JP6542811B2 - 硬化性組成物 - Google Patents
硬化性組成物 Download PDFInfo
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- JP6542811B2 JP6542811B2 JP2017000420A JP2017000420A JP6542811B2 JP 6542811 B2 JP6542811 B2 JP 6542811B2 JP 2017000420 A JP2017000420 A JP 2017000420A JP 2017000420 A JP2017000420 A JP 2017000420A JP 6542811 B2 JP6542811 B2 JP 6542811B2
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- JP
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- Prior art keywords
- polyorganosiloxane
- chemical formula
- sio
- group
- formula
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims description 122
- 239000000126 substance Substances 0.000 claims description 94
- 125000003118 aryl group Chemical group 0.000 claims description 49
- 150000003377 silicon compounds Chemical class 0.000 claims description 36
- 125000003342 alkenyl group Chemical group 0.000 claims description 33
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 26
- 150000001875 compounds Chemical class 0.000 claims description 21
- 125000003700 epoxy group Chemical group 0.000 claims description 16
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 15
- 239000004065 semiconductor Substances 0.000 claims description 15
- 229910052710 silicon Inorganic materials 0.000 claims description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 229910004283 SiO 4 Inorganic materials 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 6
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 239000004973 liquid crystal related substance Substances 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- 238000001228 spectrum Methods 0.000 claims description 3
- 238000005481 NMR spectroscopy Methods 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 description 33
- 238000000034 method Methods 0.000 description 25
- 239000002245 particle Substances 0.000 description 22
- 239000003054 catalyst Substances 0.000 description 19
- 238000001723 curing Methods 0.000 description 16
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 15
- 239000000047 product Substances 0.000 description 15
- 125000001931 aliphatic group Chemical group 0.000 description 14
- 125000000217 alkyl group Chemical group 0.000 description 13
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 13
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Inorganic materials [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 13
- -1 siloxanes Chemical class 0.000 description 13
- 125000000524 functional group Chemical group 0.000 description 12
- 150000002430 hydrocarbons Chemical group 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 10
- 125000004122 cyclic group Chemical group 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 9
- 238000006459 hydrosilylation reaction Methods 0.000 description 8
- 239000003566 sealing material Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 6
- 150000001923 cyclic compounds Chemical class 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 6
- 238000007789 sealing Methods 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 125000002723 alicyclic group Chemical group 0.000 description 5
- 238000000149 argon plasma sintering Methods 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000002318 adhesion promoter Substances 0.000 description 4
- 125000000304 alkynyl group Chemical group 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
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- 239000000376 reactant Substances 0.000 description 4
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- 239000000377 silicon dioxide Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001338 aliphatic hydrocarbons Chemical group 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000008393 encapsulating agent Substances 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- RCNRJBWHLARWRP-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane;platinum Chemical compound [Pt].C=C[Si](C)(C)O[Si](C)(C)C=C RCNRJBWHLARWRP-UHFFFAOYSA-N 0.000 description 3
