FR2776552B1 - Machine modulaire de polissage et de planarisation de substrats - Google Patents

Machine modulaire de polissage et de planarisation de substrats

Info

Publication number
FR2776552B1
FR2776552B1 FR9804202A FR9804202A FR2776552B1 FR 2776552 B1 FR2776552 B1 FR 2776552B1 FR 9804202 A FR9804202 A FR 9804202A FR 9804202 A FR9804202 A FR 9804202A FR 2776552 B1 FR2776552 B1 FR 2776552B1
Authority
FR
France
Prior art keywords
unloading
loading
substrates
planarizing machine
automaton
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9804202A
Other languages
English (en)
Other versions
FR2776552A1 (fr
Inventor
Marc Peltier
Lucien Grisel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Procedes & Equipement Pour Les
Original Assignee
Procedes & Equipement Pour Les
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR9804202A priority Critical patent/FR2776552B1/fr
Application filed by Procedes & Equipement Pour Les filed Critical Procedes & Equipement Pour Les
Priority to CNB998046353A priority patent/CN1134323C/zh
Priority to EP99937813A priority patent/EP1137514B1/fr
Priority to PCT/FR1999/000739 priority patent/WO1999050023A1/fr
Priority to DE69904647T priority patent/DE69904647D1/de
Priority to AT99937813T priority patent/ATE229867T1/de
Priority to US09/646,956 priority patent/US6343979B1/en
Priority to JP2000540971A priority patent/JP2002509812A/ja
Priority to KR10-2000-7010773A priority patent/KR100531987B1/ko
Publication of FR2776552A1 publication Critical patent/FR2776552A1/fr
Application granted granted Critical
Publication of FR2776552B1 publication Critical patent/FR2776552B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • B24B37/345—Feeding, loading or unloading work specially adapted to lapping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/02—Frames; Beds; Carriages
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Multi-Process Working Machines And Systems (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
FR9804202A 1998-03-31 1998-03-31 Machine modulaire de polissage et de planarisation de substrats Expired - Fee Related FR2776552B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR9804202A FR2776552B1 (fr) 1998-03-31 1998-03-31 Machine modulaire de polissage et de planarisation de substrats
EP99937813A EP1137514B1 (fr) 1998-03-31 1999-03-30 Machine modulaire de polissage et de planarisation de substrats
PCT/FR1999/000739 WO1999050023A1 (fr) 1998-03-31 1999-03-30 Machine modulaire de polissage et de planarisation de substrats
DE69904647T DE69904647D1 (de) 1998-03-31 1999-03-30 Baukastensystem poliermaschine und substrat planarisierung
CNB998046353A CN1134323C (zh) 1998-03-31 1999-03-30 一种用于磨削和刨削基片的组合机床
AT99937813T ATE229867T1 (de) 1998-03-31 1999-03-30 Baukastensystem poliermaschine und substrat planarisierung
US09/646,956 US6343979B1 (en) 1998-03-31 1999-03-30 Modular machine for polishing and planing substrates
JP2000540971A JP2002509812A (ja) 1998-03-31 1999-03-30 基板の研磨平削りモジューラ機
KR10-2000-7010773A KR100531987B1 (ko) 1998-03-31 1999-03-30 기판의 연마 및 평삭을 위한 모듈식 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9804202A FR2776552B1 (fr) 1998-03-31 1998-03-31 Machine modulaire de polissage et de planarisation de substrats

Publications (2)

Publication Number Publication Date
FR2776552A1 FR2776552A1 (fr) 1999-10-01
FR2776552B1 true FR2776552B1 (fr) 2000-06-16

Family

ID=9524860

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9804202A Expired - Fee Related FR2776552B1 (fr) 1998-03-31 1998-03-31 Machine modulaire de polissage et de planarisation de substrats

Country Status (9)

