JPS59162267A - 蒸着装置及び蒸着方法 - Google Patents

蒸着装置及び蒸着方法

Info

Publication number
JPS59162267A
JPS59162267A JP3453883A JP3453883A JPS59162267A JP S59162267 A JPS59162267 A JP S59162267A JP 3453883 A JP3453883 A JP 3453883A JP 3453883 A JP3453883 A JP 3453883A JP S59162267 A JPS59162267 A JP S59162267A
Authority
JP
Japan
Prior art keywords
reaction product
vapor deposition
light
nozzle
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3453883A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0480116B2 (enrdf_load_stackoverflow
Inventor
Shigeji Kimura
茂治 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3453883A priority Critical patent/JPS59162267A/ja
Publication of JPS59162267A publication Critical patent/JPS59162267A/ja
Publication of JPH0480116B2 publication Critical patent/JPH0480116B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP3453883A 1983-03-04 1983-03-04 蒸着装置及び蒸着方法 Granted JPS59162267A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3453883A JPS59162267A (ja) 1983-03-04 1983-03-04 蒸着装置及び蒸着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3453883A JPS59162267A (ja) 1983-03-04 1983-03-04 蒸着装置及び蒸着方法

Publications (2)

Publication Number Publication Date
JPS59162267A true JPS59162267A (ja) 1984-09-13
JPH0480116B2 JPH0480116B2 (enrdf_load_stackoverflow) 1992-12-17

Family

ID=12417060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3453883A Granted JPS59162267A (ja) 1983-03-04 1983-03-04 蒸着装置及び蒸着方法

Country Status (1)

Country Link
JP (1) JPS59162267A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6193830A (ja) * 1984-10-15 1986-05-12 Nec Corp 光気相成長法
US5164040A (en) * 1989-08-21 1992-11-17 Martin Marietta Energy Systems, Inc. Method and apparatus for rapidly growing films on substrates using pulsed supersonic jets
JPH06283534A (ja) * 1993-03-26 1994-10-07 Hitachi Ltd Ｉｃ素子における配線接続装置
JPH06283535A (ja) * 1993-03-26 1994-10-07 Hitachi Ltd Ｉｃ素子に対する絶縁膜形成方法
JPH06295910A (ja) * 1993-03-26 1994-10-21 Hitachi Ltd Ｉｃ素子およびｉｃ素子における配線接続方法
JPH06302603A (ja) * 1993-03-26 1994-10-28 Hitachi Ltd Ｉｃ素子
JP2007049128A (ja) * 2005-07-12 2007-02-22 Seiko Epson Corp 製膜装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5961920A (ja) * 1982-10-01 1984-04-09 Agency Of Ind Science & Technol 薄膜製造方法およびその装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5961920A (ja) * 1982-10-01 1984-04-09 Agency Of Ind Science & Technol 薄膜製造方法およびその装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6193830A (ja) * 1984-10-15 1986-05-12 Nec Corp 光気相成長法
US5164040A (en) * 1989-08-21 1992-11-17 Martin Marietta Energy Systems, Inc. Method and apparatus for rapidly growing films on substrates using pulsed supersonic jets
JPH06283534A (ja) * 1993-03-26 1994-10-07 Hitachi Ltd Ｉｃ素子における配線接続装置
JPH06283535A (ja) * 1993-03-26 1994-10-07 Hitachi Ltd Ｉｃ素子に対する絶縁膜形成方法
JPH06295910A (ja) * 1993-03-26 1994-10-21 Hitachi Ltd Ｉｃ素子およびｉｃ素子における配線接続方法
JPH06302603A (ja) * 1993-03-26 1994-10-28 Hitachi Ltd Ｉｃ素子
JP2007049128A (ja) * 2005-07-12 2007-02-22 Seiko Epson Corp 製膜装置

Also Published As

Publication number Publication date
JPH0480116B2 (enrdf_load_stackoverflow) 1992-12-17

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