JP6400977B2 - スピン処理装置 - Google Patents
スピン処理装置 Download PDFInfo
- Publication number
- JP6400977B2 JP6400977B2 JP2014162096A JP2014162096A JP6400977B2 JP 6400977 B2 JP6400977 B2 JP 6400977B2 JP 2014162096 A JP2014162096 A JP 2014162096A JP 2014162096 A JP2014162096 A JP 2014162096A JP 6400977 B2 JP6400977 B2 JP 6400977B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- clamp
- rotating
- magnet
- pin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
Description
第1の実施形態について図1ないし図8を参照して説明する。
第2の実施形態について図9及び図10を参照して説明する。
第3の実施形態について図11を参照して説明する。
21 クランプピン
23 ピン回転体
31a マグネットギア
31b 回転用磁石
31c 上下アーム
31d 上下リング
31e 昇降機構
32a マグネットギア
32b 回転用磁石
32c 上下アーム
32d 上下リング
32e 昇降機構
W 基板
Claims (5)
- 基板を回転させて処理するスピン処理装置であって、
前記基板の外周面に各々当接して前記基板を把持する少なくとも三本のクランプピンと、
前記クランプピンごとに設けられ、前記クランプピンを前記基板の回転軸と平行な自身の回転軸から偏心させて保持する回転可能な複数のピン回転体と、
前記ピン回転体ごとにそのピン回転体の外周面に設けられ、磁極が前記ピン回転体の回転軸の軸方向に沿って螺旋状に形成された複数のマグネットギアと、
前記マグネットギアごとに設けられ、前記マグネットギアの磁極と引き合うように位置付けられた複数の回転用磁石と、
前記複数の回転用磁石を前記ピン回転体の回転軸の軸方向に沿って移動させる移動機構と、
を備えることを特徴とするスピン処理装置。 - 前記移動機構は、
前記複数の回転用磁石を保持し、前記ピン回転体の回転軸の軸方向に移動可能な保持部と、
前記保持部を前記ピン回転体の回転軸の軸方向に沿って移動させる昇降機構と、
を具備することを特徴とする請求項1に記載のスピン処理装置。 - 前記移動機構は、前記保持部を位置決めして停止させる機能を有することを特徴とする請求項2に記載のスピン処理装置。
- 前記クランプピンは、前記基板の周方向に沿って一本置きに並ぶ三本を一組として六本設けられており、
前記回転用磁石は、前記クランプピンの組ごとに対応させて設けられており、
前記移動機構は、前記クランプピンの組ごとの回転用磁石をその組ごとに前記ピン回転体の回転軸の軸方向に沿って移動させることを特徴とする請求項1乃至請求項3のいずれか一項に記載のスピン処理装置。 - 前記移動機構は、前記基板を処理する処理中、前記クランプピンの組ごとの回転用磁石を交互に前記ピン回転体の回転軸の軸方向に沿って移動させることを特徴とする請求項4に記載のスピン処理装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014162096A JP6400977B2 (ja) | 2013-09-25 | 2014-08-08 | スピン処理装置 |
TW103129703A TWI547318B (zh) | 2013-09-25 | 2014-08-28 | Rotation processing device |
US14/491,065 US9454080B2 (en) | 2013-09-25 | 2014-09-19 | Spin treatment apparatus |
KR1020140126669A KR101587359B1 (ko) | 2013-09-25 | 2014-09-23 | 스핀 처리 장치 |
CN201410497873.8A CN104465359B (zh) | 2013-09-25 | 2014-09-25 | 自旋处理装置 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013198094 | 2013-09-25 | ||
JP2013198094 | 2013-09-25 | ||
JP2014162096A JP6400977B2 (ja) | 2013-09-25 | 2014-08-08 | スピン処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015088736A JP2015088736A (ja) | 2015-05-07 |
JP6400977B2 true JP6400977B2 (ja) | 2018-10-03 |
Family
ID=52689821
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014162096A Expired - Fee Related JP6400977B2 (ja) | 2013-09-25 | 2014-08-08 | スピン処理装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9454080B2 (ja) |
JP (1) | JP6400977B2 (ja) |
KR (1) | KR101587359B1 (ja) |
CN (1) | CN104465359B (ja) |
TW (1) | TWI547318B (ja) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6734666B2 (ja) * | 2015-03-30 | 2020-08-05 | 芝浦メカトロニクス株式会社 | スピン処理装置 |
KR101841342B1 (ko) | 2015-03-30 | 2018-03-22 | 시바우라 메카트로닉스 가부시끼가이샤 | 스핀 처리 장치 |
JP6482402B2 (ja) * | 2015-06-19 | 2019-03-13 | 信越半導体株式会社 | 枚葉式ウェーハ洗浄処理装置及びウェーハ洗浄方法 |
JP6581831B2 (ja) * | 2015-07-28 | 2019-09-25 | 東京エレクトロン株式会社 | 保持部の姿勢維持機構 |
CN105173629B (zh) * | 2015-09-17 | 2017-12-08 | 东莞市阳腾自动化科技有限公司 | 一种圣诞球自动装配设备 |
JP6322256B2 (ja) * | 2016-10-21 | 2018-05-09 | 株式会社プレテック | ウェーハ保持装置及びウェーハ処理装置 |
JP6322255B2 (ja) * | 2016-10-21 | 2018-05-09 | 株式会社プレテック | ウェーハ保持装置及びウェーハ処理装置 |
