CN111512239B - 光致抗蚀剂去除剂组合物 - Google Patents
光致抗蚀剂去除剂组合物 Download PDFInfo
- Publication number
- CN111512239B CN111512239B CN201980006788.8A CN201980006788A CN111512239B CN 111512239 B CN111512239 B CN 111512239B CN 201980006788 A CN201980006788 A CN 201980006788A CN 111512239 B CN111512239 B CN 111512239B
- Authority
- CN
- China
- Prior art keywords
- organic solvent
- composition according
- solvent component
- component
- mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2068—Ethers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/02—Anionic compounds
- C11D1/12—Sulfonic acids or sulfuric acid esters; Salts thereof
- C11D1/22—Sulfonic acids or sulfuric acid esters; Salts thereof derived from aromatic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/72—Ethers of polyoxyalkylene glycols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/72—Ethers of polyoxyalkylene glycols
- C11D1/721—End blocked ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/83—Mixtures of non-ionic with anionic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2075—Carboxylic acids-salts thereof
- C11D3/2082—Polycarboxylic acids-salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/34—Organic compounds containing sulfur
- C11D3/3454—Organic compounds containing sulfur containing sulfone groups, e.g. vinyl sulfones
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/007—Heating the liquid
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Emergency Medicine (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Detergent Compositions (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862621760P | 2018-01-25 | 2018-01-25 | |
| US62/621,760 | 2018-01-25 | ||
| PCT/EP2019/051534 WO2019145312A1 (en) | 2018-01-25 | 2019-01-23 | Photoresist remover compositions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111512239A CN111512239A (zh) | 2020-08-07 |
| CN111512239B true CN111512239B (zh) | 2024-05-03 |
Family
ID=65228539
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201980006788.8A Active CN111512239B (zh) | 2018-01-25 | 2019-01-23 | 光致抗蚀剂去除剂组合物 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11365379B2 (enExample) |
| EP (1) | EP3743773B1 (enExample) |
| JP (2) | JP7175316B2 (enExample) |
| KR (1) | KR102448220B1 (enExample) |
| CN (1) | CN111512239B (enExample) |
| SG (1) | SG11202004420QA (enExample) |
| TW (1) | TWI838356B (enExample) |
| WO (1) | WO2019145312A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102691177B1 (ko) * | 2018-01-25 | 2024-08-01 | 메르크 파텐트 게엠베하 | 포토레지스트 리무버 조성물 |
| EP3743773B1 (en) | 2018-01-25 | 2022-04-06 | Merck Patent GmbH | Photoresist remover compositions |
| CN115820344B (zh) * | 2022-12-05 | 2024-06-18 | 四川大学 | 一种环保型强酸性化学清洗剂及其应用 |
| KR102781373B1 (ko) * | 2023-01-17 | 2025-03-17 | 재원산업 주식회사 | 전착도장용 현상액 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1713077A (zh) * | 2004-06-21 | 2005-12-28 | 东进世美肯株式会社 | 用于去除(光致)抗蚀剂的组合物 |
| CN107406697A (zh) * | 2015-03-12 | 2017-11-28 | Az电子材料卢森堡有限公司 | 在低pka驱动的聚合物剥离过程中促进电荷络合铜保护的组合物和方法 |
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| FR2455076A1 (fr) | 1979-04-24 | 1980-11-21 | Rhone Poulenc Ind | Composition pour l'elimination des resines photoresistantes |
| US4971715A (en) | 1988-11-18 | 1990-11-20 | International Business Machines Corporation | Phenolic-free stripping composition and use thereof |
