JP2015170518A5 - - Google Patents

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Publication number
JP2015170518A5
JP2015170518A5 JP2014045311A JP2014045311A JP2015170518A5 JP 2015170518 A5 JP2015170518 A5 JP 2015170518A5 JP 2014045311 A JP2014045311 A JP 2014045311A JP 2014045311 A JP2014045311 A JP 2014045311A JP 2015170518 A5 JP2015170518 A5 JP 2015170518A5
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JP
Japan
Prior art keywords
slit
electron microscope
scanning electron
electron beam
scanning
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JP2014045311A
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English (en)
Japanese (ja)
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JP2015170518A (ja
JP6340216B2 (ja
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Priority to JP2014045311A priority Critical patent/JP6340216B2/ja
Priority claimed from JP2014045311A external-priority patent/JP6340216B2/ja
Priority to US15/123,828 priority patent/US10134558B2/en
Priority to PCT/JP2015/053033 priority patent/WO2015133214A1/ja
Publication of JP2015170518A publication Critical patent/JP2015170518A/ja
Publication of JP2015170518A5 publication Critical patent/JP2015170518A5/ja
Application granted granted Critical
Publication of JP6340216B2 publication Critical patent/JP6340216B2/ja
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JP2014045311A 2014-03-07 2014-03-07 走査電子顕微鏡 Active JP6340216B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2014045311A JP6340216B2 (ja) 2014-03-07 2014-03-07 走査電子顕微鏡
US15/123,828 US10134558B2 (en) 2014-03-07 2015-02-04 Scanning electron microscope
PCT/JP2015/053033 WO2015133214A1 (ja) 2014-03-07 2015-02-04 走査電子顕微鏡

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014045311A JP6340216B2 (ja) 2014-03-07 2014-03-07 走査電子顕微鏡

Publications (3)

Publication Number Publication Date
JP2015170518A JP2015170518A (ja) 2015-09-28
JP2015170518A5 true JP2015170518A5 (enExample) 2016-11-04
JP6340216B2 JP6340216B2 (ja) 2018-06-06

Family

ID=54055024

Family Applications (1)

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JP2014045311A Active JP6340216B2 (ja) 2014-03-07 2014-03-07 走査電子顕微鏡

Country Status (3)

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US (1) US10134558B2 (enExample)
JP (1) JP6340216B2 (enExample)
WO (1) WO2015133214A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018518005A (ja) * 2016-05-20 2018-07-05 韓国標準科学研究院Ｋｏｒｅａ Ｒｅｓｅｒｃｈ Ｉｎｓｔｉｔｕｔｅ Ｏｆ Ｓｔａｎｄａｒｄｓ Ａｎｄ Ｓｃｉｅｎｃｅ モノクロメーターを備えた電子線装置
JP6702807B2 (ja) * 2016-06-14 2020-06-03 日本電子株式会社 電子顕微鏡および画像取得方法
US10777382B2 (en) 2017-11-21 2020-09-15 Focus-Ebeam Technology (Beijing) Co., Ltd. Low voltage scanning electron microscope and method for specimen observation
US10998166B2 (en) * 2019-07-29 2021-05-04 Fei Company System and method for beam position visualization
US11328895B2 (en) * 2020-07-24 2022-05-10 Fei Company Particle beam focusing
JP7431136B2 (ja) * 2020-10-09 2024-02-14 株式会社日立ハイテク 荷電粒子線装置、及び制御方法
CN114256043B (zh) 2020-12-02 2024-04-05 聚束科技（北京）有限公司 一种电子束系统
CN114220725B (zh) 2020-12-02 2024-05-07 聚束科技（北京）有限公司 一种电子显微镜
US12542253B2 (en) * 2023-02-28 2026-02-03 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle optics, charged particle beam apparatus, and method for scanning a charged particle beam

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