JP7261280B2 - 表面処理装置及び表面処理方法 - Google Patents
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- JP7261280B2 JP7261280B2 JP2021175917A JP2021175917A JP7261280B2 JP 7261280 B2 JP7261280 B2 JP 7261280B2 JP 2021175917 A JP2021175917 A JP 2021175917A JP 2021175917 A JP2021175917 A JP 2021175917A JP 7261280 B2 JP7261280 B2 JP 7261280B2
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
- B08B5/023—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/04—Cleaning by suction, with or without auxiliary action
- B08B5/043—Cleaning travelling work
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5873—Removal of material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2205/00—Details of machines or methods for cleaning by the use of gas or air flow
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Absorbent Articles And Supports Therefor (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
一実施形態において、前記第1粒子は前記被処理対象のコーティング成分と同一な成分のことで提供されることができる。
10 被洗浄対象
20 汚染物
110 ノズル
120 移動部材
138 ヒーター
140 洗浄粒子貯蔵部材
150 キャリヤーガス供給源
200 制御器
Claims (17)
- 処理空間を提供するチャンバーと、
前記処理空間の内部を排気する排気ラインと、
前記処理空間に提供されて被処理対象を支持する支持部材と、
前記被処理対象に粒子又はガスを超音速に噴出可能に提供されるノズルと、
前記ノズルと前記被処理対象の位置を相対移動させる移動部材と、
前記ノズルに第1粒子を供給するメーン供給ラインと、を含む表面処理装置であって、
前記ノズルに前記ガスを供給するガス供給ラインをさらに含み、
前記第1粒子は、Y 2 O 3 、Al 2 O 3 、YAG、YSZ、及びZr 2 O 3 の中でいずれか1つ以上で提供される表面処理装置。 - 前記第1粒子は、前記被処理対象のコーティング成分と同一であるか、或いは硬度が類似なY 2 O 3 、Al 2 O 3 、YAG、YSZ、又はZr 2 O 3 から選択される成分で提供される請求項1に記載の表面処理装置。
- 前記第1粒子は、原料粒子から顆粒化されて提供されるか、或いはパウダー状態に提供される請求項2に記載の表面処理装置。
- 前記第1粒子は、数μm~100μmのサイズを有する請求項3に記載の表面処理装置。
- 前記第1粒子は、キャリヤーガスと共に供給される請求項1に記載の表面処理装置。
- 前記ガス供給ラインは、前記メーン供給ラインに連結されて提供され、
前記第1粒子は、前記メーン供給ラインと連結された粒子供給ラインを通じて前記メーン供給ラインに供給される請求項1に記載の表面処理装置。 - 制御器をさらに含み、
前記制御器は、
前記ノズルを通じて前記第1粒子を超音速に噴出するように制御する請求項1に記載の表面処理装置。 - 制御器をさらに含み、
前記制御器は、
前記ノズルを通じて前記第1粒子を超音速に噴出するように制御し、前記被処理対象と前記ノズルが相対移動されるように制御して、前記第1粒子と前記被処理対象の表面の汚染物を衝突させて前記汚染物を前記被処理対象の表面から除去し、
その後、前記第1粒子の供給を中断し、前記ノズルから前記ガスを噴出するように制御して前記被処理対象の表面に残留する残留物をブローする請求項6に記載の表面処理装置。 - 制御器をさらに含み、
前記メーン供給ラインは、前記ノズルに前記第1粒子と同一であるか、或いは異なる第2粒子をさらに供給するように提供され、
前記制御器は、
前記ノズルを通じて前記第1粒子を超音速に噴出するように制御し、前記被処理対象と前記ノズルが相対移動されるように制御して、前記第1粒子と前記被処理対象の表面の汚染物を衝突させて前記汚染物を前記被処理対象の表面から除去し、
その後、前記第1粒子の供給を中断し、前記ノズルから前記ガスを噴出するように制御して前記被処理対象の表面に残留する残留物をブローし、
その後、前記ノズルから前記第2粒子を噴出するように制御して前記被処理対象の表面に前記第2粒子をコーティングする請求項1に記載の表面処理装置。 - 前記被処理対象は、ウエハのような基板を処理する装置に提供される部品であり、Y2O3コーティングされたアルミニウム素材である請求項1に記載の表面処理装置。
- ウエハのような基板を処理する装置に提供されて汚染された部品を被処理対象として、請求項1に記載の表面処理装置を用いて前記被処理対象の表面を処理する方法(表面処理方法)であって、
前記被処理対象が提供される雰囲気を真空に形成する段階と、
前記被処理対象の表面の汚染物に第1粒子を超音速に衝突させて前記被処理対象の表面を洗浄する段階と、を含み、
前記第1粒子は、Y 2 O 3 、Al 2 O 3 、YAG、YSZ、及びZr 2 O 3 の中でいずれか1つ以上で提供される表面処理方法。 - 前記第1粒子は、前記被処理対象のコーティング成分と同一であるか、或いは硬度が類似なY 2 O 3 、Al 2 O 3 、YAG、YSZ、又はZr 2 O 3 から選択される成分で提供される請求項11に記載の表面処理方法。