- 229910003437 indium oxide Inorganic materials 0.000 description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 3
- 239000010954 inorganic particle Substances 0.000 description 3
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- 239000002954 polymerization reaction product Substances 0.000 description 3
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- 229920005989 resin Polymers 0.000 description 3
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- 238000004383 yellowing Methods 0.000 description 3
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- AFABGHUZZDYHJO-UHFFFAOYSA-N 2-Methylpentane Chemical compound CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 125000005370 alkoxysilyl group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- HUCVOHYBFXVBRW-UHFFFAOYSA-M caesium hydroxide Chemical compound [OH-].[Cs+] HUCVOHYBFXVBRW-UHFFFAOYSA-M 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 150000004292 cyclic ethers Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 125000005417 glycidoxyalkyl group Chemical group 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 2
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- GRGVQLWQXHFRHO-AATRIKPKSA-N (e)-3-methylpent-3-en-1-yne Chemical compound C\C=C(/C)C#C GRGVQLWQXHFRHO-AATRIKPKSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 description 1
- HYFLWBNQFMXCPA-UHFFFAOYSA-N 1-ethyl-2-methylbenzene Chemical compound CCC1=CC=CC=C1C HYFLWBNQFMXCPA-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- HGUFODBRKLSHSI-UHFFFAOYSA-N 2,3,7,8-tetrachloro-dibenzo-p-dioxin Chemical compound O1C2=CC(Cl)=C(Cl)C=C2OC2=C1C=C(Cl)C(Cl)=C2 HGUFODBRKLSHSI-UHFFFAOYSA-N 0.000 description 1
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- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
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- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
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- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
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- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
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- 239000007791 liquid phase Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
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- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
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- 125000001624 naphthyl group Chemical group 0.000 description 1
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004344 phenylpropyl group Chemical group 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002683 reaction inhibitor Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 125000006413 ring segment Chemical group 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- FBEIPJNQGITEBL-UHFFFAOYSA-J tetrachloroplatinum Chemical compound Cl[Pt](Cl)(Cl)Cl FBEIPJNQGITEBL-UHFFFAOYSA-J 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- RSNQKPMXXVDJFG-UHFFFAOYSA-N tetrasiloxane Chemical compound [SiH3]O[SiH2]O[SiH2]O[SiH3] RSNQKPMXXVDJFG-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- AKVPCIASSWRYTN-UHFFFAOYSA-N zinc oxygen(2-) silicon(4+) Chemical compound [Si+4].[O-2].[Zn+2].[O-2].[O-2] AKVPCIASSWRYTN-UHFFFAOYSA-N 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
Classifications
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- C08L83/04—Polysiloxanes
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- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
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- C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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- G02F1/133603—Direct backlight with LEDs
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- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133617—Illumination with ultraviolet light; Luminescent elements or materials associated to the cell
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- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
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Description
(R1 3SiO1/2)a(R1 2SiO2/2)b(R1SiO3/2)c(SiO4/2)d
(R2 3SiO1/2)e(R2 2SiO2/2)f(R2SiO3/2)g(SiO4/2)h
HiYjSiO(4−i−j)/2
(R1R2SiO2/2)
(R3 2SiO2/2)
[RgSiO3/2]
[RhRi 2SiO1/2]p[RgSiO3/2]q
(RhRi 2Si)2O
|A−B|>0.03
数式1において、Aはポリオルガノシロキサン(A)の屈折率であり、Bはポリオルガノシロキサン(B)とケイ素化合物(C)の混合物の屈折率とすることができる。他の例として、数式1において、Aはポリオルガノシロキサン(B)との屈折率であり、Bはポリオルガノシロキサン(A)とケイ素化合物(C)との混合物の屈折率とすることができる。
|P−Q|≦0.1
硬化性組成物を1mmの間隔で離隔されている2枚のガラス板との間に注入し、150℃で1時間の間維持することで硬化させて、厚さが1mmである板状の試験片を製造し、常温でUV−VISスペクトロメータ(spectrometer)を用いて450nm波長に対する前記試験片の厚さ方向の光透過率を測定し、下記基準で評価する。
○:光透過度が70%以上である場合
×:光透過度が70%未満である場合
硬化性組成物を、2cmの間隔で離隔されている2枚のガラス板との間に注入し、150℃で1時間の間維持して硬化させ、板状の試験片を製造する。続いて、文字が記載された紙上に前記硬化された板状の試験片を置き、肉眼で文字を観察し下記基準に従って光散乱度を評価する。
○:下部に記載された文字が肉眼で識別できない場合
×:下部に記載された文字が肉眼で識別できる場合
硬化性組成物を、1mmの間隔で離隔されている2枚のガラス板との間に注入し、150℃で1時間の間維持して硬化させ、厚さが1mmである板状の試験片を製造する。前記試験片を150℃の温度で約500時間放置された後、黄変の発生がある可否かを観察して下記基準で評価する。
○:黄変現象が観察されない
×:黄変現象が観察される
硬化性組成物の各成分の屈折率は、アベ屈折計を用いて450nm波長の光に対して測定した。
下記化学式Aのポリオルガノシロキサン30g、下記化学式Bのポリオルガノシロキサン100g、下記化学式Cのポリオルガノシロキサン200gおよび下記化学式Dのポリオルガノシロキサン50gを混合し、Pt(0)の含量が5ppmになるように触媒(白金(0)―1,3―ジビニル―1,1,3,3―テトラメチルジシロキサン(Platinum(0)―1,3―divinyl―1,1,3,3―tetramethyldisiloxane))を配合し、均一に混合して硬化性組成物を製造した。上記において、化学式Aのポリオルガノシロキサンの屈折率(A)と化学式B、CおよびDのポリオルガノシロキサンの混合物の屈折率(B)との差の絶対値は0.09であった。
(ViMe2SiO1/2)2(Me2SiO2/2)40
[化学式B]
(ViMe2SiO1/2)2(Me2SiO2/2)20(Ph2SiO2/2)15
[化学式C]
(ViMe2SiO1/2)2(PhSiO3/2)8
[化学式D]
(HMe2SiO1/2)2(HMeSiO2/2)0.5(Ph2SiO2/2)1.5
下記化学式Eのポリオルガノシロキサン30g、下記化学式Fのポリオルガノシロキサン300gおよび下記化学式Gのポリオルガノシロキサン70gを混合し、Pt(0)の含量が5ppmになるように触媒(白金(0)―1,3―ジビニル―1,1,3,3―テトラメチルジシロキサン)を配合し、均一に混合して硬化性組成物を製造した。上記において、化学式Eのポリオルガノシロキサンの屈折率(A)と化学式FおよびGのポリオルガノシロキサンの混合物の屈折率(B)との差の絶対値は0.07であった。
[ViMe2SiO1/2]2[Me2SiO2/2]40[MeSiO3/2]5
[化学式F]
[ViMeSiO2/2]2[PhSiO3/2]6.5
[化学式G]
[HMe2SiO1/2]2[HMeSiO2/2]0.5[Ph2SiO2/2]1.5
下記化学式Hのポリオルガノシロキサン30g、下記化学式Iのポリオルガノシロキサン100g、下記化学式Jのポリオルガノシロキサン20gおよび下記化学式Kのポリオルガノシロキサン20gを混合し、Pt(0)の含量が5ppmになるように,触媒(白金(0)―1,3―ジビニル―1,1,3,3―テトラメチルジシロキサン)を配合し、均一に混合して硬化性組成物を製造した。上記において、化学式Hのポリオルガノシロキサンの屈折率(A)と化学式I、JおよびKのポリオルガノシロキサンの混合物の屈折率(B)との差の絶対値は1.1であった。
(ViMe2SiO1/2)2(Me2SiO2/2)20(Ph2SiO2/2)20
[化学式I]
(ViMe2SiO1/2)(Me3SiO1/2)3(SiO4/2)2
[化学式J]
(ViMe2SiO1/2)2(Me2SiO2/2)70
[化学式K]
(Me3SiO1/2)2(HMeSiO2/2)35
化学式Aのポリオルガノシロキサンを用いないことを除いて、実施例1と同様に硬化性組成物を製造した。
化学式Hのポリオルガノシロキサンを用いないことを除いて、実施例3と同様に硬化性組成物を製造した。
化学式Aのポリオルガノシロキサンは使用せず、その代わりにポリスチレン粒子30gを配合することを除いて、実施例1と同様に硬化性組成物を製造した。
Claims (4)
- (A−3)下記化学式1の平均組成式を有し、dは0であり、アリール基を含まない部分架橋構造ポリオルガノシロキサンと、
(B−2)下記化学式2の平均組成式を有し、eは0であり、hは0であり、アリール基を含む架橋構造ポリオルガノシロキサンと、
(C−1)アリール基を含む下記化学式3の化合物と、を含み、
下記数式1を満たすことを特徴とする硬化性組成物:
[化学式1]
(R1 3SiO1/2)a(R1 2SiO2/2)b(R1SiO3/2)c(SiO4/2)d
[化学式2]
(R2 3SiO1/2)e(R2 2SiO2/2)f(R2SiO3/2)g(SiO4/2)h
[化学式3]
HiYjSiO(4−i−j)/2
[数式1]
|A−B|>0.03
前記化学式1〜3において、R1、R2およびYはそれぞれ独立的なエポキシ基または一価炭化水素基であり、R1のうち少なくとも1つまたはR2のうち少なくとも1つはアルケニル基であり、aは0または正数であり、bは正数であり、cは0または正数であり、dは0または正数であり、b/(b+c+d)は0.65以上であり、eは0または正数であり、fは0または正数であり、gは0または正数であり、hは0または正数であり、f/(f+g+h)は0.65未満であり、gとhは同時に0でなく、iは0.2〜1であり、jは0.9〜2であり、
数式1において、Aはポリオルガノシロキサン(A−3)の屈折率であり、Bはポリオルガノシロキサン(B−2)および化合物(C−1)の混合物の屈折率であり、
化学式2において、g/(g+h)が0.8以上であり、
化学式2において、f/(f+g+h)が0.4以下であり、
ポリオルガノシロキサン(A−3)を、ポリオルガノシロキサン(B−2)とケイ素化合物(C−1)の合計重量100重量部に対して0.1〜30重量部の割合で含み、
ポリオルガノシロキサン(A−3)およびポリオルガノシロキサン(B−2)に含まれるアルケニル基のモル数(Ak)に対するケイ素化合物(C−1)に含まれるケイ素原子に結合した水素原子のモル数(H)の割合(H/Ak)が0.5〜2.0であり、
ポリオルガノシロキサン(A−3)は、 1 HNMR測定により求められるスペクトラムでケイ素原子に結合されたアルケニル基から来由するピークの面積(Ak)に対してケイ素原子に結合されたアルコキシ基から由来するピークの面積(OR)の割合(OR/Ak)が0.05以下であり、
ポリオルガノシロキサン(A−3)は、KOH適正により求められる酸価(acid value)が0.05mgKOH/g以下である。 - 硬化された請求項1に記載の硬化性組成物で封止されることを特徴とする光半導体。
- 請求項2に記載の光半導体をバックライトユニットに含むことを特徴とする液晶ディスプレイ。
- 請求項2に記載の光半導体を含むことを特徴とする照明器具。
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