JPH10255319A - 原盤露光装置及び方法 - Google Patents

原盤露光装置及び方法

Info

Publication number
JPH10255319A
JPH10255319A JP9076450A JP7645097A JPH10255319A JP H10255319 A JPH10255319 A JP H10255319A JP 9076450 A JP9076450 A JP 9076450A JP 7645097 A JP7645097 A JP 7645097A JP H10255319 A JPH10255319 A JP H10255319A
Authority
JP
Japan
Prior art keywords
master
exposure apparatus
liquid
nozzle
condenser lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9076450A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10255319A5 (enExample
Inventor
Masashi Suenaga
正志 末永
Toshinori Sugiyama
寿紀 杉山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maxell Ltd
Original Assignee
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Maxell Ltd filed Critical Hitachi Maxell Ltd
Priority to JP9076450A priority Critical patent/JPH10255319A/ja
Publication of JPH10255319A publication Critical patent/JPH10255319A/ja
Publication of JPH10255319A5 publication Critical patent/JPH10255319A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Head (AREA)
JP9076450A 1997-03-12 1997-03-12 原盤露光装置及び方法 Pending JPH10255319A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9076450A JPH10255319A (ja) 1997-03-12 1997-03-12 原盤露光装置及び方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9076450A JPH10255319A (ja) 1997-03-12 1997-03-12 原盤露光装置及び方法

Publications (2)

Publication Number Publication Date
JPH10255319A true JPH10255319A (ja) 1998-09-25
JPH10255319A5 JPH10255319A5 (enExample) 2004-09-16

Family

ID=13605497

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9076450A Pending JPH10255319A (ja) 1997-03-12 1997-03-12 原盤露光装置及び方法

Country Status (1)

Country Link
JP (1) JPH10255319A (enExample)

