JP6770576B2 - プラズマエッチングを用いた反射防止表面の製造方法 - Google Patents
プラズマエッチングを用いた反射防止表面の製造方法 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims description 30
- 238000001020 plasma etching Methods 0.000 title claims description 29
- 239000000758 substrate Substances 0.000 claims description 84
- 239000010410 layer Substances 0.000 claims description 45
- 239000010954 inorganic particle Substances 0.000 claims description 41
- 238000001312 dry etching Methods 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 31
- 238000007740 vapor deposition Methods 0.000 claims description 18
- 239000011241 protective layer Substances 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 11
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 9
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- -1 polyethylene naphthalate Polymers 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 5
- 239000004697 Polyetherimide Substances 0.000 claims description 5
- 229920002530 polyetherether ketone Polymers 0.000 claims description 5
- 229920001601 polyetherimide Polymers 0.000 claims description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 4
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 4
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229910052788 barium Inorganic materials 0.000 claims description 3
- 229910052790 beryllium Inorganic materials 0.000 claims description 3
- 229910052793 cadmium Inorganic materials 0.000 claims description 3
- 229910052791 calcium Inorganic materials 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 150000002222 fluorine compounds Chemical class 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 229920000515 polycarbonate Polymers 0.000 claims description 3
- 239000004417 polycarbonate Substances 0.000 claims description 3
- 239000011112 polyethylene naphthalate Substances 0.000 claims description 3
- 229910052701 rubidium Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 238000005229 chemical vapour deposition Methods 0.000 claims description 2
- 238000005240 physical vapour deposition Methods 0.000 claims description 2
- 230000002265 prevention Effects 0.000 claims description 2
- 239000004695 Polyether sulfone Substances 0.000 claims 1
- 230000003667 anti-reflective effect Effects 0.000 claims 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 claims 1
- 229920006393 polyether sulfone Polymers 0.000 claims 1
- 230000000052 comparative effect Effects 0.000 description 13
- 229920000642 polymer Polymers 0.000 description 11
- 239000000126 substance Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- 239000011247 coating layer Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000002033 PVDF binder Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- 229920001774 Perfluoroether Polymers 0.000 description 2
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 2
