JPH057326B2 - - Google Patents
Info
- Publication number
- JPH057326B2 JPH057326B2 JP1007414A JP741489A JPH057326B2 JP H057326 B2 JPH057326 B2 JP H057326B2 JP 1007414 A JP1007414 A JP 1007414A JP 741489 A JP741489 A JP 741489A JP H057326 B2 JPH057326 B2 JP H057326B2
- Authority
- JP
- Japan
- Prior art keywords
- silica
- fine particles
- gas
- specific surface
- surface area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 78
- 239000000377 silicon dioxide Substances 0.000 claims description 35
- 239000010419 fine particle Substances 0.000 claims description 26
- 239000002245 particle Substances 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 10
- 239000012535 impurity Substances 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000012798 spherical particle Substances 0.000 claims description 4
- 238000002485 combustion reaction Methods 0.000 description 14
- 239000007789 gas Substances 0.000 description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 10
- 239000000460 chlorine Substances 0.000 description 10
- 229910052801 chlorine Inorganic materials 0.000 description 10
- 229910001873 dinitrogen Inorganic materials 0.000 description 10
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 229910001882 dioxygen Inorganic materials 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 239000003822 epoxy resin Substances 0.000 description 5
- 239000000945 filler Substances 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 229920000647 polyepoxide Polymers 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000004821 distillation Methods 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229910003902 SiCl 4 Inorganic materials 0.000 description 3
- -1 silane compound Chemical class 0.000 description 3
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052752 metalloid Inorganic materials 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- YTJUXOIAXOQWBV-UHFFFAOYSA-N butoxy(trimethyl)silane Chemical compound CCCCO[Si](C)(C)C YTJUXOIAXOQWBV-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- BZCJJERBERAQKQ-UHFFFAOYSA-N diethyl(dipropoxy)silane Chemical compound CCCO[Si](CC)(CC)OCCC BZCJJERBERAQKQ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- UCSBCWBHZLSFGC-UHFFFAOYSA-N tributoxysilane Chemical compound CCCCO[SiH](OCCCC)OCCCC UCSBCWBHZLSFGC-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP741489A JPH02188421A (ja) | 1989-01-13 | 1989-01-13 | 非晶質シリカ球状微粒子およびその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP741489A JPH02188421A (ja) | 1989-01-13 | 1989-01-13 | 非晶質シリカ球状微粒子およびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02188421A JPH02188421A (ja) | 1990-07-24 |
| JPH057326B2 true JPH057326B2 (de) | 1993-01-28 |
Family
ID=11665208
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP741489A Granted JPH02188421A (ja) | 1989-01-13 | 1989-01-13 | 非晶質シリカ球状微粒子およびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02188421A (de) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4013014B2 (ja) * | 1999-03-05 | 2007-11-28 | 信越化学工業株式会社 | 静電荷像現像剤 |
| JP3930236B2 (ja) * | 1999-10-27 | 2007-06-13 | 信越化学工業株式会社 | 静電荷像現像用トナー外添剤 |
| US7083770B2 (en) | 2000-06-20 | 2006-08-01 | Nippon Aerosil Co., Ltd. | Amorphous, fine silica particles, and method for their production and their use |
| DE60133416T2 (de) * | 2000-06-20 | 2009-04-02 | Nippon Aerosil Co., Ltd. | Amorphe feinpartikel aus siliziumdioxid, verfahren zu ihrer herstellung und verwendung. |
| JP2002275356A (ja) * | 2001-03-22 | 2002-09-25 | Denki Kagaku Kogyo Kk | エポキシ樹脂用充填材及びエポキシ樹脂組成物 |
| JP4163919B2 (ja) * | 2001-09-25 | 2008-10-08 | 三菱化学株式会社 | シリカ、及びシリカの製造方法 |
| JP5230051B2 (ja) * | 2002-09-11 | 2013-07-10 | 株式会社トクヤマ | 微小溶融シリカ粒子 |
| WO2004048261A2 (en) * | 2002-11-26 | 2004-06-10 | Cabot Corporation | Fumed metal oxide particles and process for producing the same |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6272514A (ja) * | 1985-09-25 | 1987-04-03 | メルク・パテント・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | 球状ＳｉＯ↓２粒子 |
| JPS6385012A (ja) * | 1986-09-29 | 1988-04-15 | Chisso Corp | 珪酸質球状粒子の製造方法 |
| JPS63206309A (ja) * | 1987-02-19 | 1988-08-25 | Hitachi Metals Ltd | 高純度球状酸化ケイ素微粉の製造方法 |
| JPS63291807A (ja) * | 1987-05-22 | 1988-11-29 | Tonen Sekiyukagaku Kk | 高純度球状シリカの製造方法 |
-
1989
- 1989-01-13 JP JP741489A patent/JPH02188421A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6272514A (ja) * | 1985-09-25 | 1987-04-03 | メルク・パテント・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | 球状ＳｉＯ↓２粒子 |
| JPS6385012A (ja) * | 1986-09-29 | 1988-04-15 | Chisso Corp | 珪酸質球状粒子の製造方法 |
| JPS63206309A (ja) * | 1987-02-19 | 1988-08-25 | Hitachi Metals Ltd | 高純度球状酸化ケイ素微粉の製造方法 |
| JPS63291807A (ja) * | 1987-05-22 | 1988-11-29 | Tonen Sekiyukagaku Kk | 高純度球状シリカの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02188421A (ja) | 1990-07-24 |
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Legal Events
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| FPAY | Renewal fee payment (event date is renewal date of database) |
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| FPAY | Renewal fee payment (event date is renewal date of database) |
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| EXPY | Cancellation because of completion of term |