JPH0480116B2 - - Google Patents

Info

Publication number
JPH0480116B2
JPH0480116B2 JP58034538A JP3453883A JPH0480116B2 JP H0480116 B2 JPH0480116 B2 JP H0480116B2 JP 58034538 A JP58034538 A JP 58034538A JP 3453883 A JP3453883 A JP 3453883A JP H0480116 B2 JPH0480116 B2 JP H0480116B2
Authority
JP
Japan
Prior art keywords
vapor deposition
substrate
reaction product
free jet
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58034538A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59162267A (ja
Inventor
Shigeji Kimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3453883A priority Critical patent/JPS59162267A/ja
Publication of JPS59162267A publication Critical patent/JPS59162267A/ja
Publication of JPH0480116B2 publication Critical patent/JPH0480116B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP3453883A 1983-03-04 1983-03-04 蒸着装置及び蒸着方法 Granted JPS59162267A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3453883A JPS59162267A (ja) 1983-03-04 1983-03-04 蒸着装置及び蒸着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3453883A JPS59162267A (ja) 1983-03-04 1983-03-04 蒸着装置及び蒸着方法

Publications (2)

Publication Number Publication Date
JPS59162267A JPS59162267A (ja) 1984-09-13
JPH0480116B2 true JPH0480116B2 (enrdf_load_stackoverflow) 1992-12-17

Family

ID=12417060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3453883A Granted JPS59162267A (ja) 1983-03-04 1983-03-04 蒸着装置及び蒸着方法

Country Status (1)

Country Link
JP (1) JPS59162267A (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6193830A (ja) * 1984-10-15 1986-05-12 Nec Corp 光気相成長法
US5164040A (en) * 1989-08-21 1992-11-17 Martin Marietta Energy Systems, Inc. Method and apparatus for rapidly growing films on substrates using pulsed supersonic jets
JP2527293B2 (ja) * 1993-03-26 1996-08-21 株式会社日立製作所 Ｉｃ素子における配線接続方法
JPH06283534A (ja) * 1993-03-26 1994-10-07 Hitachi Ltd Ｉｃ素子における配線接続装置
JPH06302603A (ja) * 1993-03-26 1994-10-28 Hitachi Ltd Ｉｃ素子
JP2527292B2 (ja) * 1993-03-26 1996-08-21 株式会社日立製作所 Ｉｃ素子およびｉｃ素子における配線接続方法
JP2007049128A (ja) * 2005-07-12 2007-02-22 Seiko Epson Corp 製膜装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5961920A (ja) * 1982-10-01 1984-04-09 Agency Of Ind Science & Technol 薄膜製造方法およびその装置

Also Published As

Publication number Publication date
JPS59162267A (ja) 1984-09-13

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