JP2015170518A5 - - Google Patents
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- Publication number
- JP2015170518A5 JP2015170518A5 JP2014045311A JP2014045311A JP2015170518A5 JP 2015170518 A5 JP2015170518 A5 JP 2015170518A5 JP 2014045311 A JP2014045311 A JP 2014045311A JP 2014045311 A JP2014045311 A JP 2014045311A JP 2015170518 A5 JP2015170518 A5 JP 2015170518A5
- Authority
- JP
- Japan
- Prior art keywords
- slit
- electron microscope
- scanning electron
- electron beam
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims 15
- 230000005540 biological transmission Effects 0.000 claims 12
- 238000002834 transmittance Methods 0.000 claims 8
- 238000005259 measurement Methods 0.000 claims 6
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000012544 monitoring process Methods 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014045311A JP6340216B2 (ja) | 2014-03-07 | 2014-03-07 | 走査電子顕微鏡 |
| US15/123,828 US10134558B2 (en) | 2014-03-07 | 2015-02-04 | Scanning electron microscope |
| PCT/JP2015/053033 WO2015133214A1 (ja) | 2014-03-07 | 2015-02-04 | 走査電子顕微鏡 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014045311A JP6340216B2 (ja) | 2014-03-07 | 2014-03-07 | 走査電子顕微鏡 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015170518A JP2015170518A (ja) | 2015-09-28 |
| JP2015170518A5 true JP2015170518A5 (enExample) | 2016-11-04 |
| JP6340216B2 JP6340216B2 (ja) | 2018-06-06 |
Family
ID=54055024
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014045311A Active JP6340216B2 (ja) | 2014-03-07 | 2014-03-07 | 走査電子顕微鏡 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US10134558B2 (enExample) |
| JP (1) | JP6340216B2 (enExample) |
| WO (1) | WO2015133214A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101773861B1 (ko) * | 2016-05-20 | 2017-09-01 | 한국표준과학연구원 | 모노크로미터를 구비한 전자선장치 |
| JP6702807B2 (ja) * | 2016-06-14 | 2020-06-03 | 日本電子株式会社 | 電子顕微鏡および画像取得方法 |
| WO2019100600A1 (en) * | 2017-11-21 | 2019-05-31 | Focus-Ebeam Technology (Beijing) Co., Ltd. | Low voltage scanning electron microscope and method for specimen observation |
| US10998166B2 (en) * | 2019-07-29 | 2021-05-04 | Fei Company | System and method for beam position visualization |
| US11328895B2 (en) * | 2020-07-24 | 2022-05-10 | Fei Company | Particle beam focusing |
| JP7431136B2 (ja) * | 2020-10-09 | 2024-02-14 | 株式会社日立ハイテク | 荷電粒子線装置、及び制御方法 |
| CN114256043B (zh) | 2020-12-02 | 2024-04-05 | 聚束科技(北京)有限公司 | 一种电子束系统 |
| CN114220725B (zh) | 2020-12-02 | 2024-05-07 | 聚束科技(北京)有限公司 | 一种电子显微镜 |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6293848A (ja) * | 1985-10-21 | 1987-04-30 | Hitachi Ltd | 電界放射形走査電子顕微鏡及びその類似装置 |
| US4697080A (en) * | 1986-01-06 | 1987-09-29 | The United States Of America As Represented By The United States Department Of Energy | Analysis with electron microscope of multielement samples using pure element standards |
| JPH01102930A (ja) * | 1987-10-16 | 1989-04-20 | Hitachi Ltd | 電子線描画装置 |
| JP2873839B2 (ja) * | 1989-11-01 | 1999-03-24 | 大日本印刷株式会社 | 集束イオンビーム装置におけるアパーチャー検査方法 |
| JPH03283247A (ja) * | 1990-03-30 | 1991-12-13 | Mitsubishi Electric Corp | 荷電ビーム装置におけるビームブランキング装置 |
| JPH04112439A (ja) * | 1990-08-31 | 1992-04-14 | Jeol Ltd | 電子線装置 |
| JP3272820B2 (ja) * | 1993-06-24 | 2002-04-08 | 富士通株式会社 | 電子ビーム露光装置及び方法 |
| JP3376793B2 (ja) * | 1995-12-20 | 2003-02-10 | 株式会社日立製作所 | 走査形電子顕微鏡 |
