JP6768146B2 - 液供給装置および液供給方法 - Google Patents
液供給装置および液供給方法 Download PDFInfo
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- 239000007788 liquid Substances 0.000 title claims description 165
- 238000000034 method Methods 0.000 title claims description 46
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- 230000002093 peripheral effect Effects 0.000 claims description 18
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- 238000001914 filtration Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 60
- 239000007789 gas Substances 0.000 description 45
- 235000012431 wafers Nutrition 0.000 description 44
- 230000008569 process Effects 0.000 description 33
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 25
- 238000010586 diagram Methods 0.000 description 23
- 239000012530 fluid Substances 0.000 description 18
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- 239000011259 mixed solution Substances 0.000 description 2
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- 230000005856 abnormality Effects 0.000 description 1
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- XEMZLVDIUVCKGL-UHFFFAOYSA-N hydrogen peroxide;sulfuric acid Chemical compound OO.OS(O)(=O)=O XEMZLVDIUVCKGL-UHFFFAOYSA-N 0.000 description 1
- 239000008258 liquid foam Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
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- 230000003287 optical effect Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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Description
図1は、第1の実施形態に係る基板処理システムの概略構成を示す図である。以下では、位置関係を明確にするために、互いに直交するX軸、Y軸およびZ軸を規定し、Z軸正方向を鉛直上向き方向とする。
次に、第1の実施形態の変形例について図10Aおよび図10Bを参照して説明する。図10Aは、第1管路104aに設けられる開口1121の変形例を示す図である。また、図10Bは、第1管路104aの変形例を示す図である。
第2の実施形態では、第1管路の他の構成例について説明する。図11は、第2の実施形態に係る第1管路の構成例を示す図である。
第1部分および第2部分の構成は、後述した例に限定されない。以下では、第2の実施形態における第1管路の変形例について説明する。図12〜図14は、第2の実施形態における第1〜第3の変形例に係る第1管路の構成例を示す図である。
112 分岐経路
112a 分岐部
108 フィルタ部
301 脱泡器
302 気体排出部
Claims (12)
- 処理液を基板処理装置へ供給する液供給装置であって、
第1処理液と第2処理液を含有する処理液を貯留する貯留部と、
前記処理液を水平方向に通過させる第1管路を有し、前記貯留部に貯留された前記処理液を循環させる循環経路と、
前記処理液を前記基板処理装置へ供給する分岐経路と、
前記第1管路から前記分岐経路へ処理液を流出させる開口を有する分岐部と、を備え、
前記分岐部において前記第1管路を断面視したとき、前記開口は、前記第1管路の周縁下方に設けられている、液供給装置。 - 前記循環経路は、前記第1管路よりも下流において前記処理液を下方向に通過させる第2管路を、さらに有し、
前記第1管路と前記第2管路との境界に配置された気体排出部をさらに備え、
前記気体排出部は、
前記第1管路から流入した気体を収集する気体収集室と、
前記気体収集室に収集された気体を前記循環経路の外部へ排出する気体排出口と、を有する、請求項1に記載の液供給装置。 - 前記循環経路において第1管路よりも上流に並列に配置されたフィルタをさらに備え、
前記フィルタは、
処理液の不要物を除去するろ過部材と、
一次側の閉領域から気体を排出するためのベント管と、
を備える、請求項1または2に記載の液供給装置。 - 前記フィルタは、
前記循環経路において、複数個並列に設けられている、請求項3に記載の液供給装置。 - 前記循環経路において、前記フィルタと前記第1管路の間に配置された脱泡器をさらに備える、請求項3または4に記載の液供給装置。
- 前記処理液を加熱するヒータ
をさらに備え、
前記循環経路において、上流から、前記フィルタ、前記ヒータ、前記脱泡器の順序で配置されている、請求項5に記載の液供給装置。 - 前記分岐経路を流れる前記処理液の流量を計測する流量計
をさらに備える、請求項1〜6のいずれか一つに記載の液供給装置。 - 前記基板処理装置に供給された前記処理液を回収して前記貯留部に戻す回収経路をさらに備える、請求項1〜7のいずれか一つに記載の液供給装置。
- 前記第1管路は、
第1の断面積を有する第1部分と、
前記第1部分の中途部に設けられ、前記第1の断面積よりも大きい第2の断面積を有する第2部分と
を含み、
前記開口は、前記第2部分の周縁下方に設けられている、請求項1〜8のいずれか一つに記載の液供給装置。 - 前記第1部分は、
前記第2部分よりも上流に設けられる上流側第1部分と、
前記第2部分よりも下流に設けられる下流側第1部分と
を含み、
前記下流側第1部分は、
前記上流側第1部分よりも高い位置に配置される、請求項9に記載の液供給装置。 - 前記第2部分は、
下面の高さ位置が前記上流側第1部分の下面の高さ位置と同一であり、且つ、上面の高さ位置が前記下流側第1部分の上面の高さ位置と同一である中間部分と、
前記上流側第1部分と前記中間部分との間に設けられ、前記上流側第1部分の上面から前記中間部分の上面に向かって上り傾斜する上面を有する上流側第2部分と、
前記中間部分と前記下流側第1部分との間に設けられ、前記中間部分の下面から前記下流側第1部分の下面に向かって上り傾斜する下面を有する下流側第2部分と
を含み、
前記開口は、前記中間部分の周縁下方に設けられている、請求項10に記載の液供給装置。 - 処理液を基板処理装置へ供給する液供給方法であって、
貯留部に貯留されている第1処理液と第2処理液を含有する処理液を、少なくとも前記処理液を水平方向に通過させる第1管路を用いて循環させる循環工程と、
前記処理液を前記基板処理装置へ供給するための分岐経路に対し、前記第1管路を循環する前記処理液を流出させる分岐工程と
を含み、
前記分岐工程は、
前記第1管路を断面視したとき、前記第1管路の周縁下方に設けられている開口から前記分岐経路に対して前記処理液を流出させること
を特徴とする液供給方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017076297 | 2017-04-06 | ||
JP2017076297 | 2017-04-06 | ||
JP2018029284 | 2018-02-22 | ||
JP2018029284 | 2018-02-22 | ||
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JP7203579B2 (ja) * | 2018-11-26 | 2023-01-13 | 株式会社Screenホールディングス | 基板処理装置 |
WO2021042319A1 (zh) * | 2019-09-05 | 2021-03-11 | 深圳迈瑞生物医疗电子股份有限公司 | 血液细胞分析仪的分析方法和血液细胞分析仪 |
JP7312656B2 (ja) | 2019-09-24 | 2023-07-21 | 株式会社Screenホールディングス | 基板処理装置 |
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