JP6356091B2 - 基板液処理装置、ヒータユニットの制御方法および記憶媒体 - Google Patents
基板液処理装置、ヒータユニットの制御方法および記憶媒体 Download PDFInfo
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
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Description
16 処理ユニット
102 タンク
104 循環ライン
200 ヒータユニット
206 加熱部
222 第1制御部
224 第2制御部
226 電力調整部
228 処理液温度センサ
Claims (15)
- 処理液供給源から被処理体に処理液を供給する処理液供給ラインと、
前記処理液供給ラインを流れる前記処理液を加熱する加熱部を備えるヒータユニットと、
前記加熱部に供給される電力を制御する制御装置と、
前記処理液供給ラインを流れる前記処理液の温度を計測する温度検知器と、
を備え、
前記制御装置は、前記温度検知器により計測された前記処理液の実際温度に基づき、前記処理液供給ラインを流れる前記処理液の流れの停止が生じたものと仮定したときに、前記加熱部への電力供給を停止したとしても前記ヒータユニット内にある前記処理液が到達する最高温度が処理液上限温度を上回るという事象が生じるであろうと判断される場合に、前記加熱部に供給される電力を遮断する遮断制御を行い、
前記制御装置は、
前記温度検知器により検出された前記処理液の前記実際温度の目標温度に対する偏差に基づいて、前記実際温度が前記目標温度となるように前記ヒータユニットの加熱部に供給すべき電力を決定する第1制御部と、
前記ヒータユニットの加熱部の実際温度が設定された加熱部上限温度を超えた時に、前記遮断制御として、前記ヒータユニットの加熱部に供給される電力を遮断するとともに、前記ヒータユニットの加熱部の実際温度が前記加熱部上限温度以下の時に、前記第1制御部により決定された電力が前記ヒータユニットの加熱部に供給されることを許容する第2制御部と、
を有し、
前記温度検知器により計測された前記処理液の前記実際温度が高いほど前記加熱部上限温度が段階的に若しくは連続的に低くなるように、前記加熱部上限温度が前記温度検知器により計測された前記処理液の前記実際温度の関数として設定される、液処理装置。 - 前記処理液上限温度とは、前記処理液に沸騰が生じる温度である、請求項1記載の液処理装置。
- 前記処理液上限温度は、前記処理液の種類に応じて設定される、請求項1または2記載の液処理装置。
- 前記温度検知器の検出値に基づいて前記加熱部上限温度が設定される、請求項1から3のうちのいずれか一項に記載の液処理装置。
- 前記ヒータユニットの前記加熱部の温度を検出する加熱部温度センサをさらに備えた、請求項1から4のうちのいずれか一項に記載の液処理装置。
- 前記処理液がとりうる前記実際温度を複数の温度帯に分割し、前記加熱部上限温度を、前記温度帯ごとに設定する、請求項1から5のうちのいずれか一項に記載の液処理装置。
- 前記処理液の前記実際温度を設定温度まで上昇させているときに、前記実際温度が第1処理液温度に至るまでは前記加熱部上限温度を第1加熱部上限温度に設定し、前記実際温度が第1処理液温度より高い第2処理液温度に至るまでは前記加熱部上限温度を第1加熱部上限温度よりも低い第2加熱部上限温度に設定する、請求項6記載の液処理装置。
- 前記制御装置は、前記第1制御部としてのPID制御部と、前記第2制御部としてのON/OFF制御部と、電力調整部とを含んでおり、前記ON/OFF制御部は、前記PID制御部と電力調整部との間に介在して、前記PID制御部から前記電力調整部に向けて出力された電力指令値をゼロに変更して前記電力調整部に出力するか若しくはそのまま電力調整部に向けて出力する制御、あるいはこれと等価な制御を行う、請求項1から7のうちのいずれか一項に記載の液処理装置。
- 処理液を貯留する前記処理液供給源としてのタンクと、
前記タンクに接続された循環ラインであって、前記タンクから流出した処理液が前記循環ラインを通って流れた後、前記タンクに流入するようになっている、循環ラインと、
前記循環ラインを流れる処理液を用いて前記被処理体に液処理を施す処理ユニットと、
前記循環ラインから分岐し、前記処理ユニットに前記循環ラインを流れる処理液を供給する分岐ラインと、をさらに備え、
前記処理液供給ラインは、前記循環ラインの少なくとも一部と前記分岐ラインとにより構成される、請求項1から8のうちのいずれか一項に記載の液処理装置。 - 処理液供給源から処理液供給ラインを介して被処理体に処理液を供給して前記被処理体に液処理を施す液処理工程と、前記処理液供給ラインを流れる前記処理液を加熱する加熱部を備えるヒータユニットの前記加熱部に供給される電力を制御することにより、前記処理液供給ラインを流れる前記処理液の温度を制御する制御工程と、を備えた液処理方法であって、
前記制御工程は、前記処理液供給ラインを流れる前記処理液の実際温度に基づき、前記処理液供給ラインを流れる前記処理液の流れの停止が生じたものと仮定したときに、前記加熱部への電力供給を停止したとしても前記ヒータユニット内にある前記処理液が到達する最高温度が処理液上限温度を上回るという事象が生じるであろうと判断される場合に、前記加熱部に供給される電力を遮断する遮断制御を行う工程を含み、
前記制御工程は、
前記処理液の前記実際温度の目標温度に対する偏差に基づいて、前記実際温度が前記目標温度となるように前記ヒータユニットの加熱部に供給すべき電力を決定する第1制御部と、
前記ヒータユニットの加熱部の実際温度が設定された加熱部上限温度を超えた時に、前記遮断制御として、前記ヒータユニットの加熱部に供給される電力を遮断するとともに、前記ヒータユニットの加熱部の実際温度が前記加熱部上限温度以下の時に、前記第1制御部により決定された電力が前記ヒータユニットの加熱部に供給されることを許容する第2制御部と、
を有する制御装置を用いて実行され、
前記処理液供給ラインを流れる前記処理液の前記実際温度が高いほど前記加熱部上限温度が段階的に若しくは連続的に低くなるように、前記加熱部上限温度が前記処理液供給ラインを流れる前記処理液の前記実際温度の関数として設定される、液処理方法。 - 前記処理液上限温度とは、前記処理液に沸騰が生じる温度である、請求項10記載の液処理方法。
- 前記処理液上限温度は、前記処理液の種類に応じて設定される、請求項10または11記載の液処理方法。
- 前記処理液がとりうる前記実際温度を複数の温度帯に分割し、前記加熱部上限温度を、前記温度帯ごとに設定する、請求項10から12のうちのいずれか一項に記載の液処理方法。
- 前記処理液の前記実際温度を設定温度まで上昇させているときに、前記実際温度が第1処理液温度に至るまでは前記加熱部上限温度を第1加熱部上限温度に設定し、前記実際温度が第1処理液温度より高い第2処理液温度に至るまでは前記加熱部上限温度を第1加熱部上限温度よりも低い第2加熱部上限温度に設定する、請求項13記載の液処理方法。
- 基板液処理装置の動作を制御するためのコンピュータにより実行されたときに、前記コンピュータが前記基板液処理装置を制御して請求項10から14のうちのいずれか一項に記載の方法を実行させるプログラムが記録された記憶媒体。
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