- 前記第1粒子は、原料粒子から顆粒化されて提供されるか、或いはパウダー状態に提供される請求項12に記載の表面処理方法。
- 前記第1粒子は、数μm~100μmのサイズを有する請求項13に記載の表面処理方法。
- 前記第1粒子は、キャリヤーガスと共に供給される請求項11に記載の表面処理方法。
- 前記被処理対象の表面を洗浄する段階の後、
前記第1粒子の供給を中断し、前記被処理対象の洗浄された表面にガスをブローして前記被処理対象の表面に残留する残留物を除去する段階をさらに含む請求項11に記載の表面処理方法。 - 前記被処理対象の表面に残留する残留物を除去する段階の後、
前記第1粒子と同一であるか、或いは異なる第2粒子を前記被処理対象の表面に衝突させて前記被処理対象の表面に前記第2粒子をコーティングする段階をさらに含む請求項16に記載の表面処理方法。
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KR10-2020-0143563 | 2020-10-30 | ||
KR1020200143563A KR102649715B1 (ko) | 2020-10-30 | 2020-10-30 | 표면 처리 장치 및 표면 처리 방법 |
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JP2022074074A JP2022074074A (ja) | 2022-05-17 |
JP7261280B2 true JP7261280B2 (ja) | 2023-04-19 |
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US (1) | US11866819B2 (ja) |
JP (1) | JP7261280B2 (ja) |
KR (1) | KR102649715B1 (ja) |
CN (1) | CN114433561A (ja) |
TW (1) | TWI818336B (ja) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006253629A (ja) | 2005-02-08 | 2006-09-21 | Tokyo Electron Ltd | 基板処理装置,基板処理装置の制御方法,プログラム |
JP2009191323A (ja) | 2008-02-15 | 2009-08-27 | Ulvac Material Kk | スパッタリングターゲットの製造方法、スパッタリングターゲットの洗浄方法、スパッタリングターゲット及びスパッタリング装置 |
US20110104369A1 (en) | 2008-07-24 | 2011-05-05 | Ok Ryul Kim | Apparatus and method for continuous powder coating |
US20110250361A1 (en) | 2010-04-13 | 2011-10-13 | Vijay Mohan M | Apparatus and method for prepping a surface using a coating particle entrained in a continuous or pulsed waterjet or airjet |
JP2012136757A (ja) | 2010-12-27 | 2012-07-19 | Canon Anelva Corp | 真空装置用部品および、それを備えた成膜装置 |
JP2014076426A (ja) | 2012-10-10 | 2014-05-01 | Nhk Spring Co Ltd | 成膜方法及び成膜装置 |
KR101559112B1 (ko) | 2014-05-13 | 2015-10-13 | 주식회사 펨빅스 | 공정부품 표면의 세라믹 코팅막 및 이의 형성방법 |
JP2020141128A (ja) | 2019-02-27 | 2020-09-03 | Toto株式会社 | 半導体製造装置用部材および半導体製造装置用部材を備えた半導体製造装置並びにディスプレイ製造装置 |
Family Cites Families (91)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3212914A (en) * | 1961-05-23 | 1965-10-19 | Union Carbide Corp | Electric pulse coating process and apparatus |
US3745034A (en) * | 1970-08-14 | 1973-07-10 | Nat Steel Corp | Electrostatic coating of metal powder on metal strip |
US4025664A (en) * | 1974-01-02 | 1977-05-24 | Eppco | Container coating method |
US4411935A (en) * | 1981-11-02 | 1983-10-25 | Anderson James Y | Powder flame spraying apparatus and method |
JPH0419070A (ja) | 1990-05-11 | 1992-01-23 | Sony Corp | パウダービームエッチングとデポジションの方法及びその装置 |
CA2055897C (en) * | 1990-11-21 | 1997-08-26 | Larry Sokol | Chamber for applying a thermal spray coating and method of using the same |
US5931721A (en) | 1994-11-07 | 1999-08-03 | Sumitomo Heavy Industries, Ltd. | Aerosol surface processing |
DE19548607A1 (de) * | 1995-12-23 | 1997-06-26 | Gema Volstatic Ag | Pulver-Sprühbeschichtungsvorrichtung |
JPH09299889A (ja) * | 1996-05-09 | 1997-11-25 | Shimada Phys & Chem Ind Co Ltd | 洗浄装置 |
JP3162313B2 (ja) | 1997-01-20 | 2001-04-25 | 工業技術院長 | 薄膜製造方法および薄膜製造装置 |
JPH10223587A (ja) | 1997-01-31 | 1998-08-21 | Shimada Phys & Chem Ind Co Ltd | ウェーハの洗浄装置 |
JP3790627B2 (ja) | 1998-02-13 | 2006-06-28 | 住友重機械工業株式会社 | 表面洗浄方法及び装置 |
JP2963993B1 (ja) * | 1998-07-24 | 1999-10-18 | 工業技術院長 | 超微粒子成膜法 |
US7108894B2 (en) * | 1998-09-30 | 2006-09-19 | Optomec Design Company | Direct Write™ System |
US6368658B1 (en) * | 1999-04-19 | 2002-04-09 | Scimed Life Systems, Inc. | Coating medical devices using air suspension |
US6730349B2 (en) * | 1999-04-19 | 2004-05-04 | Scimed Life Systems, Inc. | Mechanical and acoustical suspension coating of medical implants |
KR100328640B1 (ko) | 1999-06-21 | 2002-03-20 | 오자와 미토시 | 표면세정방법 및 장치 |
KR100469133B1 (ko) | 1999-06-24 | 2005-01-29 | 스미도모쥬기가이고교 가부시키가이샤 | 유체스프레이에 의한 세정방법 및 장치 |
KR100359339B1 (ko) | 1999-12-28 | 2002-11-01 | (주)케이.씨.텍 | 반도체 장비 세정 장치 및 방법 |
WO2002034966A1 (fr) * | 2000-10-23 | 2002-05-02 | National Institute Of Advanced Industrial Science And Technology | Structure composite et procede et appareil destines a sa fabrication |
KR100421038B1 (ko) | 2001-03-28 | 2004-03-03 | 삼성전자주식회사 | 표면으로부터 오염물을 제거하는 세정 장비 및 이를이용한 세정 방법 |
US6915964B2 (en) * | 2001-04-24 | 2005-07-12 | Innovative Technology, Inc. | System and process for solid-state deposition and consolidation of high velocity powder particles using thermal plastic deformation |
US7247338B2 (en) * | 2001-05-16 | 2007-07-24 | Regents Of The University Of Minnesota | Coating medical devices |
EP1402941A4 (en) * | 2001-06-22 | 2009-08-19 | Powrex Kk | DEVICE FOR TREATING POWDER PARTICLES |
US20050199739A1 (en) * | 2002-10-09 | 2005-09-15 | Seiji Kuroda | Method of forming metal coating with hvof spray gun and thermal spray apparatus |
JP2004200476A (ja) * | 2002-12-19 | 2004-07-15 | Canon Inc | 圧電素子の製造方法 |
DE20305947U1 (de) * | 2003-04-11 | 2003-06-18 | Wagner Ag Altstaetten J | Vorrichtung zur Reinigung einer Pulverbeschichtungskabine und Pulverbeschichtungskabine mit Reinigungsvorrichtung |
JP4202856B2 (ja) * | 2003-07-25 | 2008-12-24 | 東京エレクトロン株式会社 | ガス反応装置 |
US20050126476A1 (en) * | 2003-11-05 | 2005-06-16 | Nordson Corporation | Improved particulate material application system |
US7128948B2 (en) * | 2003-10-20 | 2006-10-31 | The Boeing Company | Sprayed preforms for forming structural members |
US7226510B2 (en) * | 2003-10-27 | 2007-06-05 | Fujifilm Corporation | Film forming apparatus |
US8110043B2 (en) | 2004-01-08 | 2012-02-07 | University Of Virginia Patent Foundation | Apparatus and method for applying coatings onto the interior surfaces of components and related structures produced therefrom |
US7488389B2 (en) * | 2004-03-26 | 2009-02-10 | Fujifilm Corporation | Nozzle device, film forming apparatus and method using the same, inorganic electroluminescence device, inkjet head, and ultrasonic transducer array |
US7220456B2 (en) * | 2004-03-31 | 2007-05-22 | Eastman Kodak Company | Process for the selective deposition of particulate material |
US20060040048A1 (en) * | 2004-08-23 | 2006-02-23 | Taeyoung Han | Continuous in-line manufacturing process for high speed coating deposition via a kinetic spray process |
JP3784404B1 (ja) * | 2004-11-24 | 2006-06-14 | 株式会社神戸製鋼所 | 溶射ノズル装置およびそれを用いた溶射装置 |
JP4664054B2 (ja) * | 2004-12-09 | 2011-04-06 | 富士フイルム株式会社 | 成膜装置 |
JP2007016288A (ja) * | 2005-07-08 | 2007-01-25 | Toyota Motor Corp | 軸受材被覆摺動部材の製造方法及び軸受材被覆摺動部材 |
JP4813115B2 (ja) * | 2005-07-14 | 2011-11-09 | 国立大学法人東北大学 | 半導体製造装置用部材及びその洗浄方法 |
EP1757373B1 (en) * | 2005-08-24 | 2012-04-11 | Brother Kogyo Kabushiki Kaisha | Film forming apparatus, film forming method and method for manufacturing piezoelectric actuator |
US7954448B2 (en) * | 2005-08-24 | 2011-06-07 | Brother Kogyo Kabushiki Kaisha | Film forming apparatus and method of film formation |
JP4120991B2 (ja) | 2005-09-05 | 2008-07-16 | 福岡県 | 洗浄ノズル及びそれを用いた洗浄方法 |
DE102005060754A1 (de) * | 2005-12-16 | 2007-07-05 | Kronotec Ag | Verfahren und Anlage zum Aufbringen fester Partikel auf ein Substrat |
WO2007089881A2 (en) * | 2006-01-31 | 2007-08-09 | Regents Of The University Of Minnesota | Electrospray coating of objects |
US9248217B2 (en) * | 2006-01-31 | 2016-02-02 | Nanocopocia, LLC | Nanoparticle coating of surfaces |
US20070190261A1 (en) * | 2006-02-10 | 2007-08-16 | Ronald Darnell | Overspray apparatus and process |
JP5159634B2 (ja) * | 2006-12-07 | 2013-03-06 | 独立行政法人物質・材料研究機構 | ウォームスプレーコーティング方法とその粒子 |
JP4586823B2 (ja) * | 2007-06-21 | 2010-11-24 | トヨタ自動車株式会社 | 成膜方法、伝熱部材、パワーモジュール、車両用インバータ、及び車両 |
US8636846B2 (en) * | 2007-06-29 | 2014-01-28 | Brother Kogyo Kabushiki Kaisha | Aerosol-generating apparatus, film-forming apparatus, and aerosol-generating method |
JP5293989B2 (ja) * | 2007-07-24 | 2013-09-18 | ノードソン株式会社 | 少量液体の噴霧装置 |
DE102007040154A1 (de) * | 2007-08-24 | 2009-05-07 | Dürr Systems GmbH | Verfahren zur Versorgung einer Beschichtungsanlage mit einem partikelförmigen Hilfsmaterial |
KR20090050707A (ko) | 2007-11-16 | 2009-05-20 | 포항공과대학교 산학협력단 | 초음속 노즐을 이용한 나노입자 세정장치 및 그 세정방법 |
US8349398B2 (en) * | 2008-06-02 | 2013-01-08 | Samsung Electro-Mechanics Co., Ltd. | Normal pressure aerosol spray apparatus and method of forming a film using the same |
KR101038187B1 (ko) * | 2008-11-05 | 2011-06-01 | 주식회사 펨빅스 | 온도조절장치가 구비된 고상파우더 진공증착장치 및 고상파우더 진공증착방법 |
