JP6340216B2 - 走査電子顕微鏡 - Google Patents

走査電子顕微鏡 Download PDF

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Publication number
JP6340216B2
JP6340216B2 JP2014045311A JP2014045311A JP6340216B2 JP 6340216 B2 JP6340216 B2 JP 6340216B2 JP 2014045311 A JP2014045311 A JP 2014045311A JP 2014045311 A JP2014045311 A JP 2014045311A JP 6340216 B2 JP6340216 B2 JP 6340216B2
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Japan
Prior art keywords
slit
electron beam
electron
selection
transmittance
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JP2014045311A
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English (en)
Japanese (ja)
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JP2015170518A (ja
JP2015170518A5 (enExample
Inventor
早田　康成
康成 早田
健良 大橋
健良 大橋
貴文 三羽
貴文 三羽
範次 高橋
範次 高橋
源 川野
川野　　源
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Priority to JP2014045311A priority Critical patent/JP6340216B2/ja
Priority to US15/123,828 priority patent/US10134558B2/en
Priority to PCT/JP2015/053033 priority patent/WO2015133214A1/ja
Publication of JP2015170518A publication Critical patent/JP2015170518A/ja
Publication of JP2015170518A5 publication Critical patent/JP2015170518A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/145—Combinations of electrostatic and magnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/263—Contrast, resolution or power of penetration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29—Reflection microscopes
    • H01J37/292—Reflection microscopes using scanning ray
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/057—Energy or mass filtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H01J2237/24514—Beam diagnostics including control of the parameter or property diagnosed

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2014045311A 2014-03-07 2014-03-07 走査電子顕微鏡 Active JP6340216B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2014045311A JP6340216B2 (ja) 2014-03-07 2014-03-07 走査電子顕微鏡
US15/123,828 US10134558B2 (en) 2014-03-07 2015-02-04 Scanning electron microscope
PCT/JP2015/053033 WO2015133214A1 (ja) 2014-03-07 2015-02-04 走査電子顕微鏡

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014045311A JP6340216B2 (ja) 2014-03-07 2014-03-07 走査電子顕微鏡

Publications (3)

Publication Number Publication Date
JP2015170518A JP2015170518A (ja) 2015-09-28
JP2015170518A5 JP2015170518A5 (enExample) 2016-11-04
JP6340216B2 true JP6340216B2 (ja) 2018-06-06

Family

ID=54055024

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014045311A Active JP6340216B2 (ja) 2014-03-07 2014-03-07 走査電子顕微鏡

Country Status (3)

Country Link
US (1) US10134558B2 (enExample)
JP (1) JP6340216B2 (enExample)
WO (1) WO2015133214A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101773861B1 (ko) * 2016-05-20 2017-09-01 한국표준과학연구원 모노크로미터를 구비한 전자선장치
JP6702807B2 (ja) * 2016-06-14 2020-06-03 日本電子株式会社 電子顕微鏡および画像取得方法
WO2019100600A1 (en) * 2017-11-21 2019-05-31 Focus-Ebeam Technology (Beijing) Co., Ltd. Low voltage scanning electron microscope and method for specimen observation
US10998166B2 (en) * 2019-07-29 2021-05-04 Fei Company System and method for beam position visualization
US11328895B2 (en) * 2020-07-24 2022-05-10 Fei Company Particle beam focusing
JP7431136B2 (ja) * 2020-10-09 2024-02-14 株式会社日立ハイテク 荷電粒子線装置、及び制御方法
CN114256043B (zh) 2020-12-02 2024-04-05 聚束科技（北京）有限公司 一种电子束系统
CN114220725B (zh) 2020-12-02 2024-05-07 聚束科技（北京）有限公司 一种电子显微镜