Cited By (186)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999049504A1 (fr) * 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
WO2002013194A1 (en) * 2000-08-08 2002-02-14 Koninklijke Philips Electronics N.V. Method of manufacturing an optically scannable information carrier
JP2003506828A (ja) * 1999-07-30 2003-02-18 エテック システムズ インコーポレイテッド 光電陰極の高開口数照光を用いた電子ビームコラム
WO2004053957A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 面位置検出装置、露光方法、及びデバイス製造方法
WO2004053958A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及びデバイス製造方法
WO2004053956A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及び露光方法、デバイス製造方法
WO2004053950A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及びデバイス製造方法
WO2004053951A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光方法及び露光装置並びにデバイス製造方法
WO2004053953A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及びデバイス製造方法
WO2004053952A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及びデバイス製造方法
WO2004053955A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及びデバイス製造方法
WO2004055803A1 (en) * 2002-12-13 2004-07-01 Koninklijke Philips Electronics N.V. Liquid removal in a method and device for irradiating spots on a layer
JP2004207711A (ja) * 2002-12-10 2004-07-22 Nikon Corp 露光装置及び露光方法、デバイス製造方法
WO2004086470A1 (ja) * 2003-03-25 2004-10-07 Nikon Corporation 露光装置及びデバイス製造方法
WO2004086468A1 (ja) * 2003-02-26 2004-10-07 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
WO2004112108A1 (ja) * 2003-06-13 2004-12-23 Nikon Corporation 露光方法、基板ステージ、露光装置、及びデバイス製造方法
EP1491956A1 (en) * 2003-06-27 2004-12-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1494074A1 (en) * 2003-06-30 2005-01-05 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005077533A (ja) * 2003-08-28 2005-03-24 Nikon Corp 光学素子、レンズ系、及び投影露光装置
JP2005101487A (ja) * 2002-12-10 2005-04-14 Nikon Corp 露光装置及びデバイス製造方法、露光システム
JP2005101488A (ja) * 2002-12-10 2005-04-14 Nikon Corp 露光装置及び露光方法、デバイス製造方法
SG110100A1 (en) * 2003-06-27 2005-04-28 Asml Holding Nv Immersion photolithography system and method using inverted wafer-projection optics interface
WO2005034174A3 (en) * 2003-10-03 2005-06-09 Micronic Laser Systems Ab Method and device for immersion lithography
US6952253B2 (en) 2002-11-12 2005-10-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6954256B2 (en) 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
US7009682B2 (en) 2002-11-18 2006-03-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7034917B2 (en) 2004-04-01 2006-04-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
US7050146B2 (en) 2004-02-09 2006-05-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7075616B2 (en) 2002-11-12 2006-07-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7081943B2 (en) 2002-11-12 2006-07-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7110081B2 (en) 2002-11-12 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7110087B2 (en) 2003-06-30 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7113259B2 (en) 2003-10-31 2006-09-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7119876B2 (en) 2004-10-18 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7119874B2 (en) 2003-06-27 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7133114B2 (en) 2004-09-20 2006-11-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7145630B2 (en) 2004-11-23 2006-12-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7158211B2 (en) 2003-09-29 2007-01-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7161654B2 (en) 2004-12-02 2007-01-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7161663B2 (en) 2004-07-22 2007-01-09 Asml Netherlands B.V. Lithographic apparatus
US7175968B2 (en) 2003-07-28 2007-02-13 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a substrate
JP2007502882A (ja) * 2003-08-20 2007-02-15 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ 非浸出接着剤系及び液浸対物系におけるその使用
US7184122B2 (en) 2003-07-24 2007-02-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7193232B2 (en) 2002-11-12 2007-03-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method with substrate measurement not through liquid
US7193681B2 (en) 2003-09-29 2007-03-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7196770B2 (en) 2004-12-07 2007-03-27 Asml Netherlands B.V. Prewetting of substrate before immersion exposure
US7199858B2 (en) 2002-11-12 2007-04-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7209213B2 (en) 2004-10-07 2007-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7224431B2 (en) 2005-02-22 2007-05-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7227619B2 (en) 2004-04-01 2007-06-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7242455B2 (en) 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
US7248334B2 (en) 2004-12-07 2007-07-24 Asml Netherlands B.V. Sensor shield
US7251013B2 (en) 2004-11-12 2007-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7253879B2 (en) 2005-04-19 2007-08-07 Asml Holding N.V. Liquid immersion lithography system with tilted liquid flow
US7291850B2 (en) 2005-04-08 2007-11-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7295283B2 (en) 2004-04-02 2007-11-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7304715B2 (en) 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317507B2 (en) 2005-05-03 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317504B2 (en) 2004-04-08 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR100797666B1 (ko) * 2006-01-16 2008-01-23 다이닛뽕스크린 세이조오 가부시키가이샤 기판처리장치
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1635382A4 (en) * 2003-06-19 2008-01-30 Nikon Corp EXPOSURE DEVICE AND METHOD FOR PRODUCING A DEVICE
US7326522B2 (en) 2004-02-11 2008-02-05 Asml Netherlands B.V. Device manufacturing method and a substrate
US7330238B2 (en) 2005-03-28 2008-02-12 Asml Netherlands, B.V. Lithographic apparatus, immersion projection apparatus and device manufacturing method
CN100371827C (zh) * 2003-06-19 2008-02-27 Asml控股股份有限公司 浸入式光刻系统及使用微通道喷嘴的方法
US7352433B2 (en) 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352435B2 (en) 2003-10-15 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352440B2 (en) 2004-12-10 2008-04-01 Asml Netherlands B.V. Substrate placement in immersion lithography
US7352434B2 (en) 2003-05-13 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7355674B2 (en) 2004-09-28 2008-04-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
US7359030B2 (en) 2002-11-29 2008-04-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7365827B2 (en) 2004-12-08 2008-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7372541B2 (en) 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7379155B2 (en) 2004-10-18 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7378025B2 (en) 2005-02-22 2008-05-27 Asml Netherlands B.V. Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US7379159B2 (en) 2004-05-03 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7399978B2 (en) 2002-12-19 2008-07-15 Koninklijke Philips Electronics N.V. Method and device for irradiating spots on a layer
US7403261B2 (en) 2004-12-15 2008-07-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7405805B2 (en) 2004-12-28 2008-07-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411657B2 (en) 2004-11-17 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411658B2 (en) 2005-10-06 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411654B2 (en) 2005-04-05 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411653B2 (en) 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
US7414699B2 (en) 2004-11-12 2008-08-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7420194B2 (en) 2005-12-27 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US7423955B2 (en) 2003-03-24 2008-09-09 Koninklijke Philips Electronics N.V. Method for recording a lead-out on an optical disc
US7423720B2 (en) 2004-11-12 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7428038B2 (en) 2005-02-28 2008-09-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
US7433015B2 (en) 2003-10-15 2008-10-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7433016B2 (en) 2005-05-03 2008-10-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7446850B2 (en) 2004-12-03 2008-11-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100433253C (zh) * 2003-02-26 2008-11-12 株式会社尼康 曝光装置以及器件制造方法
US7460206B2 (en) 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100444315C (zh) * 2002-12-10 2008-12-17 株式会社尼康 曝光装置以及器件制造方法
US7468779B2 (en) 2005-06-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7474379B2 (en) 2005-06-28 2009-01-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7483118B2 (en) 2003-07-28 2009-01-27 Asml Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US7486381B2 (en) 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7491661B2 (en) 2004-12-28 2009-02-17 Asml Netherlands B.V. Device manufacturing method, top coat material and substrate
JP2009044185A (ja) * 2004-04-14 2009-02-26 Asml Netherlands Bv リソグラフィック装置及びデバイス製造方法
US7522261B2 (en) 2004-09-24 2009-04-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528929B2 (en) 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528931B2 (en) 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7535644B2 (en) 2005-08-12 2009-05-19 Asml Netherlands B.V. Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7545481B2 (en) 2003-11-24 2009-06-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7583357B2 (en) 2004-11-12 2009-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7589818B2 (en) 2003-12-23 2009-09-15 Asml Netherlands B.V. Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
US7602470B2 (en) 2004-08-19 2009-10-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7633073B2 (en) 2005-11-23 2009-12-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7652746B2 (en) 2005-06-21 2010-01-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7656501B2 (en) 2005-11-16 2010-02-02 Asml Netherlands B.V. Lithographic apparatus
US7670730B2 (en) 2004-12-30 2010-03-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2161619A1 (en) * 2003-04-11 2010-03-10 Nikon Corporation Cleanup method for optics in immersion lithography
US7684010B2 (en) 2005-03-09 2010-03-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US7705962B2 (en) 2005-01-14 2010-04-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7733459B2 (en) 2003-08-29 2010-06-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7738074B2 (en) 2003-07-16 2010-06-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7751027B2 (en) 2005-06-21 2010-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7773195B2 (en) 2005-11-29 2010-08-10 Asml Holding N.V. System and method to increase surface tension and contact angle in immersion lithography
US7791709B2 (en) 2006-12-08 2010-09-07 Asml Netherlands B.V. Substrate support and lithographic process
US7804574B2 (en) 2003-05-30 2010-09-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using acidic liquid
US7804577B2 (en) 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
US7817245B2 (en) 2003-09-29 2010-10-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7834974B2 (en) 2005-06-28 2010-11-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7839483B2 (en) 2005-12-28 2010-11-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a control system
EP1643543B1 (en) * 2003-07-09 2010-11-24 Nikon Corporation Exposure apparatus and method for manufacturing device
US7864292B2 (en) 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7894040B2 (en) 2004-10-05 2011-02-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7898643B2 (en) 2003-06-27 2011-03-01 Asml Holding N.V. Immersion photolithography system and method using inverted wafer-projection optics interface
US7948604B2 (en) 2002-12-10 2011-05-24 Nikon Corporation Exposure apparatus and method for producing device
US8018573B2 (en) 2005-02-22 2011-09-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8045135B2 (en) 2006-11-22 2011-10-25 Asml Netherlands B.V. Lithographic apparatus with a fluid combining unit and related device manufacturing method
US8045134B2 (en) 2006-03-13 2011-10-25 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
US8054445B2 (en) 2005-08-16 2011-11-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1855140A4 (en) * 2005-02-28 2012-04-04 Nikon Corp ADAPTER FOR MICROSCOPE AND MICROSCOPE
US8164734B2 (en) 2004-06-16 2012-04-24 Asml Netherlands B.V. Vacuum system for immersion photolithography
US8208124B2 (en) 2003-08-29 2012-06-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
KR101323396B1 (ko) * 2003-09-29 2013-10-29 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8859188B2 (en) 2005-02-10 2014-10-14 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
US8902401B2 (en) 2006-05-09 2014-12-02 Carl Zeiss Smt Gmbh Optical imaging device with thermal attenuation
US8937704B2 (en) 2003-07-31 2015-01-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a resistivity sensor
US8947629B2 (en) 2007-05-04 2015-02-03 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US8947637B2 (en) 2003-08-29 2015-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9013672B2 (en) 2007-05-04 2015-04-21 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US9081295B2 (en) 2003-05-06 2015-07-14 Nikon Corporation Catadioptric projection optical system, exposure apparatus, and exposure method
US9110389B2 (en) 2003-06-11 2015-08-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI508136B (zh) * 2004-09-17 2015-11-11 尼康股份有限公司 Exposure apparatus, exposure method, and device manufacturing method
US9256136B2 (en) 2010-04-22 2016-02-09 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply
JP2016053734A (ja) * 2003-07-09 2016-04-14 株式会社ニコン 露光装置、及びデバイス製造方法
JP2016075790A (ja) * 2014-10-07 2016-05-12 株式会社ニコン 描画装置および描画方法、並びに湿式処理装置
JP2016075887A (ja) * 2015-03-20 2016-05-12 株式会社ニコン 湿式処理装置および湿式処理方法
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9436095B2 (en) 2004-01-20 2016-09-06 Carl Zeiss Smt Gmbh Exposure apparatus and measuring device for a projection lens
US9477158B2 (en) 2006-04-14 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9500960B2 (en) 2003-04-11 2016-11-22 Nikon Corporation Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
US9500943B2 (en) 2003-05-06 2016-11-22 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9632427B2 (en) 2003-04-10 2017-04-25 Nikon Corporation Environmental system including a transport region for an immersion lithography apparatus
US9632431B2 (en) 2004-02-02 2017-04-25 Nikon Corporation Lithographic apparatus and method having substrate and sensor tables
US9632425B2 (en) 2006-12-07 2017-04-25 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US9645505B2 (en) 2004-06-09 2017-05-09 Nikon Corporation Immersion exposure apparatus and device manufacturing method with measuring device to measure specific resistance of liquid
US9658537B2 (en) 2003-04-10 2017-05-23 Nikon Corporation Environmental system including vacuum scavenge for an immersion lithography apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9746781B2 (en) 2005-01-31 2017-08-29 Nikon Corporation Exposure apparatus and method for producing device
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9939739B2 (en) 2003-05-23 2018-04-10 Nikon Corporation Exposure apparatus and method for producing device
USRE46933E1 (en) 2005-04-08 2018-07-03 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
US10088760B2 (en) 2003-12-03 2018-10-02 Nikon Corporation Exposure apparatus, exposure method, method for producing device, and optical part
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US10126661B2 (en) 2004-03-25 2018-11-13 Nikon Corporation Exposure apparatus and device fabrication method
US10175584B2 (en) 2003-08-26 2019-01-08 Nikon Corporation Optical element and exposure apparatus
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
USRE48515E1 (en) 2002-12-19 2021-04-13 Asml Netherlands B.V. Method and device for irradiating spots on a layer
US11187991B2 (en) 2008-05-28 2021-11-30 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus

Cited By (530)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999049504A1 (fr) * 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
JP2003506828A (ja) * 1999-07-30 2003-02-18 エテック システムズ インコーポレイテッド 光電陰極の高開口数照光を用いた電子ビームコラム
WO2002013194A1 (en) * 2000-08-08 2002-02-14 Koninklijke Philips Electronics N.V. Method of manufacturing an optically scannable information carrier
US6649093B2 (en) 2000-08-08 2003-11-18 Koninklijke Philips Electronics N.V. Method of manufacturing an optically scannable information carrier
AU784573B2 (en) * 2000-08-08 2006-05-04 Koninklijke Philips Electronics N.V. Method of manufacturing an optically scannable information carrier
US9740107B2 (en) 2002-11-12 2017-08-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7372541B2 (en) 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8344341B2 (en) 2002-11-12 2013-01-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7795603B2 (en) 2002-11-12 2010-09-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9057967B2 (en) 2002-11-12 2015-06-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9091940B2 (en) 2002-11-12 2015-07-28 Asml Netherlands B.V. Lithographic apparatus and method involving a fluid inlet and a fluid outlet
US9097987B2 (en) 2002-11-12 2015-08-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9195153B2 (en) 2002-11-12 2015-11-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7593093B2 (en) 2002-11-12 2009-09-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7593092B2 (en) 2002-11-12 2009-09-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9360765B2 (en) 2002-11-12 2016-06-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9366972B2 (en) 2002-11-12 2016-06-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7482611B2 (en) 2002-11-12 2009-01-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9588442B2 (en) 2002-11-12 2017-03-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10620545B2 (en) 2002-11-12 2020-04-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7388648B2 (en) 2002-11-12 2008-06-17 Asml Netherlands B.V. Lithographic projection apparatus
US8446568B2 (en) 2002-11-12 2013-05-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9885965B2 (en) 2002-11-12 2018-02-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6952253B2 (en) 2002-11-12 2005-10-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10191389B2 (en) 2002-11-12 2019-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7193232B2 (en) 2002-11-12 2007-03-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method with substrate measurement not through liquid
US10222706B2 (en) 2002-11-12 2019-03-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7224436B2 (en) 2002-11-12 2007-05-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10261428B2 (en) 2002-11-12 2019-04-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7932999B2 (en) 2002-11-12 2011-04-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10962891B2 (en) 2002-11-12 2021-03-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7075616B2 (en) 2002-11-12 2006-07-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7081943B2 (en) 2002-11-12 2006-07-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7110081B2 (en) 2002-11-12 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7199858B2 (en) 2002-11-12 2007-04-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10788755B2 (en) 2002-11-12 2020-09-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7009682B2 (en) 2002-11-18 2006-03-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7119881B2 (en) 2002-11-18 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7359030B2 (en) 2002-11-29 2008-04-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7639343B2 (en) 2002-12-10 2009-12-29 Nikon Corporation Exposure apparatus and device manufacturing method
US7242455B2 (en) 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
US8089611B2 (en) 2002-12-10 2012-01-03 Nikon Corporation Exposure apparatus and method for producing device
US7505111B2 (en) 2002-12-10 2009-03-17 Nikon Corporation Exposure apparatus and device manufacturing method
US7515246B2 (en) 2002-12-10 2009-04-07 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US7589821B2 (en) 2002-12-10 2009-09-15 Nikon Corporation Exposure apparatus and device manufacturing method
US7948604B2 (en) 2002-12-10 2011-05-24 Nikon Corporation Exposure apparatus and method for producing device
WO2004053957A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 面位置検出装置、露光方法、及びデバイス製造方法
JP2004207711A (ja) * 2002-12-10 2004-07-22 Nikon Corp 露光装置及び露光方法、デバイス製造方法
JP2005101488A (ja) * 2002-12-10 2005-04-14 Nikon Corp 露光装置及び露光方法、デバイス製造方法
US7436486B2 (en) 2002-12-10 2008-10-14 Nikon Corporation Exposure apparatus and device manufacturing method
WO2004053958A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及びデバイス製造方法
WO2004053956A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及び露光方法、デバイス製造方法
US7379158B2 (en) 2002-12-10 2008-05-27 Nikon Corporation Exposure apparatus and method for producing device
US7446851B2 (en) 2002-12-10 2008-11-04 Nikon Corporation Exposure apparatus and device manufacturing method
WO2004053950A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及びデバイス製造方法
CN100444315C (zh) * 2002-12-10 2008-12-17 株式会社尼康 曝光装置以及器件制造方法
JP2009105472A (ja) * 2002-12-10 2009-05-14 Nikon Corp 真空システム、液浸露光装置及び露光方法、デバイス製造方法
US7466392B2 (en) 2002-12-10 2008-12-16 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JP2005101487A (ja) * 2002-12-10 2005-04-14 Nikon Corp 露光装置及びデバイス製造方法、露光システム
US7589820B2 (en) 2002-12-10 2009-09-15 Nikon Corporation Exposure apparatus and method for producing device
JP2009105473A (ja) * 2002-12-10 2009-05-14 Nikon Corp 露光装置及びデバイス製造方法、露光システム
WO2004053955A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及びデバイス製造方法
US7460207B2 (en) 2002-12-10 2008-12-02 Nikon Corporation Exposure apparatus and method for producing device
WO2004053951A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光方法及び露光装置並びにデバイス製造方法
JP2009105471A (ja) * 2002-12-10 2009-05-14 Nikon Corp 露光装置、及びデバイス製造方法
US7436487B2 (en) 2002-12-10 2008-10-14 Nikon Corporation Exposure apparatus and method for producing device
WO2004053953A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及びデバイス製造方法
WO2004053952A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及びデバイス製造方法
US7358507B2 (en) 2002-12-13 2008-04-15 Koninklijke Philips Electronics N.V. Liquid removal in a method and device for irradiating spots on a layer
WO2004055803A1 (en) * 2002-12-13 2004-07-01 Koninklijke Philips Electronics N.V. Liquid removal in a method and device for irradiating spots on a layer
US7399978B2 (en) 2002-12-19 2008-07-15 Koninklijke Philips Electronics N.V. Method and device for irradiating spots on a layer
USRE48515E1 (en) 2002-12-19 2021-04-13 Asml Netherlands B.V. Method and device for irradiating spots on a layer
US7453550B2 (en) 2003-02-26 2008-11-18 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JP2010028127A (ja) * 2003-02-26 2010-02-04 Nikon Corp 露光装置、露光方法及びデバイス製造方法
JP2015121825A (ja) * 2003-02-26 2015-07-02 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
US7535550B2 (en) 2003-02-26 2009-05-19 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JP2017068287A (ja) * 2003-02-26 2017-04-06 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
JP2016075963A (ja) * 2003-02-26 2016-05-12 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
CN100433253C (zh) * 2003-02-26 2008-11-12 株式会社尼康 曝光装置以及器件制造方法
US7542128B2 (en) 2003-02-26 2009-06-02 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JP2009147386A (ja) * 2003-02-26 2009-07-02 Nikon Corp 露光装置、及びデバイス製造方法
JP2018106206A (ja) * 2003-02-26 2018-07-05 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
US7268854B2 (en) 2003-02-26 2007-09-11 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US10180632B2 (en) 2003-02-26 2019-01-15 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JP2014112741A (ja) * 2003-02-26 2014-06-19 Nikon Corp 露光装置、露光方法及びデバイス製造方法
JP2009302596A (ja) * 2003-02-26 2009-12-24 Nikon Corp 露光装置、露光方法及びデバイス製造方法
KR101288767B1 (ko) * 2003-02-26 2013-07-23 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
JP2011023765A (ja) * 2003-02-26 2011-02-03 Nikon Corp 露光装置、露光方法及びデバイス製造方法
WO2004086468A1 (ja) * 2003-02-26 2004-10-07 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
JP2012129565A (ja) * 2003-02-26 2012-07-05 Nikon Corp 露光装置、露光方法及びデバイス製造方法
CN102495540A (zh) * 2003-02-26 2012-06-13 株式会社尼康 曝光装置、曝光方法以及器件制造方法
US9766555B2 (en) 2003-02-26 2017-09-19 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US7423955B2 (en) 2003-03-24 2008-09-09 Koninklijke Philips Electronics N.V. Method for recording a lead-out on an optical disc
JP2012080148A (ja) * 2003-03-25 2012-04-19 Nikon Corp 露光装置及びデバイス製造方法
WO2004086470A1 (ja) * 2003-03-25 2004-10-07 Nikon Corporation 露光装置及びデバイス製造方法
JP2011044736A (ja) * 2003-03-25 2011-03-03 Nikon Corp 露光装置及びデバイス製造方法
JP2009158977A (ja) * 2003-03-25 2009-07-16 Nikon Corp 露光装置及びデバイス製造方法
JP2014030061A (ja) * 2003-03-25 2014-02-13 Nikon Corp 露光装置及びデバイス製造方法
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9632427B2 (en) 2003-04-10 2017-04-25 Nikon Corporation Environmental system including a transport region for an immersion lithography apparatus
US9910370B2 (en) 2003-04-10 2018-03-06 Nikon Corporation Environmental system including a transport region for an immersion lithography apparatus
US9658537B2 (en) 2003-04-10 2017-05-23 Nikon Corporation Environmental system including vacuum scavenge for an immersion lithography apparatus
