JP6041541B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP6041541B2
JP6041541B2 JP2012127531A JP2012127531A JP6041541B2 JP 6041541 B2 JP6041541 B2 JP 6041541B2 JP 2012127531 A JP2012127531 A JP 2012127531A JP 2012127531 A JP2012127531 A JP 2012127531A JP 6041541 B2 JP6041541 B2 JP 6041541B2
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JP
Japan
Prior art keywords
optical system
reflecting mirror
convex
meniscus lens
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012127531A
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English (en)
Japanese (ja)
Other versions
JP2013250541A5 (enrdf_load_stackoverflow
JP2013250541A (ja
Inventor
善之 永井
善之 永井
恭一 宮▲崎▼
恭一 宮▲崎▼
蔵 安延
蔵 安延
春名 川島
春名 川島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2012127531A priority Critical patent/JP6041541B2/ja
Priority to TW102116193A priority patent/TWI490540B/zh
Priority to CN201310208070.1A priority patent/CN103454769B/zh
Priority to KR1020130062198A priority patent/KR20130136390A/ko
Publication of JP2013250541A publication Critical patent/JP2013250541A/ja
Publication of JP2013250541A5 publication Critical patent/JP2013250541A5/ja
Application granted granted Critical
Publication of JP6041541B2 publication Critical patent/JP6041541B2/ja
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Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2012127531A 2012-06-04 2012-06-04 露光装置及びデバイス製造方法 Active JP6041541B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012127531A JP6041541B2 (ja) 2012-06-04 2012-06-04 露光装置及びデバイス製造方法
TW102116193A TWI490540B (zh) 2012-06-04 2013-05-07 An optical system, an exposure apparatus, and a manufacturing apparatus
CN201310208070.1A CN103454769B (zh) 2012-06-04 2013-05-30 光学系统、曝光装置以及制造器件的方法
KR1020130062198A KR20130136390A (ko) 2012-06-04 2013-05-31 광학계, 노광 장치 및 디바이스를 제조하는 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012127531A JP6041541B2 (ja) 2012-06-04 2012-06-04 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2013250541A JP2013250541A (ja) 2013-12-12
JP2013250541A5 JP2013250541A5 (enrdf_load_stackoverflow) 2015-07-23
JP6041541B2 true JP6041541B2 (ja) 2016-12-07

Family

ID=49737318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012127531A Active JP6041541B2 (ja) 2012-06-04 2012-06-04 露光装置及びデバイス製造方法

Country Status (4)

Country Link
JP (1) JP6041541B2 (enrdf_load_stackoverflow)
KR (1) KR20130136390A (enrdf_load_stackoverflow)
CN (1) CN103454769B (enrdf_load_stackoverflow)
TW (1) TWI490540B (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6463087B2 (ja) * 2014-11-14 2019-01-30 キヤノン株式会社 露光装置、および物品の製造方法
JP6386896B2 (ja) * 2014-12-02 2018-09-05 キヤノン株式会社 投影光学系、露光装置、および、デバイス製造方法
JP6896404B2 (ja) * 2016-11-30 2021-06-30 キヤノン株式会社 露光装置及び物品の製造方法
JP7358106B2 (ja) * 2019-07-31 2023-10-10 キヤノン株式会社 光学装置、投影光学系、露光装置及び物品の製造方法

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4690528A (en) * 1983-10-05 1987-09-01 Nippon Kogaku K. K. Projection exposure apparatus
JPS61144020A (ja) * 1984-12-18 1986-07-01 Canon Inc 露光装置
JPH0845824A (ja) * 1994-08-03 1996-02-16 Toshiba Corp 露光装置
JP3521416B2 (ja) * 1995-10-06 2004-04-19 株式会社ニコン 投影露光装置
JPH09180985A (ja) * 1995-12-25 1997-07-11 Nikon Corp 投影露光装置
JP2001290279A (ja) * 2000-04-04 2001-10-19 Canon Inc 走査型露光装置
AU2003242268A1 (en) * 2002-06-11 2003-12-22 Nikon Corporation Exposure system and exposure method
JP3944008B2 (ja) * 2002-06-28 2007-07-11 キヤノン株式会社 反射ミラー装置及び露光装置及びデバイス製造方法
US6809888B1 (en) * 2003-04-16 2004-10-26 Ultratech, Inc. Apparatus and methods for thermal reduction of optical distortion
US7304715B2 (en) * 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102004060184A1 (de) * 2004-12-14 2006-07-06 Carl Zeiss Smt Ag EUV-Spiegelanordnung
DE102005017262B3 (de) * 2005-04-12 2006-10-12 Xtreme Technologies Gmbh Kollektorspiegel für plasmabasierte kurzwellige Strahlungsquellen
US7959310B2 (en) * 2006-09-13 2011-06-14 Carl Zeiss Smt Gmbh Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element
JP2008292761A (ja) * 2007-05-24 2008-12-04 Canon Inc 露光装置及びデバイス製造方法
JP5118407B2 (ja) * 2007-07-31 2013-01-16 キヤノン株式会社 光学系、露光装置及びデバイス製造方法
JP2009162951A (ja) * 2007-12-28 2009-07-23 Canon Inc 反射屈折型投影光学系及びそれを有する露光装置
JP2009192569A (ja) * 2008-02-12 2009-08-27 Canon Inc 露光装置およびデバイス製造方法
EP2136250A1 (en) * 2008-06-18 2009-12-23 ASML Netherlands B.V. Lithographic apparatus and method
JP5398185B2 (ja) * 2008-07-09 2014-01-29 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP5587578B2 (ja) * 2008-09-26 2014-09-10 ギガフォトン株式会社 極端紫外光源装置およびパルスレーザ装置
JP2010128301A (ja) * 2008-11-28 2010-06-10 Canon Inc 露光装置
JP5495547B2 (ja) * 2008-12-25 2014-05-21 キヤノン株式会社 処理装置、およびデバイス製造方法
JP2011039172A (ja) * 2009-08-07 2011-02-24 Canon Inc 露光装置およびデバイス製造方法
JP5595001B2 (ja) * 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
CN102243444B (zh) * 2010-05-14 2013-04-10 北京京东方光电科技有限公司 一种曝光设备、掩膜板及曝光方法

Also Published As

Publication number Publication date
TW201350902A (zh) 2013-12-16
CN103454769B (zh) 2016-05-04
JP2013250541A (ja) 2013-12-12
KR20130136390A (ko) 2013-12-12
CN103454769A (zh) 2013-12-18
TWI490540B (zh) 2015-07-01

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