JP7475463B2 - 基板ハンドリングシステム - Google Patents
基板ハンドリングシステム Download PDFInfo
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- JP7475463B2 JP7475463B2 JP2022544708A JP2022544708A JP7475463B2 JP 7475463 B2 JP7475463 B2 JP 7475463B2 JP 2022544708 A JP2022544708 A JP 2022544708A JP 2022544708 A JP2022544708 A JP 2022544708A JP 7475463 B2 JP7475463 B2 JP 7475463B2
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- 239000000758 substrate Substances 0.000 title claims description 324
- 238000004140 cleaning Methods 0.000 claims description 66
- 238000012546 transfer Methods 0.000 claims description 42
- 230000008878 coupling Effects 0.000 claims description 37
- 238000010168 coupling process Methods 0.000 claims description 37
- 238000005859 coupling reaction Methods 0.000 claims description 37
- 244000185238 Lophostemon confertus Species 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims description 2
- 230000009471 action Effects 0.000 description 102
- 230000033001 locomotion Effects 0.000 description 39
- 230000000712 assembly Effects 0.000 description 30
- 238000000429 assembly Methods 0.000 description 30
- 230000005540 biological transmission Effects 0.000 description 29
- 238000005498 polishing Methods 0.000 description 25
- 238000012545 processing Methods 0.000 description 25
- 239000002245 particle Substances 0.000 description 16
- 238000000034 method Methods 0.000 description 15
- 238000001035 drying Methods 0.000 description 11
- 230000008569 process Effects 0.000 description 7
- 238000003860 storage Methods 0.000 description 7
- 230000007704 transition Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 238000011109 contamination Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- -1 e.g. Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/02—Gripping heads and other end effectors servo-actuated
- B25J15/0253—Gripping heads and other end effectors servo-actuated comprising parallel grippers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/10—Programme-controlled manipulators characterised by positioning means for manipulator elements
- B25J9/12—Programme-controlled manipulators characterised by positioning means for manipulator elements electric
- B25J9/123—Linear actuators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/74—Feeding, transfer, or discharging devices of particular kinds or types
