JP6251955B2 - 電気光学装置、電気光学装置の製造方法、及び電子機器 - Google Patents
電気光学装置、電気光学装置の製造方法、及び電子機器 Download PDFInfo
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- JP6251955B2 JP6251955B2 JP2013009014A JP2013009014A JP6251955B2 JP 6251955 B2 JP6251955 B2 JP 6251955B2 JP 2013009014 A JP2013009014 A JP 2013009014A JP 2013009014 A JP2013009014 A JP 2013009014A JP 6251955 B2 JP6251955 B2 JP 6251955B2
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- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
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- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
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- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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Description
図1は、電気光学装置としての液晶装置が複数面付けされたウエハの一部の構成を示す模式平面図である。図2は、液晶装置の構成を示す模式平面図である。図3は、図2に示す液晶装置のH−H’線に沿う模式断面図である。図4は、液晶装置の電気的な構成を示す等価回路図である。以下、液晶装置の構成を、図1〜図4を参照しながら説明する。
図7及び図8は、電気光学装置としての液晶装置の製造方法のうち一部の製造方法を模式断面図である。以下、液晶装置の製造方法を、図7及び図8を参照しながら説明する。なお、図7及び図8は、図6に示す液晶装置の断面構造を簡略化して説明する。
次に、本実施形態の電子機器としての投射型表示装置について、図9を参照して説明する。図9は、上記した液晶装置を備えた投射型表示装置の構成を示す概略図である。
上記したように、液晶装置の構造は、図6に示すような構造であることに限定されず、例えば、図10〜図13に示すような構造でもよい。図10、図12、図13は、変形例の液晶装置の構造を示す模式断面図である。図11は、図10の液晶装置のうち一部分の変形例を示す模式断面図である。
上記したように、透過型の液晶装置100であることに限定されず、例えば、反射型の液晶装置に本発明を適用するようにしてもよい。
上記したように、電気光学装置として液晶装置100を用いることに限定されず、例えば、有機EL装置、プラズマディスプレイ、電子ペーパー等に適用するようにしてもよい。
Claims (8)
- 第1の領域と、前記第1の領域の外側に位置する第2の領域と、を有する第1基材と、
前記第1基材の上に配置されるトランジスターと、
前記第1基材上の前記第1の領域に設けられた画素電極と、
前記トランジスターに電気的に接続される、第1の電極と第2の電極との間に絶縁膜が挟持された容量と、
前記第1の電極に電気的に接続される第1配線と、
前記第2の電極に電気的に接続される第2配線と、
前記第1配線と前記画素電極とを電気的に接続するための第1コンタクトホールと、
前記第2配線の上に配置される第2コンタクトホールと、
前記第2配線に電位を供給するための外部接続端子と、を含み、
前記第1コンタクトホールと前記第2コンタクトホールは、前記画素電極と、前記第1配線及び前記第2配線との間に設けられた画素絶縁膜に設けられ、
前記第1配線および前記第2配線は、前記第1基材上の第1の層に設けられ、
前記第2配線は、前記第1の領域から前記第2の領域に延在するように設けられていることを特徴とすることを特徴とする電気光学装置。 - 前記第1基材上に配置されるデータ線と、をさらに有し、
前記トランジスターは、ドレイン領域を有し、
前記第1基材上において、前記第2配線は前記データ線とは異なる層に設けられていることを特徴とする請求項1に記載の電気光学装置。 - 前記第2の電極は、前記第1基材と前記第1の層との間に設けられた第2の層に設けられていることを特徴とする請求項1に記載の電気光学装置。
- 前記第2配線は、前記トランジスターと平面視で重なる部分を有することを特徴とする請求項1乃至3のいずれか一項に記載の電気光学装置。
- 第1基材の上にトランジスターを形成するトランジスター形成工程と、
前記トランジスターの上に、前記トランジスターと接続される、一対の電極間に絶縁膜が挟持された構造の容量を形成する容量形成工程と、
前記一対の電極のうち一方の電極と電気的に接続される第1配線を前記第1基材上の第1の層に形成する第1配線形成工程と、
前記一対の電極のうち他方の電極と電気的に接続される第2配線を、第1の領域から前記第1の領域の外側に位置する第2の領域に延在するように、前記第1の層に形成する第2配線形成工程と、
前記第1配線及び前記第2配線の上に画素絶縁膜を形成する画素絶縁膜形成工程と、
前記画素絶縁膜に、前記第1配線と画素電極とを電気的に接続するための第1コンタクトホールと、前記第2配線と電気的に接続される第2コンタクトホールと、を形成するコンタクトホール形成工程と、
前記第2配線に電位を供給するための外部接続端子を形成する外部接続端子形成工程と、
前記第1の領域に前記画素電極を形成する画素電極形成工程と、
を有することを特徴とする電気光学装置の製造方法。 - 請求項5に記載の電気光学装置の製造方法であって、
データ線を前記第2配線とは異なる層に設ける工程を有することを特徴とする電気光学装置の製造方法。 - 請求項5又は請求項6に記載の電気光学装置の製造方法であって、
第2配線形成工程では前記トランジスターと平面視で重なる部分を有するように前記第2配線を形成することを特徴とする電気光学装置の製造方法。 - 請求項1乃至請求項4のいずれか一項に記載の電気光学装置を備えることを特徴とする電子機器。
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