US9977350B2 (en) 2003-04-10 2018-05-22 Nikon Corporation Environmental system including vacuum scavenge for an immersion lithography apparatus
US9946163B2 (en) 2003-04-11 2018-04-17 Nikon Corporation Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
US9958786B2 (en) 2003-04-11 2018-05-01 Nikon Corporation Cleanup method for optics in immersion lithography using object on wafer holder in place of wafer
US9500960B2 (en) 2003-04-11 2016-11-22 Nikon Corporation Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
EP2161619A1 (en) * 2003-04-11 2010-03-10 Nikon Corporation Cleanup method for optics in immersion lithography
US9846366B2 (en) 2003-05-06 2017-12-19 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10156792B2 (en) 2003-05-06 2018-12-18 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9606443B2 (en) 2003-05-06 2017-03-28 Nikon Corporation Reducing immersion projection optical system
US9081295B2 (en) 2003-05-06 2015-07-14 Nikon Corporation Catadioptric projection optical system, exposure apparatus, and exposure method
US9500943B2 (en) 2003-05-06 2016-11-22 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9933705B2 (en) 2003-05-06 2018-04-03 Nikon Corporation Reduction projection optical system, exposure apparatus, and exposure method
US9086635B2 (en) 2003-05-06 2015-07-21 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2010157766A (ja) * 2003-05-13 2010-07-15 Asml Netherlands Bv リソグラフィ装置
JP2008160155A (ja) * 2003-05-13 2008-07-10 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
US7352434B2 (en) 2003-05-13 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9477160B2 (en) 2003-05-13 2016-10-25 Asml Netherland B.V. Lithographic apparatus and device manufacturing method
US8964164B2 (en) 2003-05-13 2015-02-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9798246B2 (en) 2003-05-13 2017-10-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10466595B2 (en) 2003-05-13 2019-11-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9939739B2 (en) 2003-05-23 2018-04-10 Nikon Corporation Exposure apparatus and method for producing device
US7808611B2 (en) 2003-05-30 2010-10-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using acidic liquid
US7804574B2 (en) 2003-05-30 2010-09-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using acidic liquid
US9541843B2 (en) 2003-06-09 2017-01-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid
US10678139B2 (en) 2003-06-09 2020-06-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9081299B2 (en) 2003-06-09 2015-07-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap
US9152058B2 (en) 2003-06-09 2015-10-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a member and a fluid opening
US10180629B2 (en) 2003-06-09 2019-01-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9110389B2 (en) 2003-06-11 2015-08-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9964858B2 (en) 2003-06-11 2018-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI607292B (zh) * 2003-06-13 2017-12-01 Nikon Corp Exposure device, exposure method, and device manufacturing method
WO2004112108A1 (ja) * 2003-06-13 2004-12-23 Nikon Corporation 露光方法、基板ステージ、露光装置、及びデバイス製造方法
JP2010010703A (ja) * 2003-06-13 2010-01-14 Nikon Corp 基板ステージ、露光装置、及びデバイス製造方法
JP2012248892A (ja) * 2003-06-13 2012-12-13 Nikon Corp 基板ステージ、露光装置、及びデバイス製造方法
US9846371B2 (en) 2003-06-13 2017-12-19 Nikon Corporation Exposure method, substrate stage, exposure apparatus, and device manufacturing method
JP2013016839A (ja) * 2003-06-13 2013-01-24 Nikon Corp 基板ステージ、露光装置、及びデバイス製造方法
US10191388B2 (en) 2003-06-19 2019-01-29 Nikon Corporation Exposure apparatus, and device manufacturing method
US7411650B2 (en) 2003-06-19 2008-08-12 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
CN101241308A (zh) * 2003-06-19 2008-08-13 Asml控股股份有限公司 浸入式光刻系统及对基底曝光的方法
CN100371827C (zh) * 2003-06-19 2008-02-27 Asml控股股份有限公司 浸入式光刻系统及使用微通道喷嘴的方法
US9709899B2 (en) 2003-06-19 2017-07-18 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
EP1635382A4 (en) * 2003-06-19 2008-01-30 Nikon Corp EXPOSURE DEVICE AND METHOD FOR PRODUCING A DEVICE
US9715178B2 (en) 2003-06-19 2017-07-25 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US8004649B2 (en) 2003-06-19 2011-08-23 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US9810995B2 (en) 2003-06-19 2017-11-07 Nikon Corporation Exposure apparatus and device manufacturing method
US10007188B2 (en) 2003-06-19 2018-06-26 Nikon Corporation Exposure apparatus and device manufacturing method
US9551943B2 (en) 2003-06-19 2017-01-24 Nikon Corporation Exposure apparatus and device manufacturing method
WO2005001572A3 (en) * 2003-06-27 2005-04-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG110100A1 (en) * 2003-06-27 2005-04-28 Asml Holding Nv Immersion photolithography system and method using inverted wafer-projection optics interface
US7012673B2 (en) 2003-06-27 2006-03-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009514183A (ja) * 2003-06-27 2009-04-02 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
EP1491956A1 (en) * 2003-06-27 2004-12-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7119874B2 (en) 2003-06-27 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7898643B2 (en) 2003-06-27 2011-03-01 Asml Holding N.V. Immersion photolithography system and method using inverted wafer-projection optics interface
USRE42741E1 (en) 2003-06-27 2011-09-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7038760B2 (en) 2003-06-30 2006-05-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7110087B2 (en) 2003-06-30 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1494074A1 (en) * 2003-06-30 2005-01-05 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
CN102944981A (zh) * 2003-07-09 2013-02-27 株式会社尼康 曝光装置、器件制造方法
JP2016053734A (ja) * 2003-07-09 2016-04-14 株式会社ニコン 露光装置、及びデバイス製造方法
EP1643543B1 (en) * 2003-07-09 2010-11-24 Nikon Corporation Exposure apparatus and method for manufacturing device
US9733575B2 (en) 2003-07-16 2017-08-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7738074B2 (en) 2003-07-16 2010-06-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10656538B2 (en) 2003-07-16 2020-05-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10151989B2 (en) 2003-07-16 2018-12-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8823920B2 (en) 2003-07-16 2014-09-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8913223B2 (en) 2003-07-16 2014-12-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8711323B2 (en) 2003-07-16 2014-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9383655B2 (en) 2003-07-16 2016-07-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7184122B2 (en) 2003-07-24 2007-02-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10444644B2 (en) 2003-07-24 2019-10-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10146143B2 (en) 2003-07-24 2018-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9594308B2 (en) 2003-07-24 2017-03-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7557901B2 (en) 2003-07-24 2009-07-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9213247B2 (en) 2003-07-24 2015-12-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8711333B2 (en) 2003-07-24 2014-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9804509B2 (en) 2003-07-24 2017-10-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10303066B2 (en) 2003-07-28 2019-05-28 Asml Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US8964163B2 (en) 2003-07-28 2015-02-24 Asml Netherlands B.V. Immersion lithographic apparatus and device manufacturing method with a projection system having a part movable relative to another part
US7175968B2 (en) 2003-07-28 2007-02-13 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a substrate
US9639006B2 (en) 2003-07-28 2017-05-02 Asml Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US7483118B2 (en) 2003-07-28 2009-01-27 Asml Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US8937704B2 (en) 2003-07-31 2015-01-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a resistivity sensor
US9285686B2 (en) 2003-07-31 2016-03-15 Asml Netherlands B.V. Lithographic apparatus involving an immersion liquid supply system with an aperture
KR101305354B1 (ko) * 2003-08-20 2013-09-06 코닌클리케 필립스 일렉트로닉스 엔.브이. 비침출형 접착제 시스템
JP2011252154A (ja) * 2003-08-20 2011-12-15 Koninkl Philips Electronics Nv 非浸出接着剤系及び液浸対物系におけるその使用
JP2007502882A (ja) * 2003-08-20 2007-02-15 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ 非浸出接着剤系及び液浸対物系におけるその使用
US7935213B2 (en) 2003-08-20 2011-05-03 Koninklijke Philips Electronics N.V. Non-leaching adhesive system and its use in a liquid immersion objective
US10175584B2 (en) 2003-08-26 2019-01-08 Nikon Corporation Optical element and exposure apparatus
JP2005077533A (ja) * 2003-08-28 2005-03-24 Nikon Corp 光学素子、レンズ系、及び投影露光装置
US9606448B2 (en) 2003-08-29 2017-03-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10146142B2 (en) 2003-08-29 2018-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8947637B2 (en) 2003-08-29 2015-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9581914B2 (en) 2003-08-29 2017-02-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9568841B2 (en) 2003-08-29 2017-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8953144B2 (en) 2003-08-29 2015-02-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7733459B2 (en) 2003-08-29 2010-06-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8208123B2 (en) 2003-08-29 2012-06-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8208124B2 (en) 2003-08-29 2012-06-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US11003096B2 (en) 2003-08-29 2021-05-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6954256B2 (en) 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
