JP7129793B2 - 接合装置 - Google Patents
接合装置 Download PDFInfo
- Publication number
- JP7129793B2 JP7129793B2 JP2018040056A JP2018040056A JP7129793B2 JP 7129793 B2 JP7129793 B2 JP 7129793B2 JP 2018040056 A JP2018040056 A JP 2018040056A JP 2018040056 A JP2018040056 A JP 2018040056A JP 7129793 B2 JP7129793 B2 JP 7129793B2
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- Prior art keywords
- chip
- bonding
- cleaning
- section
- joining
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- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Wire Bonding (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018040056A JP7129793B2 (ja) | 2018-03-06 | 2018-03-06 | 接合装置 |
| TW108106928A TWI727271B (zh) | 2018-03-06 | 2019-02-27 | 接合裝置 |
| CN201910163642.6A CN110233121B (zh) | 2018-03-06 | 2019-03-05 | 接合装置 |
| US16/294,167 US11145618B2 (en) | 2018-03-06 | 2019-03-06 | Bonding equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018040056A JP7129793B2 (ja) | 2018-03-06 | 2018-03-06 | 接合装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019153761A JP2019153761A (ja) | 2019-09-12 |
| JP2019153761A5 JP2019153761A5 (enExample) | 2020-12-03 |
| JP7129793B2 true JP7129793B2 (ja) | 2022-09-02 |
Family
ID=67843465
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018040056A Active JP7129793B2 (ja) | 2018-03-06 | 2018-03-06 | 接合装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US11145618B2 (enExample) |
| JP (1) | JP7129793B2 (enExample) |
| CN (1) | CN110233121B (enExample) |
| TW (1) | TWI727271B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11205633B2 (en) * | 2019-01-09 | 2021-12-21 | Kulicke And Soffa Industries, Inc. | Methods of bonding of semiconductor elements to substrates, and related bonding systems |
| TWI797461B (zh) * | 2019-07-26 | 2023-04-01 | 日商新川股份有限公司 | 封裝裝置 |
| US11935771B2 (en) | 2021-02-17 | 2024-03-19 | Applied Materials, Inc. | Modular mainframe layout for supporting multiple semiconductor process modules or chambers |
| US11935770B2 (en) | 2021-02-17 | 2024-03-19 | Applied Materials, Inc. | Modular mainframe layout for supporting multiple semiconductor process modules or chambers |
| JP2023068932A (ja) * | 2021-11-04 | 2023-05-18 | 信越ポリマー株式会社 | 粘着性保持治具の洗浄方法 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002252251A (ja) | 2001-02-22 | 2002-09-06 | Sony Corp | 半導体チップの実装装置及び実装方法 |
| WO2004030078A1 (ja) | 2002-09-26 | 2004-04-08 | Toray Engineering Co., Ltd. | 接合装置 |
| JP2006086418A (ja) | 2004-09-17 | 2006-03-30 | Matsushita Electric Ind Co Ltd | ボンディング装置及び方法、並びに電子部品洗浄装置 |
| JP2006310442A (ja) | 2005-04-27 | 2006-11-09 | Matsushita Electric Ind Co Ltd | ボンディング装置及び方法 |
| WO2008065926A1 (en) | 2006-11-28 | 2008-06-05 | Panasonic Corporation | Electronic component mounting structure and method for manufacturing the same |
| JP2008211196A (ja) | 2007-01-31 | 2008-09-11 | Tokyo Electron Ltd | 基板処理装置およびパーティクル付着防止方法 |
| JP2016072381A (ja) | 2014-09-29 | 2016-05-09 | ファスフォードテクノロジ株式会社 | 半導体若しくは電子部品実装装置及び半導体若しくは電子部品実装方法 |
Family Cites Families (8)
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|---|---|---|---|---|
| TW353137B (en) * | 1996-03-28 | 1999-02-21 | Matsushita Electric Industrial Co Ltd | Manufacturing apparatus with cleaning mechanism and cleaning method |
| CN100470767C (zh) * | 2004-03-26 | 2009-03-18 | 富士胶片株式会社 | 接合衬底的装置及方法 |
| US8387674B2 (en) * | 2007-11-30 | 2013-03-05 | Taiwan Semiconductor Manufacturing Comany, Ltd. | Chip on wafer bonder |
| JP5478565B2 (ja) * | 2011-07-15 | 2014-04-23 | 東京エレクトロン株式会社 | 接合システム |
| WO2013161891A1 (ja) | 2012-04-24 | 2013-10-31 | ボンドテック株式会社 | チップオンウエハ接合方法及び接合装置並びにチップとウエハとを含む構造体 |
| CN105637626A (zh) * | 2013-08-14 | 2016-06-01 | 豪锐恩科技私人有限公司 | 用于将多个半导体芯片结合到基板上的装置和方法 |
| US10910248B2 (en) | 2016-01-06 | 2021-02-02 | Shinkawa Ltd. | Electronic component mounting apparatus |
| JP6389988B2 (ja) * | 2016-06-14 | 2018-09-19 | 株式会社新川 | 異物除去装置 |
-
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Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002252251A (ja) | 2001-02-22 | 2002-09-06 | Sony Corp | 半導体チップの実装装置及び実装方法 |
| WO2004030078A1 (ja) | 2002-09-26 | 2004-04-08 | Toray Engineering Co., Ltd. | 接合装置 |
| JP2006086418A (ja) | 2004-09-17 | 2006-03-30 | Matsushita Electric Ind Co Ltd | ボンディング装置及び方法、並びに電子部品洗浄装置 |
| JP2006310442A (ja) | 2005-04-27 | 2006-11-09 | Matsushita Electric Ind Co Ltd | ボンディング装置及び方法 |
| WO2008065926A1 (en) | 2006-11-28 | 2008-06-05 | Panasonic Corporation | Electronic component mounting structure and method for manufacturing the same |
| JP2008211196A (ja) | 2007-01-31 | 2008-09-11 | Tokyo Electron Ltd | 基板処理装置およびパーティクル付着防止方法 |
| JP2016072381A (ja) | 2014-09-29 | 2016-05-09 | ファスフォードテクノロジ株式会社 | 半導体若しくは電子部品実装装置及び半導体若しくは電子部品実装方法 |
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| JP2019153761A (ja) | 2019-09-12 |
| TW201939629A (zh) | 2019-10-01 |
| CN110233121B (zh) | 2023-04-07 |
| TWI727271B (zh) | 2021-05-11 |
| CN110233121A (zh) | 2019-09-13 |
| US11145618B2 (en) | 2021-10-12 |
| US20190279956A1 (en) | 2019-09-12 |
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