JP7175316B2 - フォトレジストリムーバ組成物 - Google Patents

フォトレジストリムーバ組成物 Download PDF

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Publication number
JP7175316B2
JP7175316B2 JP2020539825A JP2020539825A JP7175316B2 JP 7175316 B2 JP7175316 B2 JP 7175316B2 JP 2020539825 A JP2020539825 A JP 2020539825A JP 2020539825 A JP2020539825 A JP 2020539825A JP 7175316 B2 JP7175316 B2 JP 7175316B2
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Japan
Prior art keywords
organic solvent
solvent component
mixture
component
weight
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JP2020539825A
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English (en)
Japanese (ja)
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JP2021511419A5 (enExample
JP2021511419A (ja
Inventor
アレント・ローベルト
ウー・ヘンペン
リン・グァンヤン
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Merck Patent GmbH
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Merck Patent GmbH
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Publication of JP2021511419A publication Critical patent/JP2021511419A/ja
Publication of JP2021511419A5 publication Critical patent/JP2021511419A5/ja
Priority to JP2022151512A priority Critical patent/JP2022191267A/ja
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Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/20Organic compounds containing oxygen
    • C11D3/2068Ethers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • G03F7/422Stripping or agents therefor using liquids only
    • G03F7/425Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/08Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/02Anionic compounds
    • C11D1/12Sulfonic acids or sulfuric acid esters; Salts thereof
    • C11D1/22Sulfonic acids or sulfuric acid esters; Salts thereof derived from aromatic compounds
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66Non-ionic compounds
    • C11D1/72Ethers of polyoxyalkylene glycols
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66Non-ionic compounds
    • C11D1/72Ethers of polyoxyalkylene glycols
    • C11D1/721End blocked ethers
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66Non-ionic compounds
    • C11D1/83Mixtures of non-ionic with anionic compounds
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/20Organic compounds containing oxygen
    • C11D3/2075Carboxylic acids-salts thereof
    • C11D3/2082Polycarboxylic acids-salts thereof
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/34Organic compounds containing sulfur
    • C11D3/3454Organic compounds containing sulfur containing sulfone groups, e.g. vinyl sulfones
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/43Solvents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • G03F7/422Stripping or agents therefor using liquids only
    • G03F7/426Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/007Heating the liquid
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10Objects to be cleaned
    • C11D2111/14Hard surfaces
    • C11D2111/22Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • General Chemical & Material Sciences (AREA)
  • Detergent Compositions (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2020539825A 2018-01-25 2019-01-23 フォトレジストリムーバ組成物 Active JP7175316B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022151512A JP2022191267A (ja) 2018-01-25 2022-09-22 フォトレジストリムーバ組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862621760P 2018-01-25 2018-01-25
US62/621,760 2018-01-25
PCT/EP2019/051534 WO2019145312A1 (en) 2018-01-25 2019-01-23 Photoresist remover compositions

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022151512A Division JP2022191267A (ja) 2018-01-25 2022-09-22 フォトレジストリムーバ組成物

Publications (3)

Publication Number Publication Date
JP2021511419A JP2021511419A (ja) 2021-05-06
JP2021511419A5 JP2021511419A5 (enExample) 2022-01-11
JP7175316B2 true JP7175316B2 (ja) 2022-11-18

Family

ID=65228539

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2020539825A Active JP7175316B2 (ja) 2018-01-25 2019-01-23 フォトレジストリムーバ組成物
JP2022151512A Pending JP2022191267A (ja) 2018-01-25 2022-09-22 フォトレジストリムーバ組成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2022151512A Pending JP2022191267A (ja) 2018-01-25 2022-09-22 フォトレジストリムーバ組成物

Country Status (8)

Country Link
US (1) US11365379B2 (enExample)
EP (1) EP3743773B1 (enExample)
JP (2) JP7175316B2 (enExample)
KR (1) KR102448220B1 (enExample)
CN (1) CN111512239B (enExample)
SG (1) SG11202004420QA (enExample)
TW (1) TWI838356B (enExample)
WO (1) WO2019145312A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102691177B1 (ko) * 2018-01-25 2024-08-01 메르크 파텐트 게엠베하 포토레지스트 리무버 조성물
KR102448220B1 (ko) 2018-01-25 2022-09-27 메르크 파텐트 게엠베하 포토레지스트 제거제 조성물
CN115820344B (zh) * 2022-12-05 2024-06-18 四川大学 一种环保型强酸性化学清洗剂及其应用
KR102781373B1 (ko) * 2023-01-17 2025-03-17 재원산업 주식회사 전착도장용 현상액

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JP2006011433A (ja) 2004-06-21 2006-01-12 Dongjin Semichem Co Ltd レジスト除去用組成物
JP2010002580A (ja) 2008-06-19 2010-01-07 Tosoh Corp レジスト剥離液

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Patent Citations (2)

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Publication number Priority date Publication date Assignee Title
JP2006011433A (ja) 2004-06-21 2006-01-12 Dongjin Semichem Co Ltd レジスト除去用組成物
JP2010002580A (ja) 2008-06-19 2010-01-07 Tosoh Corp レジスト剥離液

Also Published As

Publication number Publication date
US20210115362A1 (en) 2021-04-22
TW201934736A (zh) 2019-09-01
JP2022191267A (ja) 2022-12-27
EP3743773A1 (en) 2020-12-02
JP2021511419A (ja) 2021-05-06
CN111512239B (zh) 2024-05-03
US11365379B2 (en) 2022-06-21
KR20200110429A (ko) 2020-09-23
KR102448220B1 (ko) 2022-09-27
TWI838356B (zh) 2024-04-11
WO2019145312A1 (en) 2019-08-01
CN111512239A (zh) 2020-08-07
EP3743773B1 (en) 2022-04-06
SG11202004420QA (en) 2020-06-29

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