US8804097B2 (en) 2003-08-29 2014-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9025127B2 (en) 2003-08-29 2015-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9442388B2 (en) 2003-08-29 2016-09-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10514618B2 (en) 2003-08-29 2019-12-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10025204B2 (en) 2003-08-29 2018-07-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9316919B2 (en) 2003-08-29 2016-04-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101323396B1 (ko) * 2003-09-29 2013-10-29 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
US7158211B2 (en) 2003-09-29 2007-01-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8400615B2 (en) 2003-09-29 2013-03-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7193681B2 (en) 2003-09-29 2007-03-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7817245B2 (en) 2003-09-29 2010-10-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100465790C (zh) * 2003-10-03 2009-03-04 麦克罗尼克激光系统公司 用于构图工件的浸式光刻系统
US7369217B2 (en) 2003-10-03 2008-05-06 Micronic Laser Systems Ab Method and device for immersion lithography
WO2005034174A3 (en) * 2003-10-03 2005-06-09 Micronic Laser Systems Ab Method and device for immersion lithography
US8711330B2 (en) 2003-10-15 2014-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8570486B2 (en) 2003-10-15 2013-10-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7433015B2 (en) 2003-10-15 2008-10-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352435B2 (en) 2003-10-15 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9285685B2 (en) 2003-10-15 2016-03-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7961293B2 (en) 2003-10-15 2011-06-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8174674B2 (en) 2003-10-15 2012-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352433B2 (en) 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7532304B2 (en) 2003-10-28 2009-05-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10248034B2 (en) 2003-10-28 2019-04-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8860922B2 (en) 2003-10-28 2014-10-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10527955B2 (en) 2003-10-28 2020-01-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9482962B2 (en) 2003-10-28 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US8860923B2 (en) 2003-10-28 2014-10-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411653B2 (en) 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
US9182679B2 (en) 2003-10-28 2015-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US7113259B2 (en) 2003-10-31 2006-09-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9134623B2 (en) 2003-11-14 2015-09-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528929B2 (en) 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9952515B2 (en) 2003-11-14 2018-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10345712B2 (en) 2003-11-14 2019-07-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9134622B2 (en) 2003-11-14 2015-09-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US7545481B2 (en) 2003-11-24 2009-06-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8472006B2 (en) 2003-11-24 2013-06-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10088760B2 (en) 2003-12-03 2018-10-02 Nikon Corporation Exposure apparatus, exposure method, method for producing device, and optical part
US7460206B2 (en) 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9465301B2 (en) 2003-12-23 2016-10-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10613447B2 (en) 2003-12-23 2020-04-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10768538B2 (en) 2003-12-23 2020-09-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7589818B2 (en) 2003-12-23 2009-09-15 Asml Netherlands B.V. Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
US9817321B2 (en) 2003-12-23 2017-11-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9684250B2 (en) 2003-12-23 2017-06-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008219020A (ja) * 2003-12-23 2008-09-18 Asml Netherlands Bv リソグラフィ装置
US9436095B2 (en) 2004-01-20 2016-09-06 Carl Zeiss Smt Gmbh Exposure apparatus and measuring device for a projection lens
US10345710B2 (en) 2004-01-20 2019-07-09 Carl Zeiss Smt Gmbh Microlithographic projection exposure apparatus and measuring device for a projection lens
US9632431B2 (en) 2004-02-02 2017-04-25 Nikon Corporation Lithographic apparatus and method having substrate and sensor tables
US10007196B2 (en) 2004-02-02 2018-06-26 Nikon Corporation Lithographic apparatus and method having substrate and sensor tables
US10139737B2 (en) 2004-02-02 2018-11-27 Nikon Corporation Lithographic apparatus and method having substrate and sensor tables
US9665016B2 (en) 2004-02-02 2017-05-30 Nikon Corporation Lithographic apparatus and method having substrate table and sensor table to hold immersion liquid
US9684248B2 (en) 2004-02-02 2017-06-20 Nikon Corporation Lithographic apparatus having substrate table and sensor table to measure a patterned beam
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US7050146B2 (en) 2004-02-09 2006-05-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
USRE42849E1 (en) 2004-02-09 2011-10-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7326522B2 (en) 2004-02-11 2008-02-05 Asml Netherlands B.V. Device manufacturing method and a substrate
US10126661B2 (en) 2004-03-25 2018-11-13 Nikon Corporation Exposure apparatus and device fabrication method
US7227619B2 (en) 2004-04-01 2007-06-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7034917B2 (en) 2004-04-01 2006-04-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
US7375796B2 (en) 2004-04-01 2008-05-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7295283B2 (en) 2004-04-02 2007-11-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317504B2 (en) 2004-04-08 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9568840B2 (en) 2004-04-14 2017-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009044185A (ja) * 2004-04-14 2009-02-26 Asml Netherlands Bv リソグラフィック装置及びデバイス製造方法
US9207543B2 (en) 2004-04-14 2015-12-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a groove to collect liquid
JP2009044186A (ja) * 2004-04-14 2009-02-26 Asml Netherlands Bv リソグラフィック装置及びデバイス製造方法
US10234768B2 (en) 2004-04-14 2019-03-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9829799B2 (en) 2004-04-14 2017-11-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10705432B2 (en) 2004-04-14 2020-07-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7652751B2 (en) 2004-05-03 2010-01-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7379159B2 (en) 2004-05-03 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9623436B2 (en) 2004-05-18 2017-04-18 Asml Netherlands B.V. Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets
US10761438B2 (en) 2004-05-18 2020-09-01 Asml Netherlands B.V. Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets
US7486381B2 (en) 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9645505B2 (en) 2004-06-09 2017-05-09 Nikon Corporation Immersion exposure apparatus and device manufacturing method with measuring device to measure specific resistance of liquid
US9507270B2 (en) 2004-06-16 2016-11-29 Asml Netherlands B.V. Vacuum system for immersion photolithography
US10168624B2 (en) 2004-06-16 2019-01-01 Asml Netherlands B.V. Vacuum system for immersion photolithography
US8164734B2 (en) 2004-06-16 2012-04-24 Asml Netherlands B.V. Vacuum system for immersion photolithography
US8830440B2 (en) 2004-06-16 2014-09-09 Asml Netherlands B.V. Vacuum system for immersion photolithography
US9857699B2 (en) 2004-06-16 2018-01-02 Asml Netherlands B.V. Vacuum system for immersion photolithography
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10338478B2 (en) 2004-07-07 2019-07-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10739684B2 (en) 2004-07-07 2020-08-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9104117B2 (en) 2004-07-07 2015-08-11 Bob Streefkerk Lithographic apparatus having a liquid detection system
US7161663B2 (en) 2004-07-22 2007-01-09 Asml Netherlands B.V. Lithographic apparatus
US7804575B2 (en) 2004-08-13 2010-09-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method having liquid evaporation control
US10254663B2 (en) 2004-08-13 2019-04-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a heater
US9268242B2 (en) 2004-08-13 2016-02-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor
US11378893B2 (en) 2004-08-13 2022-07-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a heater
US7304715B2 (en) 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9188880B2 (en) 2004-08-13 2015-11-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a heater
US10838310B2 (en) 2004-08-13 2020-11-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a heater
US7602470B2 (en) 2004-08-19 2009-10-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9097992B2 (en) 2004-08-19 2015-08-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10705439B2 (en) 2004-08-19 2020-07-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9488923B2 (en) 2004-08-19 2016-11-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10331047B2 (en) 2004-08-19 2019-06-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9746788B2 (en) 2004-08-19 2017-08-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9507278B2 (en) 2004-08-19 2016-11-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10599054B2 (en) 2004-08-19 2020-03-24 Asml Holding N.V. Lithographic apparatus and device manufacturing method
