JPH0773102B2 - 半導体ウエーハにチタンケイ化物を蒸着させるための化学蒸着技術 - Google Patents

半導体ウエーハにチタンケイ化物を蒸着させるための化学蒸着技術

Info

Publication number
JPH0773102B2
JPH0773102B2 JP4298848A JP29884892A JPH0773102B2 JP H0773102 B2 JPH0773102 B2 JP H0773102B2 JP 4298848 A JP4298848 A JP 4298848A JP 29884892 A JP29884892 A JP 29884892A JP H0773102 B2 JPH0773102 B2 JP H0773102B2
Authority
JP
Japan
Prior art keywords
vapor deposition
chemical vapor
deposition method
silane
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4298848A
Other languages
English (en)
Japanese (ja)
Other versions
JPH05226269A (ja
Inventor
トゥルン・ティー・ドーン
グルテジ・エス・サンデュー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micron Technology Inc
Original Assignee
Micron Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micron Technology Inc filed Critical Micron Technology Inc
Publication of JPH05226269A publication Critical patent/JPH05226269A/ja
Publication of JPH0773102B2 publication Critical patent/JPH0773102B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H10W20/047—
    • H10D64/0112—
    • H10D64/01125—
    • H10P14/42—
    • H10W20/033—
    • H10W20/056—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/147—Silicides

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP4298848A 1991-11-08 1992-11-09 半導体ウエーハにチタンケイ化物を蒸着させるための化学蒸着技術 Expired - Fee Related JPH0773102B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US789585 1991-11-08
US07/789,585 US5278100A (en) 1991-11-08 1991-11-08 Chemical vapor deposition technique for depositing titanium silicide on semiconductor wafers

Publications (2)

Publication Number Publication Date
JPH05226269A JPH05226269A (ja) 1993-09-03
JPH0773102B2 true JPH0773102B2 (ja) 1995-08-02

Family

ID=25148080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4298848A Expired - Fee Related JPH0773102B2 (ja) 1991-11-08 1992-11-09 半導体ウエーハにチタンケイ化物を蒸着させるための化学蒸着技術

Country Status (3)

Country Link
US (1) US5278100A (OSRAM)
JP (1) JPH0773102B2 (OSRAM)
DE (1) DE4237587C2 (OSRAM)

Families Citing this family (576)

* Cited by examiner, † Cited by third party
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