JPH0567059B2 - - Google Patents

Info

Publication number
JPH0567059B2
JPH0567059B2 JP60278673A JP27867385A JPH0567059B2 JP H0567059 B2 JPH0567059 B2 JP H0567059B2 JP 60278673 A JP60278673 A JP 60278673A JP 27867385 A JP27867385 A JP 27867385A JP H0567059 B2 JPH0567059 B2 JP H0567059B2
Authority
JP
Japan
Prior art keywords
wafer
stylus
reference point
probe card
coordinate values
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60278673A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62136845A (ja
Inventor
Hidehiro Katagiri
Masayoshi Iida
Akira Yoshimuro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Seimitsu Co Ltd
Original Assignee
Tokyo Seimitsu Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Seimitsu Co Ltd filed Critical Tokyo Seimitsu Co Ltd
Priority to JP27867385A priority Critical patent/JPS62136845A/ja
Publication of JPS62136845A publication Critical patent/JPS62136845A/ja
Publication of JPH0567059B2 publication Critical patent/JPH0567059B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Measuring Leads Or Probes (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP27867385A 1985-12-10 1985-12-10 ウエ−ハプロ−ビングマシンのプロ−ビング方法 Granted JPS62136845A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27867385A JPS62136845A (ja) 1985-12-10 1985-12-10 ウエ−ハプロ−ビングマシンのプロ−ビング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27867385A JPS62136845A (ja) 1985-12-10 1985-12-10 ウエ−ハプロ−ビングマシンのプロ−ビング方法

Publications (2)

Publication Number Publication Date
JPS62136845A JPS62136845A (ja) 1987-06-19
JPH0567059B2 true JPH0567059B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-09-24

Family

ID=17600566

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27867385A Granted JPS62136845A (ja) 1985-12-10 1985-12-10 ウエ−ハプロ−ビングマシンのプロ−ビング方法

Country Status (1)

Country Link
JP (1) JPS62136845A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01162177A (ja) * 1987-12-18 1989-06-26 Tokyo Electron Ltd プロービング方法
JPH02224260A (ja) * 1988-11-02 1990-09-06 Tokyo Electron Ltd 位置合わせ方法
JP4652725B2 (ja) * 2004-06-09 2011-03-16 エスアイアイ・ナノテクノロジー株式会社 フォトマスク欠陥修正方法
JP2007034219A (ja) * 2005-07-29 2007-02-08 Sii Nanotechnology Inc フォトマスク欠陥修正方法及びそれに用いる原子間力顕微鏡微細加工装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0638438B2 (ja) * 1983-06-06 1994-05-18 日本電気株式会社 半導体装置の検査方法
JPH065690B2 (ja) * 1983-07-19 1994-01-19 東京エレクトロン株式会社 半導体ウエハプローブ方法

Also Published As

Publication number Publication date
JPS62136845A (ja) 1987-06-19

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees