JP6539199B2 - 基板搬送用移載機及び基板移載方法 - Google Patents
基板搬送用移載機及び基板移載方法 Download PDFInfo
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- JP6539199B2 JP6539199B2 JP2015246850A JP2015246850A JP6539199B2 JP 6539199 B2 JP6539199 B2 JP 6539199B2 JP 2015246850 A JP2015246850 A JP 2015246850A JP 2015246850 A JP2015246850 A JP 2015246850A JP 6539199 B2 JP6539199 B2 JP 6539199B2
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B24B21/18—Accessories
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
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- B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
- B65G2201/02—Articles
- B65G2201/0214—Articles of special size, shape or weigh
- B65G2201/022—Flat
Description
前記一対のハンドを開閉方向に互いに対称に接近又は離間するように移動させる開閉機構と、
前記開閉機構に動力を伝える駆動部と、
前記駆動部の動作を制御する制御部と、を備え、
前記開閉機構は、
前記一対のハンドの開閉方向の移動量に応じて回転する回転体と、
前記回転体の回転量を検出するセンサと、を有し、
前記制御部は、前記センサからの信号に基づいて前記駆動部の動作を制御する。
互いに対向する一対のハンドと、
前記一対のハンドを開閉方向に互いに同じ距離だけ接近又は離間するように移動させるための開閉機構と、
前記開閉機構に動力を伝えるための駆動部と、
基板を受け取る際に前記一対のハンドがウエハ受け取り位置からウエハクランプ位置へ移動するように前記駆動部の動作を制御するとともに、前記一対のハンドが前記ウエハクランプ位置に到達したか否かを判定し、前記一対のハンドが前記ウエハクランプ位置に到達しなかったと判定した場合には、リトライ動作を、予め定められた回数を上限として、前記一対のハンドが前記ウエハクランプ位置に到達するまで繰り返すように前記駆動部の動作を制御するための制御部と、
を備える。
基板を準備する工程と、
基板の両側から、第1の位置にある互いに対向する一対のハンドを互いに同じ距離だけ接近させる工程と、
前記一対のハンドが、基板を把持する第2の位置に到達したか否かを、前記一対のハンドの移動量を計測するセンサからの信号に基づいて判定する工程と、
前記一対のハンドが前記基板を把持する第2の位置に到達しなかったと判定した場合には、前記一対のハンドを前記第1の位置へ戻した後に、基板の両側から前記第1の位置にある互いに対向する一対のハンドを互いに同じ距離だけ接近させながら、前記一対のハンドが、基板を把持する第2の位置に到達したか否かを、前記一対のハンドの移動量を計測するセンサからの信号に基づいて判定する再試行を行い、該再試行により前記一対のハンドが前記基板を把持する第2位置に到達したと判定されるか、又は、該再試行の実施回数が所定回数に到達するまで、該再試行を繰り返す工程と、
前記一対のハンドが前記基板を把持する第2の位置に到達したと判定した場合には、該基板を移載する工程と、
を有する。
前記した特徴を有する基板移載方法により、基板を移載機からウエハステージへ移載し、
前記基板のベベル部を研磨し、
前記研磨されたウエハステージ上の基板を、移載機を介して搬送機へと受け渡し、
前記搬送機により洗浄ユニットに搬送された基板を洗浄する。
基板の移載機に基板を移載する方法を実行させるためのコンピュータプログラムを格納した記憶媒体において、
前記基板を移載する方法は、
基板の両側から、第1の位置にある互いに対向する一対のハンドを互いに同じ距離だけ接近させる工程と、
前記一対のハンドが、基板を把持する第2の位置に到達したか否かを、前記一対のハンドの移動量を計測するセンサからの信号に基づいて判定する工程と、
前記一対のハンドが前記基板を把持する第2の位置に到達しなかったと判定した場合には、前記一対のハンドを前記第1の位置へ戻した後に、基板の両側から前記第1の位置にある互いに対向する一対のハンドを互いに同じ距離だけ接近させながら、前記一対のハンドが、基板を把持する第2の位置に到達したか否かを、前記一対のハンドの移動量を計測するセンサからの信号に基づいて判定する再試行を行い、該再試行により前記一対のハンドが前記基板を把持する第2位置に到達したと判定されるか、又は、該再試行の実施回数が所定回数に到達するまで、該再試行を繰り返す工程と、