JP6810585B2 (ja) * | 2016-11-30 | 2021-01-06 | タツモ株式会社 | チャック装置及び貼合装置 |
JP6892774B2 (ja) * | 2017-03-24 | 2021-06-23 | 株式会社Screenホールディングス | 基板保持回転装置およびそれを備えた基板処理装置、ならびに基板処理方法 |
JP6974116B2 (ja) * | 2017-10-27 | 2021-12-01 | 株式会社荏原製作所 | 基板保持装置並びに基板保持装置を備えた基板処理装置および基板処理方法 |
US10658221B2 (en) * | 2017-11-14 | 2020-05-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor wafer cleaning apparatus and method for cleaning semiconductor wafer |
JP7066471B2 (ja) * | 2018-03-26 | 2022-05-13 | 株式会社Screenホールディングス | 基板処理方法および基板処理装置 |
JP7074606B2 (ja) * | 2018-08-02 | 2022-05-24 | 株式会社荏原製作所 | 基板を保持するためのトップリングおよび基板処理装置 |
WO2020068343A1 (en) * | 2018-09-28 | 2020-04-02 | Applied Materials, Inc. | Coaxial lift device with dynamic leveling |
CN109896277B (zh) * | 2019-03-19 | 2023-12-26 | 江苏信息职业技术学院 | 真空分配模块、真空吸盘及测试分选机 |
CN111318412B (zh) * | 2020-04-10 | 2020-11-03 | 玉环市万进新能源科技有限公司 | 一种用于电焊条上药皮的压制装置 |
CN112588485B (zh) * | 2020-12-25 | 2021-12-31 | 安徽美景工艺品有限公司 | 一种木雕工艺品人工喷漆辅助装置 |
GB202102290D0 (en) * | 2021-02-18 | 2021-04-07 | Lam Res Ag | Apparatus for processing a wafer-shaped article |
CN114653660B (zh) * | 2022-05-20 | 2022-09-16 | 智程半导体设备科技(昆山)有限公司 | 一种磁性夹块及半导体基材清洗装置 |
CN117462989B (zh) * | 2023-12-28 | 2024-03-01 | 山西铱倍力科技有限公司 | 一种氯铱酸生产用结晶设备 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH062752A (ja) * | 1992-06-18 | 1994-01-11 | Ishikawajima Harima Heavy Ind Co Ltd | 運動方向変換装置 |
JPH09213772A (ja) * | 1996-01-30 | 1997-08-15 | Dainippon Screen Mfg Co Ltd | 基板保持装置 |
JPH09303515A (ja) * | 1996-05-15 | 1997-11-25 | Hitachi Metals Ltd | 磁気ねじ装置 |
JP3647576B2 (ja) | 1996-11-01 | 2005-05-11 | 大日本スクリーン製造株式会社 | 基板保持装置 |
JP4031724B2 (ja) * | 2002-07-26 | 2008-01-09 | 大日本スクリーン製造株式会社 | 基板処理方法および基板処理装置 |
JP4095613B2 (ja) * | 2005-01-13 | 2008-06-04 | 大日本スクリーン製造株式会社 | 基板保持装置 |
JP4796902B2 (ja) * | 2005-07-11 | 2011-10-19 | 芝浦メカトロニクス株式会社 | 基板のスピン処理装置 |
KR100829923B1 (ko) * | 2006-08-30 | 2008-05-16 | 세메스 주식회사 | 스핀헤드 및 이를 이용하는 기판처리방법 |
KR100865941B1 (ko) * | 2006-11-28 | 2008-10-30 | 세메스 주식회사 | 스핀헤드 및 상기 스핀헤드의 기판 척킹/언척킹방법,그리고 상기 스핀헤드를 구비하는 기판 처리 장치 |
JP5422143B2 (ja) * | 2008-06-04 | 2014-02-19 | 株式会社荏原製作所 | 基板把持機構 |
CN101704452B (zh) * | 2009-09-03 | 2012-05-02 | 东莞宏威数码机械有限公司 | 滚轮装置驱动机构 |
KR20110108628A (ko) * | 2010-03-29 | 2011-10-06 | 가부시키가이샤 프레테크 에이티 | 웨이퍼 스테이지 |
KR101227458B1 (ko) * | 2012-08-13 | 2013-01-29 | 최이화 | 코깅 감소용 마그네틱 기어 및 이를 이용한 이송장치 |
-
2014
- 2014-08-08 JP JP2014162096A patent/JP6400977B2/ja not_active Expired - Fee Related
- 2014-08-28 TW TW103129703A patent/TWI547318B/zh not_active IP Right Cessation
- 2014-09-19 US US14/491,065 patent/US9454080B2/en not_active Expired - Fee Related
- 2014-09-23 KR KR1020140126669A patent/KR101587359B1/ko active IP Right Grant
- 2014-09-25 CN CN201410497873.8A patent/CN104465359B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TWI547318B (zh) | 2016-09-01 |
JP2015088736A (ja) | 2015-05-07 |
US9454080B2 (en) | 2016-09-27 |
KR20150034100A (ko) | 2015-04-02 |
CN104465359A (zh) | 2015-03-25 |
KR101587359B1 (ko) | 2016-01-20 |
TW201529183A (zh) | 2015-08-01 |
CN104465359B (zh) | 2017-08-04 |
US20150083038A1 (en) | 2015-03-26 |
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