| US6184524B1 (en) * | 1996-08-07 | 2001-02-06 | Gatan, Inc. | Automated set up of an energy filtering transmission electron microscope |
| JP3697810B2 (ja) * | 1996-12-18 | 2005-09-21 | 株式会社ニコン | 電子線を用いた転写装置 |
| US5969355A (en) * | 1997-09-04 | 1999-10-19 | Seiko Instruments Inc. | Focused ion beam optical axis adjustment method and focused ion beam apparatus |
| NL1009959C2 (nl) * | 1998-08-28 | 2000-02-29 | Univ Delft Tech | Elektronenmicroscoop. |
| JP2000100715A (ja) * | 1998-09-17 | 2000-04-07 | Nikon Corp | 電子ビーム露光装置の調整方法 |
| US6614026B1 (en) * | 1999-04-15 | 2003-09-02 | Applied Materials, Inc. | Charged particle beam column |
| JP2002542818A (ja) | 1999-05-03 | 2002-12-17 | カロリンスカ イノヴェーションズ アクツィエボラーグ | ニューロンの発生に関連する材料及び方法 |
| JP4041260B2 (ja) * | 2000-03-02 | 2008-01-30 | 日本電子株式会社 | 荷電粒子ビーム装置及び荷電粒子ビーム装置の制御方法 |
| TWI294632B (en) * | 2000-06-27 | 2008-03-11 | Ebara Corp | Inspecting device using an electron ebam and method for making semiconductor devices with such inspection device |
| US6678932B1 (en) * | 2001-11-08 | 2004-01-20 | Schlumberger Technologies, Inc. | Fixture for assembling parts of a device such as a Wien filter |
| US6593578B1 (en) * | 2001-11-08 | 2003-07-15 | Schlumberger Technologies, Inc. | Wien filter for use in a scanning electron microscope or the like |
| DE10312989A1 (de) * | 2002-03-28 | 2003-11-06 | Toshiba Kk | Lithographiesystem mit Strahl aus geladenen Teilchen, Lithographieverfahren, das einen Strahl aus geladenen Teilchen verwendet, Verfahren zum Steuern eines Strahls aus geladenen Teilchen, und Verfahren zur Herstellung eines Halbleiterbauteils |
| EP1517353B1 (en) * | 2003-09-11 | 2008-06-25 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam energy width reduction system for charged particle beam system |
| EP1517354B1 (en) * | 2003-09-11 | 2008-05-21 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Double stage charged particle beam energy width reduction system for charged particle beam system |
| JP2005294128A (ja) | 2004-04-02 | 2005-10-20 | Jeol Ltd | エネルギーフィルタおよび電子顕微鏡ならびにスリット移動機構 |
| EP1744344B1 (en) * | 2005-07-11 | 2010-08-25 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Electric-magnetic field generating element and assembling method for same |
| JP2009099540A (ja) * | 2007-09-27 | 2009-05-07 | Hitachi High-Technologies Corp | 試料の検査,測定方法、及び走査電子顕微鏡 |
| DE102009052392A1 (de) * | 2009-11-09 | 2011-12-15 | Carl Zeiss Nts Gmbh | SACP-Verfahren und teilchenoptisches System zur Ausführung eines solchen Verfahrens |
| JP5329380B2 (ja) | 2009-12-15 | 2013-10-30 | 日本電子株式会社 | モノクロメータのスリット位置制御方法及び装置並びに分析電子顕微鏡 |
| US8274046B1 (en) * | 2011-05-19 | 2012-09-25 | Hermes Microvision Inc. | Monochromator for charged particle beam apparatus |
| US9053900B2 (en) * | 2012-04-03 | 2015-06-09 | Kla-Tencor Corporation | Apparatus and methods for high-resolution electron beam imaging |
| JP5972677B2 (ja) * | 2012-06-12 | 2016-08-17 | 日本電子株式会社 | 電子顕微鏡の調整方法及び電子顕微鏡 |
| JP6265643B2 (ja) * | 2013-07-31 | 2018-01-24 | 株式会社日立ハイテクノロジーズ | 電子ビーム装置 |
| JP2016039119A (ja) * | 2014-08-11 | 2016-03-22 | 日本電子株式会社 | 電子顕微鏡、および電子顕微鏡の調整方法 |
| JP6266467B2 (ja) * | 2014-08-11 | 2018-01-24 | 日本電子株式会社 | 電子顕微鏡、およびモノクロメーターの調整方法 |
-
2014
- 2014-03-07 JP JP2014045311A patent/JP6340216B2/ja active Active
-
2015
- 2015-02-04 WO PCT/JP2015/053033 patent/WO2015133214A1/ja not_active Ceased
- 2015-02-04 US US15/123,828 patent/US10134558B2/en active Active
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