JP6156068B2 - 圧電体薄膜素子及びインクジェット記録ヘッド、並びにインクジェット式画像形成装置 - Google Patents
圧電体薄膜素子及びインクジェット記録ヘッド、並びにインクジェット式画像形成装置 Download PDFInfo
- Publication number
- JP6156068B2 JP6156068B2 JP2013228709A JP2013228709A JP6156068B2 JP 6156068 B2 JP6156068 B2 JP 6156068B2 JP 2013228709 A JP2013228709 A JP 2013228709A JP 2013228709 A JP2013228709 A JP 2013228709A JP 6156068 B2 JP6156068 B2 JP 6156068B2
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- Prior art keywords
- film
- piezoelectric
- thin film
- piezoelectric thin
- lower electrode
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
- B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
- H10N30/077—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
- H10N30/077—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition
- H10N30/078—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition by sol-gel deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
- H10N30/2047—Membrane type
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/704—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings
- H10N30/706—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings characterised by the underlying bases, e.g. substrates
- H10N30/708—Intermediate layers, e.g. barrier, adhesion or growth control buffer layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8548—Lead-based oxides
- H10N30/8554—Lead-zirconium titanate [PZT] based
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/87—Electrodes or interconnections, e.g. leads or terminals
- H10N30/877—Conductive materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Dispersion Chemistry (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013228709A JP6156068B2 (ja) | 2013-03-14 | 2013-11-01 | 圧電体薄膜素子及びインクジェット記録ヘッド、並びにインクジェット式画像形成装置 |
| US14/206,092 US9586401B2 (en) | 2013-03-14 | 2014-03-12 | Piezoelectric thin film element, inkjet recording head, and inkjet image-forming apparatus |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013051187 | 2013-03-14 | ||
| JP2013051187 | 2013-03-14 | ||
| JP2013228709A JP6156068B2 (ja) | 2013-03-14 | 2013-11-01 | 圧電体薄膜素子及びインクジェット記録ヘッド、並びにインクジェット式画像形成装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014199910A JP2014199910A (ja) | 2014-10-23 |
| JP2014199910A5 JP2014199910A5 (enExample) | 2016-03-31 |
| JP6156068B2 true JP6156068B2 (ja) | 2017-07-05 |
Family
ID=51525537
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013228709A Active JP6156068B2 (ja) | 2013-03-14 | 2013-11-01 | 圧電体薄膜素子及びインクジェット記録ヘッド、並びにインクジェット式画像形成装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US9586401B2 (enExample) |
| JP (1) | JP6156068B2 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8633634B2 (en) * | 2011-11-18 | 2014-01-21 | The Board Of Regents Of The University Of Texas System | MEMs-based cantilever energy harvester |
| EP2846370B1 (en) * | 2012-05-01 | 2016-07-06 | Konica Minolta, Inc. | Piezoelectric element |
| US9931670B2 (en) * | 2014-05-23 | 2018-04-03 | Konica Minolta Laboratory U.S.A., Inc. | Integrated ultrasound transducer |
| JP6414744B2 (ja) * | 2014-12-12 | 2018-10-31 | 株式会社リコー | 電気機械変換素子、液滴吐出ヘッドおよび画像形成装置 |
| JP6486094B2 (ja) * | 2014-12-17 | 2019-03-20 | スタンレー電気株式会社 | 積層構造体及びその製造方法 |
| JP6525255B2 (ja) * | 2015-05-28 | 2019-06-05 | 株式会社リコー | 電気機械変換素子、電気機械変換素子の製造方法、液滴吐出ヘッド及び液滴吐出装置 |
| JP6686444B2 (ja) | 2016-01-07 | 2020-04-22 | 株式会社リコー | Pzt膜積層構造体、液体吐出ヘッド、液体吐出ユニット、液体を吐出する装置及びpzt膜積層構造体の製造方法 |
| JP6903865B2 (ja) | 2016-01-22 | 2021-07-14 | 株式会社リコー | 電気機械変換素子及びその製造方法、液体吐出ヘッド、液体吐出ユニット、液体を吐出する装置 |
| JP2017199892A (ja) | 2016-02-17 | 2017-11-02 | 株式会社リコー | 電気−機械変換素子とその製造方法、電気−機械変換素子を備えた液体吐出ヘッドおよび液体吐出装置 |
| JP2017157773A (ja) | 2016-03-04 | 2017-09-07 | 株式会社リコー | 電気機械変換素子、液体吐出ヘッド、液体吐出ユニット及び液体を吐出する装置 |