US9904185B2 (en) 2004-08-19 2018-02-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI610340B (zh) * 2004-09-17 2018-01-01 Nikon Corp 曝光裝置、曝光方法及元件製造方法
TWI508136B (zh) * 2004-09-17 2015-11-11 尼康股份有限公司 Exposure apparatus, exposure method, and device manufacturing method
US7133114B2 (en) 2004-09-20 2006-11-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8427629B2 (en) 2004-09-24 2013-04-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7522261B2 (en) 2004-09-24 2009-04-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7808614B2 (en) 2004-09-24 2010-10-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7355674B2 (en) 2004-09-28 2008-04-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
US8068210B2 (en) 2004-09-28 2011-11-29 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
US7894040B2 (en) 2004-10-05 2011-02-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8755027B2 (en) 2004-10-05 2014-06-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving fluid mixing and control of the physical property of a fluid
US8027026B2 (en) 2004-10-05 2011-09-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7209213B2 (en) 2004-10-07 2007-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9436097B2 (en) 2004-10-18 2016-09-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8934082B2 (en) 2004-10-18 2015-01-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10248033B2 (en) 2004-10-18 2019-04-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7379155B2 (en) 2004-10-18 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9753380B2 (en) 2004-10-18 2017-09-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7119876B2 (en) 2004-10-18 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8004652B2 (en) 2004-10-18 2011-08-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8817231B2 (en) 2004-11-12 2014-08-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US9964861B2 (en) 2004-11-12 2018-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US7423720B2 (en) 2004-11-12 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9645507B2 (en) 2004-11-12 2017-05-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7251013B2 (en) 2004-11-12 2007-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7710537B2 (en) 2004-11-12 2010-05-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10620546B2 (en) 2004-11-12 2020-04-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US7414699B2 (en) 2004-11-12 2008-08-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9261797B2 (en) 2004-11-12 2016-02-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US9798247B2 (en) 2004-11-12 2017-10-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US10274832B2 (en) 2004-11-12 2019-04-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US7852457B2 (en) 2004-11-12 2010-12-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7583357B2 (en) 2004-11-12 2009-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9581916B2 (en) 2004-11-17 2017-02-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411657B2 (en) 2004-11-17 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9188882B2 (en) 2004-11-17 2015-11-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7978306B2 (en) 2004-11-17 2011-07-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7145630B2 (en) 2004-11-23 2006-12-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7812924B2 (en) 2004-12-02 2010-10-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7161654B2 (en) 2004-12-02 2007-01-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7764356B2 (en) 2004-12-03 2010-07-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7446850B2 (en) 2004-12-03 2008-11-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7248334B2 (en) 2004-12-07 2007-07-24 Asml Netherlands B.V. Sensor shield
US7196770B2 (en) 2004-12-07 2007-03-27 Asml Netherlands B.V. Prewetting of substrate before immersion exposure
US7643127B2 (en) 2004-12-07 2010-01-05 Asml Netherlands B.V. Prewetting of substrate before immersion exposure
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7365827B2 (en) 2004-12-08 2008-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8115905B2 (en) 2004-12-08 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8860926B2 (en) 2004-12-08 2014-10-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9740106B2 (en) 2004-12-10 2017-08-22 Asml Netherlands B.V. Substrate placement in immersion lithography
US9182222B2 (en) 2004-12-10 2015-11-10 Asml Netherlands B.V. Substrate placement in immersion lithography
US7352440B2 (en) 2004-12-10 2008-04-01 Asml Netherlands B.V. Substrate placement in immersion lithography
US10345711B2 (en) 2004-12-10 2019-07-09 Asml Netherlands B.V. Substrate placement in immersion lithography
US7403261B2 (en) 2004-12-15 2008-07-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8233135B2 (en) 2004-12-15 2012-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7751032B2 (en) 2004-12-15 2010-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9116443B2 (en) 2004-12-20 2015-08-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9835960B2 (en) 2004-12-20 2017-12-05 Asml Netherlands B.V. Lithographic apparatus
US10248035B2 (en) 2004-12-20 2019-04-02 Asml Netherlands B.V. Lithographic apparatus
US8462312B2 (en) 2004-12-20 2013-06-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9417535B2 (en) 2004-12-20 2016-08-16 Asml Netherlands B.V. Lithographic apparatus
US9329494B2 (en) 2004-12-20 2016-05-03 Asml Netherlands B.V. Lithographic apparatus
US8233137B2 (en) 2004-12-20 2012-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528931B2 (en) 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7491661B2 (en) 2004-12-28 2009-02-17 Asml Netherlands B.V. Device manufacturing method, top coat material and substrate
US8013978B2 (en) 2004-12-28 2011-09-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7763355B2 (en) 2004-12-28 2010-07-27 Asml Netherlands B.V. Device manufacturing method, top coat material and substrate
US8913225B2 (en) 2004-12-28 2014-12-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7405805B2 (en) 2004-12-28 2008-07-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8354209B2 (en) 2004-12-30 2013-01-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8102507B2 (en) 2004-12-30 2012-01-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7670730B2 (en) 2004-12-30 2010-03-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7705962B2 (en) 2005-01-14 2010-04-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9746781B2 (en) 2005-01-31 2017-08-29 Nikon Corporation Exposure apparatus and method for producing device
US10712675B2 (en) 2005-02-10 2020-07-14 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
US9454088B2 (en) 2005-02-10 2016-09-27 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
US9772565B2 (en) 2005-02-10 2017-09-26 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
US8859188B2 (en) 2005-02-10 2014-10-14 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
US9164391B2 (en) 2005-02-10 2015-10-20 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
US7224431B2 (en) 2005-02-22 2007-05-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8902404B2 (en) 2005-02-22 2014-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8246838B2 (en) 2005-02-22 2012-08-21 Asml Netherlands B.V. Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US7914687B2 (en) 2005-02-22 2011-03-29 Asml Netherlands B.V. Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US7378025B2 (en) 2005-02-22 2008-05-27 Asml Netherlands B.V. Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US8018573B2 (en) 2005-02-22 2011-09-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1855140A4 (en) * 2005-02-28 2012-04-04 Nikon Corp ADAPTER FOR MICROSCOPE AND MICROSCOPE
US8107053B2 (en) 2005-02-28 2012-01-31 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
US7428038B2 (en) 2005-02-28 2008-09-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
US8958051B2 (en) 2005-02-28 2015-02-17 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
US7843551B2 (en) 2005-03-04 2010-11-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9477159B2 (en) 2005-03-04 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8514369B2 (en) 2005-03-04 2013-08-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10495981B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10495980B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8390778B2 (en) 2005-03-09 2013-03-05 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US7684010B2 (en) 2005-03-09 2010-03-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US7859644B2 (en) 2005-03-28 2010-12-28 Asml Netherlands B.V. Lithographic apparatus, immersion projection apparatus and device manufacturing method
US7330238B2 (en) 2005-03-28 2008-02-12 Asml Netherlands, B.V. Lithographic apparatus, immersion projection apparatus and device manufacturing method
