880 A JP11019880 A JP 11019880A JP 11019880 A JP11019880 A JP 11019880A JP S5735319 A JPS5735319 A JP S5735319A
Authority
JP
Japan
Prior art keywords
chamber
foreign matters
wafer
gas
conveying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11019880A
Other languages
Japanese (ja)
Other versions
JPH0313735B2 (en
Inventor
Haruo Amada
Hiroshi Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11019880A priority Critical patent/JPS5735319A/en
Publication of JPS5735319A publication Critical patent/JPS5735319A/en
Publication of JPH0313735B2 publication Critical patent/JPH0313735B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To improve production yield by preventing foreign matters from adhering to a wafer, by providing a treating chamber, for heat treatment of a wafer, with a gas circulating passage designed for allowing clean gas to pass downwards, and by keeping gas pressure in the treating chamber to positive pressure in comparison with atmospheric pressure. CONSTITUTION:An inert gas, sent into a circulating chamber 3 from a gas supply pipe 4, passes through filters 14 and 15, enters a baking chamber from a ventilating chamber 7, flows downwards by action of a mesh plate 5 carrying down foreign matters produced in a driving unit of a conveying step 16 and flows into a ventilating chamber 9 through a mesh plate 6, so that foreign matters in the baking chamber can be removed. On the other hand, a wafer 17 is made to pass through a conveying entrance 20 and conveyed into the baking chamber by the conveying step 16, where it is provided with heat treatment and conveyed out from an exit 22. At this time, positive pressure is maintained in the baking chamber by adjusting gas flow so that foreign matters contained in atmosphere can be prevented from entering at the time of conveying in and out of the wafer. it is possible, by doing so, to prevent the foreign matters from adhering to a coating.
JP11019880A 1980-08-13 1980-08-13 Heat treatment device Granted JPS5735319A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11019880A JPS5735319A (en) 1980-08-13 1980-08-13 Heat treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11019880A JPS5735319A (en) 1980-08-13 1980-08-13 Heat treatment device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP12170488A Division JPS64738A (en) 1988-05-20 1988-05-20 Heat treatment of semiconductor wafer

Publications (2)

Publication Number Publication Date
JPS5735319A true JPS5735319A (en) 1982-02-25
JPH0313735B2 JPH0313735B2 (en) 1991-02-25

Family

ID=14529528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11019880A Granted JPS5735319A (en) 1980-08-13 1980-08-13 Heat treatment device

Country Status (1)

Country Link
JP (1) JPS5735319A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6120331A (en) * 1984-07-09 1986-01-29 Nec Corp Device for baking resist
JPS61164023U (en) * 1985-03-28 1986-10-11
JPS6453421A (en) * 1987-08-24 1989-03-01 Mitsubishi Electric Corp Resist coating device
JPH01225119A (en) * 1988-03-03 1989-09-08 Nec Corp Hot plate type baking device
JP2009099861A (en) * 2007-10-18 2009-05-07 Fenwall Controls Of Japan Ltd Semiconductor processing unit and semiconductor manufacturing apparatus

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895638A (en) * 1972-03-21 1973-12-07
JPS51124839A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Infrared ray baking furnace
JPS51132772A (en) * 1975-05-14 1976-11-18 Hitachi Ltd Baking apparatus
JPS5422377U (en) * 1977-07-18 1979-02-14
JPS54158445A (en) * 1978-06-05 1979-12-14 Mitsubishi Electric Corp Sintering of photosensitive resin
JPS5595332A (en) * 1979-01-12 1980-07-19 Toshiba Corp Dust removing system for conveyor

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895638A (en) * 1972-03-21 1973-12-07
JPS51124839A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Infrared ray baking furnace
JPS51132772A (en) * 1975-05-14 1976-11-18 Hitachi Ltd Baking apparatus
JPS5422377U (en) * 1977-07-18 1979-02-14
JPS54158445A (en) * 1978-06-05 1979-12-14 Mitsubishi Electric Corp Sintering of photosensitive resin
JPS5595332A (en) * 1979-01-12 1980-07-19 Toshiba Corp Dust removing system for conveyor

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6120331A (en) * 1984-07-09 1986-01-29 Nec Corp Device for baking resist
JPH0254656B2 (en) * 1984-07-09 1990-11-22 Nippon Electric Co
JPS61164023U (en) * 1985-03-28 1986-10-11
JPH0238438Y2 (en) * 1985-03-28 1990-10-17
JPS6453421A (en) * 1987-08-24 1989-03-01 Mitsubishi Electric Corp Resist coating device
JPH061758B2 (en) * 1987-08-24 1994-01-05 三菱電機株式会社 Resist coating device
JPH01225119A (en) * 1988-03-03 1989-09-08 Nec Corp Hot plate type baking device
JP2009099861A (en) * 2007-10-18 2009-05-07 Fenwall Controls Of Japan Ltd Semiconductor processing unit and semiconductor manufacturing apparatus

Also Published As

Publication number Publication date
JPH0313735B2 (en) 1991-02-25

Similar Documents

Publication Publication Date Title
JPS5735319A (en) Heat treatment device
JPS5748226A (en) Plasma processing method and device for the same
GB863817A (en) System for handling wire and the like
JPS57122997A (en) Method and apparatus for treating waste water by microorganism
JPS5666044A (en) Semiconductor device
US4578878A (en) Tobacco drying machine
JPS5534183A (en) Filtering and dust collecting device
JPS6442129A (en) Cleaning and removal of organic substance
JPS5687331A (en) Reducing furnace for solder-treatment
JPS64738A (en) Heat treatment of semiconductor wafer
EP0059781A3 (en) Arrangement for the pneumatic or hydraulic lifting and conveying of material to be conveyed
SE9502278L (en) Process and plant for treating components with a gas mixture
JPS561527A (en) Exhaust gas disposal method for semiconductor manufacturing equipment
JPS5694642A (en) Processing device of wafer
JPS5718978A (en) System for keeping interior of laboratory where dangerous material is handled at negative pressure
ES8206625A1 (en) Pre-diffusion method for sugar-works
JPS5791819A (en) Surface treatment device for stainless steel strip
JPS5621657A (en) Dust deposition preventing device in cyclon dust precipitator
JPS56158860A (en) Method and apparatus for removing fume from galvanizing
SE8102256L (en) DETECTION OF PRECIOUS GASES IN THE OUTLET FROM NUCLEAR PROCESSES
JPS54161601A (en) Operation of denitrification process of coke oven exhaust gas
JPS6420338A (en) Apparatus and method for treating fiber cable
JPS57155306A (en) Treatment of gas generated in blast furnace at time of vacant furnace blowing period
JPS57109329A (en) Liquid chemical treating device
JPS5741318A (en) Circulating and supplying device for gaseous atmosphere of heat treatment furnace