| EP3220431B1 (en) * | 2016-03-16 | 2019-10-30 | Xaar Technology Limited | A piezoelectric thin film element |
| EP3220430B1 (en) * | 2016-03-16 | 2019-10-30 | Xaar Technology Limited | A piezoelectric thin film element |
| SG11201807434QA (en) * | 2016-03-16 | 2018-09-27 | Xaar Technology Ltd | A piezoelectric thin film element |
| JP6720669B2 (ja) | 2016-04-22 | 2020-07-08 | 株式会社リコー | 電気機械変換装置、センサ、アクチュエータ、及びそれらの製造方法、液体吐出ヘッド、液体吐出ユニット、液体を吐出する装置 |
| GB2551803B (en) * | 2016-06-30 | 2020-04-01 | Xaar Technology Ltd | Poling of a piezoelectric thin film element in a preferred electric field driving direction |
| US10556431B2 (en) | 2017-06-23 | 2020-02-11 | Ricoh Company, Ltd. | Electromechanical transducer element, liquid discharge head, liquid discharge device, and liquid discharge apparatus |
| JP6939214B2 (ja) | 2017-08-01 | 2021-09-22 | 株式会社リコー | 電気−機械変換素子、液体吐出ヘッド及び液体を吐出する装置 |
| JP7142875B2 (ja) * | 2018-06-20 | 2022-09-28 | キヤノン株式会社 | 配向性圧電体膜、およびその製造方法、並びに、液体吐出ヘッド |
| JP7363067B2 (ja) | 2019-03-19 | 2023-10-18 | 株式会社リコー | 圧電体薄膜素子、液体吐出ヘッド、ヘッドモジュール、液体吐出ユニット、液体を吐出する装置及び圧電体薄膜素子の製造方法 |
| JP7537093B2 (ja) | 2020-02-17 | 2024-08-21 | 株式会社リコー | アクチュエータ、液体吐出ヘッド、液体吐出装置及びアクチュエータの製造方法 |
| JP2022057129A (ja) | 2020-09-30 | 2022-04-11 | 株式会社リコー | アクチュエータ、液体吐出ヘッド及び液体吐出装置 |
| US20240081151A1 (en) * | 2021-02-05 | 2024-03-07 | Konica Minolta, Inc. | Electromechanical conversion element, method for manufacturing same, and liquid discharge head |
| JP2023180465A (ja) | 2022-06-09 | 2023-12-21 | 株式会社リコー | 液体吐出ヘッド、液体吐出ユニット、及び、液体を吐出する装置 |
| US12391042B2 (en) | 2022-09-29 | 2025-08-19 | Ricoh Company, Ltd. | Liquid discharge head, liquid discharge unit, and liquid discharge apparatus |
| WO2025164656A1 (ja) * | 2024-01-29 | 2025-08-07 | 三菱マテリアル株式会社 | Pzt系強誘電体層付き基板 |
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| JPH10126204A (ja) * | 1996-10-15 | 1998-05-15 | Mitsubishi Materials Corp | 薄膜圧電素子 |
| JP3903474B2 (ja) | 1997-03-25 | 2007-04-11 | セイコーエプソン株式会社 | アクチュエータ、及びインクジェット式記録ヘッド、並びに圧電体薄膜素子の製造方法 |
| JPH10287983A (ja) | 1997-04-15 | 1998-10-27 | Seiko Epson Corp | チタン含有セラミックス薄膜の製造方法 |
| JP3472087B2 (ja) | 1997-06-30 | 2003-12-02 | Tdk株式会社 | 膜構造体、電子デバイス、記録媒体および酸化物導電性薄膜の製造方法 |
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| JP3517876B2 (ja) | 1998-10-14 | 2004-04-12 | セイコーエプソン株式会社 | 強誘電体薄膜素子の製造方法、インクジェット式記録ヘッド及びインクジェットプリンタ |
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| JP5090270B2 (ja) | 2008-06-27 | 2012-12-05 | Hoya株式会社 | レンズ鏡筒の光量調節ユニット支持構造 |
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| JP5035378B2 (ja) * | 2009-06-22 | 2012-09-26 | 日立電線株式会社 | 圧電薄膜素子及びその製造方法、並びに圧電薄膜デバイス |
| JP5540654B2 (ja) * | 2009-11-03 | 2014-07-02 | セイコーエプソン株式会社 | 液体噴射ヘッド及び液体噴射装置並びに圧電素子 |
| EP2617076B1 (en) | 2010-09-15 | 2014-12-10 | Ricoh Company, Limited | Electromechanical transducing device and manufacturing method thereof |
| JP5621922B2 (ja) * | 2011-05-23 | 2014-11-12 | コニカミノルタ株式会社 | 圧電素子およびその製造方法 |
| WO2012165110A1 (ja) * | 2011-05-31 | 2012-12-06 | コニカミノルタホールディングス株式会社 | 強誘電体膜およびそれを備えた圧電素子 |
| JP2012253161A (ja) * | 2011-06-01 | 2012-12-20 | Seiko Epson Corp | 圧電素子及び液体噴射ヘッド並びに液体噴射装置 |
| JP5892406B2 (ja) | 2011-06-30 | 2016-03-23 | 株式会社リコー | 電気機械変換素子、液滴吐出ヘッド及び液滴吐出装置 |
| JP5811728B2 (ja) | 2011-09-16 | 2015-11-11 | 株式会社リコー | 電気−機械変換素子、液滴吐出ヘッド、液滴吐出装置及び画像形成装置 |
| JP2013197522A (ja) | 2012-03-22 | 2013-09-30 | Ricoh Co Ltd | 圧電体薄膜素子とその製造方法、該圧電体薄膜素子を用いた液滴吐出ヘッドおよびインクジェット記録装置 |
| JP2013201198A (ja) | 2012-03-23 | 2013-10-03 | Ricoh Co Ltd | 電気機械変換素子及びその製造方法、圧電型アクチュエータ、液滴吐出ヘッド、インクジェット記録装置 |
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| US20140267509A1 (en) | 2014-09-18 |
| JP2014199910A (ja) | 2014-10-23 |
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