- B65G47/90—Devices for picking-up and depositing articles or materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/67219—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one polishing chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
Claims (18)
- 貫通するように形成された第1の開口部と第2の開口部とを有する外壁を含むエンクロージャ、
前記エンクロージャ内に配置されたアクチュエータアセンブリ、
前記第1の開口部を通して前記アクチュエータアセンブリに連結された第1のハンドリングブレードであって、前記エンクロージャの外側に配置された第1の基板ハンドリング面を含む前記第1のハンドリングブレード、
前記第2の開口部を通して前記アクチュエータアセンブリに連結された第2のハンドリングブレードであって、前記エンクロージャの外側に配置された第2の基板ハンドリング面を含む前記第2のハンドリングブレード、及び
前記エンクロージャ内に配置され、前記第1のハンドリングブレード及び前記第2のハンドリングブレードに連結されたガイドレールアセンブリ、
を含み、
前記アクチュエータアセンブリが線形アクチュエータを含む基板ハンドリングシステム。 - 前記第1のハンドリングブレード及び前記第2のハンドリングブレードが、前記エンクロージャから外側に向かって同様の方向に配置されている、請求項1に記載の基板ハンドリングシステム。
- 前記第1のハンドリングブレード及び前記第2のハンドリングブレードの両方が、内面及び外面をさらに含み、前記第1の基板ハンドリング面が、前記第1のハンドリングブレードの前記内面上に配置されており、前記第2の基板ハンドリング面が、前記第2のハンドリングブレードの前記内面上に配置されている、請求項2に記載の基板ハンドリングシステム。
- 前記第1の基板ハンドリング面及び前記第2の基板ハンドリング面は各々が、第1のフィンガ突出部及び第2のフィンガ突出部をさらに含む、請求項3に記載の基板ハンドリングシステム。
- 前記アクチュエータアセンブリに隣接して前記第1のハンドリングブレードに連結された第1の連結部材と、前記アクチュエータアセンブリに隣接して前記第2のハンドリングブレードに連結された第2の連結部材とをさらに含み、前記第1の連結部材及び前記第2の連結部材がそれぞれ、前記第1の開口部及び前記第2の開口部の各々を通して配置されている、請求項1に記載の基板ハンドリングシステム。
- 前記第1のハンドリングブレード及び前記第2のハンドリングブレードがそれぞれ、前記第1の開口部及び前記第2の開口部の各々を通して配置されている、請求項1に記載の基板ハンドリングシステム。
- 前記エンクロージャ、前記アクチュエータアセンブリ、前記第1のハンドリングブレード、及び前記第2のハンドリングブレードが、第1の基板インデクサアセンブリを形成しており、前記基板ハンドリングシステムは、第2の基板インデクサアセンブリをさらに含み、前記第2の基板インデクサアセンブリが、
貫通するように形成された第1の開口部と第2の開口部とを有する外壁を含むエンクロージャ、
前記エンクロージャ内に配置されたアクチュエータアセンブリ、
前記アクチュエータアセンブリに連結された第1のハンドリングブレードであって、前記エンクロージャの外側に配置された第1の基板ハンドリング面を含む前記第1のハンドリングブレード、及び
前記アクチュエータアセンブリに連結された第2のハンドリングブレードであって、前記エンクロージャの外側に配置された第2の基板ハンドリング面を含む前記第2のハンドリングブレード
を含む、請求項1に記載の基板ハンドリングシステム。 - 支持柱、
前記支持柱の長さに沿って配置された第1のレールであって、前記第1の基板インデクサアセンブリは第1の接続シャフト及び第1のアクチュエータアセンブリによって前記第1のレールに移動可能に接続し、前記第1の接続シャフトは前記第1のアクチュエータアセンブリに回転可能に接続する、前記第1のレール、並びに
前記支持柱の前記長さに沿って配置され、前記第1のレールに平行な第2のレールであって、前記第2の基板インデクサアセンブリは第2の接続シャフト及び第2のアクチュエータアセンブリによって前記第2のレールに移動可能に連結し、前記第2の接続シャフトが、前記第2のアクチュエータアセンブリに回転可能に接続する、前記第2のレール
をさらに含む、請求項7に記載の基板ハンドリングシステム。 - 案内梁、
前記案内梁に連結されて、第1の軸線に沿って移動可能な支持柱、
前記支持柱の長さに沿って配置された、前記第1の軸線と直交する第1のレール、
前記支持柱の前記長さに沿って配置された、前記第1のレールに平行な第2のレール、
前記第1のレールに移動可能に連結された第1の基板インデクサアセンブリ、並びに
前記第2のレールに移動可能に連結された第2の基板インデクサアセンブリ
を含む基板ハンドリングシステムであって、前記第1の基板インデクサアセンブリ及び前記第2の基板インデクサアセンブリは各々が、
貫通するように形成された第1の開口部と第2の開口部とを有する外壁を含むエンクロージャ、
前記エンクロージャ内に配置されたアクチュエータアセンブリ、
前記アクチュエータアセンブリに連結された第1のハンドリングブレードであって、前記エンクロージャの外側に配置された第1の基板ハンドリング面を含む前記第1のハンドリングブレード、及び