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 2
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 2
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 2
- CHJAYYWUZLWNSQ-UHFFFAOYSA-N 1-chloro-1,2,2-trifluoroethene;ethene Chemical group C=C.FC(F)=C(F)Cl CHJAYYWUZLWNSQ-UHFFFAOYSA-N 0.000 description 1
- 229920001780 ECTFE Polymers 0.000 description 1
- 229920007925 Ethylene chlorotrifluoroethylene (ECTFE) Polymers 0.000 description 1
- 241000238631 Hexapoda Species 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003278 mimic effect Effects 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000013615 primer Substances 0.000 description 1
- 239000002987 primer (paints) Substances 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000003362 replicative effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
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- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Sustainable Energy (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Drying Of Semiconductors (AREA)
Description
一具体例において、プラズマ乾式エッチングは、例えば、20秒〜1時間、好ましくは30秒〜50分の間行われてもよい。
下記表1に記載された通りの工程を行い、構造1〜構造3の反射防止層を有する実施例1〜3の反射防止基板を製造した。下記表1の「エッチング」は、プラズマエッチングを行った時間を意味し、「SiO2(Å)」は、SiO2粒子が蒸着された厚さを意味する。実施例1〜3のベース基板は、ポリエチレンテレフタレート(PET)基板を用い、保護層形成のためにF−Oil系列化合物であるTop Clean Safe(Ceko社製)を用いた。
製造された実施例1〜3の反射防止基板と比較例の基板(ハードコーティング処理されたPET基板)の光透過度を測定し、図6に示した。図6に示されるように、本発明の反射防止基板は、同じ波長で比較例の基板に比べて、優れた光透過度を示すことを確認することができた。
下記表2に記載されたプラズマ乾式エッチング工程[前記ステップi)]条件及び表3に記載された無機物粒子蒸着工程[前記ステップii)]条件で反射防止基板を製造した(ベース基板:PET)。サンプル番号1〜4は、それぞれ実施例4〜7を示し、サンプル番号5〜7は、それぞれ比較例1〜3を示す。
Claims (14)
- i)プラズマ乾式エッチングを用いて、ベース基板の表面に凹凸を形成するステップ;
ii)無機物粒子の蒸着により、前記凹凸上に光の反射を防止することができる反射防止構造体を形成し、前記ベース基板の表面に反射防止層を形成するステップ;及び
iii)前記ステップi)又はii)を、独立して、1回又は複数回さらに行うステップ;
を含み、
前記ステップi)において、前記プラズマ乾式エッチングが、5×10−3〜5×10−2torrの初期圧力条件下で開始され、5×10−2〜5×10−1torrの工程圧力条件下で進み、
前記ステップiii)において、前記ステップi)及びii)を1〜20回さらに行った後、最終的に、前記ステップi)を行っており、
各ステップii)で蒸着される前記無機物粒子の厚さが次第に減少されるように行うことを特徴とするプラズマエッチングを用いた反射防止表面の製造方法。 - 前記プラズマ乾式エッチングに用いられる単位面積当たりの電力が、0.2〜17W/cm2であることを特徴とする請求項1に記載のプラズマエッチングを用いた反射防止表面の製造方法。
- 前記プラズマ乾式エッチングが、20秒〜1時間行われることを特徴とする請求項1に記載のプラズマエッチングを用いた反射防止表面の製造方法。
- 前記プラズマ乾式エッチングの結果から得られるパターン幅が10〜300nmであり、パターン高さが10〜200nmであり、パターン間の間隔が10〜200nmであることを特徴とする請求項1に記載のプラズマエッチングを用いた反射防止表面の製造方法。
- 前記ベース基板が、ポリエーテルエーテルケトン、ポリエーテルスルホン、ポリエーテルイミド、ポリカーボネート、ポリエチレンナフタレート、ポリエチレンテレフタレート又はポリメチルメタクリレートの素材の基板であることを特徴とする請求項1に記載のプラズマエッチングを用いた反射防止表面の製造方法。
- 前記ステップi)が、Ar、O2、H2、He及びN2から選ばれる少なくともいずれか一つの気体の存在下で、前記プラズマ乾式エッチングすることにより行われることを特徴とする請求項1に記載のプラズマエッチングを用いた反射防止表面の製造方法。
- 前記気体の投入口と前記ベース基板との距離が、200mm以下であることを特徴とする請求項6に記載のプラズマエッチングを用いた反射防止表面の製造方法。
- 前記気体の流量が、10sccm〜200sccmであることを特徴とする請求項6に記載のプラズマエッチングを用いた反射防止表面の製造方法。
- 前記ステップii)の前記無機物粒子が、Al、Ba、Be、Ca、Cr、Cu、Cd、Dy、Ga、Ge、Hf、In、Lu、Mg、Mo、Ni、Rb、Sc、Si、Sn、Ta、Te、Ti、W、Zn、Zr、Yb及びこれらの組み合わせから選ばれる金属の酸化物、窒化物、酸窒化物(oxynitride)並びにフッ化物から選ばれる少なくともいずれか一つを含んでなることを特徴とする請求項1に記載のプラズマエッチングを用いた反射防止表面の製造方法。