CN102131951A (zh) * | 2008-07-28 | 2011-07-20 | 多摩-技术转让机关株式会社 | 物理气相沉积装置及物理气相沉积方法 |
US8246903B2 (en) * | 2008-09-09 | 2012-08-21 | H.C. Starck Inc. | Dynamic dehydriding of refractory metal powders |
US8192799B2 (en) * | 2008-12-03 | 2012-06-05 | Asb Industries, Inc. | Spray nozzle assembly for gas dynamic cold spray and method of coating a substrate with a high temperature coating |
JP2010192673A (ja) * | 2009-02-18 | 2010-09-02 | Tokyo Electron Ltd | 基板洗浄方法、基板洗浄装置、制御プログラム及びコンピュータ読取可能な記憶媒体 |
WO2011044451A2 (en) * | 2009-10-09 | 2011-04-14 | Applied Materials, Inc. | Multi-gas centrally cooled showerhead design |
CN102189753B (zh) * | 2010-03-15 | 2015-03-18 | 海德堡印刷机械股份公司 | 用于对印刷页张撒布粉末的设备 |
US8795762B2 (en) * | 2010-03-26 | 2014-08-05 | Battelle Memorial Institute | System and method for enhanced electrostatic deposition and surface coatings |
JP5186528B2 (ja) * | 2010-04-23 | 2013-04-17 | 日本発條株式会社 | 導電部材及びその製造方法 |
JP5162621B2 (ja) * | 2010-05-07 | 2013-03-13 | 日本発條株式会社 | 温度調節装置、冷却装置、及び温度調節装置の製造方法 |
JP5666167B2 (ja) * | 2010-05-07 | 2015-02-12 | 日本発條株式会社 | ステージヒータ及びシャフトの製造方法 |
JP5463224B2 (ja) * | 2010-07-09 | 2014-04-09 | 日本発條株式会社 | 流路付きプレートの製造方法、流路付きプレート、温度調節プレート、コールドプレート、及びシャワープレート |
CN103180490A (zh) * | 2010-11-02 | 2013-06-26 | 日本碍子株式会社 | 晶体制造方法 |
JP5191527B2 (ja) * | 2010-11-19 | 2013-05-08 | 日本発條株式会社 | 積層体および積層体の製造方法 |
JP5815967B2 (ja) | 2011-03-31 | 2015-11-17 | 東京エレクトロン株式会社 | 基板洗浄装置及び真空処理システム |
JP5712054B2 (ja) * | 2011-05-31 | 2015-05-07 | 日本発條株式会社 | シャフト付きヒータユニットおよびシャフト付きヒータユニットの製造方法 |
JP5548167B2 (ja) * | 2011-07-11 | 2014-07-16 | 日本発條株式会社 | 積層体及び積層体の製造方法 |
US9555473B2 (en) * | 2011-10-08 | 2017-01-31 | The Boeing Company | System and method for increasing the bulk density of metal powder |
GB201118698D0 (en) * | 2011-10-28 | 2011-12-14 | Laser Fusion Technologies Ltd | Deposition of coatings on subtrates |
US20130126773A1 (en) * | 2011-11-17 | 2013-05-23 | General Electric Company | Coating methods and coated articles |
JP5840959B2 (ja) * | 2012-01-16 | 2016-01-06 | エムテックスマート株式会社 | 塗布方法及び装置 |
KR101439168B1 (ko) | 2012-09-19 | 2014-09-12 | 우범제 | 웨이퍼 상에 잔존하는 공정가스를 제거하는 웨이퍼 퍼징 카세트를 갖춘 웨이퍼 처리장치 |
WO2014149141A1 (en) * | 2013-03-15 | 2014-09-25 | Aeromet Technologies, Inc. | Methods and apparatus for depositing protective coatings and components coated thereby |
WO2015005705A1 (ko) * | 2013-07-11 | 2015-01-15 | (주)펨빅스 | 고상파우더 코팅장치 및 코팅방법 |
US20160184967A1 (en) | 2013-08-13 | 2016-06-30 | Youtec Co., Ltd. | Nozzle, cleaning device, and cleaning method |
US9321087B2 (en) | 2013-09-10 | 2016-04-26 | TFL FSI, Inc. | Apparatus and method for scanning an object through a fluid spray |