前記アクチュエータアセンブリに連結された第2のハンドリングブレードであって、前記エンクロージャの外側に配置された第2の基板ハンドリング面を含む前記第2のハンドリングブレード
を含む、基板ハンドリングシステム。 - 前記第1の基板インデクサアセンブリが、接続シャフトによって前記第1のレールに連結されている、請求項9に記載の基板ハンドリングシステム。
- 前記接続シャフトが、前記第1のハンドリングブレード及び前記第2のハンドリングブレードが垂直位置と水平位置との間で揺動するように、軸線を中心として前記エンクロージャを回転させるように構成されている、請求項10に記載の基板ハンドリングシステム。
- 前記アクチュエータアセンブリと、前記第1のハンドリングブレード及び前記第2のハンドリングブレードの各々との間に配置された連結部材をさらに含む、請求項9に記載の基板ハンドリングシステム。
- 前記アクチュエータアセンブリが線形アクチュエータを含み、ガイドレールアセンブリが前記エンクロージャ内に配置されており、前記ガイドレールアセンブリが、前記第1のハンドリングブレード及び前記第2のハンドリングブレードに連結されている、請求項9に記載の基板ハンドリングシステム。
- 前記第1のハンドリングブレード及び前記第2のハンドリングブレードが、
前記エンクロージャの外側に配置された2つのブレード、
各々が、前記2つのブレードの一方と、第1の連結部材又は第2の連結部材の一方とに連結されている2つのブラケット、並びに
各々が、前記2つのブラケット、前記第1の連結部材、及び前記第2の連結部材間に少なくとも部分的に配置されている2つの開口部カバー
をさらに備える、請求項13に記載の基板ハンドリングシステム。 - 前記アクチュエータアセンブリが、前記線形アクチュエータに連結された2つのヒッチ部品をさらに含み、前記2つのヒッチ部品の各々は、前記第1の連結部材及び前記第2の連結部材の各々の内部のスロット内に配置された突出部を含む、請求項14に記載の基板ハンドリングシステム。
- 案内梁、
前記案内梁に連結されて、第1の軸線に沿って移動可能な支持柱、
前記支持柱の長さに沿って配置された、前記第1の軸線と直交する第1のレール、
前記支持柱の前記長さに沿って配置された、前記第1のレールに平行な第2のレール、
前記第1のレールに移動可能に連結された第1の基板インデクサアセンブリ、
前記第2のレールに移動可能に連結された第2の基板インデクサアセンブリ、及び
コントローラ
を含む基板ハンドリングシステムであって、前記コントローラが、
前記第1の基板インデクサアセンブリが水平位置にある状態で水平前洗浄モジュール内に基板を固定し、
前記第1の基板インデクサアセンブリを用いて前記水平前洗浄モジュールから前記基板を取り外し、
前記基板を固定した後、前記第1の基板インデクサアセンブリを枢動させることによって前記基板を垂直位置に揺動させ、
前記基板を垂直洗浄モジュール内に下降させ、
前記基板を前記垂直洗浄モジュール内に下降させた後、前記基板を解放し、
前記基板を解放した後、前記垂直洗浄モジュールから前記第2の基板インデクサアセンブリを用いて前記基板を固定し、
前記第2の基板インデクサアセンブリを用いて前記基板を固定した後、前記基板を移送位置に上昇させ、
水平位置にある前記支持柱を前記案内梁に沿って移動させる
ように構成されている、基板ハンドリングシステム。 - 前記第1の基板インデクサアセンブリ及び前記第2の基板インデクサアセンブリは各々が、
貫通するように形成された第1の開口部と第2の開口部とを有する外壁を含むエンクロージャ、
前記エンクロージャ内に配置されたアクチュエータアセンブリ、
前記アクチュエータアセンブリに連結された第1のハンドリングブレードであって、前記エンクロージャの外側に配置された第1の基板ハンドリング面を含む前記第1のハンドリングブレード、及び
前記アクチュエータアセンブリに連結された第2のハンドリングブレードであって、前記エンクロージャの外側に配置された第2の基板ハンドリング面を含む前記第2のハンドリングブレード
を含む、請求項16に記載の基板ハンドリングシステム。 - 前記垂直洗浄モジュールが、スプレーボックス又はブラシボックスである、請求項16に記載の基板ハンドリングシステム。
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US17/098,001 US11705354B2 (en) | 2020-07-10 | 2020-11-13 | Substrate handling systems |
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JP2012253130A (ja) | 2011-06-01 | 2012-12-20 | Ebara Corp | 基板搬送方法および基板搬送機 |
JP2018022800A (ja) | 2016-08-04 | 2018-02-08 | 株式会社荏原製作所 | ステージ、ステージを調整するための治具、ステージを調整するための調整方法 |
JP2018041854A (ja) | 2016-09-08 | 2018-03-15 | 株式会社荏原製作所 | 基板把持検出装置、基板把持装置、基板把持検出装置の調整方法 |
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