JPH0419701B2 - - Google Patents

Info

Publication number
JPH0419701B2
JPH0419701B2 JP17343682A JP17343682A JPH0419701B2 JP H0419701 B2 JPH0419701 B2 JP H0419701B2 JP 17343682 A JP17343682 A JP 17343682A JP 17343682 A JP17343682 A JP 17343682A JP H0419701 B2 JPH0419701 B2 JP H0419701B2
Authority
JP
Japan
Prior art keywords
substrate
laser beam
plate
airflow
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17343682A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5961920A (ja
Inventor
Osamu Tabata
Saburo Kimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP17343682A priority Critical patent/JPS5961920A/ja
Publication of JPS5961920A publication Critical patent/JPS5961920A/ja
Publication of JPH0419701B2 publication Critical patent/JPH0419701B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP17343682A 1982-10-01 1982-10-01 薄膜製造方法およびその装置 Granted JPS5961920A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17343682A JPS5961920A (ja) 1982-10-01 1982-10-01 薄膜製造方法およびその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17343682A JPS5961920A (ja) 1982-10-01 1982-10-01 薄膜製造方法およびその装置

Related Child Applications (5)

Application Number Title Priority Date Filing Date
JP24761283A Division JPS59140368A (ja) 1983-12-27 1983-12-27 薄膜製造方法とその装置
JP24761183A Division JPS59140367A (ja) 1983-12-27 1983-12-27 薄膜製造方法とその装置
JP24761383A Division JPS59140369A (ja) 1983-12-27 1983-12-27 薄膜製造方法とその装置
JP24761083A Division JPS59140366A (ja) 1983-12-27 1983-12-27 薄膜製造方法とその装置
JP13705689A Division JPH0243366A (ja) 1989-05-29 1989-05-29 薄膜製造方法とその装置

Publications (2)

Publication Number Publication Date
JPS5961920A JPS5961920A (ja) 1984-04-09
JPH0419701B2 true JPH0419701B2 (enrdf_load_stackoverflow) 1992-03-31

Family

ID=15960425

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17343682A Granted JPS5961920A (ja) 1982-10-01 1982-10-01 薄膜製造方法およびその装置

Country Status (1)

Country Link
JP (1) JPS5961920A (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59162267A (ja) * 1983-03-04 1984-09-13 Hitachi Ltd 蒸着装置及び蒸着方法
JPS6192048U (enrdf_load_stackoverflow) * 1984-11-22 1986-06-14
JPS61131431A (ja) * 1984-11-29 1986-06-19 Mitsubishi Electric Corp 半導体製造装置
JP2517705B2 (ja) * 1984-12-29 1996-07-24 ソニー株式会社 薄膜の選択的気相成長方法
JPH0736395B2 (ja) * 1985-04-23 1995-04-19 富士通株式会社 アルミニウム膜の成長方法
JPS61295373A (ja) * 1985-06-25 1986-12-26 Canon Inc 光化学気相成長法による堆積膜の形成方法および装置
US4694777A (en) * 1985-07-03 1987-09-22 Roche Gregory A Apparatus for, and methods of, depositing a substance on a substrate
JPS62136017A (ja) * 1985-12-10 1987-06-19 Stanley Electric Co Ltd レ−ザ−励起ｃｖｄ法によるアモルフアスシリコンの製造方法
JPS62190336U (enrdf_load_stackoverflow) * 1986-05-26 1987-12-03
RU2469433C1 (ru) * 2011-07-13 2012-12-10 Юрий Георгиевич Шретер Способ лазерного отделения эпитаксиальной пленки или слоя эпитаксиальной пленки от ростовой подложки эпитаксиальной полупроводниковой структуры (варианты)
JP6602332B2 (ja) 2017-03-28 2019-11-06 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 半導体装置の製造方法、基板処理装置およびプログラム

Also Published As

Publication number Publication date
JPS5961920A (ja) 1984-04-09

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