US7411654B2 (en) 2005-04-05 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9857695B2 (en) 2005-04-05 2018-01-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10495984B2 (en) 2005-04-05 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8259287B2 (en) 2005-04-05 2012-09-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8976334B2 (en) 2005-04-05 2015-03-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8988651B2 (en) 2005-04-05 2015-03-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10209629B2 (en) 2005-04-05 2019-02-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9429853B2 (en) 2005-04-05 2016-08-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
USRE47943E1 (en) 2005-04-08 2020-04-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
US7582881B2 (en) 2005-04-08 2009-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
USRE46933E1 (en) 2005-04-08 2018-07-03 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
US7291850B2 (en) 2005-04-08 2007-11-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7253879B2 (en) 2005-04-19 2007-08-07 Asml Holding N.V. Liquid immersion lithography system with tilted liquid flow
US7256864B2 (en) 2005-04-19 2007-08-14 Asml Holding N.V. Liquid immersion lithography system having a tilted showerhead relative to a substrate
US9146478B2 (en) 2005-05-03 2015-09-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7433016B2 (en) 2005-05-03 2008-10-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10684554B2 (en) 2005-05-03 2020-06-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10451973B2 (en) 2005-05-03 2019-10-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10353296B2 (en) 2005-05-03 2019-07-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9477153B2 (en) 2005-05-03 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US11016394B2 (en) 2005-05-03 2021-05-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9081300B2 (en) 2005-05-03 2015-07-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9606449B2 (en) 2005-05-03 2017-03-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8860924B2 (en) 2005-05-03 2014-10-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9229335B2 (en) 2005-05-03 2016-01-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317507B2 (en) 2005-05-03 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10488759B2 (en) 2005-05-03 2019-11-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10025196B2 (en) 2005-05-03 2018-07-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9268236B2 (en) 2005-06-21 2016-02-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder
US7751027B2 (en) 2005-06-21 2010-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7652746B2 (en) 2005-06-21 2010-01-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8848165B2 (en) 2005-06-28 2014-09-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8687168B2 (en) 2005-06-28 2014-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9448494B2 (en) 2005-06-28 2016-09-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7834974B2 (en) 2005-06-28 2010-11-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7474379B2 (en) 2005-06-28 2009-01-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10386725B2 (en) 2005-06-28 2019-08-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9766556B2 (en) 2005-06-28 2017-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7468779B2 (en) 2005-06-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9099501B2 (en) 2005-06-28 2015-08-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8120749B2 (en) 2005-06-28 2012-02-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9952514B2 (en) 2005-06-28 2018-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US11327404B2 (en) 2005-06-28 2022-05-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7929112B2 (en) 2005-06-28 2011-04-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7535644B2 (en) 2005-08-12 2009-05-19 Asml Netherlands B.V. Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US8054445B2 (en) 2005-08-16 2011-11-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8004654B2 (en) 2005-10-06 2011-08-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411658B2 (en) 2005-10-06 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8958054B2 (en) 2005-10-06 2015-02-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10126664B2 (en) 2005-11-16 2018-11-13 Asml Netherlands, B.V. Lithographic apparatus and device manufacturing method
US7864292B2 (en) 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US11789369B2 (en) 2005-11-16 2023-10-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8786823B2 (en) 2005-11-16 2014-07-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7804577B2 (en) 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
US7656501B2 (en) 2005-11-16 2010-02-02 Asml Netherlands B.V. Lithographic apparatus
US11209738B2 (en) 2005-11-16 2021-12-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9140996B2 (en) 2005-11-16 2015-09-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10768536B2 (en) 2005-11-16 2020-09-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9618853B2 (en) 2005-11-16 2017-04-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8421996B2 (en) 2005-11-16 2013-04-16 Asml Netherlands B.V. Lithographic apparatus
US7633073B2 (en) 2005-11-23 2009-12-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8481978B2 (en) 2005-11-23 2013-07-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7928407B2 (en) 2005-11-23 2011-04-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8138486B2 (en) * 2005-11-23 2012-03-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7773195B2 (en) 2005-11-29 2010-08-10 Asml Holding N.V. System and method to increase surface tension and contact angle in immersion lithography
US8456611B2 (en) 2005-11-29 2013-06-04 Asml Holding N.V. System and method to increase surface tension and contact angle in immersion lithography
US8232540B2 (en) 2005-12-27 2012-07-31 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US7420194B2 (en) 2005-12-27 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US8003968B2 (en) 2005-12-27 2011-08-23 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US7839483B2 (en) 2005-12-28 2010-11-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a control system
US8564760B2 (en) 2005-12-28 2013-10-22 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a control system
US8947631B2 (en) 2005-12-30 2015-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9436096B2 (en) 2005-12-30 2016-09-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9851644B2 (en) 2005-12-30 2017-12-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10222711B2 (en) 2005-12-30 2019-03-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8743339B2 (en) 2005-12-30 2014-06-03 Asml Netherlands Lithographic apparatus and device manufacturing method
US10761433B2 (en) 2005-12-30 2020-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US11275316B2 (en) 2005-12-30 2022-03-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US11669021B2 (en) 2005-12-30 2023-06-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8941810B2 (en) 2005-12-30 2015-01-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR100797666B1 (ko) * 2006-01-16 2008-01-23 다이닛뽕스크린 세이조오 가부시키가이샤 기판처리장치
US7722267B2 (en) 2006-01-16 2010-05-25 Sokudo Co., Ltd. Substrate processing apparatus
US9482967B2 (en) 2006-03-13 2016-11-01 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
US8045134B2 (en) 2006-03-13 2011-10-25 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
US10802410B2 (en) 2006-04-14 2020-10-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a barrier structure to handle liquid
US9477158B2 (en) 2006-04-14 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9810996B2 (en) 2006-05-09 2017-11-07 Carl Zeiss Smt Gmbh Optical imaging device with thermal attenuation
US8902401B2 (en) 2006-05-09 2014-12-02 Carl Zeiss Smt Gmbh Optical imaging device with thermal attenuation
US9330912B2 (en) 2006-11-22 2016-05-03 Asml Netherlands B.V. Lithographic apparatus, fluid combining unit and device manufacturing method
US8045135B2 (en) 2006-11-22 2011-10-25 Asml Netherlands B.V. Lithographic apparatus with a fluid combining unit and related device manufacturing method
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10185231B2 (en) 2006-12-07 2019-01-22 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US9632425B2 (en) 2006-12-07 2017-04-25 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US10649349B2 (en) 2006-12-07 2020-05-12 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US9645506B2 (en) 2006-12-07 2017-05-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10268127B2 (en) 2006-12-07 2019-04-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7791709B2 (en) 2006-12-08 2010-09-07 Asml Netherlands B.V. Substrate support and lithographic process
US9013672B2 (en) 2007-05-04 2015-04-21 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US8947629B2 (en) 2007-05-04 2015-02-03 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US11187991B2 (en) 2008-05-28 2021-11-30 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
US12072635B2 (en) 2008-05-28 2024-08-27 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
US9846372B2 (en) 2010-04-22 2017-12-19 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
US9256136B2 (en) 2010-04-22 2016-02-09 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply
US10620544B2 (en) 2010-04-22 2020-04-14 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
US10209624B2 (en) 2010-04-22 2019-02-19 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
JP2016075790A (ja) * 2014-10-07 2016-05-12 株式会社ニコン 描画装置および描画方法、並びに湿式処理装置
JP2016075887A (ja) * 2015-03-20 2016-05-12 株式会社ニコン 湿式処理装置および湿式処理方法

Similar Documents

Publication Publication Date Title
JPH10255319A (ja) 原盤露光装置及び方法
KR100971441B1 (ko) 레이어 상의 스폿을 조사하기 위한 방법 및 장치
US7358507B2 (en) Liquid removal in a method and device for irradiating spots on a layer
EP1579435B1 (en) Method and device for irradiating spots on a layer
CA2335844C (en) Optical disk and method of manufacture thereof
JP2001023190A (ja) 露光装置、露光方法、光ディスク装置、及び記録及び／又は再生方法
JP2002236087A (ja) 光学系調整方法、並びにその光学系調整方法を利用した光記録再生装置、顕微鏡装置及び加工装置
US5235591A (en) Stack type optical disc apparatus, sealed and separate type optical head therefor and optical disc medium
JPH10188333A (ja) 原盤露光装置
US5740138A (en) Apparatus for recording information on a primary optical disk to manufacture optical disks
US20060187786A1 (en) Optical information recording and reproducing apparatus
JPH11259900A (ja) 光ヘッド
JP4081702B2 (ja) 露光装置及び露光方法
JP2003203374A (ja) 光ピックアップ用対物レンズ、及びその製造方法、並びに光ピックアップモジュール、光ディスク装置、及び結露除去方法
JP4314684B2 (ja) ディスク原盤評価装置
US7605979B2 (en) Device for directing radiation to a layer, apparatus with such device and method using such apparatus
JP4296924B2 (ja) 露光装置、記録及び／又は再生装置
JP2002319157A (ja) 信号記録装置、信号再生装置、及びそれらの方法
JP4560968B2 (ja) 露光方法及び露光装置
JP2002092906A (ja) 光記録及び／又は再生装置、並びに光記録及び／又は再生方法
US20070206085A1 (en) Optical print head using a glass arm waveguide
JPH08124226A (ja) 光ディスク製造方法及び光ディスク製造装置
JP2613578B2 (ja) 光ディスクの現像装置
JP2008234797A (ja) 現像装置および現像方法
JP2002342974A (ja) レーザ露光装置、レーザ露光方法、ディスク原盤作成装置

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20041216

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050118

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20050524