FR2455076A1 - Composition pour l'elimination des resines photoresistantes - Google Patents

Composition pour l'elimination des resines photoresistantes

Info

Publication number
FR2455076A1
FR2455076A1 FR7910291A FR7910291A FR2455076A1 FR 2455076 A1 FR2455076 A1 FR 2455076A1 FR 7910291 A FR7910291 A FR 7910291A FR 7910291 A FR7910291 A FR 7910291A FR 2455076 A1 FR2455076 A1 FR 2455076A1
Authority
FR
France
Prior art keywords
cyclohexanone
compsn
hydro
naphthalene
organic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7910291A
Other languages
English (en)
Other versions
FR2455076B1 (fr
Inventor
Michel Peignier
Marcel Hucleux
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rhone Poulenc Industries SA
Original Assignee
Rhone Poulenc Industries SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rhone Poulenc Industries SA filed Critical Rhone Poulenc Industries SA
Priority to FR7910291A priority Critical patent/FR2455076A1/fr
Publication of FR2455076A1 publication Critical patent/FR2455076A1/fr
Application granted granted Critical
Publication of FR2455076B1 publication Critical patent/FR2455076B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Detergent Compositions (AREA)

Abstract

COMPOSITION POUR L'ELIMINATION DES RESINES PHOTORESISTANTES DEPOSEES SUR UN SUPPORT POUR PROTEGER UN CIRCUIT CONDUCTEUR GRAVE DANS CERTAINES PHASES DE SA FABRICATION. CES COMPOSITIONS COMPRENNENT DE LA TETRALINE ETOU DE LA CYCLOHEXANONE ET, DE PREFERENCE, UN COMPOSE A CARACTERE ACIDE. CES COMPOSITIONS SONT DESTINEES A L'ELIMINATION DE RESINES PHOTOPOLYMERISEES ET UTILISEES, EN PARTICULIER, DANS L'INDUSTRIE ELECTRONIQUE.
FR7910291A 1979-04-24 1979-04-24 Composition pour l'elimination des resines photoresistantes Granted FR2455076A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7910291A FR2455076A1 (fr) 1979-04-24 1979-04-24 Composition pour l'elimination des resines photoresistantes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7910291A FR2455076A1 (fr) 1979-04-24 1979-04-24 Composition pour l'elimination des resines photoresistantes

Publications (2)

Publication Number Publication Date
FR2455076A1 true FR2455076A1 (fr) 1980-11-21
FR2455076B1 FR2455076B1 (fr) 1983-02-18

Family

ID=9224638

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7910291A Granted FR2455076A1 (fr) 1979-04-24 1979-04-24 Composition pour l'elimination des resines photoresistantes

Country Status (1)

Country Link
FR (1) FR2455076A1 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0365988A2 (fr) * 1988-10-26 1990-05-02 E.I. Du Pont De Nemours & Company Incorporated Solvant pour le développement de couches réticulées par photopolymérisation et procédé de fabrication de formes en relief
US5312719A (en) * 1988-10-26 1994-05-17 E. I. Du Pont De Nemours And Company Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms
US5374500A (en) * 1993-04-02 1994-12-20 International Business Machines Corporation Positive photoresist composition containing photoacid generator and use thereof
EP0939344A1 (fr) * 1998-02-27 1999-09-01 Kanto Kagaku Kabushiki Kaisha Composition liquide pour le décapage de films de photoréserves
US11365379B2 (en) 2018-01-25 2022-06-21 Merck Patent Gmbh Photoresist remover compositions

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1419726A (fr) * 1963-10-04 1965-12-03 Kalle Ag Solutions détersives pour formes d'imprimerie planes
FR2021696A1 (en) * 1968-10-28 1970-07-24 Eastman Kodak Co Developing solution for use in photomechani- - cal process for removing support of hardened
FR2072172A5 (fr) * 1969-12-23 1971-09-24 Ibm
US4078102A (en) * 1976-10-29 1978-03-07 International Business Machines Corporation Process for stripping resist layers from substrates

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1419726A (fr) * 1963-10-04 1965-12-03 Kalle Ag Solutions détersives pour formes d'imprimerie planes
FR2021696A1 (en) * 1968-10-28 1970-07-24 Eastman Kodak Co Developing solution for use in photomechani- - cal process for removing support of hardened
FR2072172A5 (fr) * 1969-12-23 1971-09-24 Ibm
US4078102A (en) * 1976-10-29 1978-03-07 International Business Machines Corporation Process for stripping resist layers from substrates

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0365988A2 (fr) * 1988-10-26 1990-05-02 E.I. Du Pont De Nemours & Company Incorporated Solvant pour le développement de couches réticulées par photopolymérisation et procédé de fabrication de formes en relief
EP0365988A3 (en) * 1988-10-26 1990-12-12 Hoechst Aktiengesellschaft Developing solvent for layers which are crosslinkable by photopolymerization, and process for the production of relief printing forms
US5312719A (en) * 1988-10-26 1994-05-17 E. I. Du Pont De Nemours And Company Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms
US5516623A (en) * 1988-10-26 1996-05-14 E. I. Du Pont De Nemours And Company Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms
US5374500A (en) * 1993-04-02 1994-12-20 International Business Machines Corporation Positive photoresist composition containing photoacid generator and use thereof
EP0939344A1 (fr) * 1998-02-27 1999-09-01 Kanto Kagaku Kabushiki Kaisha Composition liquide pour le décapage de films de photoréserves
US6231677B1 (en) 1998-02-27 2001-05-15 Kanto Kagaku Kabushiki Kaisha Photoresist stripping liquid composition
US11365379B2 (en) 2018-01-25 2022-06-21 Merck Patent Gmbh Photoresist remover compositions

Also Published As

Publication number Publication date
FR2455076B1 (fr) 1983-02-18

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Legal Events

Date Code Title Description
ST Notification of lapse