JPS51124839A - Infrared ray baking furnace - Google Patents
Infrared ray baking furnaceInfo
- Publication number
- JPS51124839A JPS51124839A JP4968075A JP4968075A JPS51124839A JP S51124839 A JPS51124839 A JP S51124839A JP 4968075 A JP4968075 A JP 4968075A JP 4968075 A JP4968075 A JP 4968075A JP S51124839 A JPS51124839 A JP S51124839A
- Authority
- JP
- Japan
- Prior art keywords
- baking furnace
- infrared ray
- ray baking
- furnace
- products
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Resistance Heating (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To reduce the fault rate of products by making the temperature distribution inside a whole baking furnace to become uniform.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4968075A JPS51124839A (en) | 1975-04-25 | 1975-04-25 | Infrared ray baking furnace |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4968075A JPS51124839A (en) | 1975-04-25 | 1975-04-25 | Infrared ray baking furnace |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51124839A true JPS51124839A (en) | 1976-10-30 |
Family
ID=12837880
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4968075A Pending JPS51124839A (en) | 1975-04-25 | 1975-04-25 | Infrared ray baking furnace |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51124839A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5735319A (en) * | 1980-08-13 | 1982-02-25 | Hitachi Ltd | Heat treatment device |
JPS5875154A (en) * | 1981-10-29 | 1983-05-06 | Toppan Printing Co Ltd | Heater |
JPS5961027A (en) * | 1982-09-29 | 1984-04-07 | Toshiba Corp | Semiconductor substrate heating apparatus |
JPS64738A (en) * | 1988-05-20 | 1989-01-05 | Hitachi Ltd | Heat treatment of semiconductor wafer |
JPH0253059A (en) * | 1988-08-18 | 1990-02-22 | Matsushita Electric Ind Co Ltd | Pattern forming method |
-
1975
- 1975-04-25 JP JP4968075A patent/JPS51124839A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5735319A (en) * | 1980-08-13 | 1982-02-25 | Hitachi Ltd | Heat treatment device |
JPH0313735B2 (en) * | 1980-08-13 | 1991-02-25 | Hitachi Ltd | |
JPS5875154A (en) * | 1981-10-29 | 1983-05-06 | Toppan Printing Co Ltd | Heater |
JPH0241163B2 (en) * | 1981-10-29 | 1990-09-14 | Toppan Printing Co Ltd | |
JPS5961027A (en) * | 1982-09-29 | 1984-04-07 | Toshiba Corp | Semiconductor substrate heating apparatus |
JPS64738A (en) * | 1988-05-20 | 1989-01-05 | Hitachi Ltd | Heat treatment of semiconductor wafer |
JPH0424855B2 (en) * | 1988-05-20 | 1992-04-28 | Hitachi Ltd | |
JPH0253059A (en) * | 1988-08-18 | 1990-02-22 | Matsushita Electric Ind Co Ltd | Pattern forming method |
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