US9433957B2 (en) * | 2014-01-08 | 2016-09-06 | United Technologies Corporation | Cold spray systems with in-situ powder manufacturing |
JP2017522446A (ja) * | 2014-04-15 | 2017-08-10 | コモンウェルス サイエンティフィック アンド インダストリアル リサーチ オーガナイゼーション | コールドスプレーを用いてプリフォームを生産するための製法 |
JP6511858B2 (ja) * | 2015-02-27 | 2019-05-15 | シンフォニアテクノロジー株式会社 | 搬送室 |
KR101916872B1 (ko) * | 2015-10-15 | 2018-11-08 | 아이원스 주식회사 | 반도체 공정 장비 부품의 코팅층 재생 방법 및 이에 따른 반도체 공정 장비 부품 |
JP6442622B2 (ja) | 2015-11-30 | 2018-12-19 | 東京エレクトロン株式会社 | 基板処理装置のチャンバークリーニング方法 |
US11761075B2 (en) | 2015-12-07 | 2023-09-19 | Tokyo Electron Limited | Substrate cleaning apparatus |
US10328441B2 (en) * | 2016-04-29 | 2019-06-25 | Semes Co., Ltd. | Nozzle unit and coating apparatus including the same |
US20180311707A1 (en) | 2017-05-01 | 2018-11-01 | Lam Research Corporation | In situ clean using high vapor pressure aerosols |
KR102054428B1 (ko) * | 2017-05-19 | 2019-12-10 | 한국에너지기술연구원 | 촉매 제조장치 및 시스템 |
CN109844170A (zh) | 2017-09-25 | 2019-06-04 | 应用材料公司 | 用于清洁真空腔室的系统、用于清洁真空腔室的方法以及用于清洁真空腔室的压缩机的用途 |
PL3552715T3 (pl) * | 2018-04-12 | 2021-08-30 | Wagner International Ag | Instalacja powlekania proszkowego ze sprzęgłem i sposób czyszczenia instalacji powlekania proszkowego |
WO2020110858A1 (ja) | 2018-11-30 | 2020-06-04 | 東京エレクトロン株式会社 | 基板洗浄方法、処理容器洗浄方法、および基板処理装置 |
-
2020
- 2020-10-30 KR KR1020200143563A patent/KR102649715B1/ko active IP Right Grant
-
2021
- 2021-10-22 TW TW110139257A patent/TWI818336B/zh active
- 2021-10-26 US US17/510,712 patent/US11866819B2/en active Active
- 2021-10-27 JP JP2021175917A patent/JP7261280B2/ja active Active
- 2021-10-29 CN CN202111271116.5A patent/CN114433561A/zh active Pending
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006253629A (ja) | 2005-02-08 | 2006-09-21 | Tokyo Electron Ltd | 基板処理装置,基板処理装置の制御方法,プログラム |
JP2009191323A (ja) | 2008-02-15 | 2009-08-27 | Ulvac Material Kk | スパッタリングターゲットの製造方法、スパッタリングターゲットの洗浄方法、スパッタリングターゲット及びスパッタリング装置 |
US20110104369A1 (en) | 2008-07-24 | 2011-05-05 | Ok Ryul Kim | Apparatus and method for continuous powder coating |
US20110250361A1 (en) | 2010-04-13 | 2011-10-13 | Vijay Mohan M | Apparatus and method for prepping a surface using a coating particle entrained in a continuous or pulsed waterjet or airjet |
JP2012136757A (ja) | 2010-12-27 | 2012-07-19 | Canon Anelva Corp | 真空装置用部品および、それを備えた成膜装置 |
JP2014076426A (ja) | 2012-10-10 | 2014-05-01 | Nhk Spring Co Ltd | 成膜方法及び成膜装置 |
KR101559112B1 (ko) | 2014-05-13 | 2015-10-13 | 주식회사 펨빅스 | 공정부품 표면의 세라믹 코팅막 및 이의 형성방법 |
JP2020141128A (ja) | 2019-02-27 | 2020-09-03 | Toto株式会社 | 半導体製造装置用部材および半導体製造装置用部材を備えた半導体製造装置並びにディスプレイ製造装置 |
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US11866819B2 (en) | 2024-01-09 |
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