JP7017270B2 - バインダー樹脂及びこれを含む感光性樹脂組成物またはコーティング溶液 - Google Patents

バインダー樹脂及びこれを含む感光性樹脂組成物またはコーティング溶液 Download PDF

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Publication number
JP7017270B2
JP7017270B2 JP2020520644A JP2020520644A JP7017270B2 JP 7017270 B2 JP7017270 B2 JP 7017270B2 JP 2020520644 A JP2020520644 A JP 2020520644A JP 2020520644 A JP2020520644 A JP 2020520644A JP 7017270 B2 JP7017270 B2 JP 7017270B2
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carbon atoms
group
binder resin
chemical formula
independently
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Japanese (ja)
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JP2020537184A (ja
Inventor
ミ・スン・リュ
クン・ス・キム
トン・イル・ジュン
チョル・キュ・イム
ホン・ギュ・イム
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TAKOMA TECHNOLOGY Co Ltd
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TAKOMA TECHNOLOGY Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Optical Filters (AREA)
  • Polyesters Or Polycarbonates (AREA)
JP2020520644A 2017-10-11 2018-10-10 バインダー樹脂及びこれを含む感光性樹脂組成物またはコーティング溶液 Active JP7017270B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020170131666A KR102071112B1 (ko) 2017-10-11 2017-10-11 바인더 수지 및 이를 포함하는 감광성 수지 조성물 또는 코팅 용액
KR10-2017-0131666 2017-10-11
PCT/KR2018/011861 WO2019074262A1 (ko) 2017-10-11 2018-10-10 바인더 수지 및 이를 포함하는 감광성 수지 조성물 또는 코팅 용액

Publications (2)

Publication Number Publication Date
JP2020537184A JP2020537184A (ja) 2020-12-17
JP7017270B2 true JP7017270B2 (ja) 2022-02-08

Family

ID=66100767

Family Applications (1)

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JP2020520644A Active JP7017270B2 (ja) 2017-10-11 2018-10-10 バインダー樹脂及びこれを含む感光性樹脂組成物またはコーティング溶液

Country Status (5)

Country Link
JP (1) JP7017270B2 (zh)
KR (1) KR102071112B1 (zh)
CN (1) CN111448517B (zh)
TW (1) TWI687499B (zh)
WO (1) WO2019074262A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220112366A (ko) * 2021-02-04 2022-08-11 주식회사 엘지화학 폴리이미드 수지 및 이를 포함하는 포지티브형 감광성 수지 조성물

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006003860A (ja) 2003-11-26 2006-01-05 Nippon Steel Chem Co Ltd 感光性樹脂組成物及びそれを用いたカラーフィルター
WO2016047483A1 (ja) 2014-09-26 2016-03-31 東レ株式会社 有機ｅｌ表示装置
WO2016133023A1 (ja) 2015-02-19 2016-08-25 日本ゼオン株式会社 樹脂組成物、樹脂膜、及び電子部品
JP2016167447A (ja) 2015-03-05 2016-09-15 Jsr株式会社 発光装置および感放射線性材料

Family Cites Families (14)

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Publication number Priority date Publication date Assignee Title
US4093461A (en) 1975-07-18 1978-06-06 Gaf Corporation Positive working thermally stable photoresist composition, article and method of using
JPS5944615B2 (ja) 1976-02-16 1984-10-31 富士写真フイルム株式会社 感光性樹脂組成物及びそれを用いた金属画像形成材料
EP0224680B1 (en) 1985-12-05 1992-01-15 International Business Machines Corporation Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers
WO1994000801A1 (en) * 1992-06-19 1994-01-06 Nippon Steel Corporation Color filter, material thereof and resin
JP2003176343A (ja) * 2001-12-11 2003-06-24 Nagase Chemtex Corp 光重合性不飽和樹脂、その製造方法及びそれを用いたアルカリ可溶型感放射線性樹脂組成物
JP4004826B2 (ja) * 2002-03-15 2007-11-07 新日鐵化学株式会社 着色感光性樹脂組成物及びカラーフィルター
TW200530281A (en) * 2003-11-26 2005-09-16 Nippon Steel Chemical Co Photosensitive resin composition and color filter using the same
JP4508928B2 (ja) * 2005-03-31 2010-07-21 新日鐵化学株式会社 感光性樹脂組成物及びそれを用いたカラーフィルター
CN102902162A (zh) * 2007-12-14 2013-01-30 旭化成电子材料株式会社 感光性树脂组合物
KR101759929B1 (ko) * 2009-11-20 2017-07-20 코오롱인더스트리 주식회사 감광성 수지 조성물
KR101385183B1 (ko) * 2013-11-01 2014-04-21 (주)상아프론테크 포지티브형 감광성 폴리이미드 바니쉬 조성물, 포지티브형 폴리이미드 및 이를 포함하는 필름
KR101752448B1 (ko) * 2014-12-31 2017-07-04 타코마테크놀러지 주식회사 감광성 수지 조성물
JP6741427B2 (ja) * 2015-01-13 2020-08-19 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 自発光感光性樹脂組成物、これから製造された色変換層を含む表示装置
CN108137794B (zh) * 2015-10-01 2020-05-15 塔科马科技有限公司 粘合剂树脂及包含其的感光性树脂组合物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006003860A (ja) 2003-11-26 2006-01-05 Nippon Steel Chem Co Ltd 感光性樹脂組成物及びそれを用いたカラーフィルター
WO2016047483A1 (ja) 2014-09-26 2016-03-31 東レ株式会社 有機ｅｌ表示装置
WO2016133023A1 (ja) 2015-02-19 2016-08-25 日本ゼオン株式会社 樹脂組成物、樹脂膜、及び電子部品
JP2016167447A (ja) 2015-03-05 2016-09-15 Jsr株式会社 発光装置および感放射線性材料

Also Published As

Publication number Publication date
JP2020537184A (ja) 2020-12-17
TW201927982A (zh) 2019-07-16
CN111448517B (zh) 2023-12-26
CN111448517A (zh) 2020-07-24
KR102071112B1 (ko) 2020-01-29
KR20190040835A (ko) 2019-04-19
TWI687499B (zh) 2020-03-11
WO2019074262A1 (ko) 2019-04-18

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