- 前記ステップii)における初期圧力条件が、1×10−3〜5×10−2torrであり、工程圧力条件が、1×10−3〜5×10−1torrであることを特徴とする請求項1に記載のプラズマエッチングを用いた反射防止表面の製造方法。
- 前記無機物粒子が蒸着された反射防止層の最終厚さが10〜500nmであり、前記無機物粒子が蒸着された反射防止構造体の最終幅が10〜500nmであり、前記無機物粒子が蒸着された反射防止構造体の最終高さが10〜400nmであり、前記無機物粒子が蒸着された反射防止構造体間の最終間隔が10〜200nmであることを特徴とする請求項1に記載のプラズマエッチングを用いた反射防止表面の製造方法。
- 前記ステップii)が、物理的蒸気蒸着法、化学的蒸気蒸着法又はイオン補助蒸着法により行われることを特徴とする請求項1に記載のプラズマエッチングを用いた反射防止表面の製造方法。
- 前記ステップiii)の後に、
iv)前記ベース基板の前記反射防止層が形成された面の他面に保護層を形成するステップをさらに含むことを特徴とする請求項1に記載のプラズマエッチングを用いた反射防止表面の製造方法。 - 前記ステップiv)において、Si−Oil系化合物又はF−Oil系化合物を蒸着して、前記保護層を形成することを特徴とする請求項13に記載のプラズマエッチングを用いた反射防止表面の製造方法。
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JPH11172448A (ja) * | 1997-12-12 | 1999-06-29 | Tadahiro Omi | 光学部品の製造法 |
US6800378B2 (en) | 1998-02-19 | 2004-10-05 | 3M Innovative Properties Company | Antireflection films for use with displays |
KR100624308B1 (ko) * | 2004-10-11 | 2006-09-19 | 제일모직주식회사 | 반사방지 필름의 고굴절층 코팅용 조성물 |
US8771532B2 (en) * | 2009-03-31 | 2014-07-08 | Corning Incorporated | Glass having anti-glare surface and method of making |
KR101081499B1 (ko) * | 2009-08-19 | 2011-11-08 | 광주과학기술원 | 무반사 나노구조의 제조방법 |
JP2011150154A (ja) * | 2010-01-22 | 2011-08-04 | Showa Shinku:Kk | 薄膜、及び、薄膜の形成方法 |
ITMI20101529A1 (it) * | 2010-08-09 | 2012-02-10 | Consiglio Nazionale Ricerche | Elementi ottici plastici con caratteristiche antiappannanti e metodo per la loro realizzazione |
KR101235834B1 (ko) * | 2010-12-08 | 2013-02-21 | 한국기계연구원 | 폴리머층을 식각 보호층으로 이용한 돌기 패턴의 형성 방법 |
JP5810577B2 (ja) * | 2011-03-25 | 2015-11-11 | 凸版印刷株式会社 | 低反射構造を成型するための原版の製造方法 |
KR20120114975A (ko) * | 2011-04-08 | 2012-10-17 | 주식회사 엘지화학 | 반사방지 필름 제조용 주형의 제조방법, 및 그 주형을 이용한 반사방지 필름의 제조방법 |
JP5686070B2 (ja) * | 2011-08-23 | 2015-03-18 | 大日本印刷株式会社 | 反射防止フィルムの製造方法 |
JP5840448B2 (ja) * | 2011-10-12 | 2016-01-06 | 株式会社タムロン | 反射防止膜及び反射防止膜の製造方法 |
KR101244889B1 (ko) * | 2012-03-19 | 2013-03-18 | 한국기계연구원 | 보호층이 구비된 반사 방지 기판 및 그 제조 방법 |
KR101205004B1 (ko) * | 2012-05-03 | 2012-11-27 | 한국기계연구원 | 투명전도성 기판 및 그 제조 방법 |
KR101205006B1 (ko) * | 2012-05-03 | 2012-11-27 | 한국기계연구원 | 투명전도성 기판 및 그 제조 방법 |
WO2013166521A1 (en) * | 2012-05-04 | 2013-11-07 | The Regents Of The University Of California | Spectrally selective coatings for optical surfaces |
JP6516972B2 (ja) * | 2013-03-29 | 2019-05-22 | 王子ホールディングス株式会社 | 光学部材用の凹凸パターン形成シートの製造方法 |
JP6160186B2 (ja) * | 2013-04-05 | 2017-07-12 | 三菱ケミカル株式会社 | 微細凹凸構造体、加飾シート、および加飾樹脂成形体、並びに微細凹凸構造体、および加飾樹脂成形体の製造方法 |
JP5468167B1 (ja) * | 2013-05-20 | 2014-04-09 | 尾池工業株式会社 | 積層体 |
DE102013106392B4 (de) * | 2013-06-19 | 2017-06-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer Entspiegelungsschicht |
KR20140074874A (ko) * | 2014-05-07 | 2014-06-18 | (주)에스이피 | 광투과성 및 내구성이 향상된 반사방지 표면의 제조방법 및 반사방지 표면이 형성된 기판 |
CN104386645B (zh) * | 2014-10-16 | 2017-05-03 | 中国工程物理研究院激光聚变研究中心 | 自掩膜制备随机亚波长宽带减反射微结构的方法 |
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