JP6553019B2 - 広帯域可変掃引光源 - Google Patents
広帯域可変掃引光源 Download PDFInfo
- Publication number
- JP6553019B2 JP6553019B2 JP2016503103A JP2016503103A JP6553019B2 JP 6553019 B2 JP6553019 B2 JP 6553019B2 JP 2016503103 A JP2016503103 A JP 2016503103A JP 2016503103 A JP2016503103 A JP 2016503103A JP 6553019 B2 JP6553019 B2 JP 6553019B2
- Authority
- JP
- Japan
- Prior art keywords
- wavelength
- light source
- tunable
- tunable light
- source according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005855 radiation Effects 0.000 claims description 58
- 230000003287 optical effect Effects 0.000 claims description 35
- 239000012528 membrane Substances 0.000 claims description 21
- 238000012014 optical coherence tomography Methods 0.000 claims description 21
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 20
- 229910052785 arsenic Inorganic materials 0.000 claims description 20
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 20
- 229910052733 gallium Inorganic materials 0.000 claims description 20
- 229910052738 indium Inorganic materials 0.000 claims description 18
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 16
- 239000004065 semiconductor Substances 0.000 claims description 14
- 238000005424 photoluminescence Methods 0.000 claims description 12
- 230000004888 barrier function Effects 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 230000003647 oxidation Effects 0.000 claims description 9
- 238000007254 oxidation reaction Methods 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- 238000001727 in vivo Methods 0.000 claims description 8
- 210000001525 retina Anatomy 0.000 claims description 8
- 238000013016 damping Methods 0.000 claims description 6
- 230000000737 periodic effect Effects 0.000 claims description 6
- 230000004044 response Effects 0.000 claims description 6
- 238000002347 injection Methods 0.000 claims description 4
- 239000007924 injection Substances 0.000 claims description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 239000011574 phosphorus Substances 0.000 claims description 2
- 230000002123 temporal effect Effects 0.000 claims description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 12
- 238000013461 design Methods 0.000 description 12
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 11
- KXNLCSXBJCPWGL-UHFFFAOYSA-N [Ga].[As].[In] Chemical compound [Ga].[As].[In] KXNLCSXBJCPWGL-UHFFFAOYSA-N 0.000 description 11
- 238000003384 imaging method Methods 0.000 description 11
- 238000001228 spectrum Methods 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 8
- 238000002310 reflectometry Methods 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 230000003111 delayed effect Effects 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 230000010287 polarization Effects 0.000 description 5
- 230000003068 static effect Effects 0.000 description 5
- 229910016909 AlxOy Inorganic materials 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 238000007667 floating Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 3
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 230000003321 amplification Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 230000010076 replication Effects 0.000 description 2
- 230000002207 retinal effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 238000000352 supercritical drying Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- BLIQUJLAJXRXSG-UHFFFAOYSA-N 1-benzyl-3-(trifluoromethyl)pyrrolidin-1-ium-3-carboxylate Chemical compound C1C(C(=O)O)(C(F)(F)F)CCN1CC1=CC=CC=C1 BLIQUJLAJXRXSG-UHFFFAOYSA-N 0.000 description 1
