JP7061439B2 - 基板反転装置、基板処理装置および基板支持装置 - Google Patents
基板反転装置、基板処理装置および基板支持装置 Download PDFInfo
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Description
請求項9に記載の発明は、基板支持装置であって、基板の幅方向の両側にて水平姿勢の基板の周縁部に接触して下方から前記基板を支持する一対のガイド部と、前記一対のガイド部の位置を第1接触位置と第2接触位置との間で切り替えることにより、前記一対のガイド部と前記基板との接触状態を変更する切替機構と、を備え、前記一対のガイド部のそれぞれが、前記第1接触位置において前記基板の周縁部に接触する第1接触領域と、上下方向および前記幅方向において前記第1接触領域と異なる位置に位置し、前記第2接触位置において前記基板の周縁部に接触する第2接触領域と、を備え、前記一対のガイド部のうち一方のガイド部おいて、前記第2接触領域が、前記第1接触領域よりも下側かつ前記幅方向内側に位置し、前記一対のガイド部のうち他方のガイド部おいて、前記第2接触領域が、前記第1接触領域よりも上側かつ前記幅方向外側に位置し、前記切替機構が、前記一方のガイド部に対して前記他方のガイド部を相対的に前記上下方向に移動することにより、前記一対のガイド部の位置を、前記一対のガイド部の前記第1接触領域が前記上下方向の同じ位置に位置する前記第1接触位置と、前記一対のガイド部の前記第2接触領域が前記上下方向の同じ位置に位置する前記第2接触位置との間で切り替える。
請求項10に記載の発明は、基板支持装置であって、基板の幅方向の両側にて水平姿勢の基板の周縁部に接触して下方から前記基板を支持する一対のガイド部と、前記一対のガイド部を、前記基板に接触する接触位置と、前記接触位置よりも前記基板から離れた退避位置との間で進退させるガイド移動機構と、前記接触位置に位置する前記一対のガイド部の位置を第1接触位置と第2接触位置との間で切り替えることにより、前記一対のガイド部と前記基板との接触状態を変更する切替機構と、を備え、前記一対のガイド部のそれぞれが、前記第1接触位置において前記基板の周縁部に接触する第1接触領域と、上下方向および前記幅方向において前記第1接触領域と異なる位置に位置し、前記第2接触位置において前記基板の周縁部に接触する第2接触領域と、を備え、前記切替機構が、前記一対のガイド部を前記ガイド移動機構と共に移動することにより、前記一対のガイド部の位置を前記第1接触位置と前記第2接触位置との間で切り替える。
9 基板
10 インデクサセル
12 移載ロボット
20 洗浄処理セル
22 搬送ロボット
24 裏面洗浄処理部
70 支持機構
74 ガイド部
76 ガイド移動機構
77,77a,77b 切替機構
80 挟持反転機構
100,100a,100b 基板反転装置
741 上接触面
742 下接触面
773b 回転軸
A1 第1接触位置
A2 退避位置
A3 第2接触位置
Claims (10)
- 基板反転装置であって、
水平姿勢の基板の周縁部に接触して下方から前記基板を支持する支持機構と、
前記支持機構により支持される前記基板を挟持して反転させる挟持反転機構と、
を備え、
前記支持機構が、
前記基板の幅方向の両側にて前記基板の周縁部に接触する一対のガイド部と、
前記一対のガイド部を、前記基板に接触する接触位置と、前記接触位置よりも前記基板から離れた退避位置との間で進退させるガイド移動機構と、
前記接触位置に位置する前記一対のガイド部の位置を第1接触位置と第2接触位置との間で切り替えることにより、前記一対のガイド部と前記基板との接触状態を変更する切替機構と、
を備え、
前記一対のガイド部のそれぞれが、
前記第1接触位置において前記基板の周縁部に接触する第1接触領域と、
上下方向および前記幅方向において前記第1接触領域と異なる位置に位置し、前記第2接触位置において前記基板の周縁部に接触する第2接触領域と、
を備え、
前記一対のガイド部のうち一方のガイド部おいて、前記第2接触領域が、前記第1接触領域よりも下側かつ前記幅方向内側に位置し、
前記一対のガイド部のうち他方のガイド部おいて、前記第2接触領域が、前記第1接触領域よりも上側かつ前記幅方向外側に位置し、