| US5885901A (en) | 1994-08-11 | 1999-03-23 | Texas Instruments Incorporated | Rinsing solution after resist stripping process and method for manufacturing semiconductor device |
| US6323168B1 (en) | 1996-07-03 | 2001-11-27 | Advanced Technology Materials, Inc. | Post plasma ashing wafer cleaning formulation |
| JPH1055993A (ja) * | 1996-08-09 | 1998-02-24 | Hitachi Ltd | 半導体素子製造用洗浄液及びそれを用いた半導体素子の製造方法 |
| US6231677B1 (en) | 1998-02-27 | 2001-05-15 | Kanto Kagaku Kabushiki Kaisha | Photoresist stripping liquid composition |
| KR100538501B1 (ko) * | 1999-08-16 | 2005-12-23 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 신규한 오늄염, 레지스트 재료용 광산발생제, 레지스트재료 및 패턴 형성 방법 |
| US6486108B1 (en) | 2000-05-31 | 2002-11-26 | Micron Technology, Inc. | Cleaning composition useful in semiconductor integrated circuit fabrication |
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| US6699825B2 (en) | 2001-01-12 | 2004-03-02 | S.C. Johnson & Son, Inc. | Acidic hard-surface antimicrobial cleaner |
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| JP3787085B2 (ja) | 2001-12-04 | 2006-06-21 | 関東化学株式会社 | フォトレジスト残渣除去液組成物 |
| TWI284783B (en) * | 2003-05-08 | 2007-08-01 | Du Pont | Photoresist compositions and processes for preparing the same |
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| KR102247235B1 (ko) | 2015-01-26 | 2021-05-03 | 동우 화인켐 주식회사 | 티타늄막 식각액 조성물 |
| KR102637508B1 (ko) * | 2015-08-03 | 2024-02-15 | 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. | 세정 조성물 |
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| CN110249041A (zh) * | 2017-02-10 | 2019-09-17 | 富士胶片电子材料美国有限公司 | 清洗制剂 |
| WO2018175222A1 (en) * | 2017-03-24 | 2018-09-27 | Fujifilm Electronic Materials U.S.A., Inc. | Cleaning compositions for removing residues on semiconductor substrates |
| EP3743773B1 (en) | 2018-01-25 | 2022-04-06 | Merck Patent GmbH | Photoresist remover compositions |
-
2019
- 2019-01-23 EP EP19701617.3A patent/EP3743773B1/en active Active
- 2019-01-23 US US16/961,821 patent/US11365379B2/en active Active
- 2019-01-23 TW TW108102463A patent/TWI838356B/zh active
- 2019-01-23 JP JP2020539825A patent/JP7175316B2/ja active Active
- 2019-01-23 KR KR1020207024408A patent/KR102448220B1/ko active Active
- 2019-01-23 CN CN201980006788.8A patent/CN111512239B/zh active Active
- 2019-01-23 SG SG11202004420QA patent/SG11202004420QA/en unknown
- 2019-01-23 WO PCT/EP2019/051534 patent/WO2019145312A1/en not_active Ceased
-
2022
- 2022-09-22 JP JP2022151512A patent/JP2022191267A/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1713077A (zh) * | 2004-06-21 | 2005-12-28 | 东进世美肯株式会社 | 用于去除(光致)抗蚀剂的组合物 |
| CN107406697A (zh) * | 2015-03-12 | 2017-11-28 | Az电子材料卢森堡有限公司 | 在低pka驱动的聚合物剥离过程中促进电荷络合铜保护的组合物和方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP3743773A1 (en) | 2020-12-02 |
| KR20200110429A (ko) | 2020-09-23 |
| JP2022191267A (ja) | 2022-12-27 |
| EP3743773B1 (en) | 2022-04-06 |
| JP7175316B2 (ja) | 2022-11-18 |
| CN111512239A (zh) | 2020-08-07 |
| TW201934736A (zh) | 2019-09-01 |
| KR102448220B1 (ko) | 2022-09-27 |
| WO2019145312A1 (en) | 2019-08-01 |
| TWI838356B (zh) | 2024-04-11 |
| SG11202004420QA (en) | 2020-06-29 |
| US20210115362A1 (en) | 2021-04-22 |
| JP2021511419A (ja) | 2021-05-06 |
| US11365379B2 (en) | 2022-06-21 |
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