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920001486 SU-8 photoresist Polymers 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229920005560 fluorosilicone rubber Polymers 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 239000002070 nanowire Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18363—Structure of the reflectors, e.g. hybrid mirrors comprising air layers
- H01S5/18366—Membrane DBR, i.e. a movable DBR on top of the VCSEL
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B5/00—Measuring for diagnostic purposes; Identification of persons
- A61B5/0059—Measuring for diagnostic purposes; Identification of persons using light, e.g. diagnosis by transillumination, diascopy, fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
- G01B9/02091—Tomographic interferometers, e.g. based on optical coherence
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18341—Intra-cavity contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18369—Structure of the reflectors, e.g. hybrid mirrors based on dielectric materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18369—Structure of the reflectors, e.g. hybrid mirrors based on dielectric materials
- H01S5/18372—Structure of the reflectors, e.g. hybrid mirrors based on dielectric materials by native oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18377—Structure of the reflectors, e.g. hybrid mirrors comprising layers of different kind of materials, e.g. combinations of semiconducting with dielectric or metallic layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2054—Methods of obtaining the confinement
- H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
- H01S5/3095—Tunnel junction
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201361793730P | 2013-03-15 | 2013-03-15 | |
US61/793,730 | 2013-03-15 | ||
PCT/US2014/029458 WO2014144866A2 (en) | 2013-03-15 | 2014-03-14 | Widely tunable swept source |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016513889A JP2016513889A (ja) | 2016-05-16 |
JP6553019B2 true JP6553019B2 (ja) | 2019-07-31 |
Family
ID=51525934
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016503103A Expired - Fee Related JP6553019B2 (ja) | 2013-03-15 | 2014-03-14 | 広帯域可変掃引光源 |
Country Status (6)
Country | Link |
---|---|
US (2) | US9774166B2 (de) |
EP (2) | EP2967468A4 (de) |
JP (1) | JP6553019B2 (de) |
CN (1) | CN105188540B (de) |
CA (1) | CA2905537C (de) |
WO (2) | WO2014144866A2 (de) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107252302B (zh) * | 2012-07-27 | 2020-08-18 | 统雷有限公司 | 敏捷成像系统 |
WO2015003023A1 (en) * | 2013-07-03 | 2015-01-08 | Inphenix, Inc. | Wavelength-tunable vertical cavity surface emitting laser for swept source optical coherence tomography system |
JP6488299B2 (ja) * | 2013-11-26 | 2019-03-20 | インフェニックス インコーポレイテッドInphenix, Inc. | 波長可変memsファブリペローフィルター |
JP6282094B2 (ja) * | 2013-11-27 | 2018-02-21 | キヤノン株式会社 | 面発光レーザ、およびそれを用いた光干渉断層計 |
JP2015233127A (ja) * | 2014-05-12 | 2015-12-24 | キヤノン株式会社 | 面発光レーザ、レーザアレイ、光源装置、情報取得装置及び光干渉断層計 |
JP6685701B2 (ja) | 2014-12-26 | 2020-04-22 | キヤノン株式会社 | 面発光レーザ、情報取得装置、撮像装置、レーザアレイ及び面発光レーザの製造方法 |
JP6576092B2 (ja) * | 2015-04-30 | 2019-09-18 | キヤノン株式会社 | 面発光レーザ、情報取得装置及び撮像装置 |
JP2017092070A (ja) * | 2015-11-02 | 2017-05-25 | 日本電信電話株式会社 | 波長掃引光源 |
AU2017382218B2 (en) | 2016-12-21 | 2023-05-11 | Acucela Inc. | Miniaturized mobile, low cost optical coherence tomography system for home based ophthalmic applications |
DE102017205144B4 (de) | 2017-03-27 | 2019-03-14 | Jenoptik Laser Gmbh | Oberflächenemittierender Halbleiterlaser mit veränderlicher Wellenzahl |
CN112385099A (zh) * | 2018-05-08 | 2021-02-19 | 加利福尼亚大学董事会 | 具有宽波长扫频的气腔占优vcsel |
JP7443248B2 (ja) * | 2018-05-11 | 2024-03-05 | エクセリタス テクノロジーズ コーポレイション | 幾何学的分離を採用する光ポンピングチューナブルvcsel |
JP2019201179A (ja) * | 2018-05-18 | 2019-11-21 | 株式会社Qdレーザ | 面発光レーザおよび検査装置 |
EP3811473B1 (de) * | 2018-06-19 | 2022-09-07 | Excelitas Technologies Corp. | Quantentopfplatzierung in einem abstimmbaren vcsel |
WO2019246412A1 (en) | 2018-06-20 | 2019-12-26 | Acucela Inc. | Miniaturized mobile, low cost optical coherence tomography system for home based ophthalmic applications |
CN108879327A (zh) * | 2018-07-17 | 2018-11-23 | 长春理工大学 | 一种低应力微机电系统、制备方法及可调谐垂直腔面发射激光器 |
GB2582378B (en) * | 2019-03-22 | 2022-08-24 | Camlin Tech Limited | Vertical external cavity surface emitting laser with improved external mirror structure |
US11730363B2 (en) | 2019-12-26 | 2023-08-22 | Acucela Inc. | Optical coherence tomography patient alignment system for home based ophthalmic applications |
CN114982079A (zh) * | 2020-01-07 | 2022-08-30 | 索尼集团公司 | 发光元件 |
CA3107172C (en) * | 2020-01-30 | 2024-02-13 | Thorlabs Quantum Electronics, Inc. | Tunable laser assembly |
CA3111302A1 (en) * | 2020-03-09 | 2021-09-09 | Thorlabs Quantum Electronics, Inc. | Tunable laser assembly and method of control |
US10959613B1 (en) | 2020-08-04 | 2021-03-30 | Acucela Inc. | Scan pattern and signal processing for optical coherence tomography |
WO2022035809A1 (en) | 2020-08-14 | 2022-02-17 | Acucela Inc. | System and method for optical coherence tomography a-scan decurving |
JP7540492B2 (ja) | 2020-08-18 | 2024-08-27 | 日本電気株式会社 | 光干渉断層撮像装置 |
US11393094B2 (en) | 2020-09-11 | 2022-07-19 | Acucela Inc. | Artificial intelligence for evaluation of optical coherence tomography images |
CN116322471A (zh) | 2020-09-30 | 2023-06-23 | 奥克塞拉有限公司 | 近视预测、诊断、计划和监测设备 |
WO2022082203A1 (en) * | 2020-10-14 | 2022-04-21 | Excelitas Technologies Corp. | Tunable vcsel with strain compensated semiconductor dbr |
US11497396B2 (en) | 2021-03-24 | 2022-11-15 | Acucela Inc. | Axial length measurement monitor |
US20230261442A1 (en) * | 2022-02-11 | 2023-08-17 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Weak Index Guiding of Interband Lasers Bonded to GaAs Substrates |
Family Cites Families (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4991179A (en) * | 1989-04-26 | 1991-02-05 | At&T Bell Laboratories | Electrically pumped vertical cavity laser |
JPH0384985A (ja) * | 1989-08-29 | 1991-04-10 | Nec Corp | 波長可変半導体レーザ |
JPH0774431A (ja) * | 1993-06-23 | 1995-03-17 | Furukawa Electric Co Ltd:The | 半導体光素子 |
JPH08204289A (ja) * | 1995-01-31 | 1996-08-09 | Hitachi Ltd | 面発光型半導体レーザ |
US6324192B1 (en) * | 1995-09-29 | 2001-11-27 | Coretek, Inc. | Electrically tunable fabry-perot structure utilizing a deformable multi-layer mirror and method of making the same |
JPH09270567A (ja) * | 1996-03-29 | 1997-10-14 | Furukawa Electric Co Ltd:The | 量子井戸構造及びこれを備える半導体光素子 |
US5754578A (en) * | 1996-06-24 | 1998-05-19 | W. L. Gore & Associates, Inc. | 1250-1650 nm vertical cavity surface emitting laser pumped by a 700-1050 nm vertical cavity surface emitting laser |
US5936266A (en) | 1997-07-22 | 1999-08-10 | The Board Of Trustees Of The University Of Illinois | Semiconductor devices and methods with tunnel contact hole sources |
WO1999019689A1 (fr) * | 1997-10-14 | 1999-04-22 | Omron Corporation | Detecteur de vitesse angulaire |
US6438149B1 (en) * | 1998-06-26 | 2002-08-20 | Coretek, Inc. | Microelectromechanically tunable, confocal, vertical cavity surface emitting laser and fabry-perot filter |
US6490311B1 (en) * | 1998-04-14 | 2002-12-03 | Bandwidth 9, Inc. | Vertical cavity apparatus with tunnel junction |
US6227724B1 (en) * | 1999-01-11 | 2001-05-08 | Lightlogic, Inc. | Method for constructing an optoelectronic assembly |
JP2000353858A (ja) * | 1999-06-14 | 2000-12-19 | Nippon Telegr & Teleph Corp <Ntt> | 面発光レーザとその作製方法 |
US6744805B2 (en) | 2000-04-05 | 2004-06-01 | Nortel Networks Limited | Single mode operation of microelectromechanically tunable, half-symmetric, vertical cavity surface emitting lasers |
US6931042B2 (en) * | 2000-05-31 | 2005-08-16 | Sandia Corporation | Long wavelength vertical cavity surface emitting laser |
US6674785B2 (en) | 2000-09-21 | 2004-01-06 | Ricoh Company, Ltd. | Vertical-cavity, surface-emission type laser diode and fabrication process thereof |
US6741629B1 (en) * | 2000-09-22 | 2004-05-25 | Blueleaf, Inc. | Optical transmitter having optically pumped vertical external cavity surface emitting laser |
US6434180B1 (en) * | 2000-12-19 | 2002-08-13 | Lucent Technologies Inc. | Vertical cavity surface emitting laser (VCSEL) |
DE60204007T2 (de) | 2001-03-15 | 2006-03-16 | ECOLE POLYTECHNIQUE FéDéRALE DE LAUSANNE | Oberflächenemittierender laser mit vertikalem resonator |
US6546029B2 (en) * | 2001-03-15 | 2003-04-08 | Ecole Polytechnique Federale De Lausanne | Micro-electromechanically tunable vertical cavity photonic device and a method of fabrication thereof |
JP2003133639A (ja) | 2001-08-13 | 2003-05-09 | Furukawa Electric Co Ltd:The | 面発光型半導体レーザ素子 |
US6549687B1 (en) * | 2001-10-26 | 2003-04-15 | Lake Shore Cryotronics, Inc. | System and method for measuring physical, chemical and biological stimuli using vertical cavity surface emitting lasers with integrated tuner |
JP4103558B2 (ja) * | 2002-11-20 | 2008-06-18 | 横河電機株式会社 | 面発光レーザ |
JP4194854B2 (ja) * | 2003-01-31 | 2008-12-10 | シャープ株式会社 | 酸化物半導体発光素子 |
TW200524236A (en) * | 2003-12-01 | 2005-07-16 | Nl Nanosemiconductor Gmbh | Optoelectronic device incorporating an interference filter |
KR100594037B1 (ko) | 2004-01-19 | 2006-06-30 | 삼성전자주식회사 | 광모드 크기 변환 영역 포함하는 반도체 광소자 |
JP2005266567A (ja) * | 2004-03-19 | 2005-09-29 | Ricoh Co Ltd | 偏向ミラー、共振周波数制御方法、光書込装置及び画像形成装置 |
US7369583B2 (en) * | 2004-06-07 | 2008-05-06 | Innolume Gmbh | Electrooptically wavelength-tunable resonant cavity optoelectronic device for high-speed data transfer |
US20060245456A1 (en) * | 2005-04-28 | 2006-11-02 | Precision Photonics Corporation | Systems and methods for generating high repetition rate ultra-short optical pulses |
KR100657963B1 (ko) | 2005-06-28 | 2006-12-14 | 삼성전자주식회사 | 고출력 수직외부공진형 표면발광 레이저 |
JP2009087956A (ja) * | 2005-12-15 | 2009-04-23 | Nec Corp | 外部共振器型波長可変レーザとそれに内蔵する半導体光増幅器 |
US7468997B2 (en) * | 2006-01-20 | 2008-12-23 | Praevium Research, Inc. | System for swept source optical coherence tomography |
US20070183634A1 (en) * | 2006-01-27 | 2007-08-09 | Dussich Jeffrey A | Auto Individualization process based on a facial biometric anonymous ID Assignment |
JP2009529243A (ja) * | 2006-03-07 | 2009-08-13 | メアリー ケイ ブレナー | 赤色発光レーザ |
JP5176535B2 (ja) * | 2007-02-02 | 2013-04-03 | 富士電機株式会社 | レーザ式ガス分析計 |
KR101506358B1 (ko) * | 2007-04-23 | 2015-03-26 | 가부시키가이샤 니콘 | 광학 소자 유지 장치, 렌즈 배럴 및 노광 장치 |
US8059277B2 (en) * | 2007-08-27 | 2011-11-15 | Axsun Technologies, Inc. | Mode hopping swept frequency laser for FD OCT and method of operation |
JP2009260093A (ja) * | 2008-04-18 | 2009-11-05 | Nippon Telegr & Teleph Corp <Ntt> | 光半導体装置 |
JP5316783B2 (ja) | 2008-05-15 | 2013-10-16 | 株式会社リコー | 面発光レーザ素子、面発光レーザアレイ、光走査装置及び画像形成装置 |
JP2009283736A (ja) * | 2008-05-23 | 2009-12-03 | Fujifilm Corp | 光半導体素子および光半導体素子を用いた光干渉断層画像装置 |
US8263426B2 (en) * | 2008-12-03 | 2012-09-11 | Electronics And Telecommunications Research Institute | High-sensitivity z-axis vibration sensor and method of fabricating the same |
JP2010165723A (ja) * | 2009-01-13 | 2010-07-29 | Nec Corp | 面発光レーザの製造方法 |
WO2010118154A2 (en) * | 2009-04-07 | 2010-10-14 | Curators Of The University Of Missouri | Mass sensing device for liquid environment |