前記切替機構が、水平方向に延びる回転軸を中心として前記一対のガイド部を回転することにより、前記一対のガイド部の位置を、前記一対のガイド部の前記第1接触領域が前記上下方向の同じ位置に位置する前記第1接触位置と、前記一対のガイド部の前記第2接触領域が前記上下方向の同じ位置に位置する前記第2接触位置との間で切り替えることを特徴とする基板反転装置。 - 基板反転装置であって、
水平姿勢の基板の周縁部に接触して下方から前記基板を支持する支持機構と、
前記支持機構により支持される前記基板を挟持して反転させる挟持反転機構と、
を備え、
前記支持機構が、
前記基板の幅方向の両側にて前記基板の周縁部に接触する一対のガイド部と、
前記一対のガイド部を、前記基板に接触する接触位置と、前記接触位置よりも前記基板から離れた退避位置との間で進退させるガイド移動機構と、
前記接触位置に位置する前記一対のガイド部の位置を第1接触位置と第2接触位置との間で切り替えることにより、前記一対のガイド部と前記基板との接触状態を変更する切替機構と、
を備え、
前記一対のガイド部のそれぞれが、
前記第1接触位置において前記基板の周縁部に接触する第1接触領域と、
上下方向および前記幅方向において前記第1接触領域と異なる位置に位置し、前記第2接触位置において前記基板の周縁部に接触する第2接触領域と、
を備え、
前記一対のガイド部のうち一方のガイド部おいて、前記第2接触領域が、前記第1接触領域よりも下側かつ前記幅方向内側に位置し、
前記一対のガイド部のうち他方のガイド部おいて、前記第2接触領域が、前記第1接触領域よりも上側かつ前記幅方向外側に位置し、
前記切替機構が、前記一方のガイド部に対して前記他方のガイド部を相対的に前記上下方向に移動することにより、前記一対のガイド部の位置を、前記一対のガイド部の前記第1接触領域が前記上下方向の同じ位置に位置する前記第1接触位置と、前記一対のガイド部の前記第2接触領域が前記上下方向の同じ位置に位置する前記第2接触位置との間で切り替えることを特徴とする基板反転装置。 - 請求項1または2に記載の基板反転装置であって、
前記ガイド移動機構による各ガイド部の移動方向が、前記上下方向および前記幅方向に対して傾斜することを特徴とする基板反転装置。 - 基板反転装置であって、
水平姿勢の基板の周縁部に接触して下方から前記基板を支持する支持機構と、
前記支持機構により支持される前記基板を挟持して反転させる挟持反転機構と、
を備え、
前記支持機構が、
前記基板の幅方向の両側にて前記基板の周縁部に接触する一対のガイド部と、
前記一対のガイド部を、前記基板に接触する接触位置と、前記接触位置よりも前記基板から離れた退避位置との間で進退させるガイド移動機構と、
前記接触位置に位置する前記一対のガイド部の位置を第1接触位置と第2接触位置との間で切り替えることにより、前記一対のガイド部と前記基板との接触状態を変更する切替機構と、
を備え、
前記一対のガイド部のそれぞれが、
前記第1接触位置において前記基板の周縁部に接触する第1接触領域と、
上下方向および前記幅方向において前記第1接触領域と異なる位置に位置し、前記第2接触位置において前記基板の周縁部に接触する第2接触領域と、
を備え、
前記切替機構が、前記一対のガイド部を前記ガイド移動機構と共に移動することにより、前記一対のガイド部の位置を前記第1接触位置と前記第2接触位置との間で切り替えることを特徴とする基板反転装置。 - 請求項1ないし4のいずれか1つに記載の基板反転装置であって、
前記一対のガイド部のそれぞれにおいて、前記第1接触領域および前記第2接触領域が上方を向く接触面であり、前記第1接触領域と前記第2接触領域とが階段状に接続されることを特徴とする基板反転装置。 - 基板処理装置であって、
請求項1ないし5のいずれか1つに記載の基板反転装置と、
前記基板反転装置にて反転された基板の裏面を洗浄する裏面洗浄処理部と、
前記基板反転装置と前記裏面洗浄処理部との間で前記基板を搬送する基板搬送部と、
を備えることを特徴とする基板処理装置。 - 請求項6に記載の基板処理装置であって、
前記裏面洗浄処理部および前記基板搬送部が配置された洗浄処理ブロックと、
他の基板搬送部が配置され、前記洗浄処理ブロックに未処理基板を渡すとともに前記洗浄処理ブロックから処理済み基板を受け取るインデクサブロックと、
をさらに備え、
前記基板反転装置が、前記洗浄処理ブロックと前記インデクサブロックとの接続部に配置され、
前記基板搬送部および前記他の基板搬送部のうち一方の搬送部が前記基板反転装置に基板を搬入した場合、前記基板反転装置にて反転された前記基板は、他方の基板搬送部により前記基板反転装置から搬出されることを特徴とする基板処理装置。 - 基板支持装置であって、
基板の幅方向の両側にて水平姿勢の基板の周縁部に接触して下方から前記基板を支持する一対のガイド部と、
前記一対のガイド部の位置を第1接触位置と第2接触位置との間で切り替えることにより、前記一対のガイド部と前記基板との接触状態を変更する切替機構と、
を備え、
前記一対のガイド部のそれぞれが、
前記第1接触位置において前記基板の周縁部に接触する第1接触領域と、
上下方向および前記幅方向において前記第1接触領域と異なる位置に位置し、前記第2接触位置において前記基板の周縁部に接触する第2接触領域と、
を備え、
前記一対のガイド部のうち一方のガイド部おいて、前記第2接触領域が、前記第1接触領域よりも下側かつ前記幅方向内側に位置し、
前記一対のガイド部のうち他方のガイド部おいて、前記第2接触領域が、前記第1接触領域よりも上側かつ前記幅方向外側に位置し、
前記切替機構が、水平方向に延びる回転軸を中心として前記一対のガイド部を回転することにより、前記一対のガイド部の位置を、前記一対のガイド部の前記第1接触領域が前記上下方向の同じ位置に位置する前記第1接触位置と、前記一対のガイド部の前記第2接触領域が前記上下方向の同じ位置に位置する前記第2接触位置との間で切り替えることを特徴とする基板支持装置。 - 基板支持装置であって、
基板の幅方向の両側にて水平姿勢の基板の周縁部に接触して下方から前記基板を支持する一対のガイド部と、
前記一対のガイド部の位置を第1接触位置と第2接触位置との間で切り替えることにより、前記一対のガイド部と前記基板との接触状態を変更する切替機構と、
を備え、
前記一対のガイド部のそれぞれが、
前記第1接触位置において前記基板の周縁部に接触する第1接触領域と、
上下方向および前記幅方向において前記第1接触領域と異なる位置に位置し、前記第2接触位置において前記基板の周縁部に接触する第2接触領域と、
を備え、
前記一対のガイド部のうち一方のガイド部おいて、前記第2接触領域が、前記第1接触領域よりも下側かつ前記幅方向内側に位置し、
前記一対のガイド部のうち他方のガイド部おいて、前記第2接触領域が、前記第1接触領域よりも上側かつ前記幅方向外側に位置し、
前記切替機構が、前記一方のガイド部に対して前記他方のガイド部を相対的に前記上下方向に移動することにより、前記一対のガイド部の位置を、前記一対のガイド部の前記第1接触領域が前記上下方向の同じ位置に位置する前記第1接触位置と、前記一対のガイド部の前記第2接触領域が前記上下方向の同じ位置に位置する前記第2接触位置との間で切り替えることを特徴とする基板支持装置。 - 基板支持装置であって、
基板の幅方向の両側にて水平姿勢の基板の周縁部に接触して下方から前記基板を支持する一対のガイド部と、
前記一対のガイド部を、前記基板に接触する接触位置と、前記接触位置よりも前記基板から離れた退避位置との間で進退させるガイド移動機構と、
前記接触位置に位置する前記一対のガイド部の位置を第1接触位置と第2接触位置との間で切り替えることにより、前記一対のガイド部と前記基板との接触状態を変更する切替機構と、
を備え、
前記一対のガイド部のそれぞれが、
前記第1接触位置において前記基板の周縁部に接触する第1接触領域と、
上下方向および前記幅方向において前記第1接触領域と異なる位置に位置し、前記第2接触位置において前記基板の周縁部に接触する第2接触領域と、
を備え、
前記切替機構が、前記一対のガイド部を前記ガイド移動機構と共に移動することにより、前記一対のガイド部の位置を前記第1接触位置と前記第2接触位置との間で切り替えることを特徴とする基板支持装置。
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