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6293848A (ja) * 1985-10-21 1987-04-30 Hitachi Ltd 電界放射形走査電子顕微鏡及びその類似装置
US4697080A (en) * 1986-01-06 1987-09-29 The United States Of America As Represented By The United States Department Of Energy Analysis with electron microscope of multielement samples using pure element standards
JPH01102930A (ja) * 1987-10-16 1989-04-20 Hitachi Ltd 電子線描画装置
JP2873839B2 (ja) * 1989-11-01 1999-03-24 大日本印刷株式会社 集束イオンビーム装置におけるアパーチャー検査方法
JPH03283247A (ja) * 1990-03-30 1991-12-13 Mitsubishi Electric Corp 荷電ビーム装置におけるビームブランキング装置
JPH04112439A (ja) * 1990-08-31 1992-04-14 Jeol Ltd 電子線装置
JP3272820B2 (ja) * 1993-06-24 2002-04-08 富士通株式会社 電子ビーム露光装置及び方法
JP3376793B2 (ja) * 1995-12-20 2003-02-10 株式会社日立製作所 走査形電子顕微鏡
US6184524B1 (en) * 1996-08-07 2001-02-06 Gatan, Inc. Automated set up of an energy filtering transmission electron microscope
JP3697810B2 (ja) * 1996-12-18 2005-09-21 株式会社ニコン 電子線を用いた転写装置
US5969355A (en) * 1997-09-04 1999-10-19 Seiko Instruments Inc. Focused ion beam optical axis adjustment method and focused ion beam apparatus
NL1009959C2 (nl) * 1998-08-28 2000-02-29 Univ Delft Tech Elektronenmicroscoop.
JP2000100715A (ja) * 1998-09-17 2000-04-07 Nikon Corp 電子ビーム露光装置の調整方法
US6614026B1 (en) * 1999-04-15 2003-09-02 Applied Materials, Inc. Charged particle beam column
JP2002542818A (ja) 1999-05-03 2002-12-17 カロリンスカ イノヴェーションズ アクツィエボラーグ ニューロンの発生に関連する材料及び方法
JP4041260B2 (ja) * 2000-03-02 2008-01-30 日本電子株式会社 荷電粒子ビーム装置及び荷電粒子ビーム装置の制御方法
TWI294632B (en) * 2000-06-27 2008-03-11 Ebara Corp Inspecting device using an electron ebam and method for making semiconductor devices with such inspection device
US6678932B1 (en) * 2001-11-08 2004-01-20 Schlumberger Technologies, Inc. Fixture for assembling parts of a device such as a Wien filter
US6593578B1 (en) * 2001-11-08 2003-07-15 Schlumberger Technologies, Inc. Wien filter for use in a scanning electron microscope or the like
DE10312989A1 (de) * 2002-03-28 2003-11-06 Toshiba Kk Lithographiesystem mit Strahl aus geladenen Teilchen, Lithographieverfahren, das einen Strahl aus geladenen Teilchen verwendet, Verfahren zum Steuern eines Strahls aus geladenen Teilchen, und Verfahren zur Herstellung eines Halbleiterbauteils
EP1517353B1 (en) * 2003-09-11 2008-06-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam energy width reduction system for charged particle beam system
EP1517354B1 (en) * 2003-09-11 2008-05-21 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Double stage charged particle beam energy width reduction system for charged particle beam system
JP2005294128A (ja) 2004-04-02 2005-10-20 Jeol Ltd エネルギーフィルタおよび電子顕微鏡ならびにスリット移動機構
EP1744344B1 (en) * 2005-07-11 2010-08-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electric-magnetic field generating element and assembling method for same
JP2009099540A (ja) * 2007-09-27 2009-05-07 Hitachi High-Technologies Corp 試料の検査，測定方法、及び走査電子顕微鏡
DE102009052392A1 (de) * 2009-11-09 2011-12-15 Carl Zeiss Nts Gmbh SACP-Verfahren und teilchenoptisches System zur Ausführung eines solchen Verfahrens
JP5329380B2 (ja) 2009-12-15 2013-10-30 日本電子株式会社 モノクロメータのスリット位置制御方法及び装置並びに分析電子顕微鏡
US8274046B1 (en) * 2011-05-19 2012-09-25 Hermes Microvision Inc. Monochromator for charged particle beam apparatus
US9053900B2 (en) * 2012-04-03 2015-06-09 Kla-Tencor Corporation Apparatus and methods for high-resolution electron beam imaging
JP5972677B2 (ja) * 2012-06-12 2016-08-17 日本電子株式会社 電子顕微鏡の調整方法及び電子顕微鏡
JP6265643B2 (ja) * 2013-07-31 2018-01-24 株式会社日立ハイテクノロジーズ 電子ビーム装置
JP2016039119A (ja) * 2014-08-11 2016-03-22 日本電子株式会社 電子顕微鏡、および電子顕微鏡の調整方法
JP6266467B2 (ja) * 2014-08-11 2018-01-24 日本電子株式会社 電子顕微鏡、およびモノクロメーターの調整方法

Also Published As

Publication number Publication date
US10134558B2 (en) 2018-11-20
JP2015170518A (ja) 2015-09-28
WO2015133214A1 (ja) 2015-09-11
US20170018394A1 (en) 2017-01-19

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