Country Link
US (1) US6343979B1 (fr)
EP (1) EP1137514B1 (fr)
JP (1) JP2002509812A (fr)
KR (1) KR100531987B1 (fr)
CN (1) CN1134323C (fr)
AT (1) ATE229867T1 (fr)
DE (1) DE69904647D1 (fr)
FR (1) FR2776552B1 (fr)
WO (1) WO1999050023A1 (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6575818B2 (en) * 2001-06-27 2003-06-10 Oriol Inc. Apparatus and method for polishing multiple semiconductor wafers in parallel
US7273408B2 (en) * 2005-12-16 2007-09-25 Applied Materials, Inc. Paired pivot arm
KR100899973B1 (ko) * 2006-06-14 2009-05-28 이노플라 아엔씨 반도체 웨이퍼 연마 장치
US9570311B2 (en) * 2012-02-10 2017-02-14 Taiwan Semiconductor Manufacturing Company, Ltd. Modular grinding apparatuses and methods for wafer thinning
FR3054158B1 (fr) * 2016-07-21 2019-06-28 Comau France Machine-outil d’usinage
WO2019186704A1 (fr) * 2018-03-27 2019-10-03 平田機工株式会社 Dispositif de travail et système de travail
US20210323117A1 (en) * 2020-04-16 2021-10-21 Applied Materials, Inc. High throughput polishing modules and modular polishing systems
US11705354B2 (en) 2020-07-10 2023-07-18 Applied Materials, Inc. Substrate handling systems
US12198944B2 (en) 2020-11-11 2025-01-14 Applied Materials, Inc. Substrate handling in a modular polishing system with single substrate cleaning chambers
JP7668124B2 (ja) 2021-02-22 2025-04-24 株式会社岡本工作機械製作所 ワーク搬送機構
EP4377047A4 (fr) * 2021-07-28 2025-07-09 Applied Materials Inc Modules de polissage à haut rendement et systèmes de polissage modulaires
TWI834448B (zh) * 2021-12-31 2024-03-01 大陸商杭州眾硅電子科技有限公司 一種晶圓拋光系統及晶圓傳輸方法
US12224186B2 (en) 2023-04-03 2025-02-11 Applied Materials, Inc. Apparatus and method of brush cleaning using periodic chemical treatments

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4680893A (en) * 1985-09-23 1987-07-21 Motorola, Inc. Apparatus for polishing semiconductor wafers
JPS63207559A (ja) * 1987-02-19 1988-08-26 Disco Abrasive Syst Ltd ウエ−ハ自動研削装置
US5827110A (en) * 1994-12-28 1998-10-27 Kabushiki Kaisha Toshiba Polishing facility
KR100390293B1 (ko) * 1993-09-21 2003-09-02 가부시끼가이샤 도시바 폴리싱장치
US5562524A (en) * 1994-05-04 1996-10-08 Gill, Jr.; Gerald L. Polishing apparatus
US5655954A (en) * 1994-11-29 1997-08-12 Toshiba Kikai Kabushiki Kaisha Polishing apparatus
US5738574A (en) 1995-10-27 1998-04-14 Applied Materials, Inc. Continuous processing system for chemical mechanical polishing
JP3679871B2 (ja) * 1996-09-04 2005-08-03 株式会社荏原製作所 ポリッシング装置及び搬送ロボット
US5893795A (en) * 1997-07-11 1999-04-13 Applied Materials, Inc. Apparatus for moving a cassette
US6110011A (en) * 1997-11-10 2000-08-29 Applied Materials, Inc. Integrated electrodeposition and chemical-mechanical polishing tool

Also Published As

Publication number Publication date
ATE229867T1 (de) 2003-01-15
DE69904647D1 (de) 2003-01-30
CN1296434A (zh) 2001-05-23
WO1999050023A1 (fr) 1999-10-07
JP2002509812A (ja) 2002-04-02
KR100531987B1 (ko) 2005-11-30
EP1137514B1 (fr) 2002-12-18
US6343979B1 (en) 2002-02-05
CN1134323C (zh) 2004-01-14
FR2776552A1 (fr) 1999-10-01
EP1137514A1 (fr) 2001-10-04
KR20010078700A (ko) 2001-08-21

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Legal Events

Date Code Title Description
TP Transmission of property
TP Transmission of property
TP Transmission of property
ST Notification of lapse

Effective date: 20091130