JP2011018855A (ja) * | 2009-07-10 | 2011-01-27 | Sony Corp | 半導体レーザ |
US8526472B2 (en) * | 2009-09-03 | 2013-09-03 | Axsun Technologies, Inc. | ASE swept source with self-tracking filter for OCT medical imaging |
JP5510899B2 (ja) * | 2009-09-18 | 2014-06-04 | 株式会社リコー | 面発光レーザ素子、面発光レーザアレイ、光走査装置、及び画像形成装置 |
JP5718093B2 (ja) * | 2010-03-04 | 2015-05-13 | 古河電気工業株式会社 | 半導体発光素子 |
EP2552297A1 (de) * | 2010-03-31 | 2013-02-06 | Canon Kabushiki Kaisha | Optisches kohärenztomografiebildgebungsgerät und steuergerät dafür |
US20110280269A1 (en) * | 2010-05-13 | 2011-11-17 | The Regents Of The University Of California | High contrast grating integrated vcsel using ion implantation |
JP5704841B2 (ja) | 2010-06-10 | 2015-04-22 | キヤノン株式会社 | 光源装置及びこれを用いた撮像装置 |
US8687666B2 (en) * | 2010-12-28 | 2014-04-01 | Axsun Technologies, Inc. | Integrated dual swept source for OCT medical imaging |
DE102011104556B4 (de) | 2011-06-15 | 2021-03-18 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Ablenkvorrichtung für einen Scanner mit Lissajous-Abtastung |
US8873066B2 (en) * | 2011-07-14 | 2014-10-28 | Insight Photonic Solutions, Inc. | System and method for improved resolution, higher scan speeds and reduced processing time in scans involving swept-wavelength interferometry |
-
2014
- 2014-03-14 WO PCT/US2014/029458 patent/WO2014144866A2/en active Application Filing
- 2014-03-14 JP JP2016503103A patent/JP6553019B2/ja not_active Expired - Fee Related
- 2014-03-14 WO PCT/US2014/029632 patent/WO2014144998A2/en active Application Filing
- 2014-03-14 CA CA2905537A patent/CA2905537C/en active Active
- 2014-03-14 EP EP14763284.8A patent/EP2967468A4/de not_active Withdrawn
- 2014-03-14 US US14/214,201 patent/US9774166B2/en active Active
- 2014-03-14 EP EP17189482.7A patent/EP3289979B1/de active Active
- 2014-03-14 CN CN201480024956.3A patent/CN105188540B/zh active Active
-
2017
- 2017-08-22 US US15/683,435 patent/US10263394B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP3289979B1 (de) | 2023-03-01 |
US9774166B2 (en) | 2017-09-26 |
WO2014144866A3 (en) | 2014-11-20 |
CA2905537C (en) | 2021-09-14 |
EP3289979A3 (de) | 2018-06-13 |
EP3289979A2 (de) | 2018-03-07 |
CN105188540A (zh) | 2015-12-23 |
EP2967468A4 (de) | 2017-03-08 |
WO2014144866A2 (en) | 2014-09-18 |
CA2905537A1 (en) | 2014-09-18 |
CN105188540B (zh) | 2019-03-08 |
WO2014144998A3 (en) | 2014-11-13 |
EP2967468A2 (de) | 2016-01-20 |
US20140268169A1 (en) | 2014-09-18 |
WO2014144998A2 (en) | 2014-09-18 |
US10263394B2 (en) | 2019-04-16 |
US20170373469A1 (en) | 2017-12-28 |
JP2016513889A (ja) | 2016-05-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6553019B2 (ja) | 広帯域可変掃引光源 | |
US11183812B2 (en) | Widely tunable short-cavity laser | |
US20150380903A1 (en) | Surface emitting laser and optical coherence tomography using the surface emitting laser | |
JP2016027647A (ja) | 面発光レーザ、及び前記面発光レーザを用いた光干渉断層計 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170313 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20171116 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20171212 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20180309 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180510 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20181113 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190312 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20190403 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20190422 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20190604 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20190703 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6553019 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |