JP6316703B2 - 基板処理装置および基板処理方法 - Google Patents

基板処理装置および基板処理方法 Download PDF

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JP6316703B2
JP6316703B2 JP2014166641A JP2014166641A JP6316703B2 JP 6316703 B2 JP6316703 B2 JP 6316703B2 JP 2014166641 A JP2014166641 A JP 2014166641A JP 2014166641 A JP2014166641 A JP 2014166641A JP 6316703 B2 JP6316703 B2 JP 6316703B2
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processing
substrate
unit
abnormality
processing unit
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JP2016042565A (ja
JP2016042565A5 (cg-RX-API-DMAC10.html
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雄二 滝本
雄二 滝本
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2014166641A priority Critical patent/JP6316703B2/ja
Priority to US14/824,720 priority patent/US10474139B2/en
Priority to KR1020150114530A priority patent/KR102456823B1/ko
Priority to TW104126659A priority patent/TWI663490B/zh
Priority to CN201510510820.XA priority patent/CN105374715B/zh
Publication of JP2016042565A publication Critical patent/JP2016042565A/ja
Publication of JP2016042565A5 publication Critical patent/JP2016042565A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Program-control systems
    • G05B19/02—Program-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G05B19/41875—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by quality surveillance of production
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0404—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/20—Pc systems
    • G05B2219/24—Pc safety
    • G05B2219/24015—Monitoring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

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  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
JP2014166641A 2014-08-19 2014-08-19 基板処理装置および基板処理方法 Active JP6316703B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2014166641A JP6316703B2 (ja) 2014-08-19 2014-08-19 基板処理装置および基板処理方法
US14/824,720 US10474139B2 (en) 2014-08-19 2015-08-12 Substrate processing apparatus and substrate processing method
KR1020150114530A KR102456823B1 (ko) 2014-08-19 2015-08-13 기판 처리 장치 및 기판 처리 방법
TW104126659A TWI663490B (zh) 2014-08-19 2015-08-17 基板處理裝置及基板處理方法
CN201510510820.XA CN105374715B (zh) 2014-08-19 2015-08-19 基板处理装置和基板处理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014166641A JP6316703B2 (ja) 2014-08-19 2014-08-19 基板処理装置および基板処理方法

Publications (3)

Publication Number Publication Date
JP2016042565A JP2016042565A (ja) 2016-03-31
JP2016042565A5 JP2016042565A5 (cg-RX-API-DMAC10.html) 2017-02-09
JP6316703B2 true JP6316703B2 (ja) 2018-04-25

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Family Applications (1)

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JP2014166641A Active JP6316703B2 (ja) 2014-08-19 2014-08-19 基板処理装置および基板処理方法

Country Status (5)

Country Link
US (1) US10474139B2 (cg-RX-API-DMAC10.html)
JP (1) JP6316703B2 (cg-RX-API-DMAC10.html)
KR (1) KR102456823B1 (cg-RX-API-DMAC10.html)
CN (1) CN105374715B (cg-RX-API-DMAC10.html)
TW (1) TWI663490B (cg-RX-API-DMAC10.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6793048B2 (ja) 2017-01-27 2020-12-02 東京エレクトロン株式会社 基板処理装置、ダミーディスペンス方法及びコンピュータ読み取り可能な記録媒体
US11923220B2 (en) * 2018-01-26 2024-03-05 Tokyo Electron Limited Substrate processing apparatus
JP7304692B2 (ja) * 2018-12-13 2023-07-07 東京エレクトロン株式会社 基板処理方法および基板処理装置
KR102798725B1 (ko) * 2019-03-28 2025-04-23 도쿄엘렉트론가부시키가이샤 기판 처리 장치 및 기판 처리 방법
JP7303678B2 (ja) * 2019-07-08 2023-07-05 東京エレクトロン株式会社 基板処理システム及び基板処理方法
JP7330053B2 (ja) * 2019-10-09 2023-08-21 東京エレクトロン株式会社 洗浄装置、基板処理装置および異常判断方法
CN117063065A (zh) * 2022-03-14 2023-11-14 株式会社日立高新技术 诊断装置、半导体制造装置系统、半导体装置制造系统以及诊断方法

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JPH05251328A (ja) * 1992-03-05 1993-09-28 Nec Yamagata Ltd フォトレジスト膜塗布装置
JPH0629178A (ja) * 1992-07-07 1994-02-04 Nikon Corp 露光方法及び露光装置
JP3876059B2 (ja) * 1997-09-29 2007-01-31 大日本スクリーン製造株式会社 基板処理装置および周辺部材の洗浄方法
US6197123B1 (en) * 1997-12-18 2001-03-06 Texas Instruments Incorporated Method for cleaning a process chamber used for manufacturing substrates during nonproduction intervals
JPH11204390A (ja) * 1998-01-14 1999-07-30 Canon Inc 半導体製造装置およびデバイス製造方法
JP3811376B2 (ja) * 2001-08-08 2006-08-16 大日本スクリーン製造株式会社 基板洗浄方法および基板洗浄装置
JP4068404B2 (ja) * 2002-06-26 2008-03-26 大日本スクリーン製造株式会社 基板処理システム、基板処理装置、基板処理方法、プログラム及び記録媒体
JP2005064214A (ja) 2003-08-12 2005-03-10 Dainippon Screen Mfg Co Ltd 基板処理システム、基板処理装置、および基板処理方法
JP4490797B2 (ja) * 2004-01-23 2010-06-30 大日本スクリーン製造株式会社 基板処理装置
JP4377295B2 (ja) * 2004-07-28 2009-12-02 東京エレクトロン株式会社 処理方法及び処理システム
JP4972277B2 (ja) * 2004-11-10 2012-07-11 東京エレクトロン株式会社 基板処理装置の復帰方法、該装置の復帰プログラム、及び基板処理装置
JP4607576B2 (ja) * 2004-12-28 2011-01-05 東京エレクトロン株式会社 半導体製造装置
JP4874580B2 (ja) * 2005-06-14 2012-02-15 株式会社東芝 異常原因特定方法および異常原因特定システム
KR20070001641A (ko) * 2005-06-29 2007-01-04 삼성전자주식회사 웨이퍼 정렬 장치 및 그의 파티클 검출 방법, 그리고 이를구비하는 반도체 제조 설비 및 그의 처리 방법
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KR100885284B1 (ko) * 2007-08-09 2009-02-23 세메스 주식회사 기판처리장치 및 방법
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CN103367103B (zh) * 2012-03-28 2016-03-23 无锡华润上华科技有限公司 半导体产品生产方法及系统
JP2013207186A (ja) * 2012-03-29 2013-10-07 Dainippon Screen Mfg Co Ltd 雰囲気監視方法と雰囲気監視装置およびこれを用いた基板処理装置
US9240360B2 (en) * 2012-07-25 2016-01-19 International Business Machines Corporation Run-to-run control utilizing virtual metrology in semiconductor manufacturing
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TWI549007B (zh) * 2013-02-07 2016-09-11 先知科技股份有限公司 製程參數的搜尋與分析方法及其電腦程式產品
TWI497632B (zh) * 2013-04-01 2015-08-21 Process monitoring method and surface analysis system
JP6224359B2 (ja) * 2013-06-20 2017-11-01 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置のためのスケジュール作成方法およびスケジュール作成プログラム

Also Published As

Publication number Publication date
KR102456823B1 (ko) 2022-10-19
KR20160022262A (ko) 2016-02-29
TWI663490B (zh) 2019-06-21
JP2016042565A (ja) 2016-03-31
TW201619725A (zh) 2016-06-01
CN105374715B (zh) 2019-06-11
US20160054719A1 (en) 2016-02-25
CN105374715A (zh) 2016-03-02
US10474139B2 (en) 2019-11-12

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