前記一対のハンドが前記基板を把持する第2の位置に到達したと判定した場合には、該基板を移載する工程と、
を備える。
11 ハウジング
12 開口部
13 シャッタ
23 ウエハステージ
40 ベベル研磨部
80 移載機
811、812 一対のハンド
811F、812F フィンガ部
82 開閉機構
83 駆動部
83a、83b 空圧式アクチュエータ
84 制御部
85 回転体
861、862 一対の歯車
87 環状ベルト
90 センサ
91 ドグ
91a、91b スリット
92a、92b フォトマイクロセンサ
94 ストッパ
95 突起部
99 補助ベルト
1001 第1研磨部
1002 第2研磨部
1003 洗浄ユニット
1004 乾燥機
1005 FOUP
1006 制御部
1007 EFEM
1008、1009 ウエハ仮置き台
1010、1011、1012、1013 搬送機
Claims (11)
- 互いに対向する一対のハンドと、
前記一対のハンドを開閉方向に互いに対称に接近又は離間するように移動させる開閉機構と、
前記開閉機構に動力を伝える駆動部と、
前記駆動部の動作を制御する制御部と、を備え、
前記開閉機構は、
前記一対のハンドの開閉方向の移動量に応じて回転する回転体と、
前記回転体の回転量を検出するセンサと、を有し、
前記駆動部は、第1のアクチュエータと第2のアクチュエータとを有し、前記第1のアクチュエータのピストン部分の先端部は、前記第2のアクチュエータのシリンダ部分の基端部に固定されており、前記第2のアクチュエータのピストン部分の先端部は、一方のハンドの基端部に固定されており、
前記駆動部は、ストッパをさらに有し、前記第2のアクチュエータの基端部には前記ストッパと当接可能な突起部が設けられており、
前記制御部は、前記一対のハンドがウエハクランプ位置に到達したか否かが前記センサからの信号に基づいて判定される前に、前記突起部が前記ストッパに当接するまで前記第1のアクチュエータのピストン部分が伸長され、前記一対のハンドがウエハ受け取り位置へと移動され、前記突起部が前記ストッパに当接した状態で前記第2のアクチュエータのピストン部分が伸長され、前記一対のハンドがウエハクランプ位置へと移動されるように、前記センサからの信号に基づいて前記駆動部の動作を制御する、
ことを特徴とする基板搬送用移載機。 - 前記第2のアクチュエータは、前記第1のアクチュエータよりも小さい、
ことを特徴とする請求項1に記載の基板搬送用移載機。 - 前記開閉機構は、一対の歯車と、前記一対の歯車に掛け回された環状ベルトと、を有し、
前記環状ベルトは、前記一対の歯車間において互いに平行な2つの直線部分を形成するように張られており、
一方のハンドは、前記環状ベルトの一方の直線部分に取り付けられ、他方のハンドは、前記環状ベルトの他方の直線部分に取り付けられている
ことを特徴とする請求項1または2に記載の基板搬送用移載機。 - 前記センサは、前記一対の歯車の一方に設けられている、
ことを特徴とする請求項3に記載の基板搬送用移載機。 - 前記回転体は、前記一対の歯車の一方から構成されている
ことを特徴とする請求項3に記載の基板搬送用移載機。 - 前記回転体は、前記一対の歯車とは別の部品である
ことを特徴とする請求項3に記載の基板搬送用移載機。 - 前記第1のアクチュエータおよび第2のアクチュエータは、空圧式アクチュエータである
ことを特徴とする請求項1〜6のいずれかに記載の基板搬送用移載機。 - 互いに対向する一対のハンドと、
前記一対のハンドを開閉方向に互いに対称に接近又は離間するように移動させる開閉機構と、
前記開閉機構に動力を伝える駆動部と、
前記駆動部の動作を制御する制御部と、を備え、
前記開閉機構は、
前記一対のハンドの開閉方向の移動量に応じて回転する回転体と、
前記回転体の回転量を検出するセンサと、を有し、
前記制御部は、前記一対のハンドがウエハ受け取り位置からウエハクランプ位置へ移動するように前記駆動部の動作を制御し、前記一対のハンドが前記ウエハクランプ位置に到達したか否かを前記センサからの信号に基づいて判定し、前記一対のハンドが前記ウエハクランプ位置に到達しなかったと判定した場合には、前記一対のハンドが前記ウエハ受け取り位置へ戻された後に前記ウエハ受け取り位置から前記ウエハクランプ位置へ移動するように前記駆動部の動作を制御するリトライ動作を予め定められた回数を上限として、前記一対のハンドが前記ウエハクランプ位置に到達するまで繰り返す
ことを特徴とする基板搬送用移載機。 - 前記センサは、ドグ式センサである
ことを特徴とする請求項1〜8のいずれかに記載の基板搬送用移載機。 - 請求項1〜9のいずれかに記載の基板搬送用移載機を備えた
ことを特徴とする半導体デバイス製造装置。 - 請求項1〜9のいずれかに記載の基板搬送用移載機を備えた
ことを特徴とするベベル研磨装置。
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