JP6506965B2 - 光酸発生剤を含む反射防止コーティング組成物を用いるパターン形成方法 - Google Patents

光酸発生剤を含む反射防止コーティング組成物を用いるパターン形成方法 Download PDF

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JP6506965B2
JP6506965B2 JP2015000579A JP2015000579A JP6506965B2 JP 6506965 B2 JP6506965 B2 JP 6506965B2 JP 2015000579 A JP2015000579 A JP 2015000579A JP 2015000579 A JP2015000579 A JP 2015000579A JP 6506965 B2 JP6506965 B2 JP 6506965B2
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coating composition
antireflective coating
layer
composition layer
photoacid generator
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JP2015000579A
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Japanese (ja)
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JP2015129938A (ja
Inventor
カン，ジフン
イ，ネウォン
イ，スンウク
イ，ソク
イム，ジェボン
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ローム・アンド・ハース・エレクトロニック・マテリアルズ・コリア・リミテッド
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0276—Photolithographic processes using an anti-reflective coating

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
JP2015000579A 2013-12-30 2015-01-05 光酸発生剤を含む反射防止コーティング組成物を用いるパターン形成方法 Active JP6506965B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2013-0166928 2013-12-30
KR1020130166928A KR102233875B1 (ko) 2013-12-30 2013-12-30 광산 발생제를 포함하는 반사방지 코팅 조성물을 이용한 패턴 형성 방법

Publications (2)

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JP2015129938A JP2015129938A (ja) 2015-07-16
JP6506965B2 true JP6506965B2 (ja) 2019-04-24

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JP2015000579A Active JP6506965B2 (ja) 2013-12-30 2015-01-05 光酸発生剤を含む反射防止コーティング組成物を用いるパターン形成方法

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JP (1) JP6506965B2 (zh)
KR (1) KR102233875B1 (zh)
CN (1) CN105223774B (zh)
TW (1) TWI666522B (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102653125B1 (ko) * 2016-01-13 2024-04-01 삼성전자주식회사 포토레지스트의 하부막 조성물 및 이를 이용한 패턴 형성 방법
US11262656B2 (en) * 2016-03-31 2022-03-01 Rohm And Haas Electronic Materials Korea Ltd. Coating compositions for use with an overcoated photoresist
WO2018173446A1 (ja) * 2017-03-22 2018-09-27 Jsr株式会社 パターン形成方法
WO2018179704A1 (ja) * 2017-03-27 2018-10-04 Jsr株式会社 パターン形成方法
US11269252B2 (en) * 2019-07-22 2022-03-08 Rohm And Haas Electronic Materials Llc Method for forming pattern using antireflective coating composition including photoacid generator
DE102019134535B4 (de) * 2019-08-05 2023-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Materialien für unteren antireflexbelag
JPWO2021049472A1 (zh) * 2019-09-10 2021-03-18
JP7402715B2 (ja) * 2020-03-06 2023-12-21 東京エレクトロン株式会社 ウエハを処理する方法
CN116814119A (zh) * 2023-07-03 2023-09-29 长鑫存储技术有限公司 底部抗反射涂层组合物、图案形成方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6379322A (ja) * 1986-09-24 1988-04-09 Hitachi Ltd レジストパタ−ン形成方法
US6165697A (en) 1991-11-15 2000-12-26 Shipley Company, L.L.C. Antihalation compositions
US5886102A (en) 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
US5939236A (en) 1997-02-07 1999-08-17 Shipley Company, L.L.C. Antireflective coating compositions comprising photoacid generators
JP3358547B2 (ja) * 1997-07-02 2002-12-24 ヤマハ株式会社 配線形成法
US7029821B2 (en) * 2003-02-11 2006-04-18 Rohm And Haas Electronic Materials Llc Photoresist and organic antireflective coating compositions
JP4738054B2 (ja) * 2004-05-18 2011-08-03 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． オーバーコートされるフォトレジストと共に使用するコーティング組成物
IL213195A0 (en) * 2010-05-31 2011-07-31 Rohm & Haas Elect Mat Photoresist compositions and emthods of forming photolithographic patterns
JP2013061648A (ja) * 2011-09-09 2013-04-04 Rohm & Haas Electronic Materials Llc フォトレジスト上塗り組成物および電子デバイスを形成する方法
US8790867B2 (en) * 2011-11-03 2014-07-29 Rohm And Haas Electronic Materials Llc Methods of forming photolithographic patterns by negative tone development
US8697336B2 (en) * 2011-12-15 2014-04-15 Az Electronic Materials Usa Corp. Composition for forming a developable bottom antireflective coating

Also Published As

Publication number Publication date
TWI666522B (zh) 2019-07-21
KR20150077949A (ko) 2015-07-08
TW201541192A (zh) 2015-11-01
CN105223774B (zh) 2019-12-20
JP2015129938A (ja) 2015-07-16
CN105223774A (zh) 2016-01-06
KR102233875B1 (ko) 2021-03-30

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