JPH01177754U - - Google Patents

Info

Publication number
JPH01177754U
JPH01177754U JP1988073970U JP7397088U JPH01177754U JP H01177754 U JPH01177754 U JP H01177754U JP 1988073970 U JP1988073970 U JP 1988073970U JP 7397088 U JP7397088 U JP 7397088U JP H01177754 U JPH01177754 U JP H01177754U
Authority
JP
Japan
Prior art keywords
exposure
chamber
printing frame
cooling chamber
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1988073970U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988073970U priority Critical patent/JPH01177754U/ja
Priority to DE3829555A priority patent/DE3829555A1/de
Priority to US07/238,774 priority patent/US4885604A/en
Publication of JPH01177754U publication Critical patent/JPH01177754U/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/02—Exposure apparatus for contact printing
    • G03B27/14—Details
    • G03B27/26—Cooling
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Description

【図面の簡単な説明】
第１図は、本考案の一実施例を示す側面断面図
、第２図はその平面図、第３図は正面図である、
第４図は露光面冷却方法を示す構成図である。 符号の説明、１：ランプ、２：反射鏡、３：焼
枠、４：露光室、５：冷却室、６：ラジエター、
７：冷凍機、８：送風フアン、９：送風口、１０
：排気フアン、１１：温度センサー、１２：プリ
ント配線板、１３：冷却機、１４：壁、１５：真
空ポンプ、１６：エアーコンプレツサー。

Claims (1)

  1. 【実用新案登録請求の範囲】 (1) 露光室４に収納組付けされた紫外線ランプ
    １や反射鏡２等から成る光源装置と、前記露光室
    ４に出し入れ自在な焼枠３とから成る露光装置に
    おいて、 前記焼枠３面に冷風を送り、該焼枠３面を冷却
    する冷却機１３を設けて成る露光装置。 (2) 露光室４に隣接して冷却室５を形成し、冷
    却機１３を、冷凍機７から送られてくる冷媒が巡
    回するラジエター６と、該ラジエター６に前記冷
    却室５内の空気を送る送風フアン８とから構成し
    て成る請求項１記載の露光装置。 (3) 露光室４と冷却室５との間に、該露光室４
    の空気を前記冷却室５に送る排気フアン１０を設
    けて成る請求項１，２記載の露光装置。 (4) 露光室４の焼枠３近傍に温度センサー１１
    を設けて成る請求項１，２，３記載の露光装置。
JP1988073970U 1988-06-03 1988-06-03 Pending JPH01177754U (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1988073970U JPH01177754U (ja) 1988-06-03 1988-06-03
DE3829555A DE3829555A1 (de) 1988-06-03 1988-08-31 Belichtungsvorrichtung
US07/238,774 US4885604A (en) 1988-06-03 1988-09-01 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988073970U JPH01177754U (ja) 1988-06-03 1988-06-03

Publications (1)

Publication Number Publication Date
JPH01177754U true JPH01177754U (ja) 1989-12-19

Family

ID=13533450

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988073970U Pending JPH01177754U (ja) 1988-06-03 1988-06-03

Country Status (3)

Country Link
US (1) US4885604A (ja)
JP (1) JPH01177754U (ja)
DE (1) DE3829555A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04225360A (ja) * 1990-12-26 1992-08-14 Adotetsuku Eng:Kk プリント配線基板の製造におけるフィルムマスクの密着方法及びその装置
FR2754613B1 (fr) * 1996-10-16 1998-11-13 Rollin Sa Machine perfectionnee pour insoler des plaques en photopolymere pour l'impression flexographique
AT510846B1 (de) * 2011-04-13 2012-07-15 Colop Stempelerzeugung Skopek Vorrichtung zum herstellen von stempel-klischees

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4935801U (ja) * 1972-06-29 1974-03-29

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3627416A (en) * 1969-10-02 1971-12-14 The Nuarc Co Twin-exposing machine
DE3216112A1 (de) * 1982-04-30 1983-11-03 Meteor-Siegen Apparatebau Paul Schmeck Gmbh, 5900 Siegen Sicherheitseinrichtung in einer lichtpausmaschine
JPS5962858A (ja) * 1982-08-04 1984-04-10 Oak Seisakusho:Kk 露光操作方法
DE3327689C1 (de) * 1983-08-01 1984-12-20 Wilhelm Staub Gmbh, 6078 Neu-Isenburg Gerät zur Belichtung von Leiterplatten
JPS60168148A (ja) * 1984-02-13 1985-08-31 Oak Seisakusho:Kk 焼付機
JPS61160934A (ja) * 1985-01-10 1986-07-21 Canon Inc 投影光学装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4935801U (ja) * 1972-06-29 1974-03-29

Also Published As

Publication number Publication date
DE3829555A1 (de) 1989-12-07
US4885604A (en) 1989-12-05
DE3829555C2